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    • 52. 发明授权
    • Projection exposure apparatus and projection exposure method
    • 投影曝光装置和投影曝光方法
    • US6094268A
    • 2000-07-25
    • US315841
    • 1994-09-30
    • Yoshitada OshidaTetsuzo TanimotoMinoru Tanaka
    • Yoshitada OshidaTetsuzo TanimotoMinoru Tanaka
    • G03F7/207G03F9/00G01B11/14
    • G03F9/7049
    • A projection exposure apparatus (1) comprises an incident light optical system for causing the light emitted from a light source 1 to enter an object of exposure (4) in diagonal direction, a detection apparatus (3) for causing an interference between the light reflected from the object of exposure (4) and a reference light and detecting the resultant interference fringe, a processing circuit for determining the inclination and height of the surface of the object of exposure (4) from the optical information on the interference fringe, and a stage (7) for supporting the object of exposure (4). The object of exposure (4) is subjected to projection exposure by driving the stage (7) according to the calculated inclination and height of the object of exposure (4).
    • 投影曝光装置(1)包括入射光学系统,用于使从光源1发射的光在对角线方向进入曝光对象(4);检测装置(3),用于使反射光 从曝光对象(4)和参考光中检测所得的干涉条纹,处理电路用于根据干涉条纹的光学信息确定曝光物体(4)的表面的倾斜度和高度,以及 舞台(7)支持曝光对象(4)。 曝光对象(4)通过根据计算出的曝光对象的倾斜度和高度来驱动舞台(7)进行投影曝光(4)。