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51. 发明授权

US06528959B2 Driving force control system for front-and-rear wheel drive vehicles 有权
公开(公告)号：US06528959B2
公开(公告)日：2003-03-04
申请号：US09906054
申请日：2001-07-17
申请人： Kazuhiko Kitano , Toshihiko Fukuda , Takahiro Yonekura , Naoki Uchiyama , Kenji Honda , Tooru Nakasako
发明人： Kazuhiko Kitano , Toshihiko Fukuda , Takahiro Yonekura , Naoki Uchiyama , Kenji Honda , Tooru Nakasako
IPC分类号： H02P766
CPC分类号： B60W20/10 , B60K6/48 , B60K6/52 , B60K28/16 , B60L2240/486 , B60T8/1769 , B60T8/48 , B60T2201/04 , B60T2270/602 , B60W10/06 , B60W10/08 , B60W20/00 , B60W2520/10 , B60W2530/00 , B60W2540/10 , B60W2550/142 , B60W2710/0666 , B60W2710/1061 , B60W2720/106 , Y02T10/6221 , Y02T10/6265 , Y02T10/6286 , Y10S903/916
摘要： There is provided a driving force control system for a front-and-rear wheel drive vehicle, which is capable maintaining an optimum slip condition of the drive wheels even on a low-friction road surface, ensuring a proper grip of rear wheels even on a low-friction road surface or a downhill slope, even when the driver operates the steering wheel while the vehicle is performing decelerating travel on such a road, and smoothly performing the assistance of an electric motor when the vehicle is accelerated without developing a torque step, thereby ensuring stable traveling and excellent acceleration and drivability. The front-and-rear wheel drive vehicle drives the front wheels by an engine, and rear wheels by an electric motor via an electromagnetic clutch. The target driving force for driving the vehicle is calculated based on at least a vehicle speed and an accelerator pedal opening. The present traveling condition of the vehicle is determined. The driving force for driving the vehicle is controlled based on the calculated target driving force in dependence on the determined traveling condition of the vehicle.

52. 发明授权

US06330132B1 Magnetic head with high bonding strength of member for bonding head element and conductive pattern connected to external circuit 有权
标题翻译：具有高粘合强度的磁头，用于将头元件和导体图案连接到外部电路
公开(公告)号：US06330132B1
公开(公告)日：2001-12-11
申请号：US09507827
申请日：2000-02-22
申请人： Kenji Honda
发明人： Kenji Honda
IPC分类号： G11B548
CPC分类号： G11B5/4853 , G11B5/3103 , G11B5/48 , H05K3/328
摘要： A magnetic head comprises a bump electrically connected to a head element on a side wall of a slider, and a pad covering a protective layer and a contact area of the bump exposed from an flat surface of the protective layer. In the magnetic head, since a bonding member for bonding a conductive pattern to the pad is bonded in a bonding area of the pad formed on the protective layer, secure bonding can be obtained regardless of the form of the contact area of the bump, and a highly reliable magnetic head, without bonding defects, can therefore be provided.
摘要翻译：磁头包括电连接到滑块的侧壁上的头元件的凸块和覆盖保护层的焊盘和从保护层的平坦表面露出的凸块的接触区域。在磁头中，由于在导电图案与焊盘接合的接合部件被接合在形成在保护层上的焊盘的接合区域中，无论凸点的接触面的形状如何，均可获得牢固的接合，因此，可以提供高度可靠的磁头，而不会发生结合缺陷。

53. 发明授权

US06245155B1 Method for removing photoresist and plasma etch residues 失效
标题翻译：去除光刻胶和等离子蚀刻残留物的方法
公开(公告)号：US06245155B1
公开(公告)日：2001-06-12
申请号：US09055630
申请日：1998-04-06
申请人： Vincent G. Leon , Kenji Honda , Eugene F. Rothgery
发明人： Vincent G. Leon , Kenji Honda , Eugene F. Rothgery
IPC分类号： C23G102
CPC分类号： C11D1/62 , C11D3/046 , C11D3/245 , C11D3/30 , C11D7/06 , C11D7/10 , C11D7/3209 , C11D7/3218 , C11D7/3281 , C11D11/0047 , C23G1/02 , G03F7/425 , Y10S134/902
摘要： A method for the removing of plasma etch residues on a substrate comprising the steps of: (i) contacting the substrate with a cleaning composition, and (ii) contacting the substrate with ozonated water. The preferred cleaning composition has a pH from 2 to 6 and comprises: (A) water; (B) at least one selected hydroxylammonium compound; and (C) at least one basic compound; and optionally (D) a chelating stabilizer; and optionally (E) a surfactant.
摘要翻译：一种用于去除衬底上的等离子体蚀刻残留物的方法，包括以下步骤：（i）使衬底与清洁组合物接触，和（ii）使基底与臭氧水接触。优选的清洁组合物的pH为2至6，并包含：（A）水; （B）至少一种选择的羟基铵化合物; 和（C）至少一种碱性化合物; 和任选的（D）螯合稳定剂; 和任选的（E）表面活性剂。

54. 发明授权

US6020292A Non-corrosive cleaning composition for removing plasma etching residues 失效
标题翻译：用于去除等离子体蚀刻残留物的非腐蚀性清洁组合物
公开(公告)号：US6020292A
公开(公告)日：2000-02-01
申请号：US82564
申请日：1998-05-21
申请人： Kenji Honda , Taishih Maw
发明人： Kenji Honda , Taishih Maw
IPC分类号： G03F7/32 , C23G1/22 , G03F7/40 , G03F7/42 , H01L21/02 , H01L21/306 , H01L21/3213 , C11D7/32 , C11D7/60
CPC分类号： H01L21/02071 , C23G1/22 , G03F7/425 , H01L21/02052
摘要： A non-corrosive cleaning composition for removing plasma etching residues comprising water, at least one quaternary ammonium hydroxide, and at least one corrosion inhibitor selected from (i) quaternary ammonium silicates and (ii) catechol nucleus-containing oligomers having a molecular weight in the range of about 220 to about 5,000.
摘要翻译：一种用于去除包含水，至少一种氢氧化季铵和至少一种腐蚀抑制剂的等离子体蚀刻残留物的非腐蚀性清洁组合物，其选自（i）季铵硅酸盐和（ii）具有分子量的邻苯二酚的含核子的低聚物范围约220至约5,000。

55. 发明授权

US5977041A Aqueous rinsing composition 失效
标题翻译：水性漂洗组合物
公开(公告)号：US5977041A
公开(公告)日：1999-11-02
申请号：US936010
申请日：1997-09-23
申请人： Kenji Honda
发明人： Kenji Honda
IPC分类号： C11D1/68 , C11D1/72 , C11D3/20 , C11D7/26 , C11D7/36 , C11D7/50 , C11D11/00 , G03F7/42 , H01L21/304 , C11D1/722
CPC分类号： C11D3/2075 , C11D11/0047
摘要： The present invention is directed to an aqueous post-strip rinsing composition, comprising (1) water; (2) at least one water-soluble organic acid; and (3) at least one water-soluble surface-active agent, the rinse solution having a pH in the range from about 2.0 to about 5.0. The present invention is also directed to a method of using the above composition to remove residues from a semiconductor substrate.
摘要翻译：本发明涉及水性后条漂洗组合物，其包含（1）水; （2）至少一种水溶性有机酸; 和（3）至少一种水溶性表面活性剂，所述漂洗溶液的pH在约2.0至约5.0的范围内。本发明还涉及使用上述组合物从半导体衬底去除残余物的方法。

56. 发明授权

US5798323A Non-corrosive stripping and cleaning composition 失效
标题翻译：无腐蚀性剥离和清洗组合物
公开(公告)号：US5798323A
公开(公告)日：1998-08-25
申请号：US850991
申请日：1997-05-05
申请人： Kenji Honda , Richard M. Molin , Gale L. Hansen
发明人： Kenji Honda , Richard M. Molin , Gale L. Hansen
IPC分类号： G03F7/42 , C11D7/26 , C11D7/32 , C11D7/34 , C11D7/50 , C23G5/02 , H01L21/027 , H01L21/304
CPC分类号： G03F7/425 , C11D7/261 , C11D7/5009 , C11D7/5013 , G03F7/426 , C11D7/264 , C11D7/265 , C11D7/32 , C11D7/3263 , C11D7/3281 , C11D7/34
摘要： The present invention is directed to a non-corrosive photoresist stripping and cleaning composition, comprising: (a) about 5% to about 50% solvent selected from the group consisting of N-methyl-2-pyrrolidinone, N-hydroxyethyl-2-pyrrolidinone, 1,3-dimethyl-2-imidazolidinone, dimethylsulfoxide, N,N-dimethylacetamide, diacetone alcohol, ethylene glycol, propylene glycol and admixtures thereof; (b) about 10% to about 90% of an alkanolamine selected from the group consisting of diethyleneglycolamine, monoethanolamine, diethanolamine, triethanolamine, 2-(2-aminoethylamino)ethanol, and admixtures thereof; (c) about 0.1% to about 4% of Formula I: ##STR1## where R.sub.1 -R.sub.4 are individually selected from the group consisting of hydrogen, alkyl groups having 1-4 carbon atoms, alkoxy groups having 1-4 carbon atoms, halogen groups, amino groups, hydroxyl groups, carboxyl groups or combinations thereof; and (d) about 0.1% to about 40% of water, all percentages by weight of the total stripping and cleaning composition.
摘要翻译：本发明涉及非腐蚀性光致抗蚀剂剥离和清洁组合物，其包含：（a）约5％至约50％的溶剂，其选自N-甲基-2-吡咯烷酮，N-羟乙基-2-吡咯烷酮 1,3-二甲基-2-咪唑啉酮，二甲基亚砜，N，N-二甲基乙酰胺，双丙酮醇，乙二醇，丙二醇及其混合物; （b）约10％至约90％的选自二甘醇胺，单乙醇胺，二乙醇胺，三乙醇胺，2-（2-氨基乙基氨基）乙醇及其混合物的链烷醇胺; （c）约0.1％至约4％的式I：其中R 1 -R 4各自选自氢，具有1-4个碳原子的烷基，具有1-4个碳原子的烷氧基原子，卤素基团，氨基，羟基，羧基或其组合; 和（d）约0.1％至约40％的水，所有百分比均为总剥离和清洁组合物的重量百分比。

57. 发明授权

US5692987A Power transmitting system for vehicle 失效
标题翻译：车辆动力传动系统
公开(公告)号：US5692987A
公开(公告)日：1997-12-02
申请号：US497557
申请日：1995-06-30
申请人： Yasuji Shibahata , Kenji Honda , Tetsushi Asano
发明人： Yasuji Shibahata , Kenji Honda , Tetsushi Asano
IPC分类号： B60K17/16 , B60K23/04 , F16H48/30 , B60K17/20
CPC分类号： F16H48/22 , B60K17/16 , B60K23/04 , F16H48/30 , F16H48/36 , F16H2048/204 , F16H2048/368 , F16H48/10
摘要： A ring gear of a differential connected to an engine, and a sun gear and a planetary carrier are connected to left and right output shafts of the differential. A first pinion and a second pinion integrally formed and having different circle radii are carried on a carrier member which is rotatably fitted over the left output shaft. The first pinion is connected to the right output shaft, while the second pinion is connected to the left output shaft. When a hydraulic clutch is brought into an engaged state during clockwise turning of a vehicle, the carrier member is decelerated to accelerate a left front wheel, and a torque is transmitted to the left front wheel. When a hydraulic clutch is brought into an engaged state during counterclockwise turning of a vehicle, the carrier member is accelerated to accelerate a right front wheel, and a torque is transmitted to the right front wheel.
摘要翻译：连接到发动机的差速器的环形齿轮和太阳轮和行星齿轮架连接到差速器的左和右输出轴。整体形成并且具有不同圆半径的第一小齿轮和第二小齿轮被承载在可旋转地装配在左输出轴上的承载构件上。第一小齿轮连接到右输出轴，而第二小齿轮连接到左输出轴。当液压离合器在车辆顺时针转动期间处于接合状态时，承载构件减速以加速左前轮，并且扭矩传递到左前轮。当液压离合器在车辆的逆时针转动中处于接合状态时，载体构件被加速以加速右前轮，并且转矩传递到右前轮。

58. 发明授权

US5665688A Photoresist stripping composition 失效
标题翻译：光阻剥离组合物
公开(公告)号：US5665688A
公开(公告)日：1997-09-09
申请号：US590010
申请日：1996-01-23
申请人： Kenji Honda , Donald F. Perry , Taishih Maw
发明人： Kenji Honda , Donald F. Perry , Taishih Maw
IPC分类号： C11D7/32 , C11D7/50 , G03F7/42 , C11D7/26
CPC分类号： C11D7/5013 , G03F7/425 , C11D7/32
摘要： A photoresist stripping composition containing:(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;(b) 70-20% by weight of alkanolamine compounds; and(c) 0.1-10% by weight of 6,6',6"-(1,3,5-triazine-2,4,6-triyltriimino) tris(hexanoic acid).
摘要翻译：一种光致抗蚀剂剥离组合物，其含有：（a）20-70重量％偶极矩大于3.5的有机极性溶剂; （b）70-20重量％的链烷醇胺化合物; 和（c）0.1-6重量％的6,6'，6“ - （1,3,5-三嗪-2,4,6-三基三亚氨基）三（己酸）。

59. 发明授权

US5648324A Photoresist stripping composition 失效
标题翻译：光阻剥离组合物
公开(公告)号：US5648324A
公开(公告)日：1997-07-15
申请号：US590005
申请日：1996-01-23
申请人： Kenji Honda , Donald F. Perry , Taishih Maw
发明人： Kenji Honda , Donald F. Perry , Taishih Maw
IPC分类号： C11D7/32 , C11D7/34 , C11D7/50 , G03F7/42
CPC分类号： G03F7/425 , C11D7/5009 , C11D7/32 , C11D7/34
摘要： A photoresist stripping composition containing:(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;(b) 70-20% by weight of alkanolamine compounds; and(c) 0.1-10% by weight of 2,2'[[methyl-1H-benzothiazol-1-yl)methyl]imino]bis-ethanol.
摘要翻译：一种光致抗蚀剂剥离组合物，其含有：（a）20-70重量％偶极矩大于3.5的有机极性溶剂; （b）70-20重量％的链烷醇胺化合物; 和（c）0.1-10重量％的2,2'[[甲基-1H-苯并噻唑-1-基）甲基]亚氨基]双乙醇。

60. 发明授权

US5378802A Method for removing impurities from resist components and novolak resins 失效
标题翻译：从抗蚀剂成分和酚醛清漆树脂中除去杂质的方法
公开(公告)号：US5378802A
公开(公告)日：1995-01-03
申请号：US753526
申请日：1991-09-03
申请人： Kenji Honda
发明人： Kenji Honda
IPC分类号： G03F7/004 , C08G8/12 , G03F7/023 , G03F7/26 , H01L21/027 , C08F6/08
CPC分类号： G03F7/26 , C08G8/12 , G03F7/0236
摘要： A method of removing ionic impurities from a resist component, comprising the steps of:(a) dissolving said resist component in a solvent;(b) contacting said resist component solution with a fibrous ion exchange resin for a sufficient amount of time to remove at least a portion of said ionic impurities onto said fibrous ion exchange resin; and(c) separating said fibrous ion exchange resin bearing said ionic impurities from said resist component solution.
摘要翻译：一种从抗蚀剂组分中除去离子杂质的方法，包括以下步骤：（a）将所述抗蚀剂组分溶解在溶剂中; （b）使所述抗蚀剂组分溶液与纤维离子交换树脂接触足够的时间以将至少一部分所述离子杂质去除到所述纤维离子交换树脂上; 和（c）从所述抗蚀剂组分溶液中分离所述含离子杂质的所述纤维离子交换树脂。

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