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51. 发明授权

US6124933A Exposure apparatus utilizing surface position detection, method thereof, and semiconductor device production method using the apparatus 失效
标题翻译：利用表面位置检测的曝光装置，其方法和使用该装置的半导体器件制造方法
公开(公告)号：US6124933A
公开(公告)日：2000-09-26
申请号：US19565
申请日：1998-02-06
申请人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
发明人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
IPC分类号： G01B11/26 , G01B11/00 , G01B11/02 , G01C3/06 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30 , G01B11/14
CPC分类号： G03F9/7026 , G01B11/026 , G03F7/70358
摘要： In an exposure apparatus and method utilizing a projection system, a surface state relating to an exposure area of the projection system is determined by illuminating the exposure area with light, receiving light from the exposure area, designating positions of a plurality of detection points in the exposure area in accordance with a size of the exposure area, and detecting, based on information of received light corresponding to the plurality of detection points, positions related to the plurality of detection points.
摘要翻译：在利用投影系统的曝光装置和方法中，通过用光照射曝光区域来确定与投影系统的曝光区域相关的表面状态，从曝光区域接收光，指定多个检测点的位置曝光区域，并且根据与所述多个检测点对应的接收光的信息，检测与所述多个检测点相关的位置。

52. 发明授权

US5805347A Variable-magnification telecentric optical system 失效
标题翻译：可变倍率远心光学系统
公开(公告)号：US5805347A
公开(公告)日：1998-09-08
申请号：US774914
申请日：1996-12-27
申请人： Hideo Mizutani , Hiroshi Nishimura , Masashi Tanaka
发明人： Hideo Mizutani , Hiroshi Nishimura , Masashi Tanaka
IPC分类号： G02B13/22 , G02B15/16 , G02B15/14
CPC分类号： G02B13/22 , G02B15/16
摘要： Lens systems are disclosed each of which providing a variable magnification telecentric optical system in which lateral magnification can be varied while maintaining constant image position and telecentricity. The lens system comprises, from the object side, first, second, and third lens groups disposed on an optical axis. The first and third lens groups each have positive refractive power. The second lens group is afocal. While varying the lateral magnification, the object and image positions remain fixed and telecentricity of the lens system (on both the object and image sides) is maintained. Lateral magnification is varied by axially moving lenses in one or more of the first, second, and third lens groups.
摘要翻译：透镜系统被公开，每个透镜系统提供可变倍率远心光学系统，其中可以在保持恒定的图像位置和远心度的同时改变横向放大率。透镜系统包括从物体侧设置在光轴上的第一透镜组，第二透镜组和第三透镜组。第一透镜组和第三透镜组各自具有正折射光焦度。第二个镜头组无声。在改变横向放大倍数的同时，物体和图像位置保持固定，并保持透镜系统（在物体和像侧上）的远心度。侧向放大倍率是通过在第一，第二和第三透镜组中的一个或多个中的轴向运动的透镜而变化的。

53. 发明授权

US5801835A Surface position detection apparatus and method 失效
标题翻译：表面位置检测装置及方法
公开(公告)号：US5801835A
公开(公告)日：1998-09-01
申请号：US940818
申请日：1997-09-30
申请人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
发明人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
IPC分类号： G01B11/26 , G01B11/00 , G01B11/02 , G01C3/06 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30 , G01B11/14
CPC分类号： G03F9/7026 , G01B11/026 , G03F7/70358
摘要： In an apparatus and method for surface position detection, a position of a detection surface is determined by illuminating the detection surface with detection light, receiving detection light from the detection surface, designating different parts of the detection surface in accordance with a structure within an illuminated area on the detection surface, and detecting, based on information of the received light and information of the designated parts of the detection surface, positions corresponding to the designated parts of the detection surface.
摘要翻译：在用于表面位置检测的装置和方法中，通过用检测光照射检测面来确定检测表面的位置，接收来自检测表面的检测光，根据照明中的结构指定检测表面的不同部分并且根据所接收的光的信息和检测表面的指定部分的信息，检测与检测表面的指定部分相对应的位置。

54. 发明授权

US5796114A Exposure apparatus and method for positioning with a high accuracy 失效
标题翻译：高精度定位的曝光装置和方法
公开(公告)号：US5796114A
公开(公告)日：1998-08-18
申请号：US576999
申请日：1995-12-26
申请人： Hideo Mizutani
发明人： Hideo Mizutani
IPC分类号： G03F1/42 , G03F7/20 , G03F9/00 , H01L21/027 , G01N21/86
CPC分类号： G03F9/70
摘要： In this exposure apparatus, a grating-like reticle mark formed on the lower surface of a reticle is irradiated with illumination light components RB.sub.1 and RB.sub.2 with an intersecting angle 2.theta. from two directions, respectively, such that diffracted light components are emitted in directions which divide the intersecting angle 2.theta. into three pieces. Interference light formed by a +2-order diffracted light component RB.sub.1.sup.+2 of the illumination light component RB.sub.1 and a -1-order diffracted light component RB.sub.2.sup.-1 of the illumination light component RB.sub.2 or interference light formed by a +1-order diffracted light component RB.sub.1.sup.+1 of the illumination light component RB.sub.1 and a -2-order diffracted light component RB.sub.2.sup.-2 of the illumination light component RB.sub.2 is detected.
摘要翻译：在该曝光装置中，形成在掩模版的下表面上的格子状的标线标记分别用来自两个方向的相交角2θ的照明光分量RB1和RB2照射，使得衍射的光分量沿将相交角2θ分为三块。由照明光分量RB1的+ 2级衍射光分量RB1 + 2和照明光分量RB2的-1级衍射光分量RB2-1或由+ 1级衍射形成的干涉光形成的干涉光检测照明光分量RB1的光分量RB1 + 1和照明光分量RB2的-2次衍射光分量RB2-2。

55. 发明授权

US5684595A Alignment apparatus and exposure apparatus equipped therewith 失效
标题翻译：对准装置和配备的曝光装置
公开(公告)号：US5684595A
公开(公告)日：1997-11-04
申请号：US720212
申请日：1996-09-26
申请人： Masaki Kato , Hideo Mizutani , Masashi Tanaka
发明人： Masaki Kato , Hideo Mizutani , Masashi Tanaka
IPC分类号： G03F7/22 , G03F9/00 , H01L21/027 , H01L21/30 , G01B11/00
CPC分类号： G03F9/70 , G03F9/7065 , G03F9/7088
摘要： An alignment apparatus for aligning a first object (reticle) with a second object (wafer) when irradiating a projection light on the first object to project a pattern of the first object onto the second object through a projection optical system. The apparatus includes an illumination optical system for illuminating a plurality marks on the second object with an alignment light having a wavelength band different from the projection light, a detection optical system for receiving the alignment light from the illuminated mark through the projection optical system to detect an image of the mark formed by the alignment light, and a compensating optical system arranged within the detection optical system for compensating a chromatic aberration of magnification caused by the projection optical system due to the differences among the wavelengths within the wavelength band of the alignment light.
摘要翻译：一种对准装置，用于当通过投影光学系统照射第一物体上的投影光以将第一物体的图案投影到第二物体上时，使第一物体（光罩）与第二物体（晶片）对准。该装置包括：照射光学系统，用于利用具有与投射光不同的波长带的对准光来照射第二物体上的多个标记;检测光学系统，用于通过投影光学系统接收来自照明标记的对准光，以检测由对准光形成的标记的图像和布置在检测光学系统内的补偿光学系统，用于补偿由于对准光的波长带内的波长之间的差异而由投影光学系统引起的倍率色像差。

56. 发明授权

US5510892A Inclination detecting apparatus and method 失效
标题翻译：倾斜检测装置及方法
公开(公告)号：US5510892A
公开(公告)日：1996-04-23
申请号：US158060
申请日：1993-11-24
申请人： Hideo Mizutani , Kesayoshi Amano , Shinji Wakamoto , Yuji Imai
发明人： Hideo Mizutani , Kesayoshi Amano , Shinji Wakamoto , Yuji Imai
IPC分类号： G01B11/26 , G03F7/20 , G03F9/00 , G01B11/14 , G01N21/00
CPC分类号： G03F7/70583 , G01B11/26 , G03F7/70125 , G03F9/70
摘要： An inclination detecting apparatus is for detecting an inclination of a front surface of a transparent wafer placed on a perpendicular to an optical axis of a projection objective in an exposure apparatus. The inclination detecting apparatus includes an illumination optical system and a condenser optical system. The illumination optical system obliquely supplies a collimated beam onto the front surface of the wafer. The condenser optical system can condense the collimated beam supplied from the illumination optical system and reflected by the wafer, and it has a quartered photodetector for receiving the reflected beam and generating a position signal corresponding to a light receiving position. The apparatus further includes a first slit plate and a second slit plate located in the illumination optical system and the condenser optical system respectively. Each of the slit plate has a plurality of slits which are arranged such that light shield portions between slits of the second slit plate can cut off the collimated beam reflected by the back surface of the wafer.
摘要翻译：倾斜检测装置用于检测在曝光装置中与投影物镜的光轴垂直的透明晶片的前表面的倾斜度。倾斜检测装置包括照明光学系统和聚光镜系统。照明光学系统将准直光束倾斜地提供到晶片的前表面上。聚光镜系统可以冷凝从照明光学系统提供并被晶片反射的准直光束，并且其具有用于接收反射光束并产生对应于光接收位置的位置信号的四分之一光电检测器。该装置还包括分别位于照明光学系统和聚光镜系统中的第一狭缝板和第二狭缝板。每个狭缝板具有多个狭缝，其布置成使得第二狭缝板的狭缝之间的遮光部分可以切断由晶片的背面反射的准直光束。

57. 发明授权

US5220454A Cata-dioptric reduction projection optical system 失效
标题翻译： Cata屈光减光投影光学系统
公开(公告)号：US5220454A
公开(公告)日：1993-06-15
申请号：US950765
申请日：1992-09-24
申请人： Yutaka Ichihara , Hideo Mizutani , Sumio Hashimoto , Yutaka Suenaga
发明人： Yutaka Ichihara , Hideo Mizutani , Sumio Hashimoto , Yutaka Suenaga
IPC分类号： G02B17/08 , G02B27/00 , G02B27/28 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/283 , G03F7/70225 , G02B27/0018
摘要： In a cata-dioptric optical system having a combination of a reflection system and a refraction system for reduction-projecting an object on a first plane onto a second plane, a polarization beam splitter and a quarter wavelength plate are provided to split the incident light and the reflected light. The light beam directed to the polarization beam splitter is converted to a substantially collimated light beam by a first group of lenses. A second group of lenses are arranged between the polarization beam splitter and a concave reflection mirror to diverge the light beam. The light reflected by the concave reflection mirror is directed back to the polarization beam splitter with a substantially collimated state by the second group of lenses. The light beam from the second group of lenses transmitted through the polarization beam splitter is focused by a third group of lenses having a positive refraction power to form a reduced image.
摘要翻译：在具有用于将第一平面上的物体还原投影到第二平面上的反射系统和折射系统的组合的数位屈光光学系统中，设置偏振分束器和四分之一波长板以分离入射光，反射光。被引导到偏振分束器的光束被第一组透镜转换成基本准直的光束。第二组透镜被布置在偏振分束器和凹面反射镜之间以使光束发散。由第二组透镜将由凹面反射镜反射的光引导回基本准直状态的偏振分束器。通过偏振分束器透射的第二组透镜的光束被具有正折射光焦度的第三组透镜聚焦以形成缩小图像。

58. 发明授权

US08161637B2 Manufacturing method for printed wiring board 有权
标题翻译：印刷电路板的制造方法
公开(公告)号：US08161637B2
公开(公告)日：2012-04-24
申请号：US12771602
申请日：2010-04-30
申请人： Hideo Mizutani , Toshiyuki Matsui , Atsushi Deguchi
发明人： Hideo Mizutani , Toshiyuki Matsui , Atsushi Deguchi
IPC分类号： H01K3/10
CPC分类号： H05K3/108 , H05K3/067 , H05K3/4661 , H05K2203/0369 , H05K2203/0597 , H05K2203/122 , H05K2203/124 , H05K2203/1476 , Y10T29/49126 , Y10T29/49144 , Y10T29/49156 , Y10T29/49165
摘要： A manufacturing method for a printed wiring board includes forming an electroless plated film on an interlayer resin insulation layer, forming on the electroless plated film a plating resist with an opening to expose a portion of the electroless plated film, forming an electrolytic plated film on the portion of the electroless plated film exposed through the opening, removing the plating resist using a resist-removing solution containing an amine, reducing a thickness of a portion of the electroless plated film existing between adjacent portions of the electrolytic plated film by using the resist-removing solution, and forming a conductive pattern by removing the portion of the electroless plated film existing between the adjacent portions of the electrolytic plated film by using an etchant.
摘要翻译：一种印刷电路板的制造方法，包括在层间树脂绝缘层上形成无电解电镀膜，在所述无电解电镀膜上形成具有开口的电镀抗蚀剂，露出所述无电镀膜的一部分，在所述电镀膜上形成电解电镀膜通过开口露出的无电解电镀膜的一部分，使用含有胺的抗蚀剂去除溶液除去电镀抗蚀剂，通过使用抗蚀剂层，减小存在于电解电镀膜的相邻部分之间的部分无电解电镀膜的厚度，通过使用蚀刻剂除去存在于电解电镀膜的相邻部分之间的无电解电镀膜的部分，形成导电图案。

59. 发明申请

US20060126044A1 Exposure apparatus and method for producing device 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US20060126044A1
公开(公告)日：2006-06-15
申请号：US11350787
申请日：2006-02-10
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A liquid immersion type exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a liquid film forming system for forming a liquid film in a predetermined region between the projection optical system and the substrate, and a sensor for detecting disappearance of at least a portion of the liquid film in the predetermined region.
摘要翻译：液浸式曝光装置包括：投影光学系统，用于将掩模图案投射到基板上;液膜形成系统，用于在投影光学系统和基板之间的预定区域中形成液膜，以及用于检测的传感器在预定区域中液膜的至少一部分消失。

60. 发明申请

US20060126043A1 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20060126043A1
公开(公告)日：2006-06-15
申请号：US11345392
申请日：2006-02-02
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： An exposure apparatus performs an exposure of a substrate by filling at least a portion of the space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate via the projection optical system and the liquid. The apparatus includes a bubble detector that detects air bubble or bubbles in the liquid between the projection optical system and the substrate. Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.
摘要翻译：曝光装置通过用液体填充投影光学系统和基板之间的空间的至少一部分并经由投影光学系统和液体将图案的图像投影到基板上来进行基板的曝光。该装置包括气泡检测器，其检测投影光学系统和基板之间的液体中的气泡或气泡。因此，当用液体填充投影光学系统和基板之间的空间时，曝光装置能够抑制由液体中的气泡引起的图案图像的劣化。

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