专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明申请

US20100151532A1 CHONDROITIN-PRODUCING BACTERIUM AND METHOD OF PRODUCING CHONDROITIN 有权
标题翻译：生产细菌的生产细菌和生产替诺培酮的方法
公开(公告)号：US20100151532A1
公开(公告)日：2010-06-17
申请号：US12596980
申请日：2008-04-24
申请人： Kiyoshi Suzuki , Kentaro Miyamoto , Hiromi Kaseyama
发明人： Kiyoshi Suzuki , Kentaro Miyamoto , Hiromi Kaseyama
IPC分类号： C12P19/04 , C12N1/21 , C12N15/63
CPC分类号： C12N9/1051 , C12N9/90
摘要： Chondroitin is produced by culturing a UDP-glucuronic acid-producing bacterium transfected with a kfoA gene derived from Escherichia coli K4 strain and a kfoC gene derived from Escherichia coli K4 strain and having chondroitin-producing ability. Chondroitin is collected from the bacterium.
摘要翻译：通过培养用来源于大肠杆菌K4菌株的kfoA基因和来自大肠杆菌K4菌株的kfoC基因转染的具有软骨素生产能力的UDP-葡糖醛酸生产细菌产生软骨素。从细菌中收集软骨素。

52. 发明申请

US20090280502A1 ANTI-2-O-DESULFATED ACHARAN SULFATE ANTIBODY AND ITS APPLICATION 有权
标题翻译：抗2-O-脱硫亚硫酸盐抗体及其应用
公开(公告)号：US20090280502A1
公开(公告)日：2009-11-12
申请号：US12297047
申请日：2007-04-27
申请人： Kiyoshi Suzuki , Takeshi Ishimaru , Koji Yamamoto , Yeong Shik Kim
发明人： Kiyoshi Suzuki , Takeshi Ishimaru , Koji Yamamoto , Yeong Shik Kim
IPC分类号： G01N33/53 , C07K16/00 , C12N5/06
CPC分类号： C07K16/44
摘要： An antibody that reacts with 2-O-desulfated acharan sulfate, a hybridoma that produces the antibody, a detection method and a detection kit to which the antibody is applied are disclosed. The antibody that reacts with 2-O-desulfated acharan sulfate can be produced by immunizing a mammal using as an antigen a substance obtained by chemically bonding a protein to 2-O-desulfated acharan sulfate.
摘要翻译：公开了与2-O-脱硫酸阿卡拉酸硫酸反应的抗体，产生抗体的杂交瘤，检测方法和应用抗体的检测试剂盒。与2-O-脱硫酸阿沙拉硫酸盐反应的抗体可以通过使用通过化学键合蛋白质获得的物质作为抗原免疫哺乳动物来制备，所述物质通过将化学键合到2-O-脱硫酸阿卡拉酸硫酸酯。

53. 发明申请

US20090136964A1 NOVEL ANTI-HEPARAN SULFATE ANTIBODY, METHOD FOR DETECTION OF HEPARAN SULFATE, AND KIT FOR DETECTION OF HEPARAN SULFATE 有权
标题翻译：新型抗HEPARAN硫酸抗体，检测HEPARAN SULFATE的方法和用于检测HEPARAN SULFATE的试剂盒
公开(公告)号：US20090136964A1
公开(公告)日：2009-05-28
申请号：US11909956
申请日：2006-03-31
申请人： Kiyoshi Suzuki , Takeshi Ishimaru , Koji Yamamoto
发明人： Kiyoshi Suzuki , Takeshi Ishimaru , Koji Yamamoto
IPC分类号： G01N33/566 , C07K16/18 , C12N5/06
CPC分类号： C07K16/44 , G01N33/5308 , G01N2400/40 , Y10S435/975
摘要： An antibody which reacts with N-acetylheparosan and heparan sulfate that is derived from bovine kidney but does not substantially react with heparan sulfate derived from a murine Engelbreath-Holm-Swam tumor tissue, the antibody being produced with a hybridoma which is prepared using a substance composed of a protein and N-acetylheparosan bound to the protein.
摘要翻译：与来自牛肾但不与源自小鼠Engelbreth-Holm-Swarm肿瘤组织的硫酸乙酰肝素基本上反应的N-乙酰肝素和硫酸乙酰肝素反应的抗体，该抗体由使用物质制备的杂交瘤产生由与蛋白质结合的蛋白质和N-乙酰西他班组成。

54. 发明授权

US07477869B2 Electrophotographic printing apparatus and printing system 有权
标题翻译：电子照相打印设备和打印系统
公开(公告)号：US07477869B2
公开(公告)日：2009-01-13
申请号：US11139076
申请日：2005-05-26
申请人： Yoshinori Kawaai , Sadanori Kobashi , Kazutoshi Obara , Kiyoshi Suzuki
发明人： Yoshinori Kawaai , Sadanori Kobashi , Kazutoshi Obara , Kiyoshi Suzuki
IPC分类号： G03G15/00
CPC分类号： G03G15/6567 , G03G15/235 , G03G15/6564 , G03G2215/00734
摘要： In an electrophotographic printing apparatus for printing an image to an image transfer sheet medium by producing a latent image on a photosensitive unit and transferring the latent image to the image transfer sheet medium, a width-directional position of the image transfer sheet medium is detected before the latent image is produced and the same after the latent image is produced on the photosensitive unit by the width-directional positional sensor, and the detection results are compared with one another; and it is determined from the comparison result whether or not printing operation is continued.
摘要翻译：在通过在感光单元上产生潜像并将潜像转印到图像转印纸介质上来将图像印刷到图像转印纸介质的电子照相打印设备中，在图像转印纸介质的宽度方向位置之前检测在通过宽度方向位置传感器在感光单元上产生潜像之后产生潜像，并将检测结果相互比较; 并且从比较结果确定是否继续打印操作。

55. 发明申请

US20080042156A1 Semiconductor light-emitting device and light-emitting display therewith 有权
标题翻译：半导体发光装置及其发光显示器
公开(公告)号：US20080042156A1
公开(公告)日：2008-02-21
申请号：US11844622
申请日：2007-08-24
申请人： Tetsuya Hanamoto , Wataru Takase , Kiyoshi Suzuki , Kaori Kanesaka , Tomokazu Sagara
发明人： Tetsuya Hanamoto , Wataru Takase , Kiyoshi Suzuki , Kaori Kanesaka , Tomokazu Sagara
IPC分类号： H01L33/00
CPC分类号： H01L33/00 , H01L24/45 , H01L24/48 , H01L24/49 , H01L33/502 , H01L33/508 , H01L33/60 , H01L33/62 , H01L2224/05568 , H01L2224/05573 , H01L2224/16 , H01L2224/32245 , H01L2224/451 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/48247 , H01L2224/48465 , H01L2224/49107 , H01L2224/73265 , H01L2924/00014 , H01L2924/01012 , H01L2924/0102 , H01L2924/01029 , H01L2924/01039 , H01L2924/01057 , H01L2924/01063 , H01L2924/01066 , H01L2924/01079 , H01L2924/12041 , H01L2924/181 , H01L2924/3025 , H01L2924/00 , H01L2224/05599 , H01L2924/00012
摘要： A semiconductor light-emitting device has a semiconductor light-emitting element for emitting light with emission wavelengths of 390 to 420 nm, wherein the wavelengths of light from the semiconductor light-emitting element are converted by a fluorescent substance having a monochromatic emission peak. The emission wavelengths of 390 to 420 nm, which have almost no adverse effect on human bodies and components of the semiconductor light-emitting device, are in a low human visibility range. Since light whose wavelengths are converted by the fluorescent substance are hardly affected by direct light from the semiconductor light-emitting element, light from the fluorescent substance has a favorable color tone. Also, the semiconductor light-emitting device allows desired luminous colors to be obtained only by changing fluorescent substance materials without changing the structure of the semiconductor light-emitting device or the semiconductor light-emitting element.
摘要翻译：半导体发光器件具有用于发射发光波长为390〜420nm的光的半导体发光元件，其中来自半导体发光元件的光的波长由具有单色发射峰的荧光物质转换。几乎对人体和半导体发光器件的组件几乎没有不利影响的390至420nm的发射波长处于低人类可视范围。由于波长被荧光物质转换的光几乎不受来自半导体发光元件的直接光的影响，所以来自荧光物质的光具有良好的色调。此外，半导体发光器件仅通过在不改变半导体发光器件或半导体发光元件的结构的情况下改变荧光物质材料来获得期望的发光颜色。

56. 发明授权

US06634235B2 Load sensor with strain-sensing elements 失效
公开(公告)号：US06634235B2
公开(公告)日：2003-10-21
申请号：US10004902
申请日：2001-11-07
申请人： Ryoichi Maeda , Akito Miura , Koichi Takahashi , Osamu Tanabe , Kiyoshi Suzuki
发明人： Ryoichi Maeda , Akito Miura , Koichi Takahashi , Osamu Tanabe , Kiyoshi Suzuki
IPC分类号： G01L122
CPC分类号： G01L1/2206 , G01B7/20
摘要： A load sensor is provided, which prevents defective printing of strain-sensing elements caused by the deflection of a pressure-receiving portion and provides stabilized quality and fabrication yields. The load sensor is provided with the strain-sensing elements printed on the pressure-receiving portion. The tip portion of the strain generating portions having a loading point is allowed to stay in advance below the plane containing the print surface of the strain generating portions in the direction of thickness. The tip portion of the pressure-receiving portion will never stay above the print surface of the strain generating portions even when the pressure-receiving portion is deflected in the heating process during fabrication. Therefore, this makes it possible to avoid defective printing of the strain-sensing elements caused by the deflection of the pressure-receiving portion.

57. 发明授权

US06466242B1 Information processing apparatus 有权
标题翻译：信息处理装置
公开(公告)号：US06466242B1
公开(公告)日：2002-10-15
申请号：US09293208
申请日：1999-04-16
申请人： Akihiro Kumata , Kiyoshi Suzuki
发明人： Akihiro Kumata , Kiyoshi Suzuki
IPC分类号： G06F300
CPC分类号： G06F3/0481
摘要： An information processing apparatus having a schedule management function includes a display section for displaying temporal axes of at least two different cities on a schedule display screen in accordance with a time difference therebetween; a pointing section for pointing to each of the temporal axes of the different cities displayed by the display section; and an input section for inputting a time and a city of the temporal axis, which are pointed to by the pointing section, as a schedule.
摘要翻译：具有时间表管理功能的信息处理装置包括显示部分，用于根据它们之间的时间差在时间表显示屏幕上显示至少两个不同城市的时间轴; 指示部分，用于指向由显示部分显示的不同城市的每个时间轴; 以及输入部，其将由指示部指向的时间轴的时间和城市作为时间表输入。

58. 发明授权

US06375809B1 Process for sterilizing articles and process for wrapping articles 有权
标题翻译：用于消毒物品和包装物品的方法
公开(公告)号：US06375809B1
公开(公告)日：2002-04-23
申请号：US09581245
申请日：2000-06-26
申请人： Ryo Kato , Kiyoshi Suzuki , Toyohiko Doi
发明人： Ryo Kato , Kiyoshi Suzuki , Toyohiko Doi
IPC分类号： C02F1461
CPC分类号： A61L2/20 , A61L2/10 , B65B55/16 , B65B55/18
摘要： The invention provides a method of sterilizing products and a method of packaging them, which little denature of the products, little concern with rusting or corrosion of the equipment, permit a safe working environment, and can shorten the treatment time, and this invention relates to a method of sterilizing products by adding hydrochloric acid to water not containing sodium chloride, passing the resulting fluid to a diaphragm-less electrolytic bath, electrolyzing the fluid, collecting the electrolytic water, diluting the collected electrolytic water with water, and sterilizing products with both the diluted electrolytic water and ultraviolet radiation; and to a method of packaging products with packaging members sterilized by the above process.
摘要翻译：本发明提供一种消毒产品的方法及其包装方法，产品的变性几乎不受设备生锈或腐蚀的影响，允许安全的工作环境，并可缩短处理时间，本发明涉及通过向不含氯化钠的水中加入盐酸，将所得流体通入无隔膜电解槽，电解液体，收集电解水，用水稀释收集的电解水，并将产物与两者同时灭菌的方法稀释电解水和紫外线辐射; 以及通过上述方法消毒的包装部件包装产品的方法。

59. 发明授权

US5907488A Method of evaluating easiness of works and processings performed on articles and evaluation apparatus 失效
标题翻译：对物品和评估装置进行工作和处理的容易程度的评估方法
公开(公告)号：US5907488A
公开(公告)日：1999-05-25
申请号：US716017
申请日：1996-09-19
申请人： Syoji Arimoto , Yuuzoo Hiroshige , Kiyoshi Suzuki , Tatsuya Suzuki , Toshijiro Ohashi
发明人： Syoji Arimoto , Yuuzoo Hiroshige , Kiyoshi Suzuki , Tatsuya Suzuki , Toshijiro Ohashi
IPC分类号： G05B19/4097 , G05B19/418 , G06F17/50 , G06Q10/06 , G06Q10/08
CPC分类号： G06Q10/06 , G05B19/4097 , G05B19/41865 , G06F17/50 , G06Q10/0875 , G05B2219/31065 , G05B2219/32234 , G05B2219/35028 , G05B2219/35193 , G05B2219/35199 , G05B2219/35212 , G05B2219/50397 , Y02P90/04 , Y02P90/14 , Y02P90/20 , Y02P90/265
摘要： A method of evaluating quantitatively in a design stage degrees of difficulty of works and processings to be performed on an article or parts at various stage of life thereof such as manufacturing, sale, use, maintenance/inspection/repair, recovery, dismantling, disassembling, recycling for resources, nontoxication and scrapping. Part elimination scores E.sub.i representing degrees of difficulty of the works and processings to be performed on the parts are regarded to be a function of indexes indicating the degrees of difficulty of the works and the processings for the parts and expressed by E.sub.i =f(G.sub.i), while an article evaluation score E representing the degrees of difficulty of the work and the processing for the article is regarded to be a function of a mean value of the part evaluation scores E.sub.i or an index G (=.SIGMA.G.sub.i) indicating the degrees of difficulty of the work and the processing for the article and expressed by E=f(G)=f(.SIGMA.G.sub.i). Further, work and processing costs for the article under evaluation or parts are estimated on the basis of work and processing costs required really for an article or parts bearing similarity to the article under evaluation or parts thereof.
摘要翻译：在制造，销售，使用，维护/检查/修理，恢复，拆卸，拆卸等不同阶段的物品或部件上对设计阶段的工程和加工难度进行定量评估的方法，资源循环利用，无毒化和报废。部分消除得分Ei表示对零件进行的作品和处理的难度的程度被认为是指示作品的难度和部件的处理的指标的函数，并且由Ei = f（Gi）表示。而表示作品的难易程度和物品的处理的文章评价分数E被认为是部分评价分数Ei的平均值的函数或指示表示度数的指标G（= SIGMA Gi） E = f（G）= f（SIGMA Gi）表示的工作难度和文章的处理。此外，正在评估的物品或部件的工作和加工费用是根据对正在评估的物品或其部分相关的物品或部件产生的工作和加工成本进行估算的。

60. 发明授权

US5891353A Polishing agent used for polishing semiconductor wafers and polishing method using the same 失效
公开(公告)号：US5891353A
公开(公告)日：1999-04-06
申请号：US915579
申请日：1997-08-21
申请人： Hisashi Masumura , Kiyoshi Suzuki , Hideo Kudo , Teruaki Fukami
发明人： Hisashi Masumura , Kiyoshi Suzuki , Hideo Kudo , Teruaki Fukami
IPC分类号： B24B37/00 , C09K3/14 , H01L21/02 , H01L21/302 , H01L21/304 , H01L21/306 , B44C1/22
CPC分类号： H01L21/02024 , H01L21/30625 , Y10T428/21
摘要： A semiconductor wafer polishing agent contains mainly a silica containing polishing agent and is added with a polyolefin type fine particle material. The novel semiconductor wafer polishing agent is capable of low brightness polishing to the back face of the wafer, sensor detection of the front and back faces of the wafer, and suppression of dust to be generated by chipping of the back face of the wafer, thereby to increase the yield of semiconductor devices. A polishing method using the polishing agent and a novel semiconductor wafer having a back face with an unconventional surface shape are also disclosed.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式