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51. 发明授权

US5489900A Force sensitive transducer for use in a computer keyboard 失效
标题翻译：用于计算机键盘的强力传感器
公开(公告)号：US5489900A
公开(公告)日：1996-02-06
申请号：US253655
申请日：1994-06-03
申请人： Matthew F. Cali , Jerome J. Cuomo , Donald J. Mikalsen , Joseph D. Rutledge , Edwin J. Selker
发明人： Matthew F. Cali , Jerome J. Cuomo , Donald J. Mikalsen , Joseph D. Rutledge , Edwin J. Selker
IPC分类号： G01L5/22 , G05G9/047 , G06F3/033 , H03K17/965
CPC分类号： G01L5/223 , G05G9/047 , G06F3/0338
摘要： A strain sensitive columnar transducer for a data entry keyboard contains a column upstanding from the keyboard. Strain sensitive orthogonally oriented patterns are formed on a single flexible planar sheet which is sliced to place each of the patterns on a separate tab. The planar sheet is forced over the column so that the patterns lie up against the sides of the column to measure force exerted on the column.
摘要翻译：用于数据输入键盘的应变敏感柱状传感器包含从键盘竖立的列。应变敏感的正交取向图案形成在单个柔性平面片上，其被切片以将每个图案放置在单独的片上。平板被迫超过柱，使得图案靠在柱的侧面以测量施加在柱上的力。

52. 发明授权

US5478270A Ultrasonic micro machining slider air bearings with diamond faced patterned die 失效
标题翻译：超声波微型加工滑块空气轴承，金刚石面型图案模具
公开(公告)号：US5478270A
公开(公告)日：1995-12-26
申请号：US187268
申请日：1994-01-25
申请人： Jerome J. Cuomo , Randall T. Kerth , John C. Major
发明人： Jerome J. Cuomo , Randall T. Kerth , John C. Major
IPC分类号： B23K26/40 , B24B1/04 , B24B35/00 , G11B5/187 , G11B5/60 , B24B1/00
CPC分类号： G11B5/6005 , B23K26/40 , B23K26/402 , B24B1/04 , B24B35/005 , B23K2203/30 , B23K2203/50 , G11B5/1871
摘要： A method of machining a complex pattern into the air bearing surface of a magnetic head slider includes the steps of forming a die with a diamond surface which has a pattern which is a reverse image of the desired pattern for the surface of the slider; placing the die with the pattern of the die facing the surface of the slider; placing an abrasive slurry between the die and the surface of the slider; applying a pressure between the die and the surface of the slider; and ultrasonically vibrating the die and the slider reciprocally with respect to one another to cause the abrasive slurry to grind the desired pattern into the surface of the slider.
摘要翻译：将复杂图案加工到磁头滑块的空气轴承表面中的方法包括以下步骤：形成具有金刚石表面的模具，该金刚石表面具有作为滑块表面的所需图案的反向图案的图案; 将模具的模具放置在与滑块的表面相对的位置; 在模具和滑块的表面之间放置磨料浆料; 在模具和滑块的表面之间施加压力; 并且使模具和滑块相对于彼此往复地超声振动，以使磨料浆料将所需的图案研磨到滑块的表面中。

53. 发明授权

US5468326A Apparatus for polishing a diamond or carbon nitride film by reaction with oxygen transported to the film through a superionic conductor in contact with the film 失效
标题翻译：用于通过与通过与膜接触的超离子导体输送到膜的氧的反应来抛光金刚石或碳氮化物膜的装置
公开(公告)号：US5468326A
公开(公告)日：1995-11-21
申请号：US402824
申请日：1995-03-13
申请人： Jerome J. Cuomo , Joseph E. Yehoda
发明人： Jerome J. Cuomo , Joseph E. Yehoda
IPC分类号： B24B1/00 , C23C16/56 , C30B33/00 , G11B7/26 , G11B23/00 , B01J15/00 , B01J19/08
CPC分类号： C30B33/00 , B24B1/00 , C23C16/56 , C30B29/04 , G11B7/263 , G11B23/0064 , Y02T50/67 , Y10T428/24355 , Y10T428/30
摘要： Apparatus and process for polishing a diamond or carbon nitride film by reaction of the film with oxygen anions at the interface between the film and a superionic conductor (e.g., yttria stabilized zirconia) placed in contact with the film. Oxygen anions produced by the formation of vacancies in the superionic conductor are transported to the interface under the influence of a chemical gradient and react with the diamond or carbon nitride. Application of an electric field and/or heat can be used to increase the oxygen partial pressure on the side of the interface opposite the film. An oxygen plasma can be supplied to the superionic conductor such that oxygen ions from the plasma transpire through the superionic conductor to the interface and react with the diamond or carbon nitride.
摘要翻译：用于通过薄膜与氧阴离子在膜与与膜接触放置的超离子导体（例如氧化钇稳定的氧化锆）之间的界面处的反应来研磨金刚石或碳氮化物膜的装置和方法。通过在超离子导体中形成空位产生的氧阴离子在化学梯度的影响下被传送到界面，并与金刚石或碳氮化物反应。可以使用电场和/或热的应用来增加与膜相对的界面侧的氧分压。可以将氧等离子体供应到超离子导体，使得来自等离子体的氧离子通过超离子导体渗透到界面并与金刚石或碳氮化物反应。

54. 发明授权

US5280154A Radio frequency induction plasma processing system utilizing a uniform field coil 失效
标题翻译：使用均匀场线圈的射频感应等离子体处理系统
公开(公告)号：US5280154A
公开(公告)日：1994-01-18
申请号：US828060
申请日：1992-01-30
申请人： Jerome J. Cuomo , Charles R. Guarnieri , Jeffrey A. Hopwood , Stanley J. Whitehair
发明人： Jerome J. Cuomo , Charles R. Guarnieri , Jeffrey A. Hopwood , Stanley J. Whitehair
IPC分类号： H01L21/205 , C23F4/00 , H01J37/32 , H01L21/027 , H01L21/30 , H01L21/302 , H01L21/3065 , H01L21/31 , B23K9/00
CPC分类号： H01J37/321
摘要： A plasma processing apparatus comprising: a chamber for supporting a workpiece; an inlet for introducing a gas into the chamber; a coil of conductive material having a generally flattened configuration whereby to provide a at least one generally planar surface defined by parallel conductors disposed on the chamber; and apparatus for applying radio frequency energy to the coil.
摘要翻译：一种等离子体处理装置，包括：用于支撑工件的室; 用于将气体引入所述室的入口; 导电材料的线圈，其具有大致扁平的构造，由此提供由设置在所述腔室上的平行导体限定的至少一个大致平坦的表面; 以及用于向线圈施加射频能量的装置。

55. 发明授权

US5225926A Durable optical elements fabricated from free standing polycrystalline diamond and non-hydrogenated amorphous diamond like carbon (DLC) thin films 失效
标题翻译：耐用的光学元件由免费立式多晶金刚石和非氢化非晶金刚石（DLC）薄膜制成
公开(公告)号：US5225926A
公开(公告)日：1993-07-06
申请号：US754861
申请日：1991-09-04
申请人： Jerome J. Cuomo , Charles R. Guarnieri , Bruce A. Hoenig , Hajime Seki , James L. Speidell , Stanley J. Whitehair
发明人： Jerome J. Cuomo , Charles R. Guarnieri , Bruce A. Hoenig , Hajime Seki , James L. Speidell , Stanley J. Whitehair
IPC分类号： C23C16/01 , G02B1/10
CPC分类号： G02B1/105 , C23C16/01 , Y10T428/30
摘要： Optical elements, and methods for fabricating them, are described wherein each element includes a free standing (self supporting) polycrystalline continuous thin film of diamond combined with a non-hydrogenated amorphous diamond like carbon (DLC) film having a high percentage of sp.sup.3 bonding. These elements may be designed to have optically smooth surfaces, have wide optical transmission ranges (for example, be transparent across the infrared portion of the spectrum), and exhibit exceptional durability characteristics. Optical instruments that include such elements are also described, along with the derivative benefits, such as improved operating performance and lower maintenance requirements, realized using the novel optical elements. In particular, a polarization Michaelson interferometer (PMI) is taught which is operative over the entire range from far infrared into the visible portion of the spectrum without requiring the exchange of beam splitters or beam polarizers. These performance benefits are achieved as a result of the transmission characteristics of the novel optical elements associated with the PMI.

56. 发明授权

US5179264A Solid state microwave powered material and plasma processing systems 失效
标题翻译：固态微波电力材料和等离子体处理系统
公开(公告)号：US5179264A
公开(公告)日：1993-01-12
申请号：US450343
申请日：1989-12-13
申请人： Jerome J. Cuomo , Charles R. Guarnieri , Stanley Whitehair
发明人： Jerome J. Cuomo , Charles R. Guarnieri , Stanley Whitehair
IPC分类号： H05B6/64 , H05B6/68 , H05H1/46
CPC分类号： H01J37/32201 , H01J37/3222 , H05H1/46
摘要： A solid state microwave generator is utilized as an excitation source for material/ plasma processes. The invention provides very close precise control of the solid state device's power levels to control the ultimate power output and frequency which control is not readily possible with vacuum tube devices. Utilizing the concepts of the invention the total power generated by the system may be easily varied and, further, the power may be easily monitored and used to control other device parameters such as frequency and the like. Because of the degree of control possible within the overall process system of the invention any measurable physical property of the process such as temperature, power, color (e.g., optical pyrometer), or the like that can be monitored and converted to a control signal can be utilized by the present system to carefully control the overall process conditions. These control features are lacking in currently available vacuum tube microwave devices. It is also probable that the overall cost of the solid state based microwave power generators systems will be far less than that of comparable tube type microwave generators.

57. 发明授权

US5133986A Plasma enhanced chemical vapor processing system using hollow cathode effect 失效
标题翻译：使用中空阴影效应的等离子体增强化学蒸气处理系统
公开(公告)号：US5133986A
公开(公告)日：1992-07-28
申请号：US593141
申请日：1990-10-05
申请人： Joseph M. Blum , Bruce Bumble , Kevin K. Chan , Joao R. Conde , Jerome J. Cuomo , William F. Kane
发明人： Joseph M. Blum , Bruce Bumble , Kevin K. Chan , Joao R. Conde , Jerome J. Cuomo , William F. Kane
IPC分类号： H01L21/205 , C23C16/509 , H01J37/32
CPC分类号： H01J37/32082 , C23C16/5093 , Y10S156/913
摘要： A high-efficiency, low-temperature, plasma-enhanced chemical vapor deposition (PECVD) system for growing or depositing various types of thin films on substrate surfaces, or etching such surfaces, using substrates of materials such as silicon, plastic, etc. The system uses a hollow-cathode-effect electron source with a surrounding confining electrode to create a plasma at the substrate surface to insure that the density of reactive species is both enhanced and localized at the substrate surface thus causing the rate of growth of the films, or the etch rate, to increase so that the process can take place at much lower temperatures and power levels. A particular embodiment involves the growing of hydrogenated amorphous silicon (a:Si:H), at room temperature, on silicon using a tubular reactor containing a cylindrical electrode lining the inside of the reactor walls acting as a counter electrode for an rf-powered, substrate-supporting electrode near the center of the reactor. A set of silicon wafers, on which the amorphous silicon is grown, is mounted on the latter electrode. The reaction gases (silane) flowing between the electrodes are decomposed in a plasma excited by an rf power source (13.56 MHz) connected to the substrate-supporting electrode. With the use of appropriate deposition parameters (silane flow rate, pressure, applied power and frequency, and substrate spacing) room temperature growth of a-Si:H is achieved at growth rates up to 15 .ANG./sec, while keeping a low hydrogen concentration (.about.10%) and the bonded hydrogen in the Si-H monohydride configuration.

58. 发明授权

US4774151A Low contact electrical resistant composition, substrates coated therewith, and process for preparing such 失效
标题翻译：低接触电阻组合物，涂覆的基材，及其制备方法
公开(公告)号：US4774151A
公开(公告)日：1988-09-27
申请号：US866554
申请日：1986-05-23
申请人： Jerome J. Cuomo , Eric P. Dibble , Solomon L. Levine
发明人： Jerome J. Cuomo , Eric P. Dibble , Solomon L. Levine
IPC分类号： H01B1/06 , C23C14/06 , C23C14/34 , H01H1/023 , H01H11/04 , B32B9/00 , C23C14/00
CPC分类号： C23C14/3414 , C23C14/0688 , H01H1/023 , Y10T428/261
摘要： A composition of a metallic compound represented by the formula MT, and G is provided by sputtering an M.sub.x G.sub.100-x target. M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof. T is selected from the group of N, C, and mixtures thereof. G is a metal selected from the group of gold, platinum, and palladium. X is an integer from about 65 to about 95. Also provided are substrates coated with the composition and process for depositing the composition on substrates.

59. 发明授权

US4745204A Process for producing aluminum alkoxide or aluminum aryloxide 失效
标题翻译：生产烷氧基铝或氧化铝的方法
公开(公告)号：US4745204A
公开(公告)日：1988-05-17
申请号：US871046
申请日：1986-06-05
申请人： Jerome J. Cuomo , Pamela A. Leary , Jerry M. Woodall
发明人： Jerome J. Cuomo , Pamela A. Leary , Jerry M. Woodall
IPC分类号： C07B41/02 , C07B31/00 , C07C27/00 , C07C29/70 , C07C31/32 , C07C37/66 , C07C39/235 , C07C67/00 , C07F5/06
CPC分类号： C07C37/66 , C07C29/70
摘要： Aluminum alkoxide or aluminum aryloxide is produced by dissolving aluminum in gallium and/or gallium-based alloy wherein the gallium and/or gallium-based alloy is in a liquid form. The aluminum is then reacted with an organic compound having at least one reactive hydroxyl group to thereby obtain the aluminum alkoxide or aluminum aryloxide.
摘要翻译：通过将铝溶解在其中镓和/或镓基合金为液体形式的镓和/或镓基合金中来制备烷氧基铝或铝氧化铝。然后使铝与具有至少一个反应性羟基的有机化合物反应，从而得到烷氧基铝或芳氧化铝。

60. 发明授权

US4664769A Photoelectric enhanced plasma glow discharge system and method including radiation means 失效
标题翻译：光电增强型等离子体辉光放电系统及方法，包括辐射装置
公开(公告)号：US4664769A
公开(公告)日：1987-05-12
申请号：US791666
申请日：1985-10-28
申请人： Jerome J. Cuomo , Charles R. Guarnieri
发明人： Jerome J. Cuomo , Charles R. Guarnieri
IPC分类号： B01J19/08 , C23F4/00 , H01J37/32 , H01L21/203 , H01L21/302 , H01L21/31 , H05H1/22 , C23C14/00
CPC分类号： G21B1/23 , H01J37/32321
摘要： Plasma enhancement is achieved in a plasma glow system by increasing the number of photoelectric electrons in the plasma glow by producing photoelectrons from the surface of a target in the system by the use of a radiation source. This is more particularly accomplished by flooding the surface of the target with a UV laser beam during the plasma process where emitted photoelectrons are injected into the plasma to increase the plasma density.The plasma enhancement is used in a sputter etching/deposition system which includes a chamber containing a cathode, a target, a substrate platform containing substrate and a pump. An ultraviolet light source such as a UV laser and focussing optics for focussing the UV radiation onto the target through a UV transmission window are also provided. A plasma region in the chamber is enhanced by photons from the laser striking the target and producing photoelectrons which are injected into the plasma to increase its density.
摘要翻译：通过使用辐射源从系统中的靶的表面产生光电子，通过增加等离子体辉光中的光电子数量，在等离子体发光系统中实现等离子体增强。这通过在发射的光电子被注入到等离子体中的等离子体工艺期间用UV激光束淹没靶的表面来提高等离子体密度更特别地实现。等离子体增强用于溅射蚀刻/沉积系统，其包括含有阴极，靶，含基底平台的基底和泵的腔室。还提供了诸如UV激光和聚焦光学器件的紫外光源，用于通过UV透射窗将UV辐射聚焦到靶上。腔中的等离子体区域被来自激光撞击靶的光子增强，并产生注入到等离子体中以增加其密度的光电子。

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