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51. 发明申请

US20070146678A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070146678A1
公开(公告)日：2007-06-28
申请号：US11316359
申请日：2005-12-23
申请人： Erik Loopstra , Bernardus Antonius Luttikhuis
发明人： Erik Loopstra , Bernardus Antonius Luttikhuis
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , G03F7/70733
摘要： A lithographic apparatus includes an illumination system to condition a radiation beam, a patterning device support to support a patterning device in a projection plane, the patterning device to pattern the radiation beam, a substrate table to hold a substrate, a projection system to project the patterned beam onto the substrate, and an exchange device to exchange an exchangeable object with an exchangeable object support that holds the exchangeable object during projection. The exchange device includes a load unit and an unload unit that each have a holding device to hold an exchangeable object. The holding devices are positioned substantially adjacent to each other and configured to hold an exchangeable object in a plane substantially parallel to the plane in which the exchangeable object is held in the exchangeable object support during projection. The exchangeable object support exchanges an exchangeable object with each of the holding devices.
摘要翻译：光刻设备包括用于调节辐射束的照明系统，图案形成装置支撑件以支撑投影平面中的图案形成装置，图案形成装置对辐射束进行图案化，衬底台以保持衬底，投影系统将投影系统投影图案化的光束到基板上，以及交换装置，用于在可投影对象期间交换可交换对象与可更换物体的支撑。交换装置包括负载单元和卸载单元，每个都具有用于保持可更换对象的保持装置。保持装置基本上彼此相邻地定位，并且构造成将可交换物体保持在基本上平行于平面的平面中，在该平面中可交换物体在投影期间被保持在可更换物体支撑件中。可交换对象支持与每个保持装置交换可交换对象。

52. 发明申请

US20070013893A1 Stage apparatus, lithographic apparatus and device manufacturing method 有权
标题翻译：舞台装置，光刻装置及装置的制造方法
公开(公告)号：US20070013893A1
公开(公告)日：2007-01-18
申请号：US11179780
申请日：2005-07-13
申请人： Erik Loopstra
发明人： Erik Loopstra
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , G03F7/70425 , G03F7/70716
摘要： In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.
摘要翻译：为了提高光刻设备的生产率，描述了用于保持两个图案形成装置的平台装置。图案形成装置被布置成使得扫描方向上的图案之间的距离对应于图案在扫描方向上的长度。通过这样做，可以通过用第一图案曝光第一模具，跳过与第一模具相邻的第二模具，以及使用第二图案露出与第二模具相邻的第三模具来执行改进的曝光顺序。

53. 发明申请

US20060114441A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060114441A1
公开(公告)日：2006-06-01
申请号：US11335681
申请日：2006-01-20
申请人： Vadim Banine , Levinus Bakker , Jeroen Jonkers , Erik Loopstra
发明人： Vadim Banine , Levinus Bakker , Jeroen Jonkers , Erik Loopstra
IPC分类号： G03B27/72
CPC分类号： G03F7/70008 , G03F7/7005
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

54. 发明申请

US20060109442A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060109442A1
公开(公告)日：2006-05-25
申请号：US10995536
申请日：2004-11-24
申请人： Erik Loopstra , Petrus Bartray , Antonius Van Dijsseldonk , Paulus Liebregts
发明人： Erik Loopstra , Petrus Bartray , Antonius Van Dijsseldonk , Paulus Liebregts
IPC分类号： G03B27/52
CPC分类号： G03F7/70141 , G03F7/70091
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.
摘要翻译：光刻设备包括被配置为提供辐射束和投影系统的照明系统，其配置成将辐射束投影到基板的目标部分上。照明系统和投影系统中的至少一个包括用于反射或折射光束的聚焦元件。提供了多个止动盘，每个具有穿过其中的孔，以及配置成将止动盘中的一个邻近聚焦元件放置的盘定位器，以控制投影系统或照明系统的数值孔径（NA）。该装置还包括一个换盘器，其被配置为选择一个停止盘并将所选择的停止盘提供给盘定位器，换盘器位于投影系统或照明系统的外部。

55. 发明申请

US20060060799A1 Lithographic apparatus and device menufacturing method 有权
标题翻译：平版印刷设备和设备制造方法
公开(公告)号：US20060060799A1
公开(公告)日：2006-03-23
申请号：US11263012
申请日：2005-11-01
申请人： Dominicus Jacobus Franken , Erik Loopstra , Pertrus Bartray , Marc Van Der Wijst , Michael Jozefa Renkens , Gerard Van Schothorst , Johan Dries
发明人： Dominicus Jacobus Franken , Erik Loopstra , Pertrus Bartray , Marc Van Der Wijst , Michael Jozefa Renkens , Gerard Van Schothorst , Johan Dries
IPC分类号： G21K5/10
CPC分类号： G03F7/70833 , G03F7/709
摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
摘要翻译：光刻设备包括安装在参考框架上的投影系统，投影系统又安装在支撑设备的基座上。基座中的振动和位移误差通过两组隔离安装件在基座和参考框架之间以及参考框架和投影系统的投影框架之间进行过滤，因此减小了投影系统的干扰。

56. 发明申请

US20050157285A1 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US20050157285A1
公开(公告)日：2005-07-21
申请号：US10848586
申请日：2004-05-19
申请人： Gerard Schothorst , Fransiscus Van Deuren , Jan Eijk , Erik Loopstra , Robert-Han Munnig Schmidt , Felix Peters
发明人： Gerard Schothorst , Fransiscus Van Deuren , Jan Eijk , Erik Loopstra , Robert-Han Munnig Schmidt , Felix Peters
IPC分类号： G03B27/72 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70066 , G03F7/70191
摘要： A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.
摘要翻译：一种光刻设备，包括用于在将图案化的投影光束成像到衬底上之前选择性地透射投影光束的装置。该装置可以包括以下任何一种：在投影光束的方向上布置在图案形成装置的下游的选择性发射装置，扫描系统中的固定的和可移动的掩蔽刀片组，或可切换元件的阵列。该装置可以提供给掩模台/保持器或光刻投影装置的框架或结构。

57. 发明申请

US20050134820A1 Method for exposing a substrate, patterning device, and lithographic apparatus 审中-公开
标题翻译：曝光基板，图案形成装置和光刻装置的方法
公开(公告)号：US20050134820A1
公开(公告)日：2005-06-23
申请号：US10740830
申请日：2003-12-22
申请人： Heine Mulder , Antonius Johannes Van Dijsseldonk , Erik Loopstra , Uwe Mickan , Johannes Catharinus Mulkens , Harm-Jan Voorma
发明人： Heine Mulder , Antonius Johannes Van Dijsseldonk , Erik Loopstra , Uwe Mickan , Johannes Catharinus Mulkens , Harm-Jan Voorma
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/70075 , G03F7/701 , G03F7/70425 , G03F7/70566
摘要： A method using a lithographic apparatus comprising a reflective integrator is claimed that optimizes the exposure of features on a target area of a substrate, when the features make an angle between 5 and 85 degrees with respect to the target area. The method comprises rotating the reflective integrator with respect to the target area providing a rotated mirror-symmetric pupil shape, which is implemented by either rotating the substrate or rotating the reflective integrator with respect to the machine or the patterning device. The patterning device comprises a maximum usable area and a patterned area which are rotated with respect to each other if a rotated substrate is employed. The method can be used in single exposure or double exposure mode. A further advantage of the method of using a rotated wafer is that it can be used for exposing features on a substrate in any direction even when the projection system of the lithographic apparatus shows a preferred polarization direction.
摘要翻译：要求使用包括反射积分器的光刻设备的方法，当特征相对于目标区域形成5至85度的角度时，可优化基板目标区域上的特征的曝光。该方法包括使反射积分器相对于目标区域旋转，从而提供旋转的对称瞳孔形状，其通过旋转基底或相对于机器或图案形成装置旋转反射积分器来实现。如果使用旋转的衬底，则图案形成装置包括相对于彼此旋转的最大可用面积和图案化区域。该方法可用于单次曝光或双曝光模式。使用旋转晶片的方法的另一个优点是，即使当光刻设备的投影系统显示优选的偏振方向时，其可以用于在任何方向上曝光衬底上的特征。

58. 发明申请

US20050018154A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20050018154A1
公开(公告)日：2005-01-27
申请号：US10844570
申请日：2004-05-13
申请人： Wilhelmus Box , Antonius Van Dijsseldonk , Dominicus Jacobus Franken , Martinus Leenders , Erik Loopstra , Josephus Smits , Marc Van Der Wijst
发明人： Wilhelmus Box , Antonius Van Dijsseldonk , Dominicus Jacobus Franken , Martinus Leenders , Erik Loopstra , Josephus Smits , Marc Van Der Wijst
IPC分类号： G21K1/06 , G02B7/182 , G03F7/20 , H01L21/027 , G03B27/52 , G21K5/00
CPC分类号： G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70858 , G03F7/70891 , G03F7/709 , G03F7/70991
摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.
摘要翻译：光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。

59. 发明授权

US09354529B2 Arrangement for use in a projection exposure tool for microlithography having a reflective optical element 有权
标题翻译：用于具有反射光学元件的微光刻的投影曝光工具中的布置
公开(公告)号：US09354529B2
公开(公告)日：2016-05-31
申请号：US13561502
申请日：2012-07-30
申请人： Dirk Heinrich Ehm , Maarten van Kampen , Stefan-Wolfgang Schmidt , Vadim Yevgenyevich Banine , Erik Loopstra
发明人： Dirk Heinrich Ehm , Maarten van Kampen , Stefan-Wolfgang Schmidt , Vadim Yevgenyevich Banine , Erik Loopstra
IPC分类号： G03B27/52 , G03B27/54 , G03F7/20 , G01J1/58 , G02B5/08
CPC分类号： G03F7/70891 , G01J1/58 , G02B5/0891 , G03F7/70316 , G03F7/70558 , G03F7/7085 , G03F7/70958
摘要： An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).
摘要翻译：用于微光刻的投影曝光工具（100）中的布置包括反射光学元件（10; 110）和辐射检测器（30; 32; 130）。反射光学元件（10; 110）包括保证光学元件（10; 110）的机械强度的载体元件（12）和设置在载体元件（12）上的反射涂层（18），用于反射使用辐射 20a）。载体元件（12）由与使用辐射（20a）相互作用发射其波长与使用辐射（20a）的波长不同的次级辐射（24）和辐射检测器（30）的材料制成 ; 32; 130）被配置为检测所述次级辐射（24）。

60. 发明授权

US07633599B2 Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light 有权
标题翻译：用于改变照明场中的光的强度分布而不会使光的远心变形的方法
公开(公告)号：US07633599B2
公开(公告)日：2009-12-15
申请号：US11523695
申请日：2006-09-20
申请人： Stephen Roux , Erik Loopstra , Michael L. Nelson
发明人： Stephen Roux , Erik Loopstra , Michael L. Nelson
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G03F7/70558 , G03F7/70066
摘要： An apparatus for changing an intensity distribution of a light within an illumination field includes a structure configured to be positioned within the illumination field so that a first portion of the light within the illumination field impinges upon the structure, where the structure is translucent or opaque to a wavelength of the light. The apparatus also includes an actuator configured to cause a movement of a first portion of the structure so that a second portion of the light within the illumination field impinges upon the structure. The light within the illumination field is produced by a source configured so that a pupil fill of a beam of the light is uncontrolled, but the beam of the light downstream of the structure is substantially telecentric before and after the movement of the first portion of the structure. Related methods are also presented.
摘要翻译：用于改变照明场中的光的强度分布的装置包括被配置为定位在照明场内的结构，使得照明场内的光的第一部分照射在结构上，其中结构是半透明的或不透明的光的波长。该装置还包括致动器，该致动器被配置为引起结构的第一部分的移动，使得照明场内的光的第二部分撞击该结构。照明场内的光由源构成，使得光束的光瞳填充不受控制，但是结构的下游光的光束在第一部分的移动之前和之后基本上是远心的结构体。还提出了相关方法。

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