专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明授权

US07460231B2 Alignment tool for a lithographic apparatus 失效
标题翻译：光刻设备对准工具
公开(公告)号：US07460231B2
公开(公告)日：2008-12-02
申请号：US11389494
申请日：2006-03-27
申请人： Sami Musa , Richard Johannes Franciscus Van Haren , Maurits Van Der Schaar
发明人： Sami Musa , Richard Johannes Franciscus Van Haren , Maurits Van Der Schaar
IPC分类号： G01B11/00
CPC分类号： G03F9/7049 , G03F9/7015 , G03F9/7088
摘要： An alignment tool for a lithographic apparatus illuminates an alignment mark on a substrate with an alignment beam and measures the reflected spectrum. The reflected spectrum is compared with a reference mark to determine any misalignment. A blazed sub-wavelength grating is used to deflect the sub-beams created by diffracting the alignment beam from the alignment mark onto the reference mark.
摘要翻译：用于光刻设备的对准工具用对准光照射衬底上的对准标记并测量反射光谱。将反射光谱与参考标记进行比较，以确定任何未对准。使用闪耀的亚波长光栅来将通过将对准光束从对准标记衍射衍射到参考标记而产生的子光束偏转。

52. 发明申请

US20080165332A1 Lithographic Apparatus, Device Manufacturing Method and Device 有权
标题翻译：光刻设备，器件制造方法和器件
公开(公告)号：US20080165332A1
公开(公告)日：2008-07-10
申请号：US11948801
申请日：2007-11-30
申请人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons
发明人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons
IPC分类号： G03B27/68
CPC分类号： G03F7/70725 , G03F7/70258 , G03F7/70358 , G03F7/70458 , G03F7/70525 , G03F7/70633 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region.
摘要翻译：光刻设备包括配置成调节辐射束的照明系统，图案形成装置的支撑件，用于衬底的衬底台，投影系统和控制系统。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。投影系统被配置为沿着扫描路径将图案化的辐射束作为图像投影到基板的目标部分上。扫描路径由光刻设备的曝光场的扫描方向上的轨迹限定。控制系统耦合到支撑件，基板台和投影系统，用于分别控制支撑件，基板台和投影系统的作用。控制系统被配置为通过在该区域中的图像的时间调整来校正沿着扫描路径的区域中的图像的局部失真。

53. 发明申请

US20080148875A1 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 审中-公开
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US20080148875A1
公开(公告)日：2008-06-26
申请号：US11641944
申请日：2006-12-20
申请人： Thomas Leo Maria Hoogenboom , Reinder Teun Plug , Maurits Van Der Schaar
发明人： Thomas Leo Maria Hoogenboom , Reinder Teun Plug , Maurits Van Der Schaar
IPC分类号： G01M19/00
CPC分类号： G03F7/70616
摘要： Two drive systems are responsible for moving a substrate beneath, for example, an illumination system or a measurement radiation beam. A first drive system drives a substrate in a X direction and a second drive system drives the substrate in a Y direction. In order to make a measurement of a feature of the substrate surface, targets are arranged in a lattice. Rather than having the lattice aligned with the X and Y directions such that only one drive system operates at a time to step between the targets, the lattice of targets is arranged at an angle with respect to the X and Y axes such that both drive systems operate simultaneously in order to move between the targets. The targets (or sub-targets within the targets) may also be arranged with respect to each other so as to save scribelane space and to create a most economical path between them.
摘要翻译：两个驱动系统负责在例如照明系统或测量辐射束之下移动衬底。第一驱动系统沿X方向驱动基板，第二驱动系统沿Y方向驱动基板。为了测量衬底表面的特征，靶被布置成格子。不是使格子与X和Y方向对准，使得只有一个驱动系统一次在目标之间步进操作，目标的格子相对于X和Y轴以一定角度布置，使得两个驱动系统同时操作，以便在目标之间移动。目标（或目标内的子目标）也可以相对于彼此布置，以便节省scribelane空间并且在它们之间创建最经济的路径。

54. 发明授权

US07391513B2 Lithographic apparatus and device manufacturing method using overlay measurement quality indication 有权
标题翻译：平版印刷设备和设备制造方法使用覆盖测量质量指示
公开(公告)号：US07391513B2
公开(公告)日：2008-06-24
申请号：US11391690
申请日：2006-03-29
申请人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Stefan Carolus Jacobus Antonius Keij
发明人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Stefan Carolus Jacobus Antonius Keij
IPC分类号： G01B11/00 , G06K9/00
CPC分类号： G03F7/70633 , G03F7/70483
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes two reference gratings provided in the substrate and two measurement gratings on top of the reference gratings, the measurement gratings being similar to the reference gratings, and oppositely biased in a single direction relative to the respective reference gratings. An overlay measurement device with an image sensor is used for obtaining pixel data of a measurement spot in each of the two measurement gratings. Asymmetry for each pixel in the measurement spot is measured, and from the pixel asymmetry measurements in associated pixels of each of the two measurement gratings an overlay value and a process dependent value is determined, as well as a quality indicator for the overlay value and the process dependent value.
摘要翻译：布置成将图案从图案形成装置转移到基板上的光刻设备包括设置在基板中的两个参考光栅和在参考光栅顶部的两个测量光栅，测量光栅类似于参考光栅，并且相反地偏置在单个相对于各个参考光栅的方向。使用具有图像传感器的覆盖测量装置来获得两个测量光栅中的每一个中的测量点的像素数据。测量测量点中每个像素的不对称性，并且从两个测量光栅中的每一个的相关像素中的像素不对称测量结果确定覆盖值和过程相关值，以及重叠值的质量指示符和过程依赖值。

55. 发明申请

US20080144036A1 Method of measurement, an inspection apparatus and a lithographic apparatus 审中-公开
标题翻译：测量方法，检查装置和光刻设备
公开(公告)号：US20080144036A1
公开(公告)日：2008-06-19
申请号：US11641124
申请日：2006-12-19
申请人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
发明人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
IPC分类号： G01N21/47
CPC分类号： G03F7/70633 , H01L22/12
摘要： An inspection system is arranged to measure an overlay error by projecting a plurality of radiation beams, differing in wavelength and/or polarization, onto two targets. A first radiation beam is projected onto a first target and the reflected radiation A1+ is detected. The first target comprises two gratings having a bias +d with respect to each other. The first radiation beam is also projected on to a second target, which comprises two gratings having a bias −d with respect to each other, and the reflected radiation A1− is detected. A second radiation beam, having a different wavelength and/or polarization from the first radiation beam, is projected onto the first target and reflected radiation A2+ is detected and projected onto the second target and reflected radiation A2− is detected. Detected radiations A1+, A1−, A2+, and A2− is used to determine the overlay error.
摘要翻译：检查系统被布置成通过将不同波长和/或极化的多个辐射束投影到两个目标上来测量覆盖误差。第一辐射束被投影到第一目标上，并且检测到反射辐射A 1 +。第一个目标包括两个相对于彼此具有偏压+ d的光栅。第一辐射束也被投影到第二靶上，第二靶被包括相对于彼此具有偏压-d的两个光栅，并且检测到反射的辐射A 1 - 。具有与第一辐射束不同的波长和/或极化的第二辐射束被投影到第一目标上，并且检测并反射辐射A 2 + 2并将其投影到第二目标和反射辐射A 检测到<2> 。检测到的辐射使用1 ，1 ，2 和A 2 - 来确定重叠错误。

56. 发明申请

US20050147902A1 Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby 失效
标题翻译：光刻设备，确定模型参数的方法，器件制造方法以及由此制造的器件
公开(公告)号：US20050147902A1
公开(公告)日：2005-07-07
申请号：US11007578
申请日：2004-12-09
申请人： Maurits Van Der Schaar , Jeroen Huijbregtse , Sicco Schets , Bart Swinnen
发明人： Maurits Van Der Schaar , Jeroen Huijbregtse , Sicco Schets , Bart Swinnen
IPC分类号： G03F9/00 , G03B27/00 , G03C5/00 , G03C8/00 , H01L21/027 , H01L21/68
CPC分类号： G03F9/7092
摘要： A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object may include a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.
摘要翻译：根据本发明的一个实施例的方法涉及确定提供关于对象的位置的信息的模型的至少一个参数。物体可以包括多个对准标记，其中期望的位置是已知的。该方法包括测量每个对准标记的多个位置参数。基于所测量的多个位置参数，其被称重系数加权，确定对象的模型的至少一个参数。每个称重系数的数值与模型的至少一个参数一起确定。

57. 发明授权

US09235141B2 Inspection apparatus and method for measuring a property of a substrate 有权
标题翻译：用于测量基板的性质的检查装置和方法
公开(公告)号：US09235141B2
公开(公告)日：2016-01-12
申请号：US13186895
申请日：2011-07-20
申请人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Andreas Fuchs , Martyn John Coogans , Hendrik Jan Hidde Smilde
发明人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Andreas Fuchs , Martyn John Coogans , Hendrik Jan Hidde Smilde
IPC分类号： G03F7/20 , G01N21/95 , G01N21/956 , G03F9/00 , G01N21/47
CPC分类号： G03F7/70633 , G01B2210/56 , G01N21/4788 , G01N21/9501 , G01N21/95607 , G03F7/70616 , G03F9/70
摘要： An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions. Furthermore, the plurality of illuminated portions are arranged such that first order diffracted radiation arising from the one or more of the illuminated portions are overlapped by at least one of the higher orders of diffracted radiation arising from any other of the illuminated portions.
摘要翻译：检查装置测量包括周期性结构的基板的性质。照明系统提供具有包括多个照明部分的照明轮廓的辐射束。辐射投影仪将辐射束投影到基板上。检测器检测从周期性结构散射的辐射，并分别检测每个照明部分的一级衍射辐射和衍射辐射的至少一个高阶。处理器根据检测到的辐射来确定衬底的性质。多个照明部分被布置成使得从一个或多个被照射部分产生的一级衍射辐射不会被任何其他照明部分产生的零级或一级衍射辐射重叠。此外，多个照明部分被布置成使得由一个或多个被照射部分产生的一阶衍射辐射与从任何其他照明部分产生的衍射辐射的较高阶数中的至少一个重叠。

58. 发明授权

US09229338B2 Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus 有权
标题翻译：基板，测量属性的方法，检查装置和光刻设备
公开(公告)号：US09229338B2
公开(公告)日：2016-01-05
申请号：US13059405
申请日：2009-07-27
申请人： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Hendrik Jan Hidde Smilde
发明人： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Hendrik Jan Hidde Smilde
IPC分类号： G01B11/00 , G03B27/32 , G03B27/54 , G03B27/74 , H01L23/28 , G03F7/20 , G03F9/00 , H01L23/544
CPC分类号： G01N21/9501 , G01N21/4738 , G01N2201/06113 , G01N2201/10 , G02B5/1823 , G02B5/1861 , G03F7/70058 , G03F7/70633 , G03F7/70683 , G03F9/70 , G03F9/7046 , G03F9/7076 , H01L23/544 , H01L2924/0002 , Y10T428/24612 , H01L2924/00
摘要： Scatterometry for measuring overlay. A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from the first set of gratings or a different orientation. Consequently the first order diffraction pattern from the second set of superimposed gratings can be distinguished from the first order diffraction pattern from the first set of superimposed gratings.
摘要翻译：用于测量覆盖层的散射法。第二组叠加的光栅叠加在第一组叠加的光栅上。第二组光栅具有与第一组光栅不同的周期性或不同的取向。因此，来自第二组叠加光栅的一阶衍射图可以与来自第一组叠加光栅的一阶衍射图案区分开。

59. 发明授权

US08786825B2 Apparatus and method of measuring a property of a substrate 有权
标题翻译：测量基材性质的装置和方法
公开(公告)号：US08786825B2
公开(公告)日：2014-07-22
申请号：US12936327
申请日：2009-04-20
申请人： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans
发明人： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/7065 , G01N21/47 , G01N21/4788 , G01N21/9501 , G01N21/956 , G03F7/70633 , G03F9/7049 , G03F9/7088
摘要： The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.
摘要翻译：本发明使用在图像平面内或附近测量衍射光谱，以便确定曝光的基底的性质。特别地，正和负的第一衍射级被分离或发散，被检测并且测量它们的强度以确定衬底上的暴露层的覆盖层（或其它性质）。

60. 发明授权

US08724109B2 Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
标题翻译：用于角分辨光谱光刻特征的方法和装置
公开(公告)号：US08724109B2
公开(公告)日：2014-05-13
申请号：US12865828
申请日：2009-02-09
申请人： Irwan Dani Setija , Maurits Van Der Schaar
发明人： Irwan Dani Setija , Maurits Van Der Schaar
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： An apparatus and method to determine overlay of a target on a substrate (6) by measuring, in the pupil plane (40) of a high numerical aperture len (L1), an angle-resolved spectrum as a result of radiation being reflected off the substrate. The overlay is determined from the anti-symmetric component of the spectrum, which is formed by subtracting the measured spectrum and a mirror image of the measured spectrum. The measured spectrum may contain only zeroth order reflected radiation from the target.
摘要翻译：一种用于通过在高数值孔径len（L1）的光瞳平面（40）中测量作为辐射的结果的角度分辨光谱从基质。通过从测量光谱中减去测量光谱和所测量的光谱的镜像形成的光谱的反对称分量来确定覆盖。所测量的光谱可能仅包含来自目标的零级反射辐射。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式