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51. 发明申请

US20060095330A1 Merchandise sales data processing apparatus 失效
标题翻译：商品销售数据处理装置
公开(公告)号：US20060095330A1
公开(公告)日：2006-05-04
申请号：US11260869
申请日：2005-10-27
申请人： Hiroshi Nishikawa
发明人： Hiroshi Nishikawa
IPC分类号： G06Q20/00
CPC分类号： G07G1/12 , G06F3/0224 , G06F3/0238 , G06Q20/20 , G07G5/00
摘要： A receipt issuance facility included in a receipt printer incorporated in a merchandise sales data processing apparatus is utilized in order to print a role assigned to a key together with a frame matched with the size of the key.
摘要翻译：使用包含在商品销售数据处理装置中的收据打印机中所包含的收据发行设施，以便打印分配给密钥的角色以及与密钥大小匹配的帧。

52. 发明申请

US20060077484A1 Image forming apparatus and image reading apparatus 有权
公开(公告)号：US20060077484A1
公开(公告)日：2006-04-13
申请号：US11020171
申请日：2004-12-27
申请人： Keiko Toyoda , Hiroshi Nishikawa
发明人： Keiko Toyoda , Hiroshi Nishikawa
IPC分类号： H04N1/04
CPC分类号： H04N1/00909 , H04N1/12 , H04N1/1235 , H04N1/193 , H04N2201/0081 , H04N2201/0446
摘要： An image forming apparatus capable of controlling movement of a transparent member suitably depending on various situations by including a transparent member, a feeding unit that feeds an original document to the transparent member, a reading unit that reads an image of the document fed on the transparent member via the transparent member, a moving unit that reciprocates the transparent member in a prescribed direction, and a controller that moves the transparent member forward in one direction from a home position while one document passes through a reading position, and stops the transparent member and then moves the transparent member backward to the home position when an interruption event of reading the document occurs.

53. 发明申请

US20050159899A1 Device and method for monitoring process exhaust gas, semiconductor manufacturing device, and system and method for controlling semiconductor manufacturing device 有权
公开(公告)号：US20050159899A1
公开(公告)日：2005-07-21
申请号：US11062470
申请日：2005-02-22
申请人： Kiyoshi Komiyama , Takahiro Shimoda , Hiroshi Nishikawa
发明人： Kiyoshi Komiyama , Takahiro Shimoda , Hiroshi Nishikawa
IPC分类号： C23C16/44 , C23C16/52 , H01L21/205 , H01L21/302 , H01L21/3065 , G06F19/00
CPC分类号： C23C16/52 , C23C16/44 , C23C16/4412
摘要： Process exhaust gas is sampled, and the components of the process exhaust gas are analyzed by a Fourier-transform infrared spectroscope (FT-IR) (26). The analysis result is compared with a reference analysis result obtained from an analysis of process exhaust gas generated in an operation performed under reference process conditions. If the amount of a gas component changes to an amount that is outside a predetermined range set around a reference value obtained from the reference analysis result, a signal indicating a process error is outputted. Instead of the output of the signal indicating a process error, the process conditions can be automatically adjusted.

54. 发明授权

US06840435B2 Method for brazing aluminum alloy-assembled articles within a short period of time and a filler alloy usable at low temperature 失效
标题翻译：在短时间内钎焊铝合金组装制品的方法和可在低温下使用的填充合金
公开(公告)号：US06840435B2
公开(公告)日：2005-01-11
申请号：US10007797
申请日：2001-11-07
申请人： Nobuaki Ohara , Takeyoshi Doko , Masaki Shimizu , Satoshi Nohira , Hiroshi Nishikawa , Hiroshi Ogawa
发明人： Nobuaki Ohara , Takeyoshi Doko , Masaki Shimizu , Satoshi Nohira , Hiroshi Nishikawa , Hiroshi Ogawa
IPC分类号： B23K1/00 , B23K1/19 , B23K35/28 , B23K35/22 , C22C21/00
CPC分类号： B23K35/288 , B23K1/0012 , B23K1/19 , B23K2101/14 , B23K2103/10
摘要： A method for brazing aluminum alloy-assembled articles with a filler alloy having a liquidus temperature of 540° C. or lower and a difference of temperature between the liquidus temperature and the solidus temperature being 100° C. or lower, wherein the highest temperature reached in the assembled article at the time of heating for brazing being set 40° C. or more higher than the liquidus temperature but 585° C. or lower. An aluminum alloy-filler alloy usable at low temperature for brazing, which comprises Si in an amount of 4.0 wt % to 8.0 wt %, Zn in an amount of 7.0 wt % to 20.0 wt % and Cu in an amount of 10.0 wt % to 35.0 wt %, with the balance being made of aluminum.
摘要翻译：一种用液态温度为540℃以下的液相线温度为100℃以下的液相线温度为100℃以下的填充合金钎焊铝合金组装制品的方法，其中达到最高温度在加热钎焊时的组装制品中，设定为40℃以上，高于液相线温度585℃以下。一种铝合金 - 填料合金，其在低温下可用于钎焊，其包含4.0重量％至8.0重量％的Si，7.0重量％至20.0重量％的Zn和10.0重量％的Cu，相对于 35.0重量％，余量由铝制成。

55. 发明授权

US06639041B2 Spandex having low set at low temperatures 有权
标题翻译：氨纶在低温下设定低
公开(公告)号：US06639041B2
公开(公告)日：2003-10-28
申请号：US10148726
申请日：2002-05-31
申请人： Hiroshi Nishikawa , Masao Umezawa
发明人： Hiroshi Nishikawa , Masao Umezawa
IPC分类号： C08G1810
CPC分类号： C08G18/10 , C08G18/4854 , D01F6/70 , Y10S528/906 , C08G18/282 , C08G18/3206 , C08G18/3225 , C08G18/2865
摘要： A low set (at low temperatures) spandex, based on copoly(alkylene ethers), which are copolymers containing tetramethylene ether and either ethylene ether or 1,2-propylene ether moieties, is provided.
摘要翻译：提供了基于共聚（亚烷基醚）的低聚（低温）氨纶，它们是含有四亚甲基醚和乙烯醚或1,2-亚丙基醚部分的共聚物。

56. 发明授权

US06553277B1 Method and apparatus for vacuum treatment 有权
标题翻译：真空处理方法和装置
公开(公告)号：US06553277B1
公开(公告)日：2003-04-22
申请号：US09959764
申请日：2001-11-06
申请人： Shoji Yagisawa , Hiromitsu Kanbara , Hiroshi Nishikawa , Takashi Ito
发明人： Shoji Yagisawa , Hiromitsu Kanbara , Hiroshi Nishikawa , Takashi Ito
IPC分类号： H05H100
CPC分类号： H01L21/67253 , H01J37/32935 , H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： A method of vacuum treatment is performed using a vacuum treatment system (1) comprising a vacuum treatment unit (31) for treating a wafer (W) placed on a wafer stage (10) and a controller (51) for controlling the vacuum treatment unit (31). A sensor wafer (11) of substantially the same shape and size as a wafer (W), which includes a detector element (11d) for detecting data about the state of a vacuum treatment and a data processing element (11p) for processing the detected data, is placed on the wafer stage (10) and treated in a vacuum by the vacuum treatment unit (31). While the sensor wafer (11) is subjected to a vacuum treatment, data on the state of the vacuum treatment is detected and processed. Based on the processed data, the controller (51) controls the vacuum treatment unit (31) to treat the wafer (W).
摘要翻译：使用真空处理系统（1）进行真空处理的方法，真空处理系统（1）包括用于处理放置在晶片台（10）上的晶片（W）的真空处理单元（31）和用于控制真空处理单元（31）。一种与晶片（W）基本相同形状和尺寸的传感器晶片（11），其包括用于检测关于真空处理状态的数据的检测器元件（11d）和用于处理检测到的数据处理元件（11p）数据放置在晶片台（10）上，并通过真空处理单元（31）在真空中进行处理。在对传感器晶片（11）进行真空处理的同时，检测并处理真空处理状态的数据。基于处理数据，控制器（51）控制真空处理单元（31）来处理晶片（W）。

57. 发明授权

US06411588B1 Optical data recording/reproducing device 失效
标题翻译：光学数据记录/再现装置
公开(公告)号：US06411588B1
公开(公告)日：2002-06-25
申请号：US09152329
申请日：1998-09-14
申请人： Toshiyuki Kase , Hiroshi Nishikawa
发明人： Toshiyuki Kase , Hiroshi Nishikawa
IPC分类号： G11B700
CPC分类号： G11B7/133 , G11B7/1263 , G11B7/1374 , G11B7/1381
摘要： Disclosed is an optical data recording/reproducing device which is provided with a laser diode for emitting laser beam, an illuminating optical system including an objective lens which converges the laser beam emitted by the laser diode on an optical disc, a monitoring optical system including a light receiving element which receives a part of the laser beam emitted by the laser diode, and a driving circuit which drives the laser diode in accordance with an output signal of the light receiving element. A coupling efficiency of the illuminating optical system and a coupling efficiency of the monitoring optical system are made substantially the same.
摘要翻译：公开了一种设置有用于发射激光束的激光二极管的光学数据记录/再现装置，包括将由激光二极管发射的激光束会聚在光盘上的物镜的照明光学系统，包括接收由激光二极管发射的激光束的一部分的光接收元件，以及根据光接收元件的输出信号来驱动激光二极管的驱动电路。照明光学系统的耦合效率和监视光学系统的耦合效率基本上相同。

58. 发明授权

US06264788B1 Plasma treatment method and apparatus 失效
标题翻译：等离子体处理方法和装置
公开(公告)号：US06264788B1
公开(公告)日：2001-07-24
申请号：US09556133
申请日：2000-04-21
申请人： Masayuki Tomoyasu , Akira Koshiishi , Kosuke Imafuku , Shosuke Endo , Kazuhiro Tahara , Yukio Naito , Kazuya Nagaseki , Keizo Hirose , Mitsuaki Komino , Hiroto Takenaka , Hiroshi Nishikawa , Yoshio Sakamoto
发明人： Masayuki Tomoyasu , Akira Koshiishi , Kosuke Imafuku , Shosuke Endo , Kazuhiro Tahara , Yukio Naito , Kazuya Nagaseki , Keizo Hirose , Mitsuaki Komino , Hiroto Takenaka , Hiroshi Nishikawa , Yoshio Sakamoto
IPC分类号： H05H100
CPC分类号： C23C16/45565 , C23C16/4405 , C23C16/4407 , C23C16/4483 , C23C16/4485 , C23C16/4557 , C23C16/5096 , C23C16/517 , H01J37/32082 , H01J37/32146 , H01J37/32155 , H01J37/32165 , H01J37/3244 , H01J37/32935 , H01J37/32963 , Y10S156/916
摘要： A plasma treatment method comprising exhausting a process chamber so as to decompress the process chamber, mounting a wafer on a suscepter, supplying a process gas to the wafer through a shower electrode, applying high frequency power, which has a first frequency f1 lower than an inherent lower ion transit frequencies of the process gas, to the suscepter, and applying high frequency power, which has a second frequency f2 higher than an inherent upper ion transit frequencies of the process gas, whereby a plasma is generated in the process chamber and activated species influence the water.
摘要翻译：一种等离子体处理方法，包括：排出处理室以对处理室进行减压，将晶片安装在可变装置上，通过淋浴电极向晶片供应处理气体，施加高频功率，该频率的第一频率f1低于固有的较低离子转移频率的工艺气体，以及施加高频功率，其具有高于处理气体的固有上部离子转移频率的第二频率f2，由此在处理室中产生等离子体并被激活物种影响水。

59. 再颁专利

USRE36810E Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：USRE36810E
公开(公告)日：2000-08-08
申请号：US165545
申请日：1998-10-02
申请人： Masashi Arasawa , Katsuhiko Ono , Hiroshi Nishikawa , Kazuo Tsuchiya
发明人： Masashi Arasawa , Katsuhiko Ono , Hiroshi Nishikawa , Kazuo Tsuchiya
IPC分类号： H01L21/302 , C23C16/458 , H01J37/32 , H01L21/205 , H01L21/3065 , H01L21/00
CPC分类号： C23C16/466 , C23C16/4586 , H01J37/32431 , H01J2237/2001
摘要： A plasma processing apparatus comprises a first passage opened in a top of suscepter at a peripheral area thereof, a first gas supply source for supplying heat exchange gas into a small clearance between the suscepter and a wafer through the first passage, a first vacuum pump for exhausting the clearance through the first passage, a second passage opened in the top of the suscepter at a center area thereof, a second gas supply source for supplying heat exchange gas into the clearance through the second passage, a second vacuum pump for exhausting the clearance through the second passage, and a controller for controlling the first and second gas supply sources and the first and second vacuum pumps independently of the others in such a way that backpressure caused in the second passage by the second gas supply source and vacuum pump can become lower than backpressure caused in the first passage by the first gas supply source and vacuum pump.
摘要翻译：一种等离子体处理装置，包括：在其周边区域的开口的顶部开口的第一通路;第一气体供给源，其通过第一通路将热交换气体供给到所述容器和晶片之间的小间隙;第一真空泵，通过第一通道排出间隙，第二通道在其中心区域处在容器的顶部开口，第二气体供应源，用于通过第二通道将热交换气体供应到间隙中;第二真空泵，用于排出间隙通过第二通道，以及用于独立于其他方式控制第一和第二气体供给源以及第一和第二真空泵的控制器，使得由第二气体供应源和真空泵在第二通道中产生的背压可以变成低于由第一气体供应源和真空泵在第一通道中引起的背压。

60. 发明授权

US6049684A Image formation apparatus 失效
标题翻译：图像形成装置
公开(公告)号：US6049684A
公开(公告)日：2000-04-11
申请号：US246434
申请日：1999-02-08
申请人： Hiroshi Nishikawa , Kazunori Shindo , Toshiya Kusayanagi
发明人： Hiroshi Nishikawa , Kazunori Shindo , Toshiya Kusayanagi
IPC分类号： G03G15/10 , G03G15/11
CPC分类号： G03G15/11 , G03G15/101 , G03G2215/017
摘要： An image formation apparatus for performing development by supplying to a photosensitive body a developing solution containing toner includes a developing roller; a developing solution supply port; a squeeze roller for wiping off an unnecessary portion of the developing solution from the photosensitive body; a moving frame reciprocally moving toward/from the photosensitive body; a squeeze support body for holding the squeeze roller; and two elastic bodies having different natural lengths that are provided between the moving frame and the squeeze support body and can be expanded and contracted for urging depression of the squeeze roller toward the photosensitive body.
摘要翻译：一种用于通过向感光体供应含有调色剂的显影液来进行显影的图像形成装置包括显影辊; 开发解决方案供应口; 用于从感光体擦去不需要的显影液的部分的挤压辊; 从所述感光体往复移动的移动框架; 用于保持挤压辊的挤压支撑体; 以及设置在移动框架和挤压支撑体之间的具有不同自然长度的两个弹性体，并且可以膨胀和收缩以促使挤压辊朝向感光体的压下。

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