会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 51. 发明授权
    • Fiber-made surface fastener for reducing unpleasant noise at peeling-off and product provided therewith
    • 纤维制成的表面紧固件,用于减少剥离时产生的不愉快的噪音和提供的产品
    • US07475455B2
    • 2009-01-13
    • US10536474
    • 2003-11-13
    • Akira IshibashiTeiichi MurayamaMamoru TanakaShintaro Ohsugi
    • Akira IshibashiTeiichi MurayamaMamoru TanakaShintaro Ohsugi
    • A44B18/00
    • A44B18/0069A44B18/0003Y10T24/27
    • This invention relates to a fiber-made surface fastener comprising joining faces each in which a plurality of fiber-made engaging elements are provided on one surface of each flat base fabric. By specifying a structure and composition yarns of the base fabric of the same surface fastener, the ratio (A/B) of an area A of a range in which sound spectrum of a peeling-off sound Fourier-transformed in a range of 100 Hz to 15000 Hz is 100 Hz to 3000 Hz to an area B of a range in which sound spectrum of a peeling-off sound Fourier-transformed in a range of 100 Hz to 15000 Hz is 3000 Hz to 15000 Hz is 0.4 or more. Consequently, tone of a sound generated when the surface fastener is peeled off and when the surface fastener attached on a product is peeled off is shifted to a low tone side so as to reduce an uncomfortable sound to a lower tone thereby reducing a feeling of discomfort.
    • 本发明涉及一种纤维制成的表面紧固件,其包括接合面,每个平面织物的一个表面上设有多个纤维制的接合元件。 通过规定相同表面紧固件的基底织物的结构和组成纱线,在100Hz的范围内傅里叶变换的剥离声的声谱的范围A的面积A的比(A / B) 到15000Hz的范围为100Hz〜3000Hz,其范围为100Hz〜15000Hz范围内的傅立叶变换为3000Hz〜15000Hz的剥离声的声谱的范围B为0.4以上。 因此,当表面紧固件被剥离并且当附着在产品上的表面紧固件被剥离时产生的声音的色调被转移到低色调侧,以将不舒服的声音降低到较低的色调,从而减少不适感 。
    • 57. 发明授权
    • Semiconductor light emitting device, its manufacturing method and
optical recording and/or reproducing apparatus
    • 半导体发光器件,其制造方法和光学记录和/或再现装置
    • US5898662A
    • 1999-04-27
    • US967095
    • 1997-11-10
    • Akira IshibashiSatoshi TaniguchiTomonori HinoTakashi KobayashiKazushi NakanoNorikazu Nakayama
    • Akira IshibashiSatoshi TaniguchiTomonori HinoTakashi KobayashiKazushi NakanoNorikazu Nakayama
    • H01L33/00H01L33/02H01L33/28H01S5/042H01S5/32H01S5/327H01S5/347H01S3/18
    • H01L33/28B82Y20/00H01L33/0087H01L33/025H01S5/347H01S2301/173H01S5/0421H01S5/3203H01S5/327
    • A semiconductor light emitting device comprises: a compound semiconductor substrate; an n-type cladding layer on the compound semiconductor substrate; an active layer on the n-type cladding layer; a p-type cladding layer on the active layer: and a p-type contact layer on the p-type cladding layer, the n-type cladding layer, the active layer, the p-type cladding layer and the p-type contact layer being made of II-VI compound semiconductors containing at least one of group II elements selected from the group consisting of Zn, Cd, Mg, Hg and Be and at least one of group VI elements selected from the group consisting of S, Se, Te and O, characterized in that at least the active layer has undulations and at least the p-type layer is flat. A method for manufacturing a semiconductor light emitting device having: a compound semiconductor substrate; an n-type cladding layer on the compound semiconductor substrate; an active layer on the n-type cladding layer; and a p-type cladding layer on the active layer, the n-type cladding layer, the active layer and the p-type cladding layer being made of II-VI compound semiconductors containing at least one of group II elements selected from the group consisting of Zn, Cd, Mg, Hg and Be and at least one of group VI elements selected from the group consisting of S, Se, Te and O, characterized in that the n-type cladding layer, the active layer and said p-type cladding layer are grown by varying, for the respective layers, the ratio of the molecular beam intensity of the group VI element relative to the molecular beam intensity of the group II element.
    • 一种半导体发光器件包括:化合物半导体衬底; 在化合物半导体衬底上的n型覆层; 在n型包覆层上的有源层; 有源层上的p型覆层和p型覆层的p型接触层,n型包覆层,有源层,p型包覆层和p型接触层 由含有选自Zn,Cd,Mg,Hg和Be中的II族元素中的至少一种的II-VI化合物半导体和选自S,Se,Te中的至少一种VI族元素中的至少一种 和O,其特征在于至少所述活性层具有起伏并且至少所述p型层是平坦的。 一种半导体发光器件的制造方法,其具有:化合物半导体基板; 在化合物半导体衬底上的n型覆层; 在n型包覆层上的有源层; 和p型包覆层,n型包覆层,有源层和p型覆层由含有选自以下的II族元素中的至少一种的II-VI族化合物半导体构成: 的Zn,Cd,Mg,Hg和Be以及选自S,Se,Te和O的VI族元素中的至少一种,其特征在于,所述n型包覆层,所述有源层和所述p型 通过对于各层改变VI族元素的分子束强度相对于II族元素的分子束强度的比例,生长包覆层。
    • 58. 发明授权
    • Semiconductor laser
    • 半导体激光器
    • US5764672A
    • 1998-06-09
    • US829064
    • 1997-03-31
    • Masakazu UkitaAkira Ishibashi
    • Masakazu UkitaAkira Ishibashi
    • H01S5/00H01S5/024H01S5/028H01S5/042H01S5/062H01S5/323H01S5/327H01S5/343H01S5/347H01S3/19
    • B82Y20/00H01S5/024H01S5/06209H01S5/327H01S5/34333H01S5/347H01S5/0224H01S5/028H01S5/0421
    • A semiconductor laser comprises: a first cladding layer of a first conduction type; an active layer stacked on the first cladding layer; and a second cladding layer of a second conduction type stacked on the active layer. The first cladding layer, the active layer and the second cladding layer are made of II-VI compound semiconductors. Pulse oscillation occurs with characteristics of a threshold current I.sub.th (A), a threshold voltage V.sub.th (V) of the diode composed of the first cladding layer, the active layer and the second cladding layer, a differential resistance R.sub.S (.OMEGA.) of the diode after the rising, a thermal resistance R.sub.t (K/W) and a characteristic temperature T.sub.0 (K). When two amounts .alpha. and .beta. are defined by: .alpha..ident.(R.sub.t /T.sub.0)I.sub.th V.sub.th .beta..ident.(R.sub.t /T.sub.0)R.sub.S I.sub.th.sup.2 the point (.alpha., .beta.) exists in an area on the .alpha.-.beta. plane surrounded by the straight line .alpha.=0, the straight line .beta.=0, and the curve ((21n t-1)/t, (1-ln t)/t.sup.2) having t as a parameter. The semiconductor laser may include a first optical waveguide layer between the first cladding layer and the active layer and include a second optical waveguide layer between the second cladding layer and the active layer, the first optical waveguide layer and the second optical waveguide layer being made of II-VI compound semiconductors. II-VI compound semiconductors making the first cladding layer and the second cladding layer may be a ZnMgSSe compound semiconductor. A semiconductor laser using II-VI compound semiconductors and having the capability of continuous oscillation at high temperatures including the room temperature is provided.
    • 半导体激光器包括:第一导电类型的第一包层; 堆叠在所述第一包层上的有源层; 以及层叠在有源层上的第二导电类型的第二包覆层。 第一包层,有源层和第二包层由II-VI化合物半导体制成。 脉冲振荡发生在阈值电流Ith(A),由第一包层,有源层和第二包层组成的二极管的阈值电压Vth(V),二极管的差分电阻RS(OMEGA) 上升之后,具有热阻Rt(K / W)和特征温度T0(K)。 当α和β的两个量定义为:α=(Rt / T0)IthVthβ=(Rt / T0)RSIth2点(α,β)存在于由直线α= 0包围的α-β平面上的区域 ,直线β= 0以及具有t作为参数的曲线((21n t-1)/ t,(1-ln t)/ t2)。 半导体激光器可以包括在第一包层和有源层之间的第一光波导层,并且在第二包层和有源层之间包括第二光波导层,第一光波导层和第二光波导层由 II-VI化合物半导体。 制造第一包层和第二包层的II-VI化合物半导体可以是ZnMgSSe化合物半导体。 提供了使用II-VI化合物半导体并且在包括室温在内的高温下具有连续振荡能力的半导体激光器。