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    • 52. 发明申请
    • Method of Providing Alarm Service Upon Movement Out of Safety Zone
    • 在安全区移动后提供报警服务的方法
    • US20070243869A1
    • 2007-10-18
    • US11630461
    • 2005-06-30
    • Sang-woon KwonJin-hee YoonJoo-mun LeeSe-hyun Oh
    • Sang-woon KwonJin-hee YoonJoo-mun LeeSe-hyun Oh
    • H04Q7/20
    • G08B21/0261G08B21/0283H04W64/00
    • Disclosed herein is a method of providing alarm service upon movement out of a safety zone in a mobile communication network. The method is implemented in such a way as to acquire past location registration information for a ward's mobile terminal designated by a subscriber (guardian), the past location registration information being base station identifiers associated with base stations at which the past locations of the ward's mobile terminal has previously been registered, store the acquired past location registration information to a My Base Station DB allocated to the ward, check base station information, associated with a base station at which the current location of the ward's mobile terminal has been registered, at the time of an observation request, determine whether base station information has been stored in the My Base Station DB, detect movement out of the safety zone when the base station information has not been stored in the My Base Station DB, and notify the subscriber of movement out of the safety zone.
    • 本文公开了一种在移动通过移动通信网络中的安全区域之后提供报警服务的方法。 该方法以获取由用户(监护人)指定的病房的移动终端的过去位置注册信息的方式实现,过去的位置注册信息是与病房的过去位置相关联的基站标识符 终端已经被注册,将获取的过去位置注册信息存储到分配给病房的我的基站DB,检查与已经登记了病房的移动终端的当前位置的基站相关联的基站信息, 观察请求的时间,确定基站信息是否已经存储在我的基站DB中,当基站信息尚未存储在我的基站DB中时,检测出安全区域的移动,并通知用户移动 离开安全区。
    • 53. 发明申请
    • LIGHT-DIFFUSING FILM
    • 光扩散膜
    • US20070053064A1
    • 2007-03-08
    • US11379427
    • 2006-04-20
    • Sang KimMun LeeIn JungJun Park
    • Sang KimMun LeeIn JungJun Park
    • G02B5/02
    • G02B5/0278G02B5/0221G02B5/0242G02B5/0268Y10T428/24942
    • Disclosed herein is a light-diffusing film for a backlight unit of a thin film transistor-liquid crystal display. Specifically, the current invention provides a light-diffusing film, including a transparent base sheet, a light-diffusing layer, which is laminated on any one surface of the base sheet and includes a light-diffusing resin and light-diffusing particles, and an antiblocking layer, which is laminated on the other surface of the base sheet and includes an antiblocking resin and antiblocking particles, in which the light-diffusing particles satisfy a predetermined relation between a specific surface area and a radius thereof. Accordingly, the light-diffusing film of the current invention can uniformly diffuse light transmitted from a light source lamp positioned at the side surface or back surface of a display device, thus realizing vivid and distinct display images.
    • 这里公开了用于薄膜晶体管 - 液晶显示器的背光单元的光漫射膜。 具体地说,本发明提供了一种光扩散膜,其包括透明基片,光扩散层,其层叠在基片的任一表面上,并且包括光漫射树脂和光漫射粒子, 防粘连层层叠在基片的另一个表面上,并且包括防粘着树脂和防粘连颗粒,其中光漫射颗粒满足比表面积和其半径之间的预定关系。 因此,本发明的光漫射膜能够均匀地使从位于显示装置的侧面或背面的光源灯透射的光均匀地扩散,从而实现鲜明且不同的显示图像。
    • 55. 发明授权
    • Semiconductor process residue removal composition and process
    • 半导体工艺残渣去除组成和工艺
    • US06825156B2
    • 2004-11-30
    • US10162679
    • 2002-06-06
    • Wai Mun LeeKaty IpXuan-Dung DinhDavid John Maloney
    • Wai Mun LeeKaty IpXuan-Dung DinhDavid John Maloney
    • C11D726
    • H01L21/02071C11D3/30C11D7/3218C11D11/0047G03F7/425
    • A residue remover for removing polymeric material and etch residue includes 2-(2-aminoethylamino)-ethanol and optionally another two-carbon atom linkage alkanolamine compound, gallic acid or catechol, water, a polar organic solvent, and hydroxylamine. A process for removing photoresist or other residue from a substrate, such as an integrated circuit semiconductor wafer including titanium metallurgy, includes the steps of contacting the substrate with the above composition for a time and at a temperature sufficient to remove the photoresist or other residue from the substrate. Use of 2-(2-aminoethylamino)-ethanol in the composition and process provides superior residue removal without attacking titanium or other metallurgy on the substrate. The composition preferably has a flash point greater than about 130° C.
    • 用于除去聚合物材料和蚀刻残渣的残留物除去剂包括2-(2-氨基乙基氨基) - 乙醇和任选的另外的两个碳原子键链烷醇胺化合物,没食子酸或邻苯二酚,水,极性有机溶剂和羟胺。 用于从衬底(例如包括钛冶金的集成电路半导体晶片)去除光致抗蚀剂或其它残留物的方法包括以下步骤:将衬底与上述组合物接触一段时间并在足以将光致抗蚀剂或其它残余物除去的温度 底物。 在组合物和方法中使用2-(2-氨基乙基氨基) - 乙醇提供优异的残余物去除而不侵蚀基材上的钛或其他冶金。 组合物优选具有大于约130℃的闪点