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1. 发明申请

US20150297959A1 GOLF CLUB 审中-公开
标题翻译：高尔夫俱乐部
公开(公告)号：US20150297959A1
公开(公告)日：2015-10-22
申请号：US14633370
申请日：2015-02-27
申请人： Sang Mun LEE
发明人： Sang Mun LEE
IPC分类号： A63B53/04 , A63B59/00
CPC分类号： A63B53/0466 , A63B60/50 , A63B2053/0458 , A63B2053/0495
摘要： A golf club having a face adapted to directly strike a golf ball thereon, a pipe-shaped shaft coupled to the club head, and a grip coupled to the top end periphery of the shaft, includes a first protrusion formed on one side of an internal surface of a face thereof; a second protrusion formed on the rear surface of the interior thereof in such a manner as to face the first protrusion and having a lubricating oil inlet passage formed thereon in such a manner as to be connected to the outside; a spring disposed engagedly between the first protrusion and the second protrusion; a bolt detachably mounted on the entrance of the lubricating oil inlet passage of the second protrusion; and an elastic structure slidingly operating along the spring in such a manner as to surround the spring.
摘要翻译：一种高尔夫球杆，其具有适于直接撞击其上的高尔夫球的表面，联接到所述球杆头的管状轴和联接到所述轴的顶端周边的手柄，所述手柄包括形成在内部的一侧上的第一突起其表面; 第二突起，其形成在其内部的后表面上，以与所述第一突起相对的方式形成，并且具有形成在其上的润滑油入口通道，以便连接到外部; 一个配置在第一突起和第二突起之间的弹簧; 可拆卸地安装在所述第二突起的所述润滑油进入通道的入口上的螺栓; 以及沿着弹簧以围绕弹簧的方式滑动地操作的弹性结构。

2. 发明授权

US09037514B2 Authentication for service server in wireless internet and settlement using the same 有权
标题翻译：无线互联网和结算服务服务器的认证使用相同
公开(公告)号：US09037514B2
公开(公告)日：2015-05-19
申请号：US13337931
申请日：2011-12-27
申请人： Jun-Won Choi , Joo-Mun Lee , Sang-Yun Lee , Myung-Sung Lee , Jae-Boo Chung
发明人： Jun-Won Choi , Joo-Mun Lee , Sang-Yun Lee , Myung-Sung Lee , Jae-Boo Chung
IPC分类号： G06Q20/02 , G06F21/44 , G06Q20/32 , G06Q20/40 , H04W12/06 , H04L29/06
CPC分类号： G06F21/445 , G06F2221/2119 , G06Q20/02 , G06Q20/32 , G06Q20/322 , G06Q20/40 , G06Q20/4014 , H04L63/0823 , H04L63/0869 , H04L63/126 , H04L63/1483 , H04W12/06
摘要： The present invention is directed to a method of payment using a wireless Internet comprising the step of storing individual identification information provided from a user in an authentication server; authenticating the service server when request of the stored individual identification information is received from the service server, and transmitting the stored individual identification information to the service server when the authentication has succeeded; transmitting a message of requesting a service access to a mobile terminal of the user from the service server; and transmitting the individual identification information sent from the authentication server to the mobile terminal by means of a transmitting query of the individual identification information from the mobile terminal.
摘要翻译：本发明涉及一种使用无线因特网的支付方法，包括以下步骤：将从用户提供的个人识别信息存储在认证服务器中; 当从所述服务服务器接收到所存储的个人识别信息的请求时对所述服务服务器进行认证，并且当所述认证成功时将所存储的个人识别信息发送到所述服务服务器; 从所述服务服务器发送请求对所述用户的移动终端的服务访问的消息; 以及通过来自移动终端的个人识别信息的发送查询，发送从认证服务器发送到移动终端的个人识别信息。

3. 发明授权

US09007305B2 Optical navigation system and method of estimating motion with optical lift detection 有权
标题翻译：光学导航系统及光学提升检测运动估计方法
公开(公告)号：US09007305B2
公开(公告)日：2015-04-14
申请号：US12984556
申请日：2011-01-04
申请人： Yat Kheng Leong , Sai Mun Lee , Thineshwaran G. Krishnan
发明人： Yat Kheng Leong , Sai Mun Lee , Thineshwaran G. Krishnan
IPC分类号： G06F3/033 , G06F3/03 , G06F3/0354
CPC分类号： G06F3/0317 , G06F3/03543
摘要： An optical navigation system and method of estimating motion uses a plate with an aperture, a photodetector and an optical system for optical lift detection. The optical system is configured to direct an input light to a target surface through the aperture of the plate and to direct the input light reflected from the target surface and transmitted back through the aperture of the plate toward the photodetector to be detected by the photodetector for lift detection.
摘要翻译：光学导航系统和估计运动的方法使用具有光圈的光盘，光电检测器和用于光学提升检测的光学系统。光学系统被配置为通过板的孔将输入光引导到目标表面，并且引导从目标表面反射的输入光，并且通过板的孔传递回到光电检测器，以由光电检测器检测电梯检测。

4. 发明申请

US20130035272A1 NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION FOR SEMICONDUCTOR PROCESSING 有权
标题翻译：新型NIDRILE和AMIDOXIME化合物及其制备方法用于半导体加工
公开(公告)号：US20130035272A1
公开(公告)日：2013-02-07
申请号：US13354145
申请日：2012-01-19
申请人： Wai Mun Lee , Hua Cui , Mark A. Scialdone , Albert G. Anderson
发明人： Wai Mun Lee , Hua Cui , Mark A. Scialdone , Albert G. Anderson
IPC分类号： C11D7/60 , C11D3/60 , G03F7/42
CPC分类号： C11D11/0047 , C11D3/43 , C11D7/3209 , G03F7/422 , G03F7/425 , H01L21/02057 , H01L21/02063 , H01L21/02074
摘要： Semiconductor processing compositions comprising amidoxime compounds having two or more amidoxime functional groups and their use in semiconductor processing to remove photoresist, polymeric materials, etching residues and copper oxides from semiconductor substrates, particularly substrates comprising copper, low-k dielectric material, titanium nitride, and/or titanium oxynitride.
摘要翻译：包含具有两个或更多个偕胺肟官能团的偕胺肟化合物的半导体处理组合物及其在半导体处理中用于从半导体衬底，特别是包含铜，低k电介质材料，氮化钛和/或氧化物的衬底去除光致抗蚀剂，聚合物材料，蚀刻残余物和铜氧化物的用途 /或氮氧化钛。

5. 发明授权

US08303839B2 Trioka acid semiconductor cleaning compositions and methods of use 有权
标题翻译：三卡酸半导体清洗剂组合物及其使用方法
公开(公告)号：US08303839B2
公开(公告)日：2012-11-06
申请号：US13082540
申请日：2011-04-08
申请人： Wai Mun Lee
发明人： Wai Mun Lee
IPC分类号： C09K13/04
CPC分类号： H01L21/31133 , C23F1/14 , C23G1/066 , H01L21/02057 , H01L21/02074
摘要： Semiconductor processing compositions for use with silicon wafers having an insulating layers and metallization layers on the wafers comprising water and one or more Troika acids which is also referred to as α,α-disubstituted trifunctional oximes or α-(Hydroxyimino) Phosphonoacetic acids, their salts, and their derivatives.
摘要翻译：在晶片上具有绝缘层和金属化层的半导体处理组合物，其包含水和一种或多种Troika酸，其也称为α，α-二取代三官能肟或α-（羟基亚氨基）膦酰基乙酸，其盐，及其衍生物。

6. 发明授权

US08173584B2 Composition and method for treating semiconductor substrate surface 有权
标题翻译：用于处理半导体衬底表面的组合物和方法
公开(公告)号：US08173584B2
公开(公告)日：2012-05-08
申请号：US13314020
申请日：2011-12-07
申请人： Wai Mun Lee
发明人： Wai Mun Lee
IPC分类号： C11D7/50 , G03F7/42
CPC分类号： G03F7/426 , H01L21/02071 , H01L21/02074
摘要： The present invention is directed to compositions and method of use for treating semiconductor substrate comprising a sulfonium compound and a nucleophilic amine in the fabrication of electronic devices. Optionally, the said composition further comprises a chelating agent, and solvent. The pH of the said solution can be adjusted with the addition of acid or base. The semiconductor manufacturing processes include steps for post etch residue, photoresist removal and steps during chemical mechanical planarization and post chemical mechanical planarization.
摘要翻译：本发明涉及在电子器件的制造中用于处理包含锍化合物和亲核胺的半导体衬底的组合物和方法。任选地，所述组合物还包含螯合剂和溶剂。所述溶液的pH可以通过加入酸或碱来调节。半导体制造工艺包括用于后蚀刻残留，光致抗蚀剂去除和化学机械平面化和后化学机械平面化中的步骤的步骤。

7. 发明申请

US20120090771A1 APPARATUS AND METHOD FOR MAKING TUBE WITH POLYGONAL CROSS-SECTION 有权
标题翻译：用于制造具有多边形截面的管的装置和方法
公开(公告)号：US20120090771A1
公开(公告)日：2012-04-19
申请号：US13335765
申请日：2011-12-22
申请人： JAE-MUN LEE , HAN-YONG CHO
发明人： JAE-MUN LEE , HAN-YONG CHO
IPC分类号： B31C1/00 , B31C1/08
CPC分类号： B31C3/00 , Y10T428/1303
摘要： An apparatus for manufacturing a paper tube having a polygonal cross section includes a frame, an elongate core assembly having an end rotatably supported to the frame and the other free end and having an outer peripheral surface of a predetermined polygonal shape, and a delivery member installed to the core assembly for at least a portion of the delivery member to be exposed from the outer peripheral surface of the core assembly on which the strips are wound, the delivery member being installed for the exposed portion to move toward the free end of the core assembly after receiving the power, whereby the exposed portion contacts with an inner surface of the lowermost one of a plurality of the strips and thus a plurality of the strips wound on the core assembly continuously move toward the free end of the core assembly.
摘要翻译：一种具有多边形横截面的纸管的制造装置，包括框架，细长芯组件，其具有可旋转地支撑在框架上的端部，另一自由端具有预定多边形形状的外周表面，以及安装到所述芯组件，用于至少一部分所述输送构件从所述芯组件的外周表面露出，所述芯组件的所述外周表面被缠绕在所述芯组件上，所述输送构件被安装用于所述暴露部分朝向所述芯的自由端移动在接收电源之后，暴露部分与多个条中最下面的一个的内表面接触，并且因此缠绕在芯组件上的多个条带朝着芯组件的自由端连续移动。

8. 发明授权

US08148310B2 Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid 有权
标题翻译：用于清洁包含烷基二膦酸的半导体衬底的组合物和方法
公开(公告)号：US08148310B2
公开(公告)日：2012-04-03
申请号：US12888569
申请日：2010-09-23
申请人： Wai Mun Lee
发明人： Wai Mun Lee
IPC分类号： C11D7/36
CPC分类号： C11D11/0047 , C11D1/22 , C11D3/042 , C11D3/2075 , C11D3/245 , C11D3/3409 , C11D3/3418 , C11D3/349 , C11D3/361 , C11D3/365 , C11D3/367 , C11D7/08 , C11D7/265 , C11D7/34 , C11D7/36
摘要： The compositions and methods herein relate to the method for the removal of residues and contaminants from metal or dielectric surfaces. Particularly, a composition and method of cleaning residues after chemical mechanical polishing of a copper or aluminum surface of the semiconductor substrates. A method of cleaning semiconductor substrates comprising contacting the substrates with a solution of water, and sufficient amount of alkyl diphosphonic acid comprising alkyl diphosphonic acid selected from the group of 1 hydroxyethane 1,1 diphosphonic acid, methylene disphosphonic acid, hydroxymethylene diphosphonic acid, dichloromethylene disphosphonic acid, hydroxycyclohexylmethylene disphosphonic acid, 1-hydroxy-3-aminopropane 1,1 diphosphonic acid, 1-hydroxy-4-aminobutane 1,1 diphosphonic acid mixed with dodecylbenzenesulfonic acid, xylenesulfonic acid, toluenesulfonic acid, phosphonoformic acid, sulfamic acid, 2-amino ethane sulfonic acid, or fluoroboric acid or an organic carboxylic acid and pH is adjusted to from greater than 6 to about 10 with a metal ion free base, and a surfactant.
摘要翻译：本文的组合物和方法涉及从金属或电介质表面去除残余物和污染物的方法。特别是在对半导体基板的铜或铝表面进行化学机械抛光后清洗残留物的组合物和方法。一种清洗半导体衬底的方法，包括使底物与水溶液接触，并含有足够量的烷基二膦酸，其选自1-羟基乙烷1,1-二膦酸，亚甲基膦酸，羟基亚甲基二膦酸，二氯亚甲基膦酸，羟基环己基亚甲基二膦酸，1-羟基-3-氨基丙烷1,1-二膦酸，与十二烷基苯磺酸，二甲苯磺酸，甲苯磺酸，膦酰甲酸，氨基磺酸，2- 氨基乙磺酸或氟硼酸或有机羧酸，并且用金属离子游离碱和表面活性剂将pH调节至大于6至约10。

9. 发明申请

US20110303545A1 METHOD FOR TREATING SURFACE OF MAGNESIUM-BASED METAL TO GIVE METALLIC TEXTURE THEREOF 审中-公开
标题翻译：用于处理基于金属的金属表面以产生金属纹理的方法
公开(公告)号：US20110303545A1
公开(公告)日：2011-12-15
申请号：US12840167
申请日：2010-07-20
申请人： Jong Boo Kim , Kyung Mun Lee , Soo Young Doh
发明人： Jong Boo Kim , Kyung Mun Lee , Soo Young Doh
IPC分类号： C25D11/30
CPC分类号： C25D11/30 , C25D11/16
摘要： A method for treating a surface of a magnesium-based metal is disclosed for realizing a metallic texture of the magnesium-based metal. The method includes a buffing step of chemically polishing a surface of a magnesium-based metal by using a chemical polishing agent containing sodium nitride and sodium citrate; an immersing step of immersing the magnesium-based metal, which has been subject to the buffing step, into a strongly alkaline electrolyte solution of pH 11 or above; and an anodizing treatment step of forming a transparent anodizing film on the surface of the magnesium-based metal by applying current with a current density of 0.01 to 1 A/dm2 to the magnesium-based metal in the strongly alkaline electrolyte solution.
摘要翻译：公开了一种用于处理镁基金属的表面的方法，用于实现镁基金属的金属质感。该方法包括通过使用含有氮化钠和柠檬酸钠的化学抛光剂对镁基金属的表面进行化学抛光的抛光步骤; 将经过抛光步骤的镁基金属浸渍到pH11或更高的强碱性电解液中的浸渍步骤; 以及阳极氧化处理步骤，通过向强碱性电解液中的镁基金属施加电流密度为0.01〜1A / dm 2的电流，在镁基金属的表面上形成透明阳极氧化膜。

10. 发明申请

US20110247650A1 COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES 有权
标题翻译：用于清洁半导体衬底的组合物和方法
公开(公告)号：US20110247650A1
公开(公告)日：2011-10-13
申请号：US13164474
申请日：2011-06-20
申请人： WAI MUN LEE
发明人： WAI MUN LEE
IPC分类号： C23G1/02 , C11D3/60 , B08B3/08
CPC分类号： C11D1/22 , C11D3/042 , C11D3/044 , C11D3/2075 , C11D3/245 , C11D3/30 , C11D3/3409 , C11D3/3418 , C11D3/349 , C11D3/361 , C11D3/365 , C11D3/367 , C11D7/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3218 , C11D7/34 , C11D7/36 , C11D11/0047
摘要： The compositions and methods for the removal of residues and contaminants from metal or dielectric surfaces comprises at least one alkyl diphosphonic acid, at least one second acidic substance at a mole ratio of about 1:1 to about 10:1 in water, and pH is adjusted to from about 6 to about 10 with a basic compound, and optionally a surfactant. Particularly, a composition and method of cleaning residues after chemical mechanical polishing of a copper or aluminum surface of the semiconductor substrates. One of the embodiment is the method of using the compositions in dilution, wherein the solution may be diluted with DI water at dilution ratios, for example, of up to 1:10, up to 1:50, up to 1:100, up to 1:150, up to 1:250, and up to about 1:500 or any ratios therein.
摘要翻译：用于从金属或电介质表面去除残留物和污染物的组合物和方法包括至少一种烷基二膦酸，至少一种第二酸性物质，其水分摩尔比为约1:1至约10:1，pH为用碱性化合物和任选的表面活性剂调节至约6至约10。特别是在对半导体基板的铜或铝表面进行化学机械抛光后清洗残留物的组合物和方法。其中一个实施方案是在稀释中使用组合物的方法，其中溶液可用稀释比例的DI水稀释，例如至多1:10，最高1:50，至1:100，向上至1：150，高达1：250，高达约1：500或其中的任何比例。

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