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1. 发明公开

US20230390170A1 CONSUMER PRODUCTS CONTAINING PRO-FRAGRANCES 审中-公开
公开(公告)号：US20230390170A1
公开(公告)日：2023-12-07
申请号：US18246513
申请日：2021-09-24
申请人： Firmenich SA
发明人： Murray OSBORNE , Philippe GAUMANN
IPC分类号： A61K8/36 , C11D11/00 , C11D3/00 , C11D3/50 , C11D3/20 , C11D3/34 , A61Q5/02 , A61K8/46
CPC分类号： A61K8/36 , C11D11/0017 , C11D3/0015 , C11D3/50 , C11D3/2079 , C11D3/3427 , A61Q5/02 , A61K8/46
摘要： The invention relates to a perfumed consumer product a) an active base; b) at least one Zinc salt of formula Zn(RCOO)2 (I) wherein R is a hydrogen atom or a linear C1-C20 alkyl or linear C2-C20 alkenyl group; c) at least one sulfur-containing pro-fragrance compound; and d) one or more perfuming co-ingredients. The perfumed consumer product compositions can be advantageously used in methods of treatment of fabric and household surfaces, to impart thereto a fresh, odor stable and long-lasting fragrance. They also show a stable out of the bottle odor, without any off-odor notes, independently of the duration of storage of the bottled liquid products.

2. 发明申请

US20190233771A1 STRIPPING COMPOSITIONS FOR REMOVING PHOTORESISTS FROM SEMICONDUCTOR SUBSTRATES 审中-公开
公开(公告)号：US20190233771A1
公开(公告)日：2019-08-01
申请号：US16378635
申请日：2019-04-09
申请人： Fujifilm Electronic Materials U.S.A., Inc.
发明人： Atsushi Mizutani , William A. Wojtczak , Yasuo Sugishima
IPC分类号： C11D11/00 , C11D3/30 , H01L21/311 , G03F7/42 , C11D3/43 , C11D3/00 , C11D3/28 , C11D3/20 , C11D3/34
CPC分类号： C11D11/0047 , C11D3/0073 , C11D3/2065 , C11D3/2082 , C11D3/2086 , C11D3/28 , C11D3/30 , C11D3/3427 , C11D3/43 , G03F7/423 , G03F7/425 , G03F7/426 , H01L21/31111 , H01L21/31133
摘要： This disclosure relates to compositions containing 1) at least one water soluble polar aprotic organic solvent; 2) at least one quaternary ammonium hydroxide; 3) at least one carboxylic acid; 4) at least one Group II metal cation; 5) at least one copper corrosion inhibitor selected from the group consisting of 6-substituted-2,4-diamino-1,3,5-triazines; and 6) water. The compositions can effectively strip positive or negative-tone resists or resist residues, and be non-corrosive to bumps and underlying metallization materials (such as SnAg, CuNiSn, CuCoCu, CoSn, Ni, Cu, Al, W, Sn, Co, and the like) on a semiconductor substrate.

3. 发明授权

US09375389B2 Personal care compositions containing zinc pyrithione and a metal-phosphonate complex 有权
标题翻译：含有吡啶硫酮锌和金属膦酸盐络合物的个人护理组合物
公开(公告)号：US09375389B2
公开(公告)日：2016-06-28
申请号：US14255714
申请日：2014-04-17
申请人： The Procter & Gamble Company
发明人： Chunpeng Jiang , Zhe Liu , Juan Wang , Xiujun Xu , Karl Shiqing Wei
IPC分类号： A61K8/02 , A61K8/27 , A01N43/40 , A61K8/49 , A61K8/55 , A61Q19/10 , C11D7/36 , C11D3/28 , C11D3/34 , C11D3/36 , C11D3/48 , C11D17/00 , A61Q17/00
CPC分类号： A61K8/27 , A01N43/40 , A61K8/4933 , A61K8/55 , A61K2800/51 , A61K2800/58 , A61Q17/005 , A61Q19/10 , C11D3/28 , C11D3/3427 , C11D3/361 , C11D3/48 , C11D7/36 , C11D17/0047 , A01N25/00 , A01N25/22 , A01N59/16
摘要： The present invention relates to an antimicrobial bar soap that contains zinc pyrithione and a metal-phosphonate complex and is characterized by enhanced discoloration resistance, extended shelf life and/or increased anti-microbial efficacy.
摘要翻译：本发明涉及一种含有吡啶硫酮锌和金属膦酸盐络合物的抗菌皂皂，其特征在于增强耐变色性，延长保存期和/或增加的抗微生物功效。

4. 发明授权

US09103038B2 Acidic compositions including reducing agents for scale and decolorization of metal stains 有权
标题翻译：酸性组合物，包括用于鳞屑和金属污渍脱色的还原剂
公开(公告)号：US09103038B2
公开(公告)日：2015-08-11
申请号：US13482289
申请日：2012-05-29
申请人： Thomas R. Mohs , Jennifer Bergerson
发明人： Thomas R. Mohs , Jennifer Bergerson
IPC分类号： C23F14/02 , C11D3/04 , C11D3/20 , C11D3/22 , C11D3/32 , C11D7/08 , C11D7/10 , C11D7/26 , C11D7/32 , C11D7/34 , C02F5/08 , C11D3/34
CPC分类号： C23F14/02 , C02F5/08 , C11D3/042 , C11D3/046 , C11D3/2034 , C11D3/2058 , C11D3/2065 , C11D3/2075 , C11D3/2086 , C11D3/2089 , C11D3/2096 , C11D3/225 , C11D3/323 , C11D3/3427 , C11D3/3472 , C11D7/08 , C11D7/10 , C11D7/261 , C11D7/265 , C11D7/267 , C11D7/3272 , C11D7/34
摘要： An acidic destaining composition for removing hard water and metal stains is disclosed. The composition comprises an acid in combination with a reducing agent and may preferably be formulated as a solid.
摘要翻译：公开了用于去除硬水和金属污渍的酸性脱色组合物。组合物包含与还原剂组合的酸，并且可优选配制成固体。

5. 发明申请

US20140274855A1 FORMULA FOR REMOVING COLOR COATS AND VARIOUS SOIL LAYERS FROM SURFACES, METHOD FOR PRODUCING THE AGENT, AND METHOD FOR CLEANING 审中-公开
标题翻译：用于从表面除去颜色涂层和各种土壤层的公式，用于生产代理的方法和清洁方法
公开(公告)号：US20140274855A1
公开(公告)日：2014-09-18
申请号：US14182971
申请日：2014-02-18
申请人： BUBBLES & BEYOND GMBH
发明人： Dirk SCHUMANN , Rainer Surkow
IPC分类号： C11D17/00
CPC分类号： C11D17/0021 , A61K8/06 , A61K8/068 , A61K8/31 , A61K8/34 , A61K8/345 , A61K8/37 , A61K8/463 , A61K8/55 , A61K2800/21 , A61Q3/04 , C09D9/005 , C09D9/04 , C11D3/18 , C11D3/2006 , C11D3/2041 , C11D3/2068 , C11D3/2072 , C11D3/2093 , C11D3/2096 , C11D3/245 , C11D3/28 , C11D3/32 , C11D3/33 , C11D3/3427 , C11D3/3445 , C11D3/3472 , C11D3/349 , C11D3/362 , C11D3/43 , C11D3/50 , C11D11/0023 , C11D11/0052
摘要： The invention relates to the manufacture and use of a cleaning agent, characterized in that the cleaning agent comprises a microemulsion or a fluid nanophase system, and has the following components: a) at least one non-water-soluble substance having a solubility in water of less than 4 g per liter, b) at least one amphiphile substance, NP-MCA, that has no tenside structure, does not form structures on its own, has a solubility in water or oil between 4 g and 1000 g per liter, and preferably does not accumulate at the oil-water boundary, with the provision that NP-MCA is not selected from among 2-Ethyl-1,3-Hexanediol, 2-Methyl-2,4-Pentanediol, 2-(n-Butyl)-2-Ethyl-1,3-Propanediol and/or 1,2-Diols; c) at least one anionic, cationic, amphoteric and/or non-ionic tenside; d) water and/or a water-soluble solvent having hydroxyl functionality and, optionally, additives.
摘要翻译：本发明涉及清洁剂的制造和使用，其特征在于清洁剂包括微乳液或流体纳米相系统，并且具有以下组分：a）至少一种在水中具有溶解度的非水溶性物质小于4g /升，b）至少一种没有表面活性剂结构的两亲物质NP-MCA本身不形成结构，在水或油中的溶解度为4g至1000g / l，并且优选不在油水边界积聚，条件是NP-MCA不是选自2-乙基-1,3-己二醇，2-甲基-2,4-戊二醇，2-（正丁基）-2-乙基-1,3-丙二醇和/或1,2-二醇; c）至少一种阴离子，阳离子，两性和/或非离子表面活性剂; d）水和/或具有羟基官能度的水溶性溶剂和任选的添加剂。

6. 发明申请

US20130324450A1 CONSUMER PRODUCTS CONTAINING PRO-FRAGRANCES 审中-公开
标题翻译：消费品包含PRO-FRAGRANCES
公开(公告)号：US20130324450A1
公开(公告)日：2013-12-05
申请号：US14000341
申请日：2012-02-20
申请人： Daniel Reichlin , Eric Frerot , Philippe Laurent Schneider
发明人： Daniel Reichlin , Eric Frerot , Philippe Laurent Schneider
IPC分类号： C11D3/50
CPC分类号： C11D3/50 , C11D3/3427 , C11D3/3481 , C11D3/349
摘要： The invention relates to novel liquid compositions, comprising: a) a liquid base intended for the treatment of surfaces, in particular fabrics or hard surfaces; b) at least one sulfur-containing compound of formula wherein R1 and R2 represent, separately and independently of each other, a hydrogen atom, a halogen atom, preferably chlorine, a C1-C4 linear or branched alkyl group, an amino group or a benzylamino group; or, alternatively, R1 and R2 are taken together to represent a phenyl or pyridine ring, possibly substituted with one to four C1-C4 linear or branched alkyl or alkenyl groups and/or one to two halogen atoms, preferably chlorine atoms; and R3 represents a hydrogen atom, an alkali metal atom, in particular Na or k, a phenyl or benzyl group possibly substituted with one or two halogen atoms and/or one or two methyl, trifluoromethyl, methoxy or amino groups, an amine group, or a C1-C8 unsaturated, linear, branched or cyclic hydrocarbon group possibly substituted with one or two nitrogen, oxygen or halogen atoms; c) at least one sulfur-containing pro-fragrance compound; and d) one or more perfuming co-ingredients; and wherein the composition has a pH comprised between 1 and 8. The compositions can be advantageously used in methods of treatment of fabric and household surfaces, to impart thereto a fresh, odor stable and long-lasting fragrance. They also show a stable out of the bottle odor, without any off-odor notes, independently of the duration of storage of the bottled liquid products.
摘要翻译：本发明涉及新的液体组合物，其包括：a）用于处理表面，特别是织物或硬表面的液体基料; b）至少一种下式的含硫化合物，其中R 1和R 2彼此独立地且独立地表示氢原子，卤素原子，优选氯，C 1 -C 4直链或支链烷基，氨基或苄基氨基; 或者可选地，R 1和R 2一起表示苯基或吡啶环，其可以被一至四个C 1 -C 4直链或支链烷基或烯基和/或一至两个卤素原子，优选氯原子取代; R 3表示氢原子，碱金属原子，特别是Na或k，可被一个或两个卤素原子和/或一个或两个甲基，三氟甲基，甲氧基或氨基取代的苯基或苄基，胺基，或可被一个或两个氮，氧或卤原子取代的C1-C8不饱和的，直链的，支链的或环状的烃基; c）至少一种含硫的前香料化合物; 和d）一种或多种加香配料; 并且其中所述组合物具有1至8的pH。所述组合物可有利地用于处理织物和家庭表面的方法，赋予其新鲜，气味稳定和持久的香味。它们还显示出瓶子气味中的稳定性，而没有任何异味的音符，与瓶装液体产品的储存持续时间无关。

7. 发明授权

US08114220B2 Formulations for cleaning ion-implanted photoresist layers from microelectronic devices 有权
标题翻译：用于从微电子器件清洗离子注入的光致抗蚀剂层的制剂
公开(公告)号：US08114220B2
公开(公告)日：2012-02-14
申请号：US11911616
申请日：2006-04-14
申请人： Pamela M. Visintin , Michael B. Korzenski , Thomas H. Baum
发明人： Pamela M. Visintin , Michael B. Korzenski , Thomas H. Baum
IPC分类号： B08B3/04 , C11D1/00 , C11D3/28 , C11D3/26
CPC分类号： C11D3/042 , C11D3/2086 , C11D3/245 , C11D3/28 , C11D3/30 , C11D3/3427 , C11D3/368 , C11D3/43 , C11D7/08 , C11D7/261 , C11D7/30 , C11D7/32 , C11D7/3209 , C11D7/3218 , C11D7/3281 , C11D7/34 , C11D7/36 , C11D11/0047
摘要： A method and composition for removing bulk and ion-implanted photoresist and/or post-etch residue material from densely patterned microelectronic devices is described. The composition includes a co-solvent, a chelating agent, optionally an ion pairing reagent, and optionally a surfactant. The composition may further include dense fluid. The compositions effectively remove the photoresist and/or post-etch residue material from the microelectronic device without substantially over-etching the underlying silicon-containing layer(s) and metallic interconnect materials.
摘要翻译：描述了用于从致密图案化的微电子器件去除体积和离子注入的光致抗蚀剂和/或蚀刻后残留物的方法和组合物。该组合物包括共溶剂，螯合剂，任选的离子配对试剂和任选的表面活性剂。该组合物可以进一步包括稠密的流体。组合物有效地从微电子器件去除光致抗蚀剂和/或蚀刻后残留物，而基本上不会过度蚀刻下面的含硅层和金属互连材料。

8. 发明申请

US20110229424A1 FORMULA FOR REMOVING COLOR COATS AND VARIOUS SOIL LAYERS FROM SURFACES, METHOD FOR PRODUCING THE AGENT, AND METHOD FOR CLEANING 审中-公开
标题翻译：用于从表面除去颜色涂层和各种土壤层的公式，用于生产代理的方法和清洁方法
公开(公告)号：US20110229424A1
公开(公告)日：2011-09-22
申请号：US12678809
申请日：2008-09-19
申请人： Dirk Schumann , Ralner Surkow
发明人： Dirk Schumann , Ralner Surkow
IPC分类号： A61K8/92 , C11D3/60 , A61Q5/08 , C11D17/00 , B08B3/00 , A61K8/18
CPC分类号： C11D17/0021 , A61K8/06 , A61K8/068 , A61K8/31 , A61K8/34 , A61K8/345 , A61K8/37 , A61K8/463 , A61K8/55 , A61K2800/21 , A61Q3/04 , C09D9/005 , C09D9/04 , C11D3/18 , C11D3/2006 , C11D3/2041 , C11D3/2068 , C11D3/2072 , C11D3/2093 , C11D3/2096 , C11D3/245 , C11D3/28 , C11D3/32 , C11D3/33 , C11D3/3427 , C11D3/3445 , C11D3/3472 , C11D3/349 , C11D3/362 , C11D3/43 , C11D3/50 , C11D11/0023 , C11D11/0052
摘要： The invention relates to a cleaning agent, characterized in that the cleaning agent comprises a microemulsion or a fluid nanophase system, and has the following components: a) at least one non-water-soluble substance having a solubility in water of less than 4 g per liter; b) at least one amphiphile substance, NP-MCA, that has no tenside structure, does not form structures on its own, has a solubility in water or oil between 4 g and 1000 g per liter, and preferably does not accumulate at the oil-water boundary, with the provision that NP-MCA is not selected from among 2-Ethyl-1,3-Hexanediol, 2-Methyl-2,4-Pentanediol, 2-(n-Butyl)-2-Ethyl-1,3-Propanediol and/or 1,2-Diols; c) at least one anionic, cationic, amphoteric and/or non-ionic tenside; d) water and/or a water-soluble solvent having hydroxyl functionality and, optionally, additives.
摘要翻译：本发明涉及清洁剂，其特征在于清洁剂包括微乳液或流体纳米相系统，并具有以下组分：a）至少一种在水中溶解度小于4g的非水溶性物质每升 b）至少一种不具有表面活性剂的两亲物质NP-MCA本身不形成结构，在水或油中的溶解度为4g至1000g / l，优选不在油中积聚 - 水边界，其中NP-MCA不是选自2-乙基-1,3-己二醇，2-甲基-2,4-戊二醇，2-（正丁基）-2-乙基-1， 3-丙二醇和/或1,2-二醇; c）至少一种阴离子，阳离子，两性和/或非离子表面活性剂; d）水和/或具有羟基官能度的水溶性溶剂和任选的添加剂。

9. 发明授权

US07435713B2 Compositions and methods for removal of incidental soils from fabric articles via soil modification 失效
标题翻译：通过土壤改良从织物上除去附带土壤的组成和方法
公开(公告)号：US07435713B2
公开(公告)日：2008-10-14
申请号：US11051831
申请日：2005-02-04
申请人： William Michael Scheper , Michael Stanford Showell , Hiroshi Oh , David Lee Daugherty
发明人： William Michael Scheper , Michael Stanford Showell , Hiroshi Oh , David Lee Daugherty
IPC分类号： C11D9/36 , C11D1/82
CPC分类号： C11D3/046 , C11D1/123 , C11D1/22 , C11D1/29 , C11D3/02 , C11D3/162 , C11D3/2068 , C11D3/2072 , C11D3/24 , C11D3/3427 , C11D3/349 , C11D11/0017 , D06L1/04
摘要： Compositions and methods for removing and/or reducing incidental soils from fabric articles, especially articles of clothing, linen and drapery, wherein the compositions provide improved cleaning of incidental soils, either with or without a subsequent wash process or other entire fabric care process are provided. The compositions and methods are safe for use on a wide range of fabric articles, even in the home.
摘要翻译：提供用于从织物制品，特别是衣服，亚麻布和帷帘制品中去除和/或减少附带土壤的组合物和方法，其中所述组合物提供对或有或没有随后的洗涤方法或其它整个织物护理过程的偶然土壤的改进的清洁。组合物和方法可以安全地用于各种织物制品，甚至在家中。

10. 发明授权

US07435712B2 Alkaline chemistry for post-CMP cleaning 有权
标题翻译：用于CMP后清洁的碱性化学
公开(公告)号：US07435712B2
公开(公告)日：2008-10-14
申请号：US10956273
申请日：2004-10-01
申请人： Ashutosh Misra , Matthew L. Fisher
发明人： Ashutosh Misra , Matthew L. Fisher
IPC分类号： C11D3/30 , C11D7/06 , C11D3/20
CPC分类号： C23G1/20 , C11D1/62 , C11D3/0073 , C11D3/044 , C11D3/2068 , C11D3/2072 , C11D3/2075 , C11D3/2082 , C11D3/2086 , C11D3/221 , C11D3/28 , C11D3/30 , C11D3/32 , C11D3/33 , C11D3/3427 , C11D3/3472 , C11D3/3481 , C11D3/349 , C11D7/06 , C11D7/263 , C11D7/264 , C11D7/265 , C11D7/3209 , C11D7/3218 , C11D7/3245 , C11D7/3263 , C11D7/3272 , C11D7/3281 , C11D7/34 , C11D11/0047 , H01L21/02074
摘要： This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an alkaline chemistry for the post-CMP cleaning of wafers containing metal, particularly copper, interconnects. Residual slurry particles, particularly copper or other metal particles, are removed from the wafer surface without significantly etching the metal, leaving deposits on the surface, or imparting significant contamination to the wafer while also protecting the metal from oxidation and corrosion. Additionally, at least one strong chelating agent is present to complex metal ions in solution, facilitating the removal of metal from the dielectric and preventing re-deposition onto the wafer.
摘要翻译：本公开内容讨论了半导体器件制造期间晶片的化学机械平面化（CMP）之后的半导体晶片的清洁。公开了用于后CMP清洗含有金属，特别是铜互连的晶片的碱性化学。剩余的浆料颗粒，特别是铜或其他金属颗粒，从晶片表面去除，而不会显着蚀刻金属，从而在表面上留下沉积物，或对晶片造成显着的污染，同时也保护金属免受氧化和腐蚀。此外，存在至少一种强螯合剂以使溶液中的金属离子复合，有助于从电介质去除金属并防止再沉积到晶片上。

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