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51. 发明申请

US20120105818A1 LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：US20120105818A1
公开(公告)日：2012-05-03
申请号：US13378913
申请日：2010-06-07
申请人： Jan Bernard Plechelmus Van Schoot , Gosse Charles De Vries
发明人： Jan Bernard Plechelmus Van Schoot , Gosse Charles De Vries
IPC分类号： G03B27/54 , F21V7/04
CPC分类号： G03F7/702 , G03F7/70075 , G03F7/70116
摘要： An illumination system having a plurality of reflective elements, the reflective elements being movable between different orientations which direct radiation towards different locations in a pupil plane, thereby forming different illumination modes. Each reflective element is moveable to a first orientation in which it directs radiation to a location in an inner illumination location group, to a second orientation in which it directs radiation to a location in an intermediate illumination location group, and to a third orientation in which it directs radiation to a location in an outer illumination location group. The reflective elements are configured to be oriented to direct equal amounts of radiation towards the inner, intermediate and outer illumination location groups, and are configured to be oriented such that they can direct substantially no radiation into the outer illumination location group and direct substantially equal amounts of radiation towards the inner and intermediate illumination location groups.
摘要翻译：一种具有多个反射元件的照明系统，所述反射元件可在不同取向之间移动，所述不同取向将辐射导向光瞳平面中的不同位置，从而形成不同的照明模式。每个反射元件可移动到第一取向，其中它将辐射引导到内照明位置组中的位置，到第二方向，其中它将辐射引导到中间照明位置组中的位置，并且其中第三方向它将辐射引导到外部照明位置组中的位置。反射元件被配置为被定向成将等量的辐射引导到内部，中间和外部照明位置组，并且被配置为被定向成使得它们可以基本上不将辐射引导到外部照明位置组中并且引导基本相等的量的辐射朝向内部和中间照明位置组。

52. 发明授权

US07816658B2 Extreme ultra-violet lithographic apparatus and device manufacturing method 有权
标题翻译：极紫外光刻设备及其制造方法
公开(公告)号：US07816658B2
公开(公告)日：2010-10-19
申请号：US11808264
申请日：2007-06-07
申请人： Jan Bernard Plechelmus Van Schoot , Johannes Hubertus Josephina Moors
发明人： Jan Bernard Plechelmus Van Schoot , Johannes Hubertus Josephina Moors
IPC分类号： G21K1/10
CPC分类号： G03F7/70908 , G03F7/70191 , G21K1/10
摘要： An extreme ultra-violet lithographic apparatus for imaging a pattern onto a substrate includes a radiation system constructed and arranged to provide a beam of an extreme ultra-violet radiation, and an absorber arranged in the beam and constructed and arranged to absorb at least a portion of the radiation beam. The absorber has a volume configured to accommodate a flow of an absorbing gas. The flow is directed in a transverse direction with respect to the beam. The absorber includes a structure having an extreme ultra-violet radiation-transmissive beam entry area and an extreme ultra-violet radiation-transmissive beam exit area. The apparatus also includes a gas inlet actuator array configured to inject the gas into the volume and a gas outlet actuator array arranged to evacuate the gas from the volume.
摘要翻译：用于将图案成像到基板上的极紫外光刻设备包括构造和布置成提供极紫外辐射光束的辐射系统和布置在光束中的构造和布置成吸收至少一部分的辐射束。吸收器具有构造成容纳吸收气体流的体积。流动相对于梁的横向被引导。吸收器包括具有极紫外辐射透射光束入射区域和极紫外辐射透射光束出射区域的结构。该装置还包括配置成将气体注入容积的气体入口致动器阵列和布置成从体积排出气体的气体出口致动器阵列。

53. 发明授权

US09372413B2 Optical apparatus for conditioning a radiation beam for use by an object, lithography apparatus and method of manufacturing devices 有权
标题翻译：用于调节被物体使用的辐射束的光学设备，光刻设备及其制造方法
公开(公告)号：US09372413B2
公开(公告)日：2016-06-21
申请号：US13433923
申请日：2012-03-29
申请人： Gosse Charles De Vries , Jan Bernard Plechelmus Van Schoot , Franciscus Johannes Joseph Janssen , Nicolaas Aldegonda Jan Maria Van Aerle
发明人： Gosse Charles De Vries , Jan Bernard Plechelmus Van Schoot , Franciscus Johannes Joseph Janssen , Nicolaas Aldegonda Jan Maria Van Aerle
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70575 , G03F7/70075 , G03F7/70116 , G03F7/70158 , G03F7/70191
摘要： In an EUV (extreme ultraviolet) lithography apparatus, an illumination system includes a multifaceted field mirror and a multifaceted pupil mirror. A field facet mirror within mirror focuses EUV radiation onto a particular associated pupil facet mirror, from where it is directed to a target area. Each field facet mirror is modified to scatter unwanted DUV (deep ultraviolet) radiation into a range of directions. The majority of DUV falls onto neighboring pupil facet mirrors within the pupil mirrors, so that the amount of DUV radiation reaching target E is suppressed in comparison to the wanted EUV radiation. Because the distance between mirrors is much greater than the width of an individual pupil facet mirror, good DUV suppression can be achieved with only a narrow scattering angle. Absorption of EUV radiation in the scattering layer can be minimized.
摘要翻译：在EUV（极紫外）光刻设备中，照明系统包括多面镜场和多面瞳镜。镜子内的场面镜将EUV辐射聚焦到特定的相关瞳孔面反射镜上，从而将其引导到目标区域。修改每个场分面镜，以将不需要的DUV（深紫外）辐射散射到一系列方向。 DUV的大部分落在瞳孔镜内的相邻瞳孔面反射镜上，从而与所需的EUV辐射相比，达到目标E的DUV辐射量被抑制。因为镜子之间的距离远远大于单个瞳孔面反射镜的宽度，所以只有较窄的散射角才能实现良好的DUV抑制。可以使散射层中的EUV辐射的吸收最小化。

54. 发明授权

US09134629B2 Illumination system, lithographic apparatus and method of forming an illumination mode 有权
标题翻译：照明系统，光刻设备和形成照明模式的方法
公开(公告)号：US09134629B2
公开(公告)日：2015-09-15
申请号：US13203773
申请日：2010-02-25
申请人： Erik Roelof Loopstra , Koen Van Ingen Schenau , Jan Bernard Plechelmus Van Schoot , Christian Wagner , Gosse Charles De Vries
发明人： Erik Roelof Loopstra , Koen Van Ingen Schenau , Jan Bernard Plechelmus Van Schoot , Christian Wagner , Gosse Charles De Vries
IPC分类号： G03F7/20
CPC分类号： G03F7/70825 , G03F7/70075 , G03F7/70116
摘要： An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.
摘要翻译：光刻设备的照明系统包括被布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。在不同的取向中，反射元件将辐射定向到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动。反射元件的第一方向和第二方向由端点限定。

55. 发明授权

US08711330B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08711330B2
公开(公告)日：2014-04-29
申请号：US13102620
申请日：2011-05-06
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70333
摘要： In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
摘要翻译：在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。

56. 发明申请

US20120229787A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20120229787A1
公开(公告)日：2012-09-13
申请号：US13510518
申请日：2010-09-08
申请人： Jan Bernard Plechelmus Van Schoot , Koen Van Ingen Schenau , Gosse Charles De Vries
发明人： Jan Bernard Plechelmus Van Schoot , Koen Van Ingen Schenau , Gosse Charles De Vries
IPC分类号： G03B27/72
CPC分类号： G03F7/70425 , G02B26/0833 , G02B27/0068 , G03F7/70075 , G03F7/70116 , G03F7/70191
摘要： In a lithographic apparatus, an illumination mode is set using a field mirror comprising a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. In the event that a field facet mirror is defective and cannot be set to a desired position, another of the movable facet mirrors is set to a corrective position, different than its desired position, to at least partially ameliorate a deleterious effect of the defective facet mirror.
摘要翻译：在光刻设备中，使用包括多个可移动小面的场反射镜来设置照明模式，以将辐射引导到瞳孔面反射镜上的可选位置。在场面反射镜有缺陷并且不能被设置到期望位置的情况下，可移动刻面镜中的另一个被设置为与其期望位置不同的校正位置，以至少部分地改善缺陷面的有害影响镜子。

57. 发明申请

US20120229782A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20120229782A1
公开(公告)日：2012-09-13
申请号：US13408471
申请日：2012-02-29
申请人： Han-Kwang Nienhuys , Martinus Anges Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Olesksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Anges Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Olesksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

58. 发明申请

US20120013882A1 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING AN ILLUMINATION MODE 有权
标题翻译：照明系统，光刻设备和形成照明模式的方法
公开(公告)号：US20120013882A1
公开(公告)日：2012-01-19
申请号：US13203773
申请日：2010-02-25
申请人： Erik Roelof Loopstra , Koen Van Ingen Schenau , Jan Bernard Plechelmus Van Schoot , Christian Wagner , Gosse Charles De Vries
发明人： Erik Roelof Loopstra , Koen Van Ingen Schenau , Jan Bernard Plechelmus Van Schoot , Christian Wagner , Gosse Charles De Vries
IPC分类号： G03B27/54 , F21V17/02
CPC分类号： G03F7/70825 , G03F7/70075 , G03F7/70116
摘要： An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.
摘要翻译：光刻设备的照明系统包括被布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。在不同的取向中，反射元件将辐射定向到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动。反射元件的第一方向和第二方向由端点限定。

59. 发明申请

US20110188018A1 Alignment of Collector Device in Lithographic Apparatus 有权
标题翻译：收集器在平版印刷设备中的对准
公开(公告)号：US20110188018A1
公开(公告)日：2011-08-04
申请号：US13002544
申请日：2009-07-15
申请人： Michel Fransois Hubert Klaassen , Jan Bernard Plechelmus Van Schoot , Sylvain Dutartre
发明人： Michel Fransois Hubert Klaassen , Jan Bernard Plechelmus Van Schoot , Sylvain Dutartre
IPC分类号： G03B27/54
CPC分类号： G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/70825 , G03F7/7085
摘要： A lithographic apparatus (2) can include a radiation source (SO) configured to provide radiation (200), a radiation collector (CO) configured to collect radiation (200) from the radiation source (SO), an illumination system (IL), and a detector (300). The detector (300) can be disposed in a fixed positional relationship with the illumination system (IL) relative to an alignment of the collector (CO). Further, a region (310) of the collector (CO) can be configured to direct a portion of radiation (200) emanating from the radiation source (SO) and traversing the region (310) towards the detector (300). The detector (300) can be configured to detect a change in a portion of the radiation (200). The change can be indicative of a change in position or orientation of the collector (CO) relative to the illumination system (IL) relative to an alignment of the collector (CO).
摘要翻译：光刻设备（2）可以包括被配置为提供辐射（200）的辐射源（SO），被配置为从辐射源（SO）收集辐射（200）的辐射收集器（CO），照明系统（IL）和检测器（300）。检测器（300）可以相对于收集器（CO）的排列与照明系统（IL）以固定的位置关系设置。此外，收集器（CO）的区域（310）可以被配置为引导从辐射源（SO）发出并且朝向检测器（300）横穿该区域（310）的一部分辐射（200）。检测器（300）可以被配置为检测辐射（200）的一部分中的变化。该变化可以指示相对于收集器（CO）的对准，收集器（CO）相对于照明系统（IL）的位置或取向的变化。

60. 发明授权

US07889321B2 Illumination system for illuminating a patterning device and method for manufacturing an illumination system 失效
标题翻译：用于照射图案形成装置的照明系统和用于制造照明系统的方法
公开(公告)号：US07889321B2
公开(公告)日：2011-02-15
申请号：US11730751
申请日：2007-04-03
申请人： Jan Bernard Plechelmus Van Schoot , Hendricus Johannes Maria Meijer
发明人： Jan Bernard Plechelmus Van Schoot , Hendricus Johannes Maria Meijer
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70833 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/702 , G03F7/70808
摘要： An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged to illuminate a patterning device with a radiation beam diverging from an intermediate focus. The intermediate focus is located at a position substantially at the same level or below a bottom portion of the illumination system.
摘要翻译：照明系统包括壳体和位于壳体内的光学系统。光学系统包括至少一个光学元件。光学系统被构造和布置成用从中间焦点分散的辐射束照射图案形成装置。中间焦点位于基本上在照明系统的底部的相同水平或低于底部的位置处。

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