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41. 发明申请

US20170043609A1 SECURITY DEVICE COMPONENTS AND METHODS OF MANUFACTURE THEREOF 审中-公开
标题翻译：安全装置组件及其制造方法
公开(公告)号：US20170043609A1
公开(公告)日：2017-02-16
申请号：US15305526
申请日：2015-04-23
申请人： DE LA RUE INTERNATIONAL LIMITED
发明人： Adam LISTER
IPC分类号： B42D25/378 , B42D25/328 , B42D25/342 , B42D25/351 , B42D25/355 , B42D25/369 , B42D25/41 , B42D25/42 , B42D25/455 , B42D25/46 , B42D25/21 , B42D25/337 , B42D25/364 , B41M3/14 , G03C5/08 , B42D25/324
CPC分类号： B42D25/378 , B41M3/142 , B42D25/21 , B42D25/324 , B42D25/328 , B42D25/337 , B42D25/342 , B42D25/351 , B42D25/355 , B42D25/36 , B42D25/364 , B42D25/369 , B42D25/41 , B42D25/42 , B42D25/455 , B42D25/46 , G03C5/08
摘要： A method of manufacturing a security device component includes: providing a photosensitive film including a diazonium compound which decomposes upon exposure to radiation of a predetermined wavelength; providing a dye coupler film comprising one or more dye coupler compositions; exposing elements of the photosensitive film to radiation of the predetermined wavelength in accordance with a predetermined pattern; and contacting at least part of the exposed photosensitive film against at least part of the dye coupler film so as to effect at least partial transfer of the one or more dye coupler compositions to the exposed photosensitive film, whereupon unexposed elements of the photosensitive film exhibit one or more colours such that the photosensitive film exhibits a reproduction of the predetermined pattern.
摘要翻译：一种制造安全装置部件的方法包括：提供包括重氮化合物的感光膜，其在暴露于预定波长的辐射时分解; 提供包含一种或多种染料偶合剂组合物的染料偶合剂膜; 根据预定图案将感光膜的元件暴露于预定波长的辐射; 并且使至少部分曝光的感光膜与染料偶合剂膜的至少一部分接触，以便使一种或多种染料偶合剂组合物至少部分转移到曝光的感光膜上，感光膜的未曝光元件表现出一个或更多的颜色，使得感光膜表现出预定图案的再现。

42. 发明授权

US09556350B2 Stable dispersions of monocrystalline nanometric silver particles 有权
标题翻译：单晶纳米银颗粒的稳定分散体
公开(公告)号：US09556350B2
公开(公告)日：2017-01-31
申请号：US13991905
申请日：2011-12-06
申请人： Fernando De La Vega , Ganit Shter Bar Joshua , Semyon Melamed , Reuven Geva , Moshe Link
发明人： Fernando De La Vega , Ganit Shter Bar Joshua , Semyon Melamed , Reuven Geva , Moshe Link
IPC分类号： C09D11/52 , B22F9/24 , B22F1/00 , B82Y30/00 , G03C1/825
CPC分类号： B01F17/0007 , B01F17/005 , B22F1/0022 , B22F9/24 , B22F2009/245 , B22F2301/255 , B22F2998/10 , B82Y30/00 , C09D11/52 , G03C1/8255 , H01B1/22
摘要： A concentrated dispersion of nanometric silver particles, and a method of producing the dispersion, the dispersion including a first solvent; a plurality of nanometric silver particles, in which a majority are single-crystal silver particles, the plurality of nanometric silver particles having an average secondary particle size (d50) within a range of 30 to 300 nanometers, the particles disposed within the solvent; and at least one dispersant; wherein a concentration of the silver particles within the dispersion is within a range of 30% to 75%, by weight, and wherein a concentration of the dispersant is within a range of 0.2% to 30% of the concentration of the silver particles, by weight.
摘要翻译：纳米银颗粒的浓缩分散体和分散体的制造方法，分散体包含第一溶剂; 多数是单晶银颗粒的纳米银颗粒，多个纳米银颗粒的平均二次粒径（d50）在30-300纳米的范围内，颗粒位于溶剂中; 和至少一种分散剂; 其中所述分散体中的银颗粒的浓度在30重量％至75重量％的范围内，并且其中所述分散剂的浓度在所述银颗粒的浓度的0.2％至30％的范围内，通过重量。

43. 发明授权

US09529248B2 Protective means for protecting imaging media 有权
标题翻译：用于保护成像介质的保护手段
公开(公告)号：US09529248B2
公开(公告)日：2016-12-27
申请号：US13141117
申请日：2009-12-21
申请人： Jari Taskinen
发明人： Jari Taskinen
IPC分类号： B65D33/18 , B65D33/20 , G03C3/00 , B65D27/14 , B65D27/16 , B65D27/32 , B65D27/34 , B65D27/12
CPC分类号： G03C3/003 , A61B6/14 , A61B6/145 , A61B2562/247 , B65D27/12 , B65D27/14 , B65D27/16 , B65D27/32 , B65D27/34 , B65D33/18 , B65D33/20 , G03B42/042
摘要： A protective means has a pouch-like structure, comprising an orifice for inserting X-ray imaging media in the protective means. In connection with the protective means there is also a closing means, which is arranged to close the orifice. Also in connection with the protective means there is a fastening means for fastening a closing means to the pouch-like structure of the protective means so that upon fastening the closing means the fastening means is arranged to be located on both sides of the orifice.
摘要翻译：保护装置具有袋状结构，包括用于将X射线成像介质插入保护装置中的孔口。关于保护装置，还有一个关闭装置，其被设置成关闭孔口。还与保护装置相关联的是紧固装置，用于将闭合装置紧固到保护装置的袋状结构上，使得在紧固闭合装置时，紧固装置被布置成位于孔的两侧。

44. 发明授权

US09522921B2 Photochromic spirooxazine compounds 有权
标题翻译：光致变色螺恶嗪化合物
公开(公告)号：US09522921B2
公开(公告)日：2016-12-20
申请号：US15152710
申请日：2016-05-12
申请人： Sabic Global Technologies, B.V.
发明人： Girish Koripelly , Mohamed Ashraf Moideen , Pradeep Jeevaji Nadkarni , Meghna Markanday
IPC分类号： G02B5/23 , C07D498/10 , G02B1/04 , G03C1/00 , G03C5/00
CPC分类号： C07D498/10 , B29D11/00653 , G02B1/04 , C08L2666/70
摘要： A photochromic dye comprising at least one compound characterized by Formula I:

45. 发明授权

US09505023B2 Ozone applicator and method for polymer oxidation 有权
标题翻译：臭氧施加器和聚合物氧化方法
公开(公告)号：US09505023B2
公开(公告)日：2016-11-29
申请号：US12922202
申请日：2009-03-13
申请人： Suzanne E. Schaefer , Jeremy Lee Winsor , Paul V. Zeyn
发明人： Suzanne E. Schaefer , Jeremy Lee Winsor , Paul V. Zeyn
IPC分类号： G03C1/76 , B05D1/30 , C07D417/12 , C07D417/14 , B05D3/04
CPC分类号： B05D3/04 , B05D1/305 , B05D3/002 , B05D3/044 , B29C59/10 , C07D417/12 , C07D417/14
摘要： Apparatuses and methods are described for distributing gas which may be applicable in the field of polymer oxidation and melt curtain ozonation in particular. Ozone applicators and other features of ozonation apparatuses, which may be used separately or in combination, are also described.
摘要翻译：对用于分散气体的装置和方法进行了描述，这些气体特别适用于聚合物氧化和熔融窗口臭氧化领域。也可以分别使用或组合使用臭氧施加器和臭氧化装置的其它特征。

46. 发明授权

US09475307B2 Inkless printing method 有权
标题翻译：无油印刷法
公开(公告)号：US09475307B2
公开(公告)日：2016-10-25
申请号：US14233881
申请日：2012-07-23
申请人： John Cridland
发明人： John Cridland
IPC分类号： B41J2/44 , B41M5/28 , B41M5/34 , G03C1/73 , G03F7/025
CPC分类号： B41J2/44 , B41M5/285 , B41M5/34 , G03C1/73 , G03F7/025
摘要： The present invention relates to a method of marking a substrate that comprises a color forming material, comprising the steps of: activating a region of the substrate so as to transform it from an inactive, low reactive state to an active, high reactive state; irradiating a part of the activated region with an initial color changing radiation to effect an initial color change to a first color; and irradiating a part of the substrate that has been changed to the first color with a high power density beam of visible electromagnetic radiation to effect a further color change of the irradiated region to a second color.
摘要翻译：本发明涉及一种标记包含成色材料的基板的方法，包括以下步骤：激活基板的区域，以便将其从无活性的低反应状态转变为活性的高反应状态; 用初始颜色变化辐射照射激活区域的一部分以实现初始颜色变化为第一颜色; 以及用可见电磁辐射的高功率密度束照射已经被改变为第一颜色的基板的一部分，以使照射区域进一步变色为第二颜色。

47. 发明授权

US09377690B2 Compositon for forming metal oxide-containing film and patterning process 有权
标题翻译：用于形成含金属氧化物的膜和图案化工艺的组合物
公开(公告)号：US09377690B2
公开(公告)日：2016-06-28
申请号：US14107500
申请日：2013-12-16
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： Tsutomu Ogihara , Takafumi Ueda , Seiichiro Tachibana , Yoshinori Taneda
IPC分类号： G03C1/77 , G03F7/09 , G03F7/075
CPC分类号： G03F7/094 , G03F7/0752
摘要： The invention provides a composition for forming a metal oxide-containing film comprising, as a component (A), a metal oxide-containing compound A1 obtained by hydrolysis and/or condensation of one or more kinds of hydrolysable metal compounds shown by the following general formula (A-1), as a component (B), an aromatic compound shown by the following general formula (B-1), the compound generating a hydroxyl group by thermal and/or an acid. There can be provided a composition for a resist lower layer film, which has high etching selectivity, capable of subjecting to stripping under mild conditions than the conventional process, has excellent pattern adhesiveness, and fine pattern formation can be performed.
摘要翻译：本发明提供一种用于形成含金属氧化物的膜的组合物，其包含作为（A）成分的含有金属氧化物的化合物A1，所述金属氧化物含有化合物A1通过下述一般化合物所示的一种或多种可水解金属化合物的水解和/或缩合得到式（A-1），作为（B）成分的下述通式（B-1）表示的芳香族化合物，通过热和/或酸生成羟基的化合物。可以提供一种抗蚀剂下层膜的组合物，其具有高的蚀刻选择性，能够在比常规方法温和的条件下进行剥离，具有优异的图案粘合性，并且可以进行精细图案形成。

48. 发明授权

US09354518B2 Epoxy-functional radiation-curable composition containing an epoxy-functional siloxane oligomer for enhanced film retention and adhesion during solvent development 有权
标题翻译：含有环氧官能的硅氧烷低聚物的环氧官能的可辐射固化组合物，用于在溶剂显影期间增强膜的保留性和粘附性
公开(公告)号：US09354518B2
公开(公告)日：2016-05-31
申请号：US14119950
申请日：2012-05-23
申请人： Duane Raymond Bujalski , Jon Vierling Degroot, Jr. , David J. Deshazer , Shedric Oneal Glover , Karen L. Hueston , John Ladouce
发明人： Duane Raymond Bujalski , Jon Vierling Degroot, Jr. , David J. Deshazer , Shedric Oneal Glover , Karen L. Hueston , John Ladouce
IPC分类号： G03F7/20 , G03F7/075 , G02F1/00 , C08L83/06 , C09D183/06 , G02B6/122 , G03C1/00
CPC分类号： G03F7/0757 , C08L83/06 , C09D183/06 , G02B6/1221 , G02F1/0063 , G02F2202/023 , G03C1/00 , G03F7/20
摘要： The present invention provides a silicone composition that includes an epoxy-functional organopolysiloxane resin and an epoxy-functional organosiloxane oligomer, and a method of preparing optical waveguides using the silicon composition. The present invention also provides a cured silicon composition, and an optical waveguide that includes the cured silicon composition.
摘要翻译：本发明提供了包含环氧官能的有机聚硅氧烷树脂和环氧官能的有机硅氧烷低聚物的硅氧烷组合物，以及使用硅组合物制备光波导的方法。本发明还提供一种固化硅组合物和包括固化硅组合物的光波导。

49. 发明授权

US09342715B2 Marking paper products 有权
公开(公告)号：US09342715B2
公开(公告)日：2016-05-17
申请号：US14308190
申请日：2014-06-18
申请人： XYLECO, INC.
发明人： Marshall Medoff
IPC分类号： D21H25/04 , G06K5/00 , C12P19/00 , D21H21/48 , G03C11/02 , G21K5/00 , G01N33/34 , C12M1/00 , H01J3/02 , H01J3/04 , C08B15/00 , C08J7/12
CPC分类号： G06K5/02 , B32B29/002 , B32B2262/0276 , B32B2554/00 , C08B15/00 , C08J7/123 , C12M45/00 , C12M45/06 , C12P19/00 , D21H21/48 , D21H25/04 , G01N33/346 , G01N2223/1013 , G01N2223/102 , G03C11/02 , G06K5/00 , G21K5/00 , H01J3/02 , H01J3/04
摘要： Methods of marking paper products and marked paper products are provided. Some methods include irradiating the paper product to alter the functionalization of the paper.

50. 发明授权

US09268235B2 Controller for optical device, exposure method and apparatus, and method for manufacturing device 有权
标题翻译：用于光学装置的控制器，曝光方法和装置以及制造装置的方法
公开(公告)号：US09268235B2
公开(公告)日：2016-02-23
申请号：US14320075
申请日：2014-06-30
申请人： NIKON CORPORATION
发明人： Soichi Owa
IPC分类号： G03C5/04 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/20 , G03F7/70091 , G03F7/70108 , G03F7/70116 , G03F7/70141 , G03F7/702 , G03F7/70291
摘要： An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light modulator and exposing a wafer with light from the second spatial light modulator, accompanied by: controlling a conversion state of the second spatial light modulator including a plurality of second mirror elements; and controlling a conversion state of the first spatial light modulator including a plurality of first mirror elements to control intensity distribution of the illumination light on a predetermined plane between the first spatial light modulator and the second spatial light modulator.
摘要翻译：一种曝光方法，用于以每种类型图案的高通量和最佳照明条件曝光包括多种图案的掩模图案。该方法包括将来自照明光的脉冲光照射的第一空间光调制器的光引导到第二空间光调制器，并且用来自第二空间光调制器的光曝光晶片，伴随着：控制第二空间光调制器包括多个第二镜元件; 以及控制包括多个第一反射镜元件的第一空间光调制器的转换状态，以控制照明光在第一空间光调制器和第二空间光调制器之间的预定平面上的强度分布。

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