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    • 41. 发明申请
    • Apparatus and method(s) for reducing the effects of coherent artifacts in an interferometer
    • 用于减少干涉仪中相干伪像的影响的装置和方法
    • US20030030819A1
    • 2003-02-13
    • US10053741
    • 2002-01-22
    • Michael Kuechel
    • G01B011/02
    • G01B9/02059G01B9/02034G01B9/02057G01J9/02
    • Interferometric apparatus and methods for reducing the effects of coherent artifacts in interferometers. Fringe contrast in interferograms is preserved while coherent artifacts that would otherwise be present in the interferogram because of coherent superposition of unwanted radiation generated in the interferometer are suppressed. Use is made of illumination and interferogrammetric imaging architectures that generate individual interferograms of the selected characteristics of a test surface from the perspective of different off-axis locations of illumination in an interferometer and then combine them to preserve fringe contrast while at the same time arranging for artifacts to exist at different field locations so that their contribution in the combined interferogram is diluted.
    • 用于减少干涉仪中相干伪像的影响的干涉仪和方法。 保留了干涉图中的边缘对比度,同时由于在干涉仪中产生的不期望的辐射的相干叠加而干涉图中存在的相干伪影被抑制。 使用照明和干涉测量成像架构,其从干涉仪中的照明的不同离轴位置的角度产生测试表面的所选特征的单独干涉图,然后将它们组合以保留条纹对比度,同时安排 人造物存在于不同的场地,使得它们在组合干涉图中的贡献被稀释。
    • 44. 发明申请
    • Wavefront and intensity analyzer for collimated beams
    • 准直光束的波前和强度分析仪
    • US20020176092A1
    • 2002-11-28
    • US10120077
    • 2002-04-10
    • Leslie L. Deck
    • G01B011/02
    • G01J1/4257G01J9/02
    • Interferometeric apparatus for analyzing the wavefront and intensity distribution of collimated beams from fiber optic collimators, lasers, and the like. The collimated beams are directed through a plate beamsplitter and combined with a well defined diverging, spherical reference beam preferably generated by a single mode fiber. Reference and test beams are directed through an optical assembly for changing magnification to selectively control lateral resolution at a detector plane. Phase shifting analysis is performed on the resultant interference patterns to analyze the wavefront, and intensity profile is determined as a separate step.
    • 用于分析来自光纤准直器,激光器等的准直光束的波前和强度分布的干涉仪。 准直的光束被引导通过平板分光镜并与明确限定的发散的球形参考光束组合,优选地由单模光纤产生。 参考和测试光束被引导通过用于改变放大率的光学组件以选择性地控制检测器平面处的横向分辨率。 对所得到的干涉图案执行相移分析以分析波前,并且将强度分布确定为单独的步骤。
    • 45. 发明申请
    • Interferometer for measuring the thickness profile of thin transparent substrates
    • 用于测量薄透明基板厚度分布的干涉仪
    • US20020145739A1
    • 2002-10-10
    • US10061238
    • 2002-02-01
    • Peter J. De GrootLeslie L. Deck
    • G01B011/02
    • G01B11/02G01B11/06
    • An method for measuring an optical thickness of a test object, the method includes: interfering a first optical wave front from the test object and a second optical wave front from a reference surface to produce an interference signal; for a selected location on the test object, obtaining an interference pattern of the test object at a first wavelength null1; for the selected location, calculating a first estimate of the optical thickness from the interference pattern recorded at wavelength null1; for the selected location obtaining an interference pattern of the test object at a second wavelength null2; for the selected location, calculating a second estimate of the optical thickness from the interference pattern recorded at wavelength null2; and for the selected location, calculating a third estimate of the optical thickness by combining the first and second estimates of optical thickness.
    • 一种用于测量被测物体的光学厚度的方法,所述方法包括:从测试对象干涉第一光波前沿和从参考表面干涉第二光波前沿以产生干涉信号; 对于测试对象上的选定位置,以第一波长lambd1获得测试对象的干涉图案; 对于所选择的位置,从记录在波长lambd1处的干涉图案计算光学厚度的第一估计; 对于所选择的位置,获得第二波长lambd2的测试对象的干涉图案; 对于所选择的位置,从记录在波长lambd2处的干涉图案计算光学厚度的第二估计; 并且对于所选位置,通过组合光学厚度的第一和第二估计来计算光学厚度的第三估计。
    • 46. 发明申请
    • Interferometric alignment device
    • 干涉校准装置
    • US20020131051A1
    • 2002-09-19
    • US09811275
    • 2001-03-19
    • Robert R. MitchellGene H. Widenhofer
    • G01B011/02
    • G01B11/26
    • The interferometric alignment device is a small, compact device that can be attached to any two optical instruments that need to be aligned precisely in both pitch and yaw angles. The device utilizes light reflecting from mirrors that are permanently mounted inside the instruments, one mirror in each of the instruments. The reflected light beams exit their respective instruments via a window built into the frame of the instrument and re-enters the attached alignment device wherein they combine to form an interference pattern. The operator of the alignment device observes the fringes of this pattern and adjusts the azimuth and elevation of one instrument relative to the other instrument until the fringes are at an acceptable minimum number or are eliminated altogether.
    • 干涉式对准装置是一种小型,紧凑的装置,其可以附接到需要在俯仰角和偏航角度精确对准的任何两个光学仪器。 该设备利用永久安装在仪器内的镜子的光反射,每个仪器都有一个镜子。 反射光束通过内置在仪器框架中的窗口离开它们各自的仪器,并重新进入附接的对准装置,其中它们组合以形成干涉图案。 对准装置的操作者观察这种模式的边缘,并调整一个仪器相对于另一个仪器的方位和仰角,直到条纹达到可接受的最小数量或完全消除为止。
    • 47. 发明申请
    • Method for determining defect depth using thermal imaging
    • 使用热成像确定缺陷深度的方法
    • US20020128797A1
    • 2002-09-12
    • US09766214
    • 2001-01-19
    • Jiangang Sun
    • G06F015/00G01B011/02
    • G01B11/06G01B11/22
    • A method and apparatus are provided for determining the thickness of a sample and defect depth using thermal imaging in a variety of plastic, ceramic, metal and other products. A pair of flash lamps is positioned at a first side of the sample. An infrared camera is positioned near the first side of the sample. A data acquisition and processing computer is coupled to the flash lamps for triggering the flash lamps. The data acquisition and processing computer is coupled to the infrared camera for acquiring and processing thermal image data. The thermal image data are processed using a theoretical solution to analyze the thermal image data to determine the thickness of a sample and defect depth.
    • 提供了一种方法和装置,用于使用各种塑料,陶瓷,金属和其它产品中的热成像确定样品的厚度和缺陷深度。 一对闪光灯位于样品的第一侧。 红外摄像机位于样品第一侧附近。 数据采集​​和处理计算机耦合到闪光灯以触发闪光灯。 数据采集​​和处理计算机耦合到红外摄像机,用于获取和处理热图像数据。 使用理论解决方案处理热图像数据以分析热图像数据以确定样品的厚度和缺陷深度。
    • 48. 发明申请
    • Method and apparatus for determining temperature and temperature distribution in a slider
    • 用于确定滑块温度和温度分布的方法和装置
    • US20020122184A1
    • 2002-09-05
    • US10034714
    • 2001-12-28
    • International Business Machines Corp.
    • Ruediger Friedrich BergerPeter Karl Maechtle
    • G01B011/02
    • G01K5/48
    • A method for in-situ measuring a temperature and/or temperature distribution within a slider due to local heat transfer is provided, whereby the slider is positioned above the surface of a rotating disk, and carries a sensor and/or write element, whereby the rotating disk is moving relatively to the sensor and/or write element, and whereby the shape of said slider is changed locally due to the temperature and/or temperature distribution. By measuring the shape changes of the slider, the temperature and/or temperature distribution can be calculated on the basis of the changes by means of numerical methods. The method may be used as an in-situ measurement in already existing testers, like, e.g., flying height testers. No additional hardware is required and studies of the slider near contact can be performed. In addition, information with respect to the flight height is obtained simultaneously.
    • 提供了一种用于由于局部传热而原位测量滑块内的温度和/或温度分布的方法,由此滑块位于旋转盘的表面上方,并且承载传感器和/或写入元件,由此 旋转盘相对于传感器和/或写入元件移动,并且由此由于温度和/或温度分布而使滑块的形状局部地改变。 通过测量滑块的形状变化,可以通过数值方法基于变化来计算温度和/或温度分布。 该方法可以用作已经存在的测试器中的现场测量,例如飞行高度测试仪。 不需要额外的硬件,并且可以对接触点附近的滑块进行研究。 另外,同时获得关于飞行高度的信息。