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41. 发明授权

US06753518B2 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus 失效
标题翻译：电子束曝光或系统检查或测量装置及其方法和高度检测装置
公开(公告)号：US06753518B2
公开(公告)日：2004-06-22
申请号：US10012454
申请日：2001-12-12
申请人： Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
发明人： Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
IPC分类号： G02B704
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electron beam apparatus includes a movable table which mounts a specimen, an electron optical system including an electron beam source which emits electron beams, an element for deflecting the emitted electron beams, an objective lens for converging and irradiating the deflected electron beams onto the specimen mounted on the table, and a detector for detecting a secondary electron emanated from the specimen by the irradiation of the electron beams. A surface height detection unit is provided which optically detects a height of a surface of the specimen by projecting light onto the surface of the specimen from an oblique direction to the surface and detecting light reflected from the specimen. A focus controller is provided for focusing the electron beam onto the surface of the specimen by controlling a position of the table in a height direction in accordance with the height information from the surface height detection unit.
摘要翻译：一种电子束装置，包括安装试件的可移动台，包括发射电子束的电子束源的电子光学系统，用于偏转发射的电子束的元件，用于会聚并将偏转的电子束照射到试样上的物镜安装在桌子上的检测器和用于通过照射电子束来检测从样品发出的二次电子的检测器。提供一种表面高度检测单元，其通过从表面倾斜的方向将样品投射到样品表面上并检测从样品反射的光来光学地检测样品的表面的高度。提供了一种聚焦控制器，用于根据来自表面高度检测单元的高度信息控制桌子在高度方向上的位置，将电子束聚焦到样本表面上。

42. 发明授权

US06621082B2 Automatic focusing system for scanning electron microscope equipped with laser defect detection function 有权
公开(公告)号：US06621082B2
公开(公告)日：2003-09-16
申请号：US10171797
申请日：2002-06-13
申请人： Seiji Morita , Mitsuyoshi Sato , Atsushi Uemoto
发明人： Seiji Morita , Mitsuyoshi Sato , Atsushi Uemoto
IPC分类号： G01N2300
CPC分类号： H01J37/226 , H01J37/21 , H01J2237/216
摘要： A scanning electron microscope equipped with a laser defect detection function has an automatic focusing function that performs the steps of: obtaining a deviation (offset) amount between focal positions of an optical microscope and a scanning electron microscope; detecting a defect by a laser dark-field image of the optical microscope; analyzing the dark-field image to readjust a focus of the optical microscope to adjust a height of the optical microscope; and automatically adjusting a focus of the scanning electron microscope by adding a readjusted amount of the focus of the optical microscope to the offset amount before an observation is conducted by the scanning electron microscope.

43. 发明申请

US20020056808A1 Method and apparatus for charged particle beam microscopy 失效
标题翻译：带电粒子束显微镜的方法和装置
公开(公告)号：US20020056808A1
公开(公告)日：2002-05-16
申请号：US09983898
申请日：2001-10-26
发明人： Ruriko Tsuneta , Masanari Koguchi , Mari Nozoe , Muneyuki Fukuda , Mitsugu Sato
IPC分类号： G01N023/225
CPC分类号： H01J37/21 , H01J37/226 , H01J37/28 , H01J2237/1501 , H01J2237/216 , H01J2237/2482 , H01J2237/31745 , H01J2237/31749
摘要： By use of charged particle beam images picked up in different conditions, a positional displacement caused by parallax is analyzed, and an optics of an apparatus for charged particle beam microscopy is corrected automatically. An analysis method using phase difference of Fourier transform images and having analytic accuracy lower than that for one pixel is adopted for the displacement analysis. In addition, a degree of coincidence between images calculated in this analysis method is used as a criterion for evaluating the reliability of an analysis result. Since the analysis method based on parallax is low in specimen dependency, the operation range is expanded. In addition, by adopting a high-accuracy displacement analysis method, the apparatus correction accuracy is improved by one digit. A malfunction preventing flow is added using the degree of coincidence as a judgement criterion. Thus, the apparatus can deal with unmanned operation. In addition, the degree of coincidence can be used as a monitor of inspection states or a record of states in an inspection apparatus.
摘要翻译：通过使用在不同条件下拾取的带电粒子束图像，分析由视差引起的位置位移，并且自动校正用于带电粒子束显微镜的装置的光学元件。采用傅里叶变换图像的相位差分析方法，分析精度低于1个像素的分析方法进行位移分析。此外，使用在该分析方法中计算出的图像之间的一致程度作为用于评估分析结果的可靠性的标准。由于基于视差的分析方法在样本依赖性方面较低，所以操作范围扩大。此外，通过采用高精度位移分析方法，装置校正精度提高一位数。使用一致度作为判断标准来添加故障防止流程。因此，该装置可以处理无人操作。此外，一致度可以用作检查状态的监视器或检查装置中的状态记录。

44. 发明申请

US20010021020A1 Inspection method, apparatus and system for circuit pattern 有权
标题翻译：检查方法，电路图案的装置和系统
公开(公告)号：US20010021020A1
公开(公告)日：2001-09-13
申请号：US09832218
申请日：2001-04-11
发明人： Yasuhiko Nara , Takashi Hiori
IPC分类号： G01B011/00 , G01V008/00
CPC分类号： G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
摘要翻译：设置用于电路图案的检查方法，装置和系统，其中当通过使用通过照射白光形成的图像，激光束或带电粒子束来检查精细电路图案的情况下需要各种条件时，其运行效率可以提高。显示检查对象基板的检查对象区域，并且指定区域的指定地图画面和光学显微镜或电子束显微镜的图像并行显示，从而能够将缺陷分布和缺陷图像同时看到。检查条件的项目名称和显示，输入或指示检查条件内容的画面被整合，这些内容与图像平面重叠，层叠显示，并且所有项目名称均以选项卡格式在内容的图片平面的上部。当点击所需的项目名称时，切换画面并显示与点击的项目名称对应的内容。

45. 发明申请

US20010019411A1 Inspection method, apparatus and system for circuit pattern 有权
公开(公告)号：US20010019411A1
公开(公告)日：2001-09-06
申请号：US09832219
申请日：2001-04-11
发明人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
IPC分类号： G01N021/88 , G21K007/00
CPC分类号： G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.

46. 发明申请

US20010015805A1 Inspection method, apparatus and system for circuit pattern 有权
公开(公告)号：US20010015805A1
公开(公告)日：2001-08-23
申请号：US09832222
申请日：2001-04-11
发明人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
IPC分类号： G01B011/00
CPC分类号： G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.

47. 发明授权

US5784150A Electron-beam cell projection lithography system 失效
标题翻译：电子束电池投影光刻系统
公开(公告)号：US5784150A
公开(公告)日：1998-07-21
申请号：US749956
申请日：1996-11-14
申请人： Katsuyuki Itoh
发明人： Katsuyuki Itoh
IPC分类号： H01L21/027 , G03F7/20 , H01J37/22 , H01J37/304 , G03B27/42
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/226 , H01J37/3045 , H01J2237/30438 , H01J2237/3175
摘要： An electron-beam cell projection lithography apparatus includes an electron-beam source, a first aperture through which an electron-beam transmitted from the electron-beam source passes is shaped, and a second aperture formed with an aperture in a desired transfer pattern. The electron beam passes through the second aperture and irradiates an object. The second aperture is placed on a stage, which is movable in X and Y axes directions. A registration mark is placed or positioned on at least one of the second aperture and the stage. The apparatus also includes a device such as a microscope, a charge coupled device (CCD) for observing the registration mark to position the second aperture. The observing device has variable magnifications. The second aperture can be positioned by observing the registration mark with the observing device having variable magnifications. Thus, the second aperture is first roughly positioned by virtue of the registration mark by observing the second aperture and a wide area of the stage with the observing device adjusted to have low magnifications, and then accurately positioned with the observing device adjusted to have high magnifications. Thus, it is possible to align the registration mark with a reference point in a short period of time, thereby accomplishing rapid positional adjustment of the stage on which the second aperture is placed. In addition, since the second aperture can be wholly observed, it is possible to find defects and damages of a transfer pattern.
摘要翻译：电子束单元投影光刻设备包括电子束源，从电子束源发射的电子束通过的第一孔成形，以及形成有所需转印图案的孔的第二孔。电子束通过第二孔并照射物体。第二孔被放置在能沿X和Y轴方向移动的平台上。登记标记放置或定位在第二孔径和台架中的至少一个上。该装置还包括诸如显微镜的装置，用于观察对准标记以定位第二孔的电荷耦合装置（CCD）。观察装置具有可变放大倍率。可以通过用具有可变放大率的观察装置观察对准标记来定位第二孔。因此，通过观察第二孔径和将观察装置调整为具有低放大率的阶段的宽区域，首先通过对准标记大致定位第二孔径，然后将观察装置调整为具有高倍率的精确定位。因此，可以在短时间内对准标记与参考点，从而实现放置第二孔的台的快速位置调整。此外，由于可以完全观察到第二孔，所以可以发现转印图案的缺陷和损坏。

48. 发明授权

US4266128A Electron microscope with optical microscope 失效
标题翻译：电子显微镜用光学显微镜
公开(公告)号：US4266128A
公开(公告)日：1981-05-05
申请号：US107627
申请日：1979-12-27
申请人： Shigeru Suzuki , Kazuo Ohsawa
发明人： Shigeru Suzuki , Kazuo Ohsawa
IPC分类号： G02B21/00 , H01J37/20 , H01J37/22 , G01N23/00
CPC分类号： H01J37/226
摘要： A combination of electron microscope and optical microscope. The optical microscope is juxtaposed adjacent to the electron microscope so that the optical and lens axes of respective microscopes extend in parallel to each other. A specimen transfer mechanism is provided in common to both of the electron microscope and the optical microscope for interchangeably positioning a specimen to be observed at respective predetermined positions along the lens axis and the optical axis for alternative observations through the electron microscope and the optical microscope. The specimen transfer means including specimen holding bar adapted to be displaced in two-dimensional direction in a plane extending orthogonally to both of the lens axis and the optical axis thereby to interchangeably position the specimen at the predetermined positions through displacement of the specimen holding bar which corresponds to a distance between the lens axis and the optical axis. One and the same specimen is allowed to be interchangeably observed through both of the electron microscope and the optical microscope by correspondingly manipulating the specimen transfer means.
摘要翻译：电子显微镜和光学显微镜的组合。光学显微镜与电子显微镜相邻并置，使得各显微镜的光学和透镜轴彼此平行地延伸。为电子显微镜和光学显微镜两者提供了一个样本转移机构，用于可互换地定位沿着透镜轴和光轴的各个预定位置观察的样本，以通过电子显微镜和光学显微镜进行替代观察。样本传送装置包括样本保持杆，其适于在垂直于透镜轴和光轴两者延伸的平面中在二维方向上移位，从而通过样本保持杆的位移将样本可互换定位在预定位置，对应于透镜轴和光轴之间的距离。通过电子显微镜和光学显微镜通过相应地操作样品转印装置，使相同的样品可以互换地观察。

49. 发明授权

US2951157A X-ray apparatus 失效
公开(公告)号：US2951157A
公开(公告)日：1960-08-30
申请号：US76047258
申请日：1958-09-11
申请人： VICKERS ELECTRICAL CO LTD
发明人： EDWARD HAINE MICHAEL , THOMAS MULVEY
IPC分类号： G01N23/20 , G01N23/22 , G01N23/225 , H01J37/20 , H01J37/22 , H01J37/252
CPC分类号： H01J37/226 , G01N23/20025 , G01N23/2204 , G01N23/225 , H01J37/20 , H01J37/252

50. 发明公开

US20230326714A1 METAL PATTERN INSPECTION METHOD AND FOCUSED ION BEAM APPARATUS 审中-公开
公开(公告)号：US20230326714A1
公开(公告)日：2023-10-12
申请号：US18027051
申请日：2021-08-04
申请人： V TECHNOLOGY CO., LTD.
发明人： Michinobu MIZUMURA
IPC分类号： H01J37/28 , H01J37/317 , H01J37/32 , H01J37/244 , H01J37/22
CPC分类号： H01J37/28 , H01J37/3178 , H01J37/32449 , H01J37/244 , H01J37/226 , H01J2237/2817 , H01J2237/2806
摘要： A metal pattern inspection method which applies a pulsed voltage to a metallic pattern, sets a cycle of the pulsed voltage to be shorter than a scanning cycle in which a focused ion beam is swept, indicating only a region of a secondary charged particle image corresponding to a portion of the metallic pattern which is isolated by a wire breakage and to which the pulsed voltage is applied in the form of a first pattern created as a function of surface electrical potentials changing in level with time, detecting, as a disconnection, a boundary between the first pattern and a second pattern created as a function of surface electrical potentials not changing in level with time, and determining whether there is a breaking of or a short circuit in the metallic pattern based on the presence or absence of the disconnection.

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