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41. 发明申请

US20100143521A1 Method for Expelling Gas Positioned Between a Substrate and a Mold 有权
标题翻译：排出位于基板和模具之间的气体的方法
公开(公告)号：US20100143521A1
公开(公告)日：2010-06-10
申请号：US12707345
申请日：2010-02-17
申请人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Ian M. McMackin , Pankaj B. Lad
发明人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Ian M. McMackin , Pankaj B. Lad
IPC分类号： B29C33/18
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed towards a system for expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.
摘要翻译：本发明涉及一种用于排出位于基底和模具之间的气体的系统，所述基底和模具进一步具有位于其间的液体。

42. 发明申请

US20100129486A1 Method and System for Double-Sided Patterning of Substrates 有权
标题翻译：基板双面图案化方法与系统
公开(公告)号：US20100129486A1
公开(公告)日：2010-05-27
申请号：US12686732
申请日：2010-01-13
申请人： Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B28B13/02
CPC分类号： G03F7/70425 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S977/887
摘要： A system of patterning first and second opposed sides of a substrate is described. The system may employ a mold assembly and obtaining a desired spatial relationship between the first and second opposed sides of the substrate and the mold assembly. In a further embodiment, the method and system may employ a first and a second mold assembly.
摘要翻译：描述了基板的第一和第二相对侧的构图的系统。该系统可以采用模具组件并且获得基板和模具组件的第一和第二相对侧之间的期望的空间关系。在另一个实施例中，该方法和系统可以采用第一和第二模具组件。

43. 发明申请

US20100109195A1 RELEASE AGENT PARTITION CONTROL IN IMPRINT LITHOGRAPHY 审中-公开
标题翻译：释放代理分割控制在印刷图
公开(公告)号：US20100109195A1
公开(公告)日：2010-05-06
申请号：US12612527
申请日：2009-11-04
申请人： Frank Y. Xu , Weijun Liu
发明人： Frank Y. Xu , Weijun Liu
IPC分类号： B29C59/02 , C07C233/18 , C07D237/08 , G03F7/004 , C23C8/80
CPC分类号： C07D237/24 , B82Y10/00 , B82Y40/00 , C07C233/18 , G03F7/0002
摘要： Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography.
摘要翻译：在纳米压印光刻工艺中将模板与固化的抗蚀剂分离期间，与纳米压印光刻模板表面的亲和性增加的脱模剂与模板相互作用强烈。表面活性剂和模板表面之间的强相互作用减少了在压印光刻循环中将图案化层与模板分离期间从模板表面上拉出的表面活性剂的量。在将图案化层与模板分离之后，维持与模板表面相关的更多表面活性剂可以减少液体抗蚀剂中所需的表面活性剂的量，以在压印光刻过程中从模板中实现固化的抗蚀剂的合适释放。脱模剂与模板表面的强相关有助于在纳米压印光刻中形成超薄的残余层和致密的精细特征。

44. 发明申请

US20100104852A1 Fabrication of High-Throughput Nano-Imprint Lithography Templates 审中-公开
标题翻译：高通量纳米压印光刻模板的制作
公开(公告)号：US20100104852A1
公开(公告)日：2010-04-29
申请号：US12604094
申请日：2009-10-22
申请人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
发明人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
IPC分类号： B32B3/26 , B05D3/10 , B01D3/00 , C23C16/00 , B05D3/06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017 , Y10T428/249978 , Y10T428/268
摘要： An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (pporous/pfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
摘要翻译：压印光刻模板包括限定平均孔径至少约0.4nm的多个孔的多孔材料。多孔材料包括硅和氧，并且杨氏模量（E）与多孔材料相对于熔融二氧化硅的相对密度（磷/二氧化硅）的比例为至少约10:1。多孔材料的折射率在约1.4和1.5之间。多孔材料可以形成压印光刻模板的中间层或盖层。模板可以包括在多孔层和盖层之间的孔密封层，或者在盖层的顶部上的孔密封层。

45. 发明申请

US20100102470A1 Misalignment Management 有权
标题翻译：不对齐管理
公开(公告)号：US20100102470A1
公开(公告)日：2010-04-29
申请号：US12553645
申请日：2009-09-03
申请人： Babak Mokaberi
发明人： Babak Mokaberi
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7003 , G03F9/7088
摘要： A method of determining overlay error between a template and a substrate using placement of template features and placement of substrate features in one or more images. Estimated distortion of the template and/or substrate may be determined using the overlay error. One or more forces acting on the template and/or substrate may be varied based on the estimated distortion for subsequent nano-lithography imprinting. Additionally, bias may be introduced in subsequent imprinting steps based on overlay performance.
摘要翻译：使用放置模板特征并将衬底特征放置在一个或多个图像中来确定模板和衬底之间的重叠误差的方法。可以使用重叠误差来确定模板和/或衬底的估计失真。基于对随后的纳米光刻印迹的估计失真，可以改变作用在模板和/或基底上的一个或多个力。另外，可以基于覆盖性能在随后的压印步骤中引入偏差。

46. 发明申请

US20100085555A1 In-Situ Cleaning of an Imprint Lithography Tool 有权
标题翻译：印刷平版印刷工具的原位清洁
公开(公告)号：US20100085555A1
公开(公告)日：2010-04-08
申请号：US12563356
申请日：2009-09-21
申请人： Gerard M. Schmid , Ian Matthew McMackin , Byung-Jin Choi , Douglas J. Resnick
发明人： Gerard M. Schmid , Ian Matthew McMackin , Byung-Jin Choi , Douglas J. Resnick
IPC分类号： G03B27/64 , B08B7/00 , B01J19/12
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/70925
摘要： Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.
摘要翻译：压印光刻系统可以提供用于固化位于模板和衬底之间的材料的能量源。此外，能量源和/或附加能量源可用于从模板和/或基底清洁污染物。

47. 发明授权

US07691313B2 Method for expelling gas positioned between a substrate and a mold 有权
标题翻译：用于排出位于基底和模具之间的气体的方法
公开(公告)号：US07691313B2
公开(公告)日：2010-04-06
申请号：US11565393
申请日：2006-11-30
申请人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Ian M. McMackin , Pankaj B. Lad
发明人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Ian M. McMackin , Pankaj B. Lad
IPC分类号： B29D11/00
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed towards a method and a system of expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.
摘要翻译：本发明涉及排出位于基底和模具之间的气体的方法和系统，所述基底和模具进一步具有位于其间的液体。

48. 发明申请

US20100072671A1 NANO-IMPRINT LITHOGRAPHY TEMPLATE FABRICATION AND TREATMENT 审中-公开
标题翻译： NANO-IMPRINT LITHOGRAPHY模板制造和处理
公开(公告)号：US20100072671A1
公开(公告)日：2010-03-25
申请号：US12567275
申请日：2009-09-25
申请人： Gerard M. Schmid , Weijun Liu , Edward Brian Fletcher , Frank Y. Xu , Fen Wan
发明人： Gerard M. Schmid , Weijun Liu , Edward Brian Fletcher , Frank Y. Xu , Fen Wan
IPC分类号： B29C43/02 , B29C35/00
CPC分类号： G03F7/0002 , B29C33/06 , B29C33/10 , B29C43/003 , B29C43/021 , B29C2043/025 , B82Y10/00 , B82Y40/00
摘要： A nano-imprint lithography template includes a rigid support layer, a cap layer, and a flexible cushion layer positioned between the support layer and the cap layer. Treating an imprint lithography template includes heating the template to desorb gases from the template. Heating the template includes radiating the template at a selected wavelength with, for example, infrared radiation. The selected wavelength may correspond to a wavelength at which the template material is strongly absorbing.
摘要翻译：纳米压印光刻模板包括刚性支撑层，盖层和位于支撑层和盖层之间的柔性缓冲层。处理压印光刻模板包括加热模板以从模板解吸气体。加热模板包括用例如红外辐射以选定的波长辐射模板。所选择的波长可以对应于模板材料强烈吸收的波长。

49. 发明申请

US20100072652A1 IMPRINT LITHOGRAPHY SYSTEM AND METHOD 失效
标题翻译： IMPRINT LITHOGRAPHY系统和方法
公开(公告)号：US20100072652A1
公开(公告)日：2010-03-25
申请号：US12582091
申请日：2009-10-20
申请人： Mahadevan GanapathiSubramanian , Byung-Jin Choi , Mario Johannes Meissl
发明人： Mahadevan GanapathiSubramanian , Byung-Jin Choi , Mario Johannes Meissl
IPC分类号： B29C47/76 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process.
摘要翻译：使用基板和/或模板的受控变形来压印基板的系统，方法和工艺。衬底和/或模板可以在压印光刻工艺期间被定位成单波形成或双波形成。

50. 发明申请

US20100053578A1 Apparatus for imprint lithography using an electric field 审中-公开
标题翻译：用于使用电场进行压印光刻的装置
公开(公告)号：US20100053578A1
公开(公告)日：2010-03-04
申请号：US10923629
申请日：2004-08-20
申请人： Sidlgata V. Sreenivasan , Roger T. Bonnecaze , Carlton Grant Willson
发明人： Sidlgata V. Sreenivasan , Roger T. Bonnecaze , Carlton Grant Willson
IPC分类号： G03B27/42
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0271
摘要： A lithography process for creating patterns in an activating light curable liquid using electric fields followed by curing of the activating light curable liquid is described. The process involves the use of a template that is formed of non-conductive and electrically conductive portions. The template is brought into close proximity to the activating light curable liquid on the substrate. An external electric field is applied to the template-substrate interface while maintaining a uniform, carefully controlled gap between the template and substrate. This causes the activating light curable liquid to be attracted to the raised portions of the template. Activating light is applied to the curable liquid while an electric field is applied to the template to create a patterned layer on the substrate.
摘要翻译：描述了使用电场随后激活活化的光固化液体的固化来在激活光固化液体中产生图案的光刻工艺。该方法涉及使用由非导电和导电部分形成的模板。使模板靠近基板上的活化可光固化液体。外部电场被施加到模板 - 衬底界面，同时保持模板和衬底之间均匀的小心控制的间隙。这使得激活的可光固化液体被吸引到模板的凸起部分。将活化光施加到可固化液体，同时向模板施加电场以在基板上产生图案化层。

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