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    • 42. 发明申请
    • DEFECT INSPECTION TOOL FOR SAMPLE SURFACE AND DEFECT DETECTION METHOD THEREFOR
    • 用于样品表面的缺陷检查工具及其缺陷检测方法
    • US20080151235A1
    • 2008-06-26
    • US11940483
    • 2007-11-15
    • Yoshimasa OshimaToshiyuki Nakao
    • Yoshimasa OshimaToshiyuki Nakao
    • G01N21/88
    • G01N21/9501G01N2021/8864
    • In a defect inspection for a semiconductor substrate, inspection objects include, in addition to a bear Si wafer, a wafer with various films formed on the surface thereof. For a sample formed with a metal film in particular, scattering light generated by surface roughness thereof is large, thus making it difficult to detect a minute defect and a minute foreign substance. It is desirable that a minute defect and a minute foreign substance be detected regardless of scattering light generated by the roughness of the sample surface. Insertion of an analyzer in an optical path of a detection optical system at such an angle that the scattering light generated by the roughness becomes minimum permits suppressing the scattering light generated by the roughness.
    • 在半导体基板的缺陷检查中,除了承载硅晶片之外,检查对象还包括在其表面上形成有各种膜的晶片。 对于特别是金属膜形成的样品,由于其表面粗糙度而产生的散射光大,因此难以检测到微小的缺陷和微小的异物。 不管由样品表面的粗糙度产生的散射光如何,都希望检测到微小的缺陷和微小的异物。 以使得由粗糙度产生的散射光变得最小的角度插入检测光学系统的光路中的分析器,可以抑制由粗糙度产生的散射光。
    • 43. 发明授权
    • Defect inspecting device for sample surface and defect detection method therefor
    • 样品表面缺陷检测装置及其缺陷检测方法
    • US07719673B2
    • 2010-05-18
    • US11940483
    • 2007-11-15
    • Yoshimasa OshimaToshiyuki Nakao
    • Yoshimasa OshimaToshiyuki Nakao
    • G01N21/00
    • G01N21/9501G01N2021/8864
    • In a defect inspection for a semiconductor substrate, inspection objects include, in addition to a bare Si wafer, a wafer with various films formed on the surface thereof. For a sample formed with a metal film in particular, scattering light generated by surface roughness thereof is large, thus making it difficult to detect a minute defect and a minute foreign substance. It is desirable that a minute defect and a minute foreign substance be detected regardless of scattering light generated by the roughness of the sample surface. Insertion of an analyzer in an optical path of a detection optical system at such an angle that the scattering light generated by the roughness becomes minimum permits suppressing the scattering light generated by the roughness.
    • 在半导体衬底的缺陷检查中,检查对象除了裸硅片外还包括在其表面上形成有各种膜的晶片。 对于特别是金属膜形成的样品,由于其表面粗糙度而产生的散射光大,因此难以检测到微小的缺陷和微小的异物。 不管由样品表面的粗糙度产生的散射光如何,都希望检测到微小的缺陷和微小的异物。 以使得由粗糙度产生的散射光变得最小的角度插入检测光学系统的光路中的分析器,可以抑制由粗糙度产生的散射光。
    • 44. 发明授权
    • Method for detecting foreign matter and device for realizing same
    • 异物检测方法及其实现方法
    • US5046847A
    • 1991-09-10
    • US262573
    • 1988-10-25
    • Toshihiko NakataNobuyuki AkiyamaYoshihiko YamuchiMitsuyoshi KoizumiYoshimasa Oshima
    • Toshihiko NakataNobuyuki AkiyamaYoshihiko YamuchiMitsuyoshi KoizumiYoshimasa Oshima
    • G01N21/21G01N21/94G03F9/00
    • G03F9/70G01N21/94G01N21/95623G01N2021/473G01N21/21
    • A method and apparatus for detecting foreign matter on a sample by illuminating a stripe-shaped region with linearly polarized light. Some of the light reflected by the sample is intercepted by a light intercepting stage, and the rest of the light reflected by the sample, which passes through the light intercepting stage is directed to a detecting optical system, to be detected by a photo-detector. The sample is illuminated obliquely at a predetermined angle with respect to a group of straight lines constituting a primary pattern on the sample. The angle is selected so that the diffraction light reflected by the group of straight lines does not enter the detecting optical system. A polarizing spatial filter using a liquid crystal element may be disposed in a predetermined restricted region in a spacial frequency region, or Fourier transformation plane, within the detecting optical system. The light scattered by the sample may further be separated in the detecting optical system into partial beams having different wave orientation characteristics, which characteristics are detected by a number of one-dimensional solid state imaging elements. The signals are processed by a driver, adder, and quantizer in synchronism with the one-dimensional solid state imaging elements.
    • 一种通过用线性偏振光照射条形区域来检测样品上的异物的方法和装置。 由样品反射的一些光被遮光阶段遮挡,并且通过遮光台的由样品反射的其余光指向检测光学系统,由光检测器检测 。 样品相对于构成样品上的主要图案的一组直线以预定角度倾斜照射。 选择该角度使得由直线组反射的衍射光不进入检测光学系统。 使用液晶元件的偏振空间滤光片可以设置在检测光学系统内的空间频率区域或傅立叶变换平面的预定限制区域中。 由样本散射的光可以在检测光学系统中进一步分离成具有不同波取向特性的部分光束,该特征由多个一维固态成像元件检测。 信号由驱动器,加法器和量化器与一维固态成像元件同步处理。
    • 45. 发明授权
    • Method and apparatus for inspecting specimen surface
    • 检测样品表面的方法和装置
    • US4423331A
    • 1983-12-27
    • US242483
    • 1981-03-11
    • Mitsuyoshi KoizumiNobuyuki AkiyamaYoshimasa Oshima
    • Mitsuyoshi KoizumiNobuyuki AkiyamaYoshimasa Oshima
    • G01B11/30G01N21/88G01N21/95G11B5/84
    • G01N21/88
    • A method and apparatus of inspecting a surface of a specimen for the presence of defects, foreign substance and the like are disclosed. The surface has a mark such as a cutting mark formed thereon and composed of fine grooves or recesses extending in a predetermined direction. The surface is scanned two-dimensionally with an irradiating laser beam impinging or illuminating on the specimen surface perpendicularly thereto. Those of the irregularly scattered laser light rays reflected from the specimen surface which are in a first direction perpendicular to the lengthwise direction of the mark are intercepted by a shielding member or caused to pass through regions other than a reflecting region of a reflecting mirror, while those scattered light rays which are in other directions than the first direction are directed to a photoelectric converter tube along a bypass path across the shielding member or through reflection of the mirror. A picture signal derived from the output of the photoelectric converter tube is digitalized into binary picture element signals by a sampling and binary encoding circuit, the resulting signals being then stored in a two-dimensional memory. The presence and forms of defects, foreign substances and the like on the specimen surface are discriminatively determined in dependence on particular combinations of the binary picture element signals stored in the memory.
    • 公开了一种检查样品表面存在缺陷,异物等的方法和装置。 该表面具有形成在其上的切割标记和由沿预定方向延伸的细小凹槽或凹部组成的标记。 使用照射激光束在垂直于其的样品表面上照射或照射二维地扫描该表面。 从与标记的长度方向垂直的第一方向从试样表面反射的不规则散射的激光光线被屏蔽部件遮断,或者通过反射镜的反射区域以外的区域,同时 沿着除了第一方向以外的方向的那些散射光线沿着穿过屏蔽部件的旁通路径或者通过反射镜的反射被引导到光电转换管。 从光电转换管的输出得到的图像信号由采样和二进制编码电路数字化成二进制像素信号,然后将所得到的信号存储在二维存储器中。 根据存储在存储器中的二进制像素信号的特定组合,鉴别地确定样本表面上的缺陷,异物等的存在和形式。
    • 46. 发明授权
    • Apparatus for automatically checking external appearance of object
    • 用于自动检查物体外观的装置
    • US4242702A
    • 1980-12-30
    • US856097
    • 1977-11-30
    • Asahiro KuniNobuyuki AkiyamaYoshimasa Oshima
    • Asahiro KuniNobuyuki AkiyamaYoshimasa Oshima
    • G01B11/02G01B11/24H04N7/18
    • G01B11/24G01B11/024
    • An apparatus for examining an object such as a contact welded on a leaf spring in respect of geometrical and qualitative factors comprises an image pick-up device such as TV camera for detecting an optical image of the contact and the leaf spring having a dark portion along the contour of the contact and converting the optical image into corresponding video signals which are then compared with a predetermined threshold level to be converted into a binary encoded signal having two logic levels corresponding, respectively, to bright and dark portions of the optical image. Frequency distributions of the binary signal representing the dark portion are determined along two orthogonal directions thereby to define a coordinate of a region in which the contact is located. A first checking device is provided to determine if the above coordinate is located in a preset allowable tolerance range. A second checking device is additionally provided which serves to define a frame of a size differed from that of the contact in dependence on the coordinate thereby dividing the area within the frame into a predetermined number of picture elements in a matrix array, whereby faults of the contact such as injury, welding dust or deformation are detected in dependence upon a predetermined combination of the picture element signals representing the dark portions of the optical image.
    • 用于检查诸如接触焊接在板簧上的物体的几何和定性因素的装置包括用于检测接触的光学图像的电视摄像机等图像拾取装置和具有暗部分的板簧 接触的轮廓并将光学图像转换成相应的视频信号,然后将其与预定的阈值电平进行比较,以转换成具有两个逻辑电平的二进制编码信号,该逻辑电平分别对应于光学图像的明暗部分。 根据两个正交方向确定表示暗部分的二进制信号的频率分布,从而定义接触位置的区域的坐标。 提供第一检查装置以确定上述坐标是否位于预设的允许公差范围内。 另外提供另外提供的第二检查装置,其用于根据坐标定义与触点的尺寸不同的尺寸的框架,从而将框架内的区域划分成矩阵阵列中的预定数量的图像元素,由此, 根据表示光学图像的暗部的像素信号的预定组合来检测诸如伤害,焊接灰尘或变形的接触。