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1. 发明授权

US4614427A Automatic contaminants detection apparatus 失效
标题翻译：自动污染物检测装置
公开(公告)号：US4614427A
公开(公告)日：1986-09-30
申请号：US611947
申请日：1984-05-18
申请人： Mitsuyoshi Koizumi , Yoshimasa Oshima , Nobuyuki Akiyama , Toshiaki Yachi
发明人： Mitsuyoshi Koizumi , Yoshimasa Oshima , Nobuyuki Akiyama , Toshiaki Yachi
IPC分类号： G01N21/88 , G01B11/30 , G01N21/21 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66
CPC分类号： G01N21/94 , G01N21/21 , G01N21/956
摘要： An automatic contaminants detection apparatus comprises a polarized laser beam source, a polarized laser beam irradiation optical system having irradiation angle switching means for switching an irradiation angle depending on the presence or absence of a pattern on a sample surface to irradiate the polarized laser beam emitted by the polarized laser beam source to the sample surface with an angle of grazing, a detector for detecting condensed scattered or reflected lights of the laser beam from the sample surface with or without interleave of an analyzer, and analyzer switching means for inserting or removing the analyzer into or from a detection light path of the detector depending on the presence or absence of the pattern on the sample surface. The apparatus can detect contaminants on the patterned or non-patterned sample surface with a high sensitivity.
摘要翻译：一种自动污染物检测装置，包括：偏振激光束源，具有照射角度切换装置的偏光激光束照射光学系统，用于根据样品表面上有无图案切换照射角度，照射由将偏振激光束源以放牧角度放置到样品表面，用于检测来自样品表面的来自样品表面的聚集的散射或反射光的检测器，具有或不具有分析仪的交错;以及分析器切换装置，用于插入或移除分析器取决于样品表面上图案的存在或不存在，进入或离开检测器的检测光路。该装置可以以高灵敏度检测图案化或非图案化样品表面上的污染物。

2. 发明授权

US5046847A Method for detecting foreign matter and device for realizing same 失效
标题翻译：异物检测方法及其实现方法
公开(公告)号：US5046847A
公开(公告)日：1991-09-10
申请号：US262573
申请日：1988-10-25
申请人： Toshihiko Nakata , Nobuyuki Akiyama , Yoshihiko Yamuchi , Mitsuyoshi Koizumi , Yoshimasa Oshima
发明人： Toshihiko Nakata , Nobuyuki Akiyama , Yoshihiko Yamuchi , Mitsuyoshi Koizumi , Yoshimasa Oshima
IPC分类号： G01N21/21 , G01N21/94 , G03F9/00
CPC分类号： G03F9/70 , G01N21/94 , G01N21/95623 , G01N2021/473 , G01N21/21
摘要： A method and apparatus for detecting foreign matter on a sample by illuminating a stripe-shaped region with linearly polarized light. Some of the light reflected by the sample is intercepted by a light intercepting stage, and the rest of the light reflected by the sample, which passes through the light intercepting stage is directed to a detecting optical system, to be detected by a photo-detector. The sample is illuminated obliquely at a predetermined angle with respect to a group of straight lines constituting a primary pattern on the sample. The angle is selected so that the diffraction light reflected by the group of straight lines does not enter the detecting optical system. A polarizing spatial filter using a liquid crystal element may be disposed in a predetermined restricted region in a spacial frequency region, or Fourier transformation plane, within the detecting optical system. The light scattered by the sample may further be separated in the detecting optical system into partial beams having different wave orientation characteristics, which characteristics are detected by a number of one-dimensional solid state imaging elements. The signals are processed by a driver, adder, and quantizer in synchronism with the one-dimensional solid state imaging elements.
摘要翻译：一种通过用线性偏振光照射条形区域来检测样品上的异物的方法和装置。由样品反射的一些光被遮光阶段遮挡，并且通过遮光台的由样品反射的其余光指向检测光学系统，由光检测器检测。样品相对于构成样品上的主要图案的一组直线以预定角度倾斜照射。选择该角度使得由直线组反射的衍射光不进入检测光学系统。使用液晶元件的偏振空间滤光片可以设置在检测光学系统内的空间频率区域或傅立叶变换平面的预定限制区域中。由样本散射的光可以在检测光学系统中进一步分离成具有不同波取向特性的部分光束，该特征由多个一维固态成像元件检测。信号由驱动器，加法器和量化器与一维固态成像元件同步处理。

3. 发明授权

US4423331A Method and apparatus for inspecting specimen surface 失效
标题翻译：检测样品表面的方法和装置
公开(公告)号：US4423331A
公开(公告)日：1983-12-27
申请号：US242483
申请日：1981-03-11
申请人： Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yoshimasa Oshima
发明人： Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yoshimasa Oshima
IPC分类号： G01B11/30 , G01N21/88 , G01N21/95 , G11B5/84
CPC分类号： G01N21/88
摘要： A method and apparatus of inspecting a surface of a specimen for the presence of defects, foreign substance and the like are disclosed. The surface has a mark such as a cutting mark formed thereon and composed of fine grooves or recesses extending in a predetermined direction. The surface is scanned two-dimensionally with an irradiating laser beam impinging or illuminating on the specimen surface perpendicularly thereto. Those of the irregularly scattered laser light rays reflected from the specimen surface which are in a first direction perpendicular to the lengthwise direction of the mark are intercepted by a shielding member or caused to pass through regions other than a reflecting region of a reflecting mirror, while those scattered light rays which are in other directions than the first direction are directed to a photoelectric converter tube along a bypass path across the shielding member or through reflection of the mirror. A picture signal derived from the output of the photoelectric converter tube is digitalized into binary picture element signals by a sampling and binary encoding circuit, the resulting signals being then stored in a two-dimensional memory. The presence and forms of defects, foreign substances and the like on the specimen surface are discriminatively determined in dependence on particular combinations of the binary picture element signals stored in the memory.
摘要翻译：公开了一种检查样品表面存在缺陷，异物等的方法和装置。该表面具有形成在其上的切割标记和由沿预定方向延伸的细小凹槽或凹部组成的标记。使用照射激光束在垂直于其的样品表面上照射或照射二维地扫描该表面。从与标记的长度方向垂直的第一方向从试样表面反射的不规则散射的激光光线被屏蔽部件遮断，或者通过反射镜的反射区域以外的区域，同时沿着除了第一方向以外的方向的那些散射光线沿着穿过屏蔽部件的旁通路径或者通过反射镜的反射被引导到光电转换管。从光电转换管的输出得到的图像信号由采样和二进制编码电路数字化成二进制像素信号，然后将所得到的信号存储在二维存储器中。根据存储在存储器中的二进制像素信号的特定组合，鉴别地确定样本表面上的缺陷，异物等的存在和形式。

4. 发明授权

US4541715A Apparatus for detecting contaminants on the reticle of exposure system 失效
标题翻译：用于检测曝光系统的掩模版上的污染物的装置
公开(公告)号：US4541715A
公开(公告)日：1985-09-17
申请号：US456296
申请日：1983-01-06
申请人： Nobuyuki Akiyama , Mitsuyoshi Koizumi
发明人： Nobuyuki Akiyama , Mitsuyoshi Koizumi
IPC分类号： G01N21/88 , G01N21/47 , G01N21/94 , G01N21/956 , G03F7/20 , H01L21/027 , H01L21/66 , G01N21/00
CPC分类号： G03F7/70866 , G01N21/94 , G03F7/70916 , G01N21/47 , G01N2201/1085
摘要： An apparatus for detecting contaminants depositing on the reticle of a reduction projection mask aligner comprises a laser spot projector which conducts a laser beam to the light path upstream of the condenser lens of the aligner such that the laser beam is in the same direction as of the exposure light beam. The laser spot projector projects the laser beam from above the reticle through the condenser lens so as to form a laser spot on the upper surface of the reticle. A laser spot scanner which scans the entire area of the reticle by the laser spot projected on to the reticle by the laser spot projector, and a photoelectric detector which receives the scattered light emitted aslant on the reticle surface, whereby a contaminant on the reticle is detected in accordance with the signal produced by the detector.
摘要翻译：用于检测沉积在掩模版上的污染物的还原投影掩模对准器的装置包括：激光点投影仪，其将激光束传导到对准器的聚光透镜上游的光路，使得激光束处于与曝光光束。激光点投影仪将激光束从光罩上方投射聚光透镜，以在掩模版的上表面上形成激光斑点。一种激光点扫描器，其通过由激光点投影仪投射在掩模版上的激光光斑扫描掩模版的整个区域，以及光电检测器，其接收在光罩表面上倾斜发射的散射光，由此掩模版上的污染物为根据由检测器产生的信号检测。

5. 发明授权

US4460273A Test apparatus for defects of plate 失效
标题翻译：板材缺陷试验装置
公开(公告)号：US4460273A
公开(公告)日：1984-07-17
申请号：US309485
申请日：1981-10-07
申请人： Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yoshimasa Ohshima
发明人： Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yoshimasa Ohshima
IPC分类号： G01N21/88 , G01N21/89 , G01N21/94 , G01N21/956 , G01N21/958
CPC分类号： G01N21/89 , G01N21/88
摘要： A test apparatus for detecting defects on a plate is disclosed. An illumination light is focused to one surface of the plate and another illumination light is focused to the other surface of the plate, and scattered light from the defects on the surfaces are detected to separately detect the defects on the front and rear surfaces of the plate.
摘要翻译：公开了一种用于检测板上的缺陷的测试装置。照明光聚焦到板的一个表面，另一个照明光聚焦到板的另一个表面，并且检测来自表面上的缺陷的散射光以分别检测板的前表面和后表面上的缺陷。

6. 发明授权

US4433235A Focusing position detecting device in optical magnifying and observing apparatus 失效
标题翻译：聚焦位置检测装置在光学放大和观察装置中
公开(公告)号：US4433235A
公开(公告)日：1984-02-21
申请号：US310240
申请日：1981-10-09
申请人： Nobuyuki Akiyama , Yoshimasa Ohshima , Mitsuyoshi Koizumi
发明人： Nobuyuki Akiyama , Yoshimasa Ohshima , Mitsuyoshi Koizumi
IPC分类号： G02B21/24 , G01J1/20 , G01J1/32
CPC分类号： G02B21/245
摘要： A focusing position detecting device in which a laser beam is directed through an objective lens toward the surface of an object to form a minute spot on the surface of the object, and the beam reflected from the surface of the object is led through the objective lens again toward a concentrating point, so as to detect the focusing position of the objective lens by measuring the position of the concentrating point. In the device, a photoelectric element is provided to detect the intensity of the reflected beam, and the intensity of the laser beam is so controlled that the output of the photoelectric element is maintained constant.
摘要翻译：一种聚焦位置检测装置，其中激光束被引导通过物镜朝向物体的表面，以在物体的表面上形成微小的点，并且从物体的表面反射的光束被引导通过物镜再次朝向集中点，以便通过测量集中点的位置来检测物镜的聚焦位置。在该装置中，设置光电元件以检测反射光束的强度，并且控制激光束的强度使得光电元件的输出保持恒定。

7. 发明授权

US5098191A Method of inspecting reticles and apparatus therefor 失效
标题翻译：检查掩模版及其设备的方法
公开(公告)号：US5098191A
公开(公告)日：1992-03-24
申请号：US424196
申请日：1989-10-19
申请人： Minori Noguchi , Hiroaki Shishido , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Toshihilo Nakata
发明人： Minori Noguchi , Hiroaki Shishido , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Toshihilo Nakata
IPC分类号： G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , G03F1/00 , H01L21/027 , H01L21/30 , H01L21/66
CPC分类号： G03F1/84 , G01N21/95607 , G01N21/95623 , G01N2021/95676 , G01N21/94
摘要： Method of inspecting reticles and an apparatus therefor, where means for holding and transferring an inspected reticle and a standard reticle respectively, means for illuminating light with spatial coherency adjusted onto both reticles respectively, and an objective lens for collecting transmitted light or reflected light from the illuminated body produced by the illuminating, are installed on respective Fourier transformation surfaces of both reticle surfaces, and a light blocking plate for blocking light corresponding to the adjusted spatial coherency is installed, and electric signals obtained are compared thereby a defect or a foreign substance existing on the inspected reticle can be detected.
摘要翻译：检测掩模版的方法及其装置，分别用于保持和传送被检查的掩模版和标准掩模版的装置，用于分别照射调节到两个光罩上的空间一致性的光，以及用于收集透射光或反射光的物镜通过照明产生的照明体安装在两个标线片表面的相应的傅立叶变换表面上，并且安装用于阻挡与调整的空间相干性相对应的光的遮光板，并且比较所获得的电信号，从而存在缺陷或异物可以检测到被检查的掩模版。

8. 发明授权

US4504045A Wafer transforming device 失效
标题翻译：晶圆转换装置
公开(公告)号：US4504045A
公开(公告)日：1985-03-12
申请号：US434397
申请日：1982-10-14
申请人： Yukio Kenbo , Nobuyuki Akiyama , Mitsuyoshi Koizumi , Asahiro Kuni
发明人： Yukio Kenbo , Nobuyuki Akiyama , Mitsuyoshi Koizumi , Asahiro Kuni
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30 , H01L21/673 , H05K3/00 , B25B11/00
CPC分类号： G03F7/707 , H01L21/30
摘要： A wafer transforming device defines an airtight space by means of a base, a hollow case, and a diaphragm type chuck which is fixed to the upper end of the case by suction. In this space, a large number of vertically moving elements are arranged at predetermined intervals. In the state in which a wafer is held by suction by means of the chuck and in which the chuck is held in contact with the upper ends of the vertically moving elements by supplying a vacuum pressure into the space, the vertically moving elements located within a required range are selectively actuated. Thus, the chuck is pushed up, and the wafer held on the chuck by the suction is transformed into a desired state.
摘要翻译：晶片转换装置通过基座，中空壳体和隔膜式卡盘来限定气密空间，其通过抽吸固定到壳体的上端。在该空间中，大量的垂直移动元件以预定的间隔布置。在通过卡盘吸附保持晶片的状态下，通过向该空间内供给真空压力使卡盘与垂直移动的元件的上端保持接触的状态下，位于所需范围被选择性地启动。因此，卡盘被向上推动，并且通过抽吸将保持在卡盘上的晶片转变成期望的状态。

9. 发明授权

US4475223A Exposure process and system 失效
标题翻译：曝光过程和系统
公开(公告)号：US4475223A
公开(公告)日：1984-10-02
申请号：US387206
申请日：1982-06-10
申请人： Motoya Taniguchi , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yukio Kembo , Minoru Ikeda
发明人： Motoya Taniguchi , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yukio Kembo , Minoru Ikeda
IPC分类号： H01L21/027 , G03B27/02 , G03F7/20 , G03F7/207 , G03F9/00 , G03F9/02 , G21K5/00
CPC分类号： G03F7/707 , G03F7/20 , G03F7/703 , G03F9/703 , G03F9/7034
摘要： An X ray exposure process and system for transferring a mask pattern onto a wafer with use of X rays, wherein heights on the mask at many points are measured on a light interference band basis by a mask-height measuring device of non-contact measurement type at an X ray exposure position, the mask being mounted on a chamber which is filled with a He gas and or the like to prevent attenuation of an X ray source, heights on the wafer at many points are measured at a wafer-height measuring position different from said exposure position, and according to the measured results, the wafer is finely moved upwardly or downwardly (that is, deformed) individually independently by means of a chuck which sucks and holds the wafer at many points thereon so that, a gap between the mask and wafer is adjusted to a desired level.
摘要翻译： X射线曝光处理和系统，用于使用X射线将掩模图案转印到晶片上，其中通过非接触测量型的掩模高度测量装置在光干涉条带下测量许多点上的掩模上的高度在X射线曝光位置，掩模被安装在填充有He气体等的室中以防止X射线源的衰减，在晶片高度测量位置处测量许多点上的晶片上的高度与所述曝光位置不同，并且根据测量结果，通过在其上的许多点吸附并保持晶片的卡盘，晶片被独立地独立地向上或向下（即变形）精细地移动，使得晶片之间的间隙掩模和晶片被调节到期望的水平。

10. 发明申请

US20100103397A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE 审中-公开
标题翻译：曝光装置，曝光方法和制造显示面板基板的方法
公开(公告)号：US20100103397A1
公开(公告)日：2010-04-29
申请号：US12540879
申请日：2009-08-13
申请人： Ryouji Nemoto , Tomoaki Hayashi , Satoshi Uehara , Mitsuyoshi Koizumi
发明人： Ryouji Nemoto , Tomoaki Hayashi , Satoshi Uehara , Mitsuyoshi Koizumi
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03B27/32 , G03F7/70275
摘要： A position of a chuck 10 is detected. The movements of the stages 5 and 7 are controlled according to a result of detecting the position of the chuck 10, so as to position the chuck 10. Further, a light receiving means 51 is disposed on the chuck 10 for receiving a light beam irradiated from a head 20a of a light beam irradiation device 20. The misalignment of the head 20a of the light beam irradiation device 20 is detected based on the received light beam. According to a result of detecting the misalignment, a coordinate of drawing data supplied to a DMD driving circuit 27 of each light beam irradiation device 20 is modified. Moreover, the drawing data with the modified coordinate is supplied to the DMD driving circuit 27 of each light beam irradiation device 20.
摘要翻译：检测卡盘10的位置。根据检测卡盘10的位置的结果来控制级5和7的运动，以便定位卡盘10.此外，光盘接收装置51设置在卡盘10上以接收照射的光束来自光束照射装置20的头部20a。基于所接收的光束来检测光束照射装置20的头部20a的未对准。根据检测到未对准的结果，修改提供给每个光束照射装置20的DMD驱动电路27的绘图数据的坐标。此外，具有改变的坐标的绘制数据被提供给每个光束照射装置20的DMD驱动电路27。

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