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41. 发明授权

US07592106B2 Halftone type phase shift mask blank and phase shift mask thereof 有权
标题翻译：半色调型相移掩模空白及其相移掩模
公开(公告)号：US07592106B2
公开(公告)日：2009-09-22
申请号：US11562217
申请日：2006-11-21
申请人： Yuuki Shiota , Osamu Nozawa , Hideaki Mitsui
发明人： Yuuki Shiota , Osamu Nozawa , Hideaki Mitsui
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F1/32 , G03F1/84
摘要： A halftone type phase shift mask blank including, on a transparent substrate, at least a phase shifter film having a predetermined transmittance for an exposed light and a predetermined phase difference for the transparent substrate, wherein the phase shifter film is formed by a multilayer film in which films including at least two layers having an upper layer formed on the most surface side and a lower layer formed thereunder are provided, and a thickness of the upper layer is adjusted in such a manner that a refractive index of the film to be the upper layer is smaller than that of the film to be the lower layer and a surface reflectance for the inspecting light of the phase shifter film is maximized and approximates to a maximum.
摘要翻译：一种半透明型相移掩模坯料，在透明基板上具有至少一透明基板具有预定透射率的移相膜和对于该透明基板的预定相位差，其中该移相膜由多层膜形成提供包括至少两层具有形成在最表面侧的上层和下面形成的下层的膜，并且以使膜的折射率成为上层的方式调节上层的厚度层比作为下层的膜小，并且移相膜的检查光的表面反射率最大化并近似为最大。

42. 发明申请

US20090214961A1 PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME 有权
标题翻译： PHOTOMASK BLANK，PHOTOMASK及其制造方法
公开(公告)号：US20090214961A1
公开(公告)日：2009-08-27
申请号：US12394503
申请日：2009-02-27
申请人： Osamu Nozawa
发明人： Osamu Nozawa
IPC分类号： G03F1/00
CPC分类号： G03F1/58 , G03F1/46
摘要： A photomask blank has a light-shielding film composed of at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and further containing xenon and a front-surface antireflection layer formed on the light-shielding layer and made of a material mainly containing tantalum oxide and further containing argon.
摘要翻译：光掩模坯料具有在透明基板上由至少两层构成的遮光膜。遮光膜包括由主要含有氮化钽的材料制成并且还包含氙的遮光层和形成在遮光层上并由主要包含氧化钽并进一步含有氩的材料制成的前表面抗反射层。

43. 发明申请

US20080206655A1 MASK BLANK, METHOD OF MANUFACTURING AN EXPOSURE MASK, AND METHOD OF MANUFACTURING AN IMPRINT TEMPLATE 有权
标题翻译：掩模布，制造曝光掩模的方法和制造印模的方法
公开(公告)号：US20080206655A1
公开(公告)日：2008-08-28
申请号：US12038826
申请日：2008-02-28
申请人： Osamu Nozawa , Mitsuhiro Kureishi
发明人： Osamu Nozawa , Mitsuhiro Kureishi
IPC分类号： G03F1/14
CPC分类号： G03F1/30 , B82Y10/00 , B82Y40/00 , G03F1/32 , G03F1/54 , G03F1/58 , G03F1/80 , G03F7/0002
摘要： A mask blank includes a substrate and a thin film formed thereon and used to form a pattern. The mask blank is adapted to be subjected to dry etching corresponding to a method of producing an exposure mask by patterning the thin film by dry etching using an etching gas substantially free from oxygen with a resist pattern formed on the thin film used as a mask. The thin film has a protective layer formed at least at its upper layer and containing 60 atomic % or more oxygen. For example, the dry etching is performed by the use of a chlorine-based gas substantially free from oxygen.
摘要翻译：掩模坯料包括基板和形成在其上的薄膜并用于形成图案。通过使用基本上不含氧的蚀刻气体通过干蚀刻对薄膜进行图案化，对掩膜坯料进行干蚀刻，形成在用作掩模的薄膜上的抗蚀剂图案。薄膜具有至少在其上层形成且含有60原子％以上的氧的保护层。例如，通过使用基本上不含氧的氯系气体进行干蚀刻。

44. 发明申请

US20070092808A1 HALFTONE TYPE PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK THEREOF 有权
标题翻译： HALFTONE类型相移屏蔽区和相位移屏蔽
公开(公告)号：US20070092808A1
公开(公告)日：2007-04-26
申请号：US11562217
申请日：2006-11-21
申请人： Yuuki Shiota , Osamu Nozawa , Hideaki Mitsui
发明人： Yuuki Shiota , Osamu Nozawa , Hideaki Mitsui
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/32 , G03F1/84
摘要： A halftone type phase shift mask blank including, on a transparent substrate, at least a phase shifter film having a predetermined transmittance for an exposed light and a predetermined phase difference for the transparent substrate, wherein the phase shifter film is formed by a multilayer film in which films including at least two layers having an upper layer formed on the most surface side and a lower layer formed thereunder are provided, and a thickness of the upper layer is adjusted in such a manner that a refractive index of the film to be the upper layer is smaller than that of the film to be the lower layer and a surface reflectance for the inspecting light of the phase shifter film is maximized and approximates to a maximum.
摘要翻译：一种半透明型相移掩模坯料，在透明基板上具有至少一透明基板具有预定透射率的移相膜和对于该透明基板的预定相位差，其中该移相膜由多层膜形成提供包括至少两层具有形成在最表面侧的上层和下面形成的下层的膜，并且以使膜的折射率成为上层的方式调节上层的厚度层比作为下层的膜小，并且移相膜的检查光的表面反射率最大化并近似为最大。

45. 发明授权

US06783634B2 Manufacturing method and apparatus of phase shift mask blank 有权
标题翻译：相移掩模空白的制造方法和装置
公开(公告)号：US06783634B2
公开(公告)日：2004-08-31
申请号：US09952445
申请日：2001-09-12
申请人： Osamu Nozawa , Hideaki Mitsui
发明人： Osamu Nozawa , Hideaki Mitsui
IPC分类号： C23C1434
CPC分类号： G03F1/32 , C23C14/0036 , C23C14/0641 , C23C14/225 , C23C14/505 , G03F1/26 , G03F1/68
摘要： There is disclosed a manufacturing method of a phase shift mask blank in which dispersions of phase angle and transmittance among blanks can be reduced as much as possible and yield is satisfactory. In the manufacturing method of the phase shift mask blank, a process of using a sputtering method to continuously form a thin film on a transparent substrate comprises: successively subjecting a plurality of substrates to a series of process of supplying the transparent substrate into a sputtering chamber, forming the thin film for forming a pattern in the sputtering chamber, and discharging the transparent substrate with the film formed thereon from the sputtering chamber; supplying and discharging the transparent substrate substantially at a constant interval; and setting a film formation time to be constant among a plurality of blanks.
摘要翻译：公开了一种相移掩模坯料的制造方法，其中可以尽可能地减少坯料之间的相位角和透射率的分散，并且产率令人满意。在相移掩模空白的制造方法中，使用溅射法在透明基板上连续地形成薄膜的工艺包括：依次对多个基板进行一系列将透明基板供应到溅射室在溅射室中形成用于形成图案的薄膜，并且从其上形成的膜从溅射室排出透明基板; 基本上以一定间隔供给和排出透明基板; 并且在多个坯料中将成膜时间设定为恒定。

46. 发明授权

US06287429B1 Magnetic recording medium having an improved magnetic characteristic 有权
标题翻译：具有改善的磁特性的磁记录介质
公开(公告)号：US06287429B1
公开(公告)日：2001-09-11
申请号：US09312162
申请日：1999-05-14
申请人： Keiji Moroishi , Junichi Horikawa , Masato Kobayashi , Osamu Nozawa
发明人： Keiji Moroishi , Junichi Horikawa , Masato Kobayashi , Osamu Nozawa
IPC分类号： C23C1434
CPC分类号： C23C14/3414
摘要： A magnetic recording medium comprises a non-magnetic substrate having a principal surface, an intermediate layer formed on the principal surface, and a magnetic layer formed on the intermediate layer. The intermediate layer comprises an intermediate material composed of chromium and molybdenum. The magnetic layer comprises a magnetic material composed of cobalt and platinum. The intermediate layer may comprise first and second layers. The first layer comprises a first material composed of chromium and is formed on the principal surface. The second layer comprises a second material composed of chromium and molybdenum and is formed on the first layer.
摘要翻译：磁记录介质包括具有主表面的非磁性基底，在主表面上形成的中间层和形成在中间层上的磁性层。中间层包括由铬和钼组成的中间材料。磁性层包括由钴和铂组成的磁性材料。中间层可以包括第一层和第二层。第一层包括由铬构成的第一材料并形成在主表面上。第二层包括由铬和钼组成的第二材料，并形成在第一层上。

47. 发明授权

US6087047A Phase shift mask and phase shift mask blank 失效
标题翻译：相移掩模和相移掩模空白
公开(公告)号：US6087047A
公开(公告)日：2000-07-11
申请号：US153027
申请日：1998-09-15
申请人： Hideaki Mitsui , Osamu Nozawa , Megumi Takeuchi
发明人： Hideaki Mitsui , Osamu Nozawa , Megumi Takeuchi
IPC分类号： G03F1/32 , G03F1/68 , H01L21/027 , G03F9/00
CPC分类号： G03F1/32
摘要： In a half-tone type phase shift mask blank in which a semi-transparent film is formed on a transparent substrate, and the semi-transparent film serves to shift phase of a first optical light beam which transmits the semi-transparent film for a second optical light beam which directly transmits the transparent substrate and further, serves to reduce strength of the first optical light beam, the semi-transparent film includes silicon and nickel, and at least one selected from the group consisting of nitrogen, oxygen and hydrogen, and the relationship between the silicon and the nickel is specified by a formula in which a rate of [atom % of the nickel in the film] for [atom % of the nickel in the film+atom % of the silicon in the film] falls within the range between 0.15 and 0.5.
摘要翻译：在透明基板上形成半透明膜的半色调型相移掩模坯料中，半透明膜用于将透过半透明膜的第一光束的相位偏移一秒直接透过透明基板的光束，进一步降低第一光束的强度，半透明膜包括硅和镍，以及选自氮，氧和氢的至少一种，以及硅和镍之间的关系由以下公式确定：其中[膜中的镍原子％的原子％的原子％与膜中的硅的原子％的比率]落入其中范围在0.15和0.5之间。

48. 发明授权

US5968679A Magnetic recording medium and method of manufacturing the same 失效
标题翻译：磁记录介质及其制造方法
公开(公告)号：US5968679A
公开(公告)日：1999-10-19
申请号：US758015
申请日：1996-11-27
申请人： Masato Kobayashi , Keiji Moroishi , Jun-ichi Horikawa , Osamu Nozawa
发明人： Masato Kobayashi , Keiji Moroishi , Jun-ichi Horikawa , Osamu Nozawa
IPC分类号： G11B5/64 , G11B5/66 , G11B5/73
CPC分类号： G11B5/7325 , G11B5/64 , G11B5/656 , G11B5/66 , Y10T428/26 , Y10T428/265
摘要： In a magnetic recording medium having an underlying film of a body-centered-cubic (bcc) CrV-based alloy and a magnetic film of a hexagonal close-packed (hcp) CoPtCr-based alloy deposited on the underlying film, a difference between a crystal lattice plane distance d.sub.(002) of (002) planes in the hcp alloy of the magnetic film and another crystal lattice plane distance d.sub.(110) of (110) planes in the bcc alloy of the nonmagnetic film is given by subtracting d.sub.(110) from d.sub.(002) and falls within a range between 0.002 and 0.032 angstrom. Preferably, the difference d.sub.(002) -d.sub.(110) is present between 0.014 and 0.030 angstrom only a single pair of the underlying film and the magnetic film may be included in the magnetic recording medium or plural pairs of the underlying film and the magnetic film may be included in the magnetic recording medium.
摘要翻译：在具有体心立方（bcc）CrV基合金的基底膜和沉积在基底膜上的六方密堆积（hcp）CoPtCr基合金的磁性膜的磁记录介质中，磁性薄膜的hcp合金中的（002）面的晶格平面距离d（002）和非磁性膜的bcc合金中的（110）面的另一个晶格面距离d（110）给出是减去d（ 110），并且落在0.002和0.032埃之间的范围内。优选地，差d（002）-d（110）仅存在于0.014和0.030埃之间，只有一对下面的膜，并且磁膜可以包括在磁记录介质中或多对下面的膜和磁性膜可以包括在磁记录介质中。

49. 发明授权

US5954927A Method of manufacturing magnetic recording medium 失效
标题翻译：磁记录介质的制造方法
公开(公告)号：US5954927A
公开(公告)日：1999-09-21
申请号：US917112
申请日：1997-08-25
申请人： Masato Kobayashi , Osamu Nozawa , Hisao Kawai , Keiji Moroishi , Takashi Sato , Junichi Horikawa
发明人： Masato Kobayashi , Osamu Nozawa , Hisao Kawai , Keiji Moroishi , Takashi Sato , Junichi Horikawa
IPC分类号： G11B5/66 , G11B5/73 , G11B5/851 , C23C14/34
CPC分类号： G11B5/7325 , G11B5/66 , G11B5/851
摘要： A method of manufacturing a magnetic recording medium by using an in-line sputtering apparatus to successively form, on a substrate, at least one underlying layer, a first magnetic CoPt-based film, a nonmagnetic intermediate film, and a second magnetic CoPt-based film. The underlying film and/or the nonmagnetic film, which are in contact with the first magnetic film, are deposited at a low sputtering power between 100 and 1000 watts to improve the magnetic properties of the magnetic recording medium. Low power sputtering is also effective to improve the distribution of difference of the crystal lattice spacings between the nonmagnetic intermediate film and the first magnetic film and between the underlying layer and the first magnetic film.
摘要翻译：一种使用在线溅射装置制造磁记录介质的方法，在衬底上依次形成至少一个下层，第一磁性CoPt基膜，非磁性中间膜和第二磁性CoPt基电影。与第一磁性膜接触的下面的薄膜和/或非磁性薄膜以低至1000瓦特的低溅射功率沉积，以提高磁记录介质的磁特性。低功率溅射对于改善非磁性中间膜和第一磁性膜之间以及下层和第一磁性膜之间的晶格间距的差异的分布也是有效的。

50. 发明授权

US5824427A Magnetic recording media and methods for producing the same 失效
标题翻译：磁记录介质及其制造方法
公开(公告)号：US5824427A
公开(公告)日：1998-10-20
申请号：US673754
申请日：1996-06-27
申请人： Masato Kobayashi , Keiji Moroishi , Jun-ichi Horikawa , Osamu Nozawa
发明人： Masato Kobayashi , Keiji Moroishi , Jun-ichi Horikawa , Osamu Nozawa
IPC分类号： G11B5/66 , G11B5/64 , G11B5/65 , G11B5/73 , G11B5/738 , G11B5/85 , G11B5/851 , H01F10/16 , H01F10/18 , H01F10/30 , C23C14/34 , G11B5/62
CPC分类号： G11B5/7325 , G11B5/656
摘要： A magnetic recording medium comprising a non-magnetic underlayer and a CoPt magnetic layer provided on a substrate in this order wherein the non-magnetic underlayer comprises one or more non-magnetic layers, one of the non-magnetic layers which is in contact with the CoPt magnetic layer consists mainly of Cr and Mo, and difference (d.sub.(002) -d.sub.(110)) obtained by subtracting a crystalline lattice spacing of bcc (110) faces in the non-magnetic layer consisting mainly of Cr and Mo from a crystalline lattice spacing of hcp (002) faces in the magnetic layer falls within a range of from 0.002 to 0.032 .ANG., which shows a high magnetic coercive force and square ratio and a low medium noise, and a method for producing the magnetic recording medium mentioned above wherein at least the non-magnetic layer consisting mainly of Cr and Mo and the CoPt magnetic layer are formed by a sputtering technique using a substrate heating temperature within a range of 250.degree. to 425.degree. C. and an Ar gas pressure within a range of 0.5 to 10 mTorr.
摘要翻译：一种包括非磁性底层和设置在基板上的CoPt磁性层的磁记录介质，其中非磁性底层包括一个或多个非磁性层，与非磁性层接触的非磁性层之一 CoPt磁性层主要由Cr和Mo组成，并且通过从主要由Cr和Mo组成的非磁性层中减去bcc（110）面的晶格间距而得到的差（d（002）-d（110））磁性层中的hcp（002）面的晶格间距在0.002〜0.032的范围内，具有高的矫顽力和平方比以及低的中等噪音，以及提供的磁记录介质的制造方法其中至少主要由Cr和Mo组成的非磁性层和CoPt磁性层通过使用基板加热温度在250°至425℃范围内的溅射技术形成，并且Ar气体压制在0.5至10 mTorr的范围内。

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