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41. 发明申请

US20080290472A1 SEMICONDUCTOR INTERLAYER-INSULATING FILM FORMING COMPOSITION, PREPARATION METHOD THEREOF, FILM FORMING METHOD, AND SEMICONDUCTOR DEVICE 审中-公开
标题翻译：半导体层间绝缘膜形成组合物，其制备方法，膜形成方法和半导体器件
公开(公告)号：US20080290472A1
公开(公告)日：2008-11-27
申请号：US12029562
申请日：2008-02-12
申请人： Fujio Yagihashi , Yoshitaka Hamada , Takeshi Asano , Tsutomu Ogihara , Motoaki Iwabuchi , Hideo Nakagawa , Masaru Sasago
发明人： Fujio Yagihashi , Yoshitaka Hamada , Takeshi Asano , Tsutomu Ogihara , Motoaki Iwabuchi , Hideo Nakagawa , Masaru Sasago
IPC分类号： H01L23/58 , C08K3/34 , C08K3/36 , B32B5/18 , H01L21/312
CPC分类号： H01L21/31695 , C08G77/16 , C08G77/70 , C08G77/80 , C08K3/36 , C08L83/04 , C09D183/04 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/3122 , H01L21/7682 , H01L2221/1047 , Y10T428/249953 , C08L83/00
摘要： Provided is a porous-film-forming composition containing silicon-oxide-based fine particles and a polysiloxane compound obtained by hydrolysis and condensation reactions, in the presence of an acid catalyst, of a hydrolyzable silane compound containing at least one tetrafunctional alkoxysilane compound represented by the following formula (1): Si(OR1)4 (1) wherein, R1s may be the same or different and each independently represents a linear or branched C1-4 alkyl group and/or at least one alkoxysilane compound represented by the following formula (2): R2nSi(OR3)4-n (2) wherein, R2(s) may be the same or different when there are plural R2s and each independently represents a linear or branched C1-8 alkyl group, R3(s) may be the same or different when there are plural R3s and each independently represents a linear or branched C1-4 alkyl group, and n is an integer from 1 to 3 in the reaction mixture containing a large excess of water.
摘要翻译：本发明提供一种多孔膜形成用组合物，其含有氧化硅系微粒和通过水解缩合反应得到的聚硅氧烷化合物，在酸催化剂的存在下，含有至少一种四官能性烷氧基硅烷化合物的水解性硅烷化合物以下公式（1）：<？in-line-formula description =“In-line formula”end =“lead”？> Si（OR1）4（1）<？in-line-formula description =“In-line 式中，R 1可以相同或不同，各自独立地表示直链或支链C 1-4烷基和/或由下式（2）表示的至少一种烷氧基硅烷化合物： in-line-formula description =“In-line Formulas”end =“lead”？> R2nSi（OR3）4-n（2）<？in-line-formula description =“In-line Formulas”end =“tail” 其中，当有多个R 2并且各自独立地表示直链或支链的C 1-8烷基时，R 2（s）可以相同或不同，R 3（s）可以相同或不同当存在多个R 3并且各自独立地表示直链或支链C 1-4烷基时，并且n是含有大量过量水的反应混合物中n是1至3的整数。

42. 发明申请

US20080248280A1 Process for Preparing a Dispersion Liquid of Zeolite Fine Particles 有权
标题翻译：沸石微粒分散液的制备方法
公开(公告)号：US20080248280A1
公开(公告)日：2008-10-09
申请号：US12060291
申请日：2008-04-01
申请人： Yoshitaka Hamada , Masaru Sasago , Hideo Nakagawa , Yasunori Morinaga
发明人： Yoshitaka Hamada , Masaru Sasago , Hideo Nakagawa , Yasunori Morinaga
IPC分类号： B32B3/26 , C09K17/40 , H01L21/3105 , B05D3/02
CPC分类号： H01L21/31695 , C01B39/04 , C23C18/1212 , C23C18/122 , C23C18/127 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , Y10T428/249953
摘要： The invention provides a preparation process of organic-group-modified zeolite fine particles excellent in stability of particle size and to be used for electronic materials or the like. The preparation process comprises a first step of obtaining a liquid containing zeolite seed crystals having a particle size of 80 nm or less which are formed in the presence of a structure directing agent, a second step of adding an organic-group-containing hydrolyzable silane compound to the liquid obtained by the first step, and a third step of maturing the liquid of the second step at temperature higher than that of the first step. A dispersion liquid of zeolite fine particles obtained by the process.
摘要翻译：本发明提供了粒径稳定性优异且用于电子材料等的有机基团改性沸石微粒的制备方法。制备方法包括获得在结构导向剂存在下形成的含有粒径为80nm以下的沸石晶种的液体的第一步骤，添加含有机基的可水解硅烷化合物的第二步骤与第一步骤获得的液体相比，以及第三步骤，在比第一步高的温度下熟化第二步骤的液体。通过该方法获得的沸石细颗粒的分散液。

43. 发明授权

US07341775B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device 有权
标题翻译：用于形成多孔膜的组合物，多孔膜及其形成方法，层间绝缘膜和半导体器件
公开(公告)号：US07341775B2
公开(公告)日：2008-03-11
申请号：US10706861
申请日：2003-11-12
申请人： Yoshitaka Hamada , Fujio Yagihashi , Hideo Nakagawa , Masaru Sasago
发明人： Yoshitaka Hamada , Fujio Yagihashi , Hideo Nakagawa , Masaru Sasago
IPC分类号： H01L23/48
CPC分类号： H01L21/02126 , C08K5/19 , C09D183/02 , C09D183/04 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/31695 , Y10T428/249953 , Y10T428/31649 , Y10T428/31663
摘要： Provided are a composition for forming film which can form a porous film excelling in dielectric constant, adhesiveness, uniformity of the film, mechanical strength and having low hygroscopicity; a porous film and a method for forming the film; and a high-performing and highly reliable semiconductor device comprising the porous film inside. More specifically, provided is a composition for forming porous film, comprising a surfactant and a solution comprising polymer obtainable by hydrolyzing and condensing, in the presence of the surfactant, one or more of alkoxysilane represented by Formula (1) and one or more of alkoxysilane represented by Formula (2): (R1)mSi(OR2)4-m (1) R3Si(R4)n(OR5)3-n (2) Also provided is a method for forming porous film comprising a step of applying said composition on a substrate to form film and a step of transforming the film into porous film.
摘要翻译：提供一种可形成介电常数，粘合性，膜均匀性，机械强度和吸湿性低的多孔膜的成膜用组合物。多孔膜和形成膜的方法; 以及内部具有多孔膜的高性能，高可靠性的半导体装置。更具体地，提供了一种用于形成多孔膜的组合物，其包含表面活性剂和包含可通过在表面活性剂存在下水解和缩合获得的聚合物的溶液，所述聚合物可由一种或多种由式（1）表示的烷氧基硅烷和一种或多种烷氧基硅烷由式（2）表示：<？in-line-formula description =“In-line Formulas”end =“lead”？>（R＆lt; 1＆gt;）＆lt; （1）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line -formulae description =“In-line Formulas”end =“lead”？> R <3> Si（R 4） 3-n（2）<？in-line-formula description =“In-line Formulas”end =“tail”？>还提供了形成多孔的方法薄膜，其包括在基材上涂布所述组合物以形成薄膜的步骤和将薄膜转变成多孔薄膜的步骤。

44. 发明申请

US20070178319A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device 审中-公开
标题翻译：用于形成多孔膜的组合物，多孔膜及其形成方法，层间绝缘膜和半导体器件
公开(公告)号：US20070178319A1
公开(公告)日：2007-08-02
申请号：US11625754
申请日：2007-01-22
申请人： Yoshitaka Hamada , Fujio Yagihashi , Hideo Nakagawa , Masaru Sasago
发明人： Yoshitaka Hamada , Fujio Yagihashi , Hideo Nakagawa , Masaru Sasago
IPC分类号： B32B9/04 , H01L21/31
CPC分类号： C09D183/14 , C09D4/00 , C09D183/04 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/31695 , Y10T428/31663 , C08G77/04
摘要： The present invention is a composition for forming a porous film obtainable by hydrolysis and condensation, in an acidic or alkaline condition, of a mixture of 100 parts by weight of one or more compounds selected of the group consisting of hydrolysable silicon compounds represented by Formulas (1) and (2) as described herein and partially hydrolyzed and condensed products of the hydrolysable silicon compounds represented by Formulas (1) and (2), and 0.1 to 20 parts by weight of one or more cross-linking agents selected from the group consisting of structure-controlled cyclic or multi-branched oligomers represented by Formulas (3) to (8) as described herein.
摘要翻译：本发明是一种用于形成多孔膜的组合物，其通过在酸性或碱性条件下水解和缩合100重量份的一种或多种选自由式（II）表示的可水解硅化合物的化合物的混合物 1）和（2）和由式（1）和（2）表示的可水解硅化合物的部分水解和缩合产物和0.1至20重量份选自以下的交联剂：由本文所述的由式（3）至（8）表示的结构受控的环状或多支链低聚物组成。

45. 发明授权

US08537808B2 SIP telephone set, and file transfer system, file transfer method and file transfer program thereof 失效
标题翻译： SIP电话机，文件传输系统，文件传输方法和文件传输程序
公开(公告)号：US08537808B2
公开(公告)日：2013-09-17
申请号：US12871015
申请日：2010-08-30
申请人： Yoshitaka Hamada
发明人： Yoshitaka Hamada
IPC分类号： H04L12/66
CPC分类号： H04L12/66
摘要： Provided is service for transmitting and receiving a file between a calling device and a call receiving device without depending on a capacity of a proxy server.An SIP telephone set (calling device 11) which makes a call through a proxy server 13 to establish a session for a voice path with a call receiving device 12 conformed to SIP, comprising a request issuing unit 111 which requests the call receiving device 12 to establish a session for a data path by the pressing of a specific extension at the time of establishment of a session for a voice path, a session establishing unit 112 which obtains an access authentication result by the pressing of the specific extension to establish a session for a data path with the call receiving device 12, and a file obtaining unit 113 which obtains a file managed by the call receiving device 12 from the call receiving device 12 independently of the proxy server 13 after a session for a data path is established.
摘要翻译：提供了用于在主叫设备和呼叫接收设备之间发送和接收文件而不依赖于代理服务器的容量的服务。通过代理服务器13进行呼叫以建立符合SIP的呼叫接收设备12的语音路由会话的SIP电话机（呼叫设备11），包括请求发送单元111，其请求呼叫接收设备12 在建立用于语音路径的会话时通过按压特定分机来建立用于数据路径的会话;会话建立单元112，其通过按压特定分机来获得访问认证结果，以建立会话与呼叫接收装置12的数据路径，以及文件获取单元113，其在建立了数据路径的会话之后，独立于代理服务器13从呼叫接收装置12获取由呼叫接收装置12管理的文件。

46. 发明授权

US08257528B2 Substrate joining method and 3-D semiconductor device 有权
标题翻译：基板接合方法和3-D半导体器件
公开(公告)号：US08257528B2
公开(公告)日：2012-09-04
申请号：US12540764
申请日：2009-08-13
申请人： Fujio Yagihashi , Yoshitaka Hamada , Takeshi Asano
发明人： Fujio Yagihashi , Yoshitaka Hamada , Takeshi Asano
IPC分类号： B32B37/00 , B32B9/04 , C09J163/00 , C09J5/06 , C09J201/00 , H01L21/20 , H01L21/50 , H01L21/52
CPC分类号： H01L21/2007 , H01L2924/0002 , Y10T156/10 , H01L2924/00
摘要： A pair of substrates each having a bonding surface are joined together by interposing a bond layer precursor coating between the bonding surfaces of the substrates and heating the precursor coating to form a bond layer. Prior to the joining step, the substrate on the bonding surface is provided with a gas-permeable layer. Even when a material which will evolve a noticeable volume of gas upon heat curing is used as the precursor coating, substrates can be joined via a robust bond without the peeling problem by gas evolution.
摘要翻译：将具有接合面的一对基板通过在基板的接合面之间插入接合层前体涂层并加热前体涂层而形成接合层而接合在一起。在接合步骤之前，接合表面上的基底设置有透气层。即使当热固化时将产生显着体积的气体的材料用作前体涂层时，可以通过坚固的粘结将衬底接合，而不会由气体逸出造成剥离问题。

47. 发明申请

US20120207917A1 CONDUCTIVE PATTERN-FORMING COMPOSITION AND METHOD 审中-公开
标题翻译：导电形成组合物和方法
公开(公告)号：US20120207917A1
公开(公告)日：2012-08-16
申请号：US13372673
申请日：2012-02-14
申请人： Yoshitaka Hamada , Fujio Yagihashi
发明人： Yoshitaka Hamada , Fujio Yagihashi
IPC分类号： B05D5/12 , H01B1/22 , H01B1/20
CPC分类号： H01B1/22 , C09D7/69 , C09D11/322 , C09D11/52
摘要： A conductive pattern-forming composition is obtained by loading a silicone rubber composition comprising a curable organopolysiloxane and a curing agent with conductive submicron particles.
摘要翻译：通过将包含可固化的有机聚硅氧烷和固化剂的硅橡胶组合物与导电的亚微米颗粒相加来获得导电图案形成组合物。

48. 发明申请

US20120165564A1 METHOD FOR PREPARING PURIFIED AMINOSILANE 审中-公开
标题翻译：制备纯化氨基硅烷的方法
公开(公告)号：US20120165564A1
公开(公告)日：2012-06-28
申请号：US13332822
申请日：2011-12-21
申请人： Yoshitaka Hamada , Kazuhiro Hirahara
发明人： Yoshitaka Hamada , Kazuhiro Hirahara
IPC分类号： C07F7/10
CPC分类号： C07F7/10 , C07F7/20
摘要： An object is to provide a highly pure aminosilane having a reduced amount of halogen impurity, which is suitable for applications of electronic materials and others. More specifically, provided is a method for preparing a purified aminosilane comprising at least the steps of treating, with an alkyl metal reagent, an aminosilane having a Si—N bond but not a Si-halogen bond and having halogen impurity content of 1 ppm (w/w) or more; and distilling the treated aminosilane.
摘要翻译：本发明的目的是提供一种具有减少量的卤素杂质的高纯氨基硅烷，其适用于电子材料等的应用。更具体地说，提供了一种制备纯化氨基硅烷的方法，其至少包括用烷基金属试剂处理具有Si-N键但不是Si-卤素键并具有1ppm的卤素杂质含量的氨基硅烷的步骤 w / w）以上; 并蒸馏处理的氨基硅烷。

49. 发明申请

US20090294726A1 ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE 有权
标题翻译：有机硅氧化物微粒及其制备方法，多孔膜成膜组合物，多孔膜及其形成方法及半导体器件
公开(公告)号：US20090294726A1
公开(公告)日：2009-12-03
申请号：US12472681
申请日：2009-05-27
申请人： Yoshitaka Hamada , Fujio Yagihashi , Takeshi Asano , Hideo Nakagawa , Masaru Sasago
发明人： Yoshitaka Hamada , Fujio Yagihashi , Takeshi Asano , Hideo Nakagawa , Masaru Sasago
IPC分类号： B32B1/00 , B29C35/08 , B29C35/02 , C09K3/00
CPC分类号： H01B3/10 , Y10T428/25 , Y10T428/259 , Y10T428/2991 , Y10T428/2993 , Y10T428/2995 , Y10T428/31663
摘要： Provided are organic silicon oxide fine particles which can be formed into a porous film having a dielectric constant and mechanical strength expected as a high-performance porous insulating film and having excellent chemical stability, and a preparation method thereof. Described specifically, provided are an organic silicon oxide fine particle comprising a core containing at least an inorganic silicon oxide or an organic silicon oxide and a shell containing at least an organic silicon oxide and being formed around the core by using shell-forming hydrolyzable silane in the presence of a basic catalyst; wherein of silicon atoms constituting the core or the shell, a ratio (T/Q) of a number (T) of silicon atoms having at least one bond directly attached to a carbon atom to a number (Q) of silicon atoms having all of four bonds attached to an oxygen atom is greater in the shell than in the core; and wherein the shell-forming hydrolyzable silane comprise at least a hydrolyzable silane compound having two or more hydrolyzable-group-having silicon atoms bound to each other via a carbon chain or via a carbon chain containing one silicon atom between some carbon atoms.
摘要翻译：提供可以形成具有期望作为高性能多孔绝缘膜的介电常数和机械强度并且具有优异的化学稳定性的多孔膜的有机氧化硅微粒及其制备方法。具体地说，提供了一种有机氧化硅微粒，其包含至少含有无机氧化硅或有机氧化硅的芯和至少含有有机氧化硅的壳，并且通过使用壳形成可水解硅烷在芯周围形成存在碱性催化剂; 其中构成核或壳的硅原子中，具有至少一个直接连接到碳原子上的键的硅原子数（T）与（Q）的硅原子数（Q）的比（T / Q）附着在氧原子上的四个键在壳中比在核中大; 并且其中所述成壳可水解硅烷至少包含具有两个或多个可水解基团的硅原子的可水解硅烷化合物，其通过碳链彼此结合，或通过在一些碳原子之间含有一个硅原子的碳链。

50. 发明授权

US07485690B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method 有权
标题翻译：牺牲成膜组合物，图案化工艺，牺牲膜和去除方法
公开(公告)号：US07485690B2
公开(公告)日：2009-02-03
申请号：US11148380
申请日：2005-06-09
申请人： Yoshitaka Hamada , Tsutomu Ogihara , Motoaki Iwabuchi , Takeshi Asano , Takafumi Ueda , Dirk Pfeiffer
发明人： Yoshitaka Hamada , Tsutomu Ogihara , Motoaki Iwabuchi , Takeshi Asano , Takafumi Ueda , Dirk Pfeiffer
IPC分类号： C08G77/08
CPC分类号： G03F7/094 , G03F7/0752 , H01L21/31116 , H01L21/31144 , H01L21/76808
摘要： A sacrificial film-forming composition is provided comprising (A) a silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formulae (1) and (2): X—Y—SiZ3 (1) RnSiZ4-n (2) wherein Z is a hydrolyzable group, X is a crosslinkable organofunctional group such as an unsubstituted hydroxyl group or a substituted or unsubstituted epoxy, acyloxy or acryloxy group, Y is a single bond or a divalent hydrocarbon group, R is hydrogen or a monovalent hydrocarbon group, and n is an integer of 0 to 3, the silicone resin being capable of crosslinking reaction by the crosslinkable organofunctional group in formula (1), (B) a crosslinking agent, (C) an acid generator, and (D) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is effectively dissolvable in a stripping solution.
摘要翻译：提供牺牲性成膜组合物，其包含（A）作为具有式（1）和（2）的可水解硅烷的共水解缩合物的硅氧烷树脂：<？在线配方说明=“在线配方” end =“lead”？> XY-SiZ3（1）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line formula end =“lead”？> RnSiZ4-n（2）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中Z是可水解基团，X是可交联的有机官能团，例如未取代的羟基或取代或未取代的环氧基，酰氧基或丙烯酰氧基，Y为单键或二价烃基，R为氢或一价烃基，n为0〜3的整数，有机硅树脂为能够通过式（1）中的交联性有机官能团交联反应，（B）交联剂，（C）酸产生剂和（D）有机溶剂进行交联反应。该组合物具有提高的储存稳定性，填充性能，粘附性和涂层均匀性，足以形成有效地溶解在剥离溶液中的牺牲膜。

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