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    • 41. 发明授权
    • Multi-stage plasma reactor system with hollow cathodes for cracking carbonaceous material
    • 具有中空阴极的多级等离子体反应器系统用于裂化碳质材料
    • US09393542B2
    • 2016-07-19
    • US14361616
    • 2012-08-03
    • Xuan LiBinhang YanChangning WuYi ChengYi Guo
    • Xuan LiBinhang YanChangning WuYi ChengYi Guo
    • B01J19/08C10J3/00C10J3/48C10J3/72C10J3/78C10J3/84B01J19/24
    • B01J19/088B01J19/2415B01J2219/0809B01J2219/0869B01J2219/0871B01J2219/0894C10J3/00C10J3/485C10J3/721C10J3/78C10J3/84C10J2200/12C10J2300/093C10J2300/0946C10J2300/0959C10J2300/0976C10J2300/1238C10J2300/1807
    • Disclosed is a multi-stage plasma reactor system with hollow cathodes for cracking carbonaceous material with each stage comprising: hollow cathodes and hollow anodes cooled by recycling cooling medium or refrigerant; working gas inlet(s); inlet(s) of carbonaceous material and carrier gas as feedstock; reaction tubes in connection with the anode or cathode, in addition, the reactor system also comprises: at least one inlet(s) of quench medium located lower portion of last one of the reaction tubes; and at least one outlet(s) of quenched products and gases located on bottom or lower portion of last one of the reaction tubes, wherein chambers are formed between the first hollow cathode or the hollow cathode used as the reaction tube of any stage and the anode so as to generate plasma gas and/or electric arc therein, generated plasma gas jet fully contacts and efficiently mixes with the carbonaceous material and carrier gas as feedstock and/or volatiles caused by pyrolysis within or nearby highest temperature region of the chambers, and pyrolysis of the carbonaceous material and/or gas-phase reaction of volatiles are occurred. The present reactor system has excellent energy efficiency and higher cracked products yield.
    • 公开了一种具有用于裂化含碳材料的空心阴极的多级等离子体反应器系统,每级包括:通过循环冷却介质或制冷剂冷却的中空阴极和中空阳极; 工作气体入口; 碳质材料和载气作为原料的入口; 与阳极或阴极连接的反应管,此外,反应器系统还包括:位于反应管的最后一个的下部的至少一个骤冷介质入口; 以及位于最后一个反应管的底部或下部的至少一个淬火产物和气体出口,其中在用作任何阶段的反应管的第一空心阴极或中空阴极之间形成腔室, 阳极,以便在其中产生等离子体气体和/或电弧,所产生的等离子体气体射流完全接触并有效地与碳质材料和载体混合,作为由室内或附近的最高温度区域内或其附近的热解引起的原料和/或挥发物,以及 发生碳质材料的热解和/或挥发物的气相反应。 本反应器系统具有优异的能量效率和较高的裂化产物产率。
    • 43. 发明授权
    • Method for chemical mechanical polishing a substrate
    • 化学机械抛光基材的方法
    • US08119529B2
    • 2012-02-21
    • US12432021
    • 2009-04-29
    • Yi GuoZhendong Liu
    • Yi GuoZhendong Liu
    • H01L21/302
    • H01L21/31053B24B37/0056B24B37/044C09G1/02
    • A method for chemical mechanical polishing of a substrate, comprising: providing a substrate, wherein the substrate comprises silicon dioxide; providing a chemical mechanical polishing composition, wherein the chemical mechanical polishing composition comprises: water, an abrasive; a diquaternary cation according to formula (I); and optionally a quaternary alkylammonium compound; providing a chemical mechanical polishing pad; creating dynamic contact at an interface between the chemical mechanical polishing pad and the substrate; and dispensing the chemical mechanical polishing composition onto the chemical mechanical polishing pad at or near the interface between the chemical mechanical polishing pad and the substrate; wherein the chemical mechanical polishing composition has a pH of 2 to 6; wherein the chemical mechanical polishing composition exhibits a silicon dioxide removal rate of at least 1,500 Å/min.
    • 一种用于基板的化学机械抛光的方法,包括:提供基板,其中所述基板包括二氧化硅; 提供化学机械抛光组合物,其中所述化学机械抛光组合物包括:水,研磨剂; 式(I)的二季阳离子; 和任选的季烷基铵化合物; 提供化学机械抛光垫; 在化学机械抛光垫和基底之间的界面处产生动态接触; 以及将化学机械抛光组合物分配到化学机械抛光垫或化学机械抛光垫与基底之间界面附近的化学机械抛光垫上; 其中所述化学机械抛光组合物的pH为2至6; 其中化学机械抛光组合物的二氧化硅去除率至少为1500埃/分钟。
    • 44. 发明申请
    • Method for chemical mechanical polishing a substrate
    • 化学机械抛光基材的方法
    • US20100279507A1
    • 2010-11-04
    • US12432021
    • 2009-04-29
    • Yi GuoZhendong Liu
    • Yi GuoZhendong Liu
    • H01L21/306
    • H01L21/31053B24B37/0056B24B37/044C09G1/02
    • A method for chemical mechanical polishing of a substrate, comprising: providing a substrate, wherein the substrate comprises silicon dioxide; providing a chemical mechanical polishing composition, wherein the chemical mechanical polishing composition comprises: water, an abrasive; a diquaternary cation according to formula (I); and optionally a quaternary alkylammonium compound; providing a chemical mechanical polishing pad; creating dynamic contact at an interface between the chemical mechanical polishing pad and the substrate; and dispensing the chemical mechanical polishing composition onto the chemical mechanical polishing pad at or near the interface between the chemical mechanical polishing pad and the substrate; wherein the chemical mechanical polishing composition has a pH of 2 to 6; wherein the chemical mechanical polishing composition exhibits a silicon dioxide removal rate of at least 1,500 Å/min.
    • 一种用于基板的化学机械抛光的方法,包括:提供基板,其中所述基板包括二氧化硅; 提供化学机械抛光组合物,其中所述化学机械抛光组合物包括:水,研磨剂; 式(I)的二季阳离子; 和任选的季烷基铵化合物; 提供化学机械抛光垫; 在化学机械抛光垫和基底之间的界面处产生动态接触; 以及将化学机械抛光组合物分配到化学机械抛光垫或化学机械抛光垫与基底之间界面附近的化学机械抛光垫上; 其中所述化学机械抛光组合物的pH为2至6; 其中化学机械抛光组合物的二氧化硅去除率至少为1500埃/分钟。
    • 46. 发明授权
    • Distributed network monitoring system and method
    • 分布式网络监控系统及方法
    • US07370356B1
    • 2008-05-06
    • US10350172
    • 2003-01-22
    • Yi Guo
    • Yi Guo
    • G06F11/00H04L12/28H04L9/00H04L1/00H04K1/00
    • H04L63/0861G06Q20/0855H04L63/101
    • Methods and systems for protecting the computer network against unauthorized access are disclosed. Information is reported about each network device connected to the network and/or one or more corresponding users. The reported information is correlated to determine if any unauthorized devices are connected to the network. To report the desired information, each device authorized to use the network may be provided with an agent configured to report information about the device to which it corresponds and information about one or more neighboring devices. A “reporting your neighbor” method may be used wherein each network device report its address and the address of its neighbors may be used to determine if any device is not reporting its address. Alternatively, each agent may report information about its device's physical location, e.g., by global positioning satellite (GPS). A door badge system may be used to provide user location information.
    • 公开了用于保护计算机网络免受未经授权的访问的方法和系统。 报告关于连接到网络和/或一个或多个相应用户的每个网络设备的信息。 报告的信息是相关的,以确定是否有任何未经授权的设备连接到网络。 为了报告所需的信息,授权使用网络的每个设备可以被提供有被配置为报告关于其对应的设备的信息的代理和关于一个或多个相邻设备的信息的代理。 可以使用“报告您的邻居”方法,其中每个网络设备报告其地址,并且可以使用其邻居的地址来确定是否有任何设备不报告其地址。 或者,每个代理可以例如通过全球定位卫星(GPS)来报告关于其设备的物理位置的信息。 可以使用门徽系统来提供用户位置信息。
    • 50. 发明申请
    • MULTI-STAGE PLASMA REACTOR SYSTEM WITH HOLLOW CATHODES FOR CRACKING CARBONACEOUS MATERIAL
    • 多层等离子体反应器系统,用于破碎碳质材料的中空阴极
    • US20150044106A1
    • 2015-02-12
    • US14361616
    • 2012-08-03
    • Xuan LiBinhang YanChangning WuYi ChengYi Guo
    • Xuan LiBinhang YanChangning WuYi ChengYi Guo
    • B01J19/08B01J19/24
    • B01J19/088B01J19/2415B01J2219/0809B01J2219/0869B01J2219/0871B01J2219/0894C10J3/00C10J3/485C10J3/721C10J3/78C10J3/84C10J2200/12C10J2300/093C10J2300/0946C10J2300/0959C10J2300/0976C10J2300/1238C10J2300/1807
    • Disclosed is a multi-stage plasma reactor system with hollow cathodes for cracking carbonaceous material with each stage comprising: hollow cathodes and hollow anodes cooled by recycling cooling medium or refrigerant; working gas inlet(s); inlet(s) of carbonaceous material and carrier gas as feedstock; reaction tubes in connection with the anode or cathode, in addition, the reactor system also comprises: at least one inlet(s) of quench medium located lower portion of last one of the reaction tubes; and at least one outlet(s) of quenched products and gases located on bottom or lower portion of last one of the reaction tubes, wherein chambers are formed between the first hollow cathode or the hollow cathode used as the reaction tube of any stage and the anode so as to generate plasma gas and/or electric arc therein, generated plasma gas jet fully contacts and efficiently mixes with the carbonaceous material and carrier gas as feedstock and/or volatiles caused by pyrolysis within or nearby highest temperature region of the chambers, and pyrolysis of the carbonaceous material and/or gas-phase reaction of volatiles are occurred. The present reactor system has excellent energy efficiency and higher cracked products yield.
    • 公开了一种具有用于裂化含碳材料的空心阴极的多级等离子体反应器系统,每级包括:通过循环冷却介质或制冷剂冷却的中空阴极和中空阳极; 工作气体入口; 碳质材料和载气作为原料的入口; 与阳极或阴极连接的反应管,此外,反应器系统还包括:位于反应管的最后一个的下部的至少一个骤冷介质入口; 以及位于最后一个反应管的底部或下部的至少一个淬火产物和气体出口,其中在用作任何阶段的反应管的第一空心阴极或中空阴极之间形成腔室, 阳极,以便在其中产生等离子体气体和/或电弧,所产生的等离子体气体射流完全接触并有效地与碳质材料和载体混合,作为由室内或附近的最高温度区域内或其附近的热解引起的原料和/或挥发物,以及 发生碳质材料的热解和/或挥发物的气相反应。 本反应器系统具有优异的能量效率和较高的裂化产物产率。