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41. 发明授权

US07062075B2 Surface shape recognition sensor device 失效
公开(公告)号：US07062075B2
公开(公告)日：2006-06-13
申请号：US10140742
申请日：2002-05-07
申请人： Hiroki Morimura , Toshishige Shimamura , Satoshi Shigematsu , Katsuyuki Machida , Hakaru Kyuragi
发明人： Hiroki Morimura , Toshishige Shimamura , Satoshi Shigematsu , Katsuyuki Machida , Hakaru Kyuragi
IPC分类号： G06K9/00
CPC分类号： G06K9/0002
摘要： A calibration mode signal line to which sensor cells are commonly connected is arranged. In a calibration mode, a calibration mode signal is supplied to the sensor cells through the calibration mode signal line to designate calibration. In each sensor cell, when the calibration mode signal is being supplied from the calibration mode signal line, and the sensor cell is selected by the decoder, calibration operation of adjusting the detection sensitivity of a sensor circuit is executed using a calibration circuit.

42. 发明申请

US20050258877A1 Waveform shaping circuit 失效
标题翻译：波形整形电路
公开(公告)号：US20050258877A1
公开(公告)日：2005-11-24
申请号：US10505629
申请日：2004-01-21
申请人： Hiroki Morimura , Toshishige Shimamura , Koji Fujii , Satoshi Shigematsu , Yukio Okazaki , Katsuyuki Machida
发明人： Hiroki Morimura , Toshishige Shimamura , Koji Fujii , Satoshi Shigematsu , Yukio Okazaki , Katsuyuki Machida
IPC分类号： H03K5/08 , H03K5/1534 , H03K17/22 , H03K17/30 , H03B1/00
CPC分类号： H03K5/082 , H03K5/1534 , H03K17/223 , H03K17/302
摘要： A first control potential setting means (1) generates a first control potential (N2) which reverses the magnitude relationship with a second control potential (N3) when an input signal (IN) reaches the vicinity of a logical threshold value. A second control potential setting means (2) generates the second control potential (N3) which changes in the same direction as the input signal (IN), in accordance with a change in input signal (IN). An output means (3) includes transistors (Q5, Q6), and generates an output signal (OUT) having a predetermined potential on the basis of the first control potential (N2), the second control potential (N3), and a reset signal (RSET). A reset means (4) turns off the transistor (Q6) while a waveform shaping circuit is in operation.
摘要翻译：当输入信号（IN）达到逻辑门限值附近时，第一控制电位设定装置（1）产生使与第二控制电位（N 3）的大小关系相反的第一控制电位（N 2）。第二控制电位设定装置（2）根据输入信号（IN）的变化产生与输入信号（IN）沿相同方向变化的第二控制电位（N 3）。输出装置（3）包括晶体管（Q 5，Q 6），并且基于第一控制电位（N 2），第二控制电位（N 3）产生具有预定电位的输出信号（OUT）和复位信号（RSET）。当波形整形电路处于工作状态时，复位装置（4）关断晶体管（Q 6）。

43. 发明授权

US06248655B1 Method of fabricating a surface shape recognition sensor 有权
标题翻译：制作表面形状识别传感器的方法
公开(公告)号：US06248655B1
公开(公告)日：2001-06-19
申请号：US09515962
申请日：2000-02-29
申请人： Katsuyuki Machida , Satoshi Shigematsu , Hiroki Morimura , Akihiko Hirata
发明人： Katsuyuki Machida , Satoshi Shigematsu , Hiroki Morimura , Akihiko Hirata
IPC分类号： H01L2144
CPC分类号： G06K9/0002 , G01B7/004 , G01B7/34
摘要： A surface shape recognition sensor of this invention includes at least a plurality of capacitance detection elements having sensor electrodes arranged in the same plane on an interlevel dielectric film formed on a semiconductor substrate to be insulated/isolated from each other, capacitance detection means for detecting the capacitances of the capacitance detection elements, and a stationary electrode disposed on the interlevel dielectric film to be insulated/isolated from the sensor electrodes. When an object to be recognized touches the upper surface of the stationary electrode, the capacitances detected by the capacitance detection elements change in accordance with the recesses/projections on the upper surface.
摘要翻译：本发明的表面形状识别传感器至少包括多个电容检测元件，该电容检测元件具有布置在形成于半导体衬底上的层间电介质膜上的同一平面内的绝缘/隔离的电容检测元件，用于检测电容检测元件的电容和设置在层间电介质膜上的与传感器电极绝缘/隔离的固定电极。当待识别的物体接触固定电极的上表面时，由电容检测元件检测的电容根据上表面上的凹凸来改变。

44. 发明授权

US6086699A Thin film-forming method and thin film-forming apparatus therefor 失效
标题翻译：薄膜形成方法及其薄膜形成装置
公开(公告)号：US6086699A
公开(公告)日：2000-07-11
申请号：US79112
申请日：1998-05-14
申请人： Akira Nakashima , Atsushi Tonai , Ryo Muraguchi , Michio Komatsu , Katsuyuki Machida , Hakaru Kyuragi , Kazuo Imai
发明人： Akira Nakashima , Atsushi Tonai , Ryo Muraguchi , Michio Komatsu , Katsuyuki Machida , Hakaru Kyuragi , Kazuo Imai
IPC分类号： H01L21/3205 , B05D1/28 , H01L21/00 , H01L21/31 , H01L21/316 , H01L21/768 , B32B33/00 , B05D5/00 , B05D7/24 , B05D7/26
CPC分类号： H01L21/6715 , B05D1/28 , H01L21/67132
摘要： Disclosed is a thin film-forming apparatus comprising a coating liquid feed means 6 for feeding a thin film-forming coating liquid onto a surface of a transfer roll 2, a transfer means 4 including the transfer roll 2 a surface of which is coated with the thin film-forming coating liquid fed from the coating liquid feed means to form a transfer thin film 8, and a substrate conveying means 16 for continuously conveying a substrate 9 under the transfer roll, a surface of said substrate 9 to be provided with a thin film, wherein the transfer means is so fabricated that the transfer roll surface having the transfer thin film thereon is closely contacted with the surface of the substrate conveyed by the substrate conveying means, to transfer the transfer thin film formed on the transfer roll surface to the substrate surface. Also disclosed is a thin film-forming method using the thin film-forming apparatus. By the apparatus and the method, formation of a planar thin film on a substrate such as a semiconductor wafer can be carried out continuously, stably and at a low cost, and quality lowering of the thin film and property change thereof with time caused by adherence of impurities to the thin film or contamination of the thin film with impurities are avoidable. Moreover, the apparatus and the method are applicable to large-sized substrates.
摘要翻译：公开了一种薄膜形成装置，其包括用于将薄膜形成涂布液供给到转印辊2的表面上的涂布液供给装置6，包括转印辊2的转印装置4，转印辊2的表面涂覆有从涂布液供给装置供给的薄膜形成用涂布液，形成转印薄膜8，以及用于在转印辊下连续输送基板9的基板输送机构16，所述基板9的表面设置有薄的膜，其中转印装置被制造成使得其上具有转印薄膜的转印辊表面与由基板输送装置输送的基板的表面紧密接触，以将形成在转印辊表面上的转印薄膜转印到基材表面。还公开了使用该薄膜形成装置的薄膜形成方法。通过该装置和方法，可以连续，稳定地且低成本地在诸如半导体晶片的基板上形成平面薄膜，并且随着粘附时间的推移，薄膜的质量降低及其性能变化杂质对薄膜的污染或杂质污染薄膜是可以避免的。此外，该装置和方法适用于大尺寸基板。

45. 发明授权

US5376590A Semiconductor device and method of fabricating the same 失效
标题翻译：半导体装置及其制造方法
公开(公告)号：US5376590A
公开(公告)日：1994-12-27
申请号：US5670
申请日：1993-01-19
申请人： Katsuyuki Machida , Katsumi Murase , Nobuhiro Shimoyama , Toshiaki Tsuchiya , Junichi Takahashi , Kazushige Minegishi , Yasuo Takahashi , Hideo Namatsu , Kazuo Imai
发明人： Katsuyuki Machida , Katsumi Murase , Nobuhiro Shimoyama , Toshiaki Tsuchiya , Junichi Takahashi , Kazushige Minegishi , Yasuo Takahashi , Hideo Namatsu , Kazuo Imai
IPC分类号： H01L21/3105 , H01L21/316 , H01L21/768 , H01L23/532 , H01L21/02
CPC分类号： H01L21/02126 , H01L21/02129 , H01L21/0214 , H01L21/02164 , H01L21/0217 , H01L21/022 , H01L21/02211 , H01L21/02271 , H01L21/02274 , H01L21/02282 , H01L21/02337 , H01L21/3105 , H01L21/31608 , H01L21/76801 , H01L21/76814 , H01L21/76826 , H01L21/76828 , H01L21/76829 , H01L21/76832 , H01L21/76834 , H01L23/5329 , H01L2924/0002
摘要： A semiconductor device includes an interlevel film constituted by a first dielectrics film containing dangling bonds and a bonded group of Si and hydrogen, and a second dielectrics film formed on the first dielectrics film.
摘要翻译：半导体器件包括由包含悬挂键的第一电介质膜和Si和氢的键合基团构成的层间膜和形成在第一介电膜上的第二电介质膜。

46. 发明授权

US4732761A Thin film forming apparatus and method 失效
标题翻译：薄膜成膜装置及方法
公开(公告)号：US4732761A
公开(公告)日：1988-03-22
申请号：US842244
申请日：1986-03-21
申请人： Katsuyuki Machida , Hideo Oikawa
发明人： Katsuyuki Machida , Hideo Oikawa
IPC分类号： H01L21/205 , C23C14/35 , C23C16/40 , C23C16/48 , C23C16/511 , H01L21/302 , H01L21/3065 , H01L21/31 , H01L21/3105 , H01L21/768 , B05D5/12
CPC分类号： C23C16/48 , C23C14/357 , C23C16/402 , C23C16/511 , H01L21/31051 , H01L21/31055 , H01L21/76819
摘要： An apparatus for forming a thin film to planarize a surface of a semiconductor device having convex and concave regions, comprising a plasma generating chamber into which are an Ar gas and an O.sub.2 gas are supplied so that a plasma is produced; a specimen chamber in which a substrate electrode upon which a specimen substrate is placed and which is in partial communication with the plasma generating chamber and into which an SiH.sub.4 gas as a film material is introduced; and a bias power source for applying a bias voltage to the substrate electrode so that ions sufficiently impinge substantially vertically upon the electrode to perform ion etching. First, an SiO.sub.2 film is deposited on the specimen substrate by using the O.sub.2 and SiH.sub.4 gases. In the next step, Ar plasma and O.sub.2 plasma are produced in the plasma generating chamber and a bias voltage is applied to the substrate electrode. As a result, deposition and etching occur simultaneously, whereby the surface of the device having convex and concave regions is planarized with an SiO.sub.2 film. Submicron interconnections can be planarized with easily setting planarization conditions at a low rf power. The planarization time can be shortened.
摘要翻译：一种用于形成薄膜以平坦化具有凸和凹区域的半导体器件的表面的装置，包括其中供给有Ar气体和O 2气体的等离子体产生室，从而产生等离子体; 试样室，其中放置有试样基板并与等离子体发生室部分连通的基板电极，并且引入作为膜材料的SiH 4气体; 以及偏置电源，用于向衬底电极施加偏置电压，使得离子充分地基本垂直地撞击在电极上以进行离子蚀刻。首先，使用O 2和SiH 4气体在样品基板上沉积SiO 2膜。在下一步骤中，在等离子体发生室中产生Ar等离子体和O 2等离子体，并且将偏置电压施加到衬底电极。结果，沉积和蚀刻同时发生，由此具有凸区域的器件的表面被SiO 2膜平坦化。亚微米互连可以平坦化，容易设置低功率的平坦化条件。可以缩短平坦化时间。

47. 发明授权

US07508963B2 Surface shape recognition sensor device 有权
标题翻译：表面形状识别传感器装置
公开(公告)号：US07508963B2
公开(公告)日：2009-03-24
申请号：US12079818
申请日：2008-03-28
申请人： Toshishige Shimamura , Hiroki Morimura , Satoshi Shigematsu , Norio Sato , Masami Urano , Katsuyuki Machida
发明人： Toshishige Shimamura , Hiroki Morimura , Satoshi Shigematsu , Norio Sato , Masami Urano , Katsuyuki Machida
IPC分类号： G06K9/00
CPC分类号： G06K9/0002 , G06K9/0012
摘要： A detection element (1A) having a detection electrode (11A) connected to a surface shape detection unit (2) and a detection electrode (12A) connected to a common potential, and a detection element (1B) having a detection electrode (11B) connected to the surface shape detection unit (2) and a detection electrode (12B) connected to a biometric recognition unit (3) are arranged. The surface shape detection unit (2) outputs a signal representing the three-dimensional pattern of the surface shape corresponding to the contact portion to each detection element on the basis of individual capacitances obtained from the detection elements (1A, 1B). The biometric recognition unit (3) determines whether an object (9) is a living body, on the basis of a signal corresponding to the impedance of the object (9) connected between the detection electrode (12B) of the detection element (1B) and the detection electrode (12A) of the detection element (1A).
摘要翻译：一种具有连接到表面形状检测单元（2）的检测电极（11A）和与公共电位连接的检测电极（12A）的检测元件（1A）和具有检测电极（11B）的检测元件（1B）连接到表面形状检测单元（2）和连接到生物识别单元（3）的检测电极（12B）。表面形状检测单元（2）基于从检测元件（1A，1B）获得的各个电容，将表示与接触部分相对应的表面形状的三维图案的信号输出到每个检测元件。生物识别单元（3）基于与检测元件（1B）的检测电极（12B）之间连接的物体（9）的阻抗相对应的信号来判定物体（9）是否为活体，和检测元件（1A）的检测电极（12A）。

48. 发明申请

US20080187192A1 Surface shape recognition sensor device 有权
标题翻译：表面形状识别传感器装置
公开(公告)号：US20080187192A1
公开(公告)日：2008-08-07
申请号：US12079818
申请日：2008-03-28
申请人： Toshishige Shimamura , Hiroki Morimura , Satoshi Shigematsu , Norio Sato , Masami Urano , Katsuyuki Machida
发明人： Toshishige Shimamura , Hiroki Morimura , Satoshi Shigematsu , Norio Sato , Masami Urano , Katsuyuki Machida
IPC分类号： G06K9/00
CPC分类号： G06K9/0002 , G06K9/0012
摘要： A detection element (1A) having a detection electrode (11A) connected to a surface shape detection unit (2) and a detection electrode (12A) connected to a common potential, and a detection element (1B) having a detection electrode (11B) connected to the surface shape detection unit (2) and a detection electrode (12B) connected to a biometric recognition unit (3) are arranged. The surface shape detection unit (2) outputs a signal representing the three-dimensional pattern of the surface shape corresponding to the contact portion to each detection element on the basis of individual capacitances obtained from the detection elements (1A, 1B). The biometric recognition unit (3) determines whether an object (9) is a living body, on the basis of a signal corresponding to the impedance of the object (9) connected between the detection electrode (12B) of the detection element (1B) and the detection electrode (12A) of the detection element (1A).
摘要翻译：具有连接到表面形状检测单元（2）的检测电极（11A）和与公共电位连接的检测电极（12A）的检测元件（1A）和具有检测元件连接到表面形状检测单元（2）的电极（11B）和连接到生物识别单元（3）的检测电极（12B）。表面形状检测单元（2）基于从检测元件（1A，1B）获得的各个电容，将表示与接触部分相对应的表面形状的三维图案的信号输出到每个检测元件。生物识别单元（3）基于与检测元件（1）的检测电极（12B）之间连接的物体（9）的阻抗相对应的信号来判定物体（9）是活体， B）和检测元件（1A）的检测电极（12A）。

49. 发明授权

US07381663B2 Method of fabricating a surface shape recognition sensor 有权
标题翻译：制作表面形状识别传感器的方法
公开(公告)号：US07381663B2
公开(公告)日：2008-06-03
申请号：US11704024
申请日：2007-02-07
申请人： Norio Sato , Katsuyuki Machida , Satoshi Shigematsu , Hiroki Morimura
发明人： Norio Sato , Katsuyuki Machida , Satoshi Shigematsu , Hiroki Morimura
IPC分类号： H01L29/78
CPC分类号： G06K9/0002 , Y10S438/942
摘要： A structure (113b) which includes an overhang and a support portion supporting substantially the center of the overhang, and in which the area of the support portion is smaller than the area of the overhang in the two-dimensional direction of an upper electrode (1110b) is formed on the upper electrode (110a) in a region above each lower electrode 105a in one-to-one correspondence with the lower electrode (105a). An object of surface shape sensing, e.g., the tip of a finger (1602) touches the surface of the overhang of the structure (113b), and the support portion of the structure (113b) whose overhang is in contact with the object of sensing pushes down a portion of the upper electrode (110a) toward the lower electrode (105a), thereby deforming the upper electrode (110a).
摘要翻译： 1.一种结构（113b），其包括突出端和支撑部分，所述支撑部分基本上支撑所述突出部的中心，并且所述支撑部分的面积小于所述上部电极的二维方向上的所述突出部分的面积（ 1110b）形成在每个下电极105a上的区域中的上电极（110a）上，与下电极（105a）一一对应地形成。表面形状检测的目的，例如手指的尖端（1602）接触结构（113b）的突出部分的表面，并且结构（113b）的支撑部分（113b）的突出部与物体接触的感测将上部电极（110a）的一部分朝向下部电极（105a）下压，从而使上部电极（110a）变形。

50. 发明授权

US07366332B2 Surface shape recognition sensor 有权
标题翻译：表面形状识别传感器
公开(公告)号：US07366332B2
公开(公告)日：2008-04-29
申请号：US10528283
申请日：2004-08-12
申请人： Toshishige Shimamura , Hiroki Morimura , Satoshi Shigematsu , Norio Sato , Masami Urano , Katsuyuki Machida
发明人： Toshishige Shimamura , Hiroki Morimura , Satoshi Shigematsu , Norio Sato , Masami Urano , Katsuyuki Machida
IPC分类号： G06K9/00
CPC分类号： G06K9/0002 , G06K9/0012
摘要： A detection element (1A) having a detection electrode (11A) connected to a surface shape detection unit (2) and a detection electrode (12A) connected to a common potential, and a detection element (1B) having a detection electrode (11B) connected to the surface shape detection unit (2) and a detection electrode (12B) connected to a biometric recognition unit (3) are arranged. The surface shape detection unit (2) outputs a signal representing the three-dimensional pattern of the surface shape corresponding to the contact portion to each detection element on the basis of individual capacitances obtained from the detection elements (1A, 1B). The biometric recognition unit (3) determines whether an object (9) is a living body, on the basis of a signal corresponding to the impedance of the object (9) connected between the detection electrode (12B) of the detection element (1B) and the detection electrode (12A) of the detection element (1A).
摘要翻译：具有连接到表面形状检测单元（2）的检测电极（11A）和与公共电位连接的检测电极（12A）的检测元件（1A）和具有检测元件连接到表面形状检测单元（2）的电极（11B）和连接到生物识别单元（3）的检测电极（12B）。表面形状检测单元（2）基于从检测元件（1A，1B）获得的各个电容，将表示与接触部分相对应的表面形状的三维图案的信号输出到每个检测元件。生物识别单元（3）基于与检测元件（1）的检测电极（12B）之间连接的物体（9）的阻抗相对应的信号来判定物体（9）是活体， B）和检测元件（1A）的检测电极（12A）。

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