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41. 发明申请

US20130156421A1 DISPERSION MEASUREMENT SYSTEM AND METHOD IN AN OPTICAL COMMUNICATION NETWORK 有权
标题翻译：光通信网络中的分散度测量系统和方法
公开(公告)号：US20130156421A1
公开(公告)日：2013-06-20
申请号：US13810957
申请日：2011-07-19
申请人： Emilio Bravi , Giuseppe Tali , David McDonald , Michael Todd , David Bernard
发明人： Emilio Bravi , Giuseppe Tali , David McDonald , Michael Todd , David Bernard
IPC分类号： H04B10/08
CPC分类号： H04B10/07951 , G01M11/332 , G01M11/335 , G01M11/338 , H04B10/073
摘要： The invention relates to a system and method of dispersion measurement in an optical fibre network. The invention provides means for transmitting from a transmitting node, using a single tunable laser transmitter, two consecutive bursts of data at different wavelengths λ1 and λ2 to a receiver node, wherein each burst of data comprises a unique sequence of amplitude modulated data, and wherein the two sequences are injected with a fixed known delay. The delay between the two consecutive bursts of data is maintained by selective switching of the tunable laser, such that clock recovery circuitry at the receiver node remains locked during the delay between the two bursts. The dispersion measurements method of the present invention is based on walk off and bit position detection between two wavelengths suitable for fast optical burst switching network is described. This method does not require an operator, extra equipment, or traffic interruption on the network.
摘要翻译：本发明涉及光纤网络中色散测量的系统和方法。本发明提供了用于使用单个可调谐激光发射机从发射节点向不同波长λ1和λ2向接收机节点发射两个连续的数据脉冲串的装置，其中每个脉冲串包括幅度调制数据的唯一序列，并且其中两个序列以固定的已知延迟注入。通过可调谐激光器的选择性切换来维持两个连续的数据脉冲之间的延迟，使得接收器节点处的时钟恢复电路在两个脉冲串之间的延迟期间保持锁定。本发明的色散测量方法是基于步行和适用于快速光突发交换网络的两个波长之间的位位置检测进行描述的。该方法不需要网络上的操作员，额外的设备或流量中断。

42. 发明授权

US08450953B2 Controller assemblies for electric drive utility vehicles 有权
标题翻译：电动多功能车的控制器组件
公开(公告)号：US08450953B2
公开(公告)日：2013-05-28
申请号：US13532577
申请日：2012-06-25
申请人： Raymond Hauser , Christopher K. Wyatt , Ivan E. Fox , Josh Butler , Michael Todd , Donald Rousser
发明人： Raymond Hauser , Christopher K. Wyatt , Ivan E. Fox , Josh Butler , Michael Todd , Donald Rousser
IPC分类号： H02P1/54
CPC分类号： A01D34/008 , A01D34/78 , B60L15/007 , B60L15/20 , B60L15/2036 , B60L15/38 , B60L2200/40 , H02P5/68 , H02P5/74 , H04L12/403 , H05K1/14 , Y02T10/645 , Y02T10/646 , Y02T10/72 , Y02T10/7275
摘要： Controller assemblies and packaging for electronic control systems of electric motors utilized in utility vehicles or other power equipment are disclosed. The controller assemblies are packaged for robust design and heat dissipation, while collectively housing the controllers, switches and sensors needed to operate multiple motors performing different functions, or the same function in serial.
摘要翻译：公开了用于多用途车辆或其他电力设备中的电动机的电子控制系统的控制器组件和包装。控制器组件被封装，用于坚固的设计和散热，同时集中操作执行不同功能的多个电机所需的控制器，开关和传感器，或串联相同的功能。

43. 发明授权

US08174853B2 Variable speed drive 有权
标题翻译：变速驱动
公开(公告)号：US08174853B2
公开(公告)日：2012-05-08
申请号：US13034308
申请日：2011-02-24
申请人： Ajit W. Kane , Ivan Jadric , Shreesha Adiga-Manoor , Michael Todd , Konstantin Borisov
发明人： Ajit W. Kane , Ivan Jadric , Shreesha Adiga-Manoor , Michael Todd , Konstantin Borisov
IPC分类号： H02M1/12
CPC分类号： H02M5/4585 , H02M1/126 , H02M7/003
摘要： Systems and methods for improved VSDs are provided. One embodiment relates to an apparatus for common mode and differential mode filtering for motor or compressor bearing protection when operating with VSDs, including conducted EMI/RFI input power mains mitigation. Another embodiment relates to a method to extend the synchronous operation of an Active Converter to the AC mains voltage during complete line dropout. Another embodiment relates to an Active Converter-based Variable Speed Drive system with Improved Full Speed Efficiency.
摘要翻译：提供了改进的VSD的系统和方法。一个实施例涉及一种用于在使用VSD进行运行时的电动机或压缩机轴承保护的共模和差模过滤装置，包括传导EMI / RFI输入电源减轻。另一个实施例涉及在完整的线路断开期间将有源转换器的同步操作扩展到AC电源电压的方法。另一实施例涉及具有改进的全速效率的基于有源转换器的变速驱动系统。

44. 发明申请

US20080181227A1 ZERO-DAY SECURITY SYSTEM 有权
标题翻译：零日安全系统
公开(公告)号：US20080181227A1
公开(公告)日：2008-07-31
申请号：US11669815
申请日：2007-01-31
申请人： Michael Todd
发明人： Michael Todd
IPC分类号： H04L12/56
CPC分类号： H04L63/14 , H04L63/1416 , H04L63/1433
摘要： A system for protecting networks from vulnerability exploits comprises a security engine operable to receive a packet destined for a user's network and forward the packet to at least one host virtual machine for processing. The security engine is further operable to forward the stored packet to the user's internal network based upon a result of the processed packet. A method of securing a network from vulnerability exploits is described. The method comprises receiving a packet destined for a user's internal network; forwarding the packet to at least one virtual machine based upon a virtual machine configuration table; processing the forwarded packet on the at least one virtual machine; and releasing the packet to the user's internal network based upon results of the processing.
摘要翻译：用于保护网络免受漏洞利用的系统包括可操作以接收去往用户网络的分组的安全引擎，并将分组转发到至少一个主机虚拟机进行处理。安全引擎还可操作以基于处理的分组的结果将存储的分组转发到用户的内部网络。描述了保护网络免受漏洞利用的一种方法。该方法包括接收目的地是用户内部网络的分组; 基于虚拟机配置表将分组转发到至少一个虚拟机; 在所述至少一个虚拟机上处理所述转发的分组; 并且基于处理的结果将该分组释放到用户的内部网络。

45. 发明申请

US20080073645A1 THIN FILMS AND METHODS OF MAKING THEM 有权
标题翻译：薄膜及其制造方法
公开(公告)号：US20080073645A1
公开(公告)日：2008-03-27
申请号：US11854163
申请日：2007-09-12
申请人： Michael Todd , Ivo Raaijmakers
发明人： Michael Todd , Ivo Raaijmakers
IPC分类号： H01L29/04
CPC分类号： C23C16/0272 , B82Y10/00 , B82Y30/00 , C23C16/22 , C23C16/24 , C23C16/30 , C23C16/308 , C23C16/325 , C23C16/345 , C23C16/36 , C23C16/56 , C30B25/02 , C30B29/06 , H01L21/02422 , H01L21/0243 , H01L21/0245 , H01L21/0251 , H01L21/02529 , H01L21/02532 , H01L21/02576 , H01L21/02579 , H01L21/02592 , H01L21/02595 , H01L21/02598 , H01L21/0262 , H01L21/02667 , H01L21/2257 , H01L21/28035 , H01L21/28044 , H01L21/28194 , H01L21/28525 , H01L21/28556 , H01L21/3185 , H01L21/32055 , H01L28/84 , H01L29/127 , H01L29/51 , H01L29/517 , H01L29/518 , H01L29/66181 , H01L29/66242 , H01L31/1804 , H01L31/182 , H01L31/202 , Y02E10/546 , Y02E10/547 , Y02P70/521 , Y10S438/933
摘要： Thin, smooth silicon-containing films are prepared by deposition methods that utilize a silicon containing precursor. In preferred embodiments, the methods result in Si-containing films that are continuous and have a thickness of about 150 Å or less, a surface roughness of about 5 Å rms or less, and a thickness non-uniformity of about 20% or less. Preferred silicon-containing films display a high degree of compositional uniformity when doped or alloyed with other elements. Preferred deposition methods provide improved manufacturing efficiency and can be used to make various useful structures such as wetting layers, HSG silicon, quantum dots, dielectric layers, anti-reflective coatings (ARC's), gate electrodes and diffusion sources.
摘要翻译：通过使用含硅前体的沉积方法制备薄的，平滑的含硅膜。在优选的实施方案中，该方法产生连续的并且具有约150或更小的厚度，约5μm或更小的表面粗糙度和约20％或更小的厚度不均匀性的含Si膜。当与其它元素掺杂或合金化时，优选的含硅膜显示出高度的组成均匀性。优选的沉积方法提供了改进的制造效率，并且可以用于制备各种有用的结构，例如润湿层，HSG硅，量子点，电介质层，抗反射涂层（ARC），栅电极和扩散源。

46. 发明申请

US20080038936A1 METHOD TO FORM ULTRA HIGH QUALITY SILICON-CONTAINING COMPOUND LAYERS 有权
标题翻译：形成超高品质含硅化合物层的方法
公开(公告)号：US20080038936A1
公开(公告)日：2008-02-14
申请号：US11877480
申请日：2007-10-23
申请人： Michael Todd , Keith Weeks , Christiaan Werkhoven , Christophe Pomarede
发明人： Michael Todd , Keith Weeks , Christiaan Werkhoven , Christophe Pomarede
IPC分类号： H01L21/469
CPC分类号： C23C16/45523 , C23C16/24 , C23C16/345 , C23C16/45525 , C23C16/56 , H01L21/0217 , H01L21/02247 , H01L21/02252 , H01L21/3144 , H01L21/31612 , H01L21/31662 , H01L21/3185
摘要： Multiple sequential processes are conducted in a reaction chamber to form ultra high quality silicon-containing compound layers, including silicon nitride layers. In a preferred embodiment, a silicon layer is deposited on a substrate using trisilane as the silicon precursor. A silicon nitride layer is then formed by nitriding the silicon layer. By repeating these steps, a silicon nitride layer of a desired thickness is formed.
摘要翻译：在反应室中进行多个顺序的工艺以形成包括氮化硅层的超高质量含硅化合物层。在优选实施例中，使用丙硅烷作为硅前体在衬底上沉积硅层。然后通过氮化硅层形成氮化硅层。通过重复这些步骤，形成期望厚度的氮化硅层。

47. 发明授权

US07320577B1 Dual pump transmission 有权
标题翻译：双泵传动
公开(公告)号：US07320577B1
公开(公告)日：2008-01-22
申请号：US11100836
申请日：2005-04-07
申请人： Lonnie E. Holder , Michael Todd , Robert E. Trimble
发明人： Lonnie E. Holder , Michael Todd , Robert E. Trimble
IPC分类号： F04B1/26 , F04B49/00
CPC分类号： F16H61/448 , F04B1/22 , F04B1/324 , F04B23/06 , F04B23/106
摘要： A dual pump apparatus for use on a vehicle or industrial application having a housing in which a pair of hydraulic pumps are mounted, having a cooling fan mounted on the primary or secondary input shaft on the opposite side of the pulley used to engage the prime mover. A charge pump may be mounted on the end cap, and the trunnion arms for controlling the hydraulic pumps extend out of opposite sides of the housing. An auxiliary pump may also be mounted on the primary input shaft and may be located either at the input end thereof adjacent to the pulley, or on the opposite side of the housing.
摘要翻译：一种用于车辆或工业应用的双泵装置，其具有安装有一对液压泵的壳体，其具有安装在用于接合原动机的滑轮的相对侧上的主输入轴或次输入轴上的冷却风扇。电荷泵可以安装在端盖上，并且用于控制液压泵的耳轴臂从壳体的相对侧延伸出来。辅助泵也可以安装在主输入轴上，并且可以位于与滑轮相邻的输入端处或者位于壳体的相对侧上。

48. 发明申请

US20070261883A1 Methods For Improving The Flux Compatibility Of Underfill Formulations 审中-公开
标题翻译：提高底层填料配方的助焊剂兼容性的方法
公开(公告)号：US20070261883A1
公开(公告)日：2007-11-15
申请号：US10599875
申请日：2005-04-12
申请人： Bruce Chan , Michael Todd , Maurice Edwards
发明人： Bruce Chan , Michael Todd , Maurice Edwards
IPC分类号： H05K1/02 , B29C65/00
CPC分类号： C08G59/68 , H01L21/563 , H01L23/293 , H01L24/29 , H01L2224/73203 , H01L2924/01019 , H01L2924/01021 , H01L2924/01029 , H01L2924/01057 , H01L2924/09701 , H01L2924/351 , Y10T156/10 , H01L2924/00
摘要： In accordance with the present invention, it has been discovered that the addition of one or more cationic catalyst(s), such as onium salts as defined herein, provides improved flux compatibility of underfill formulations in the presence of flux, flux residues and/or reaction products thereof. Accordingly, there are provided methods for improving the flux compatibility of underfill formulations in the presence of flux, flux residues and/or reaction products thereof. In accordance with another embodiment of the present invention, there are provided methods for improving HAST performance of underfill formulations, especially in the presence of flux, flux residues and/or reaction products thereof. In accordance with another embodiment of the present invention, there are provided methods for preparing underfill formulations having improved flux compatibility, especially in the presence of flux, flux residues and/or reaction products thereof. In yet another embodiment of the present invention, there are provided methods for adhesively attaching and/or encapsulating electronic components, especially in the presence of flux, flux residues and/or reaction products thereof. In a further embodiment of the present invention, there are provided articles produced by the above-described processes.
摘要翻译：根据本发明，已经发现，加入一种或多种阳离子催化剂，如本文所定义的鎓盐，在助焊剂，助焊剂残余物和/或氧化物存在的情况下提供了底部填充剂配方的改善的助熔剂相容性其反应产物。因此，提供了在助焊剂，助焊剂残余物和/或其反应产物存在的情况下改善底部填充剂的助熔剂相容性的方法。根据本发明的另一个实施方案，提供了用于改善底部填充剂制剂的HAST性能的方法，特别是在助焊剂，助焊剂残余物和/或其反应产物的存在下。根据本发明的另一个实施方案，提供了制备具有改善的助熔剂相容性的底部填充剂的方法，特别是在助焊剂，助焊剂残余物和/或其反应产物的存在下。在本发明的另一个实施方案中，提供了用于粘合地附着和/或封装电子元件的方法，特别是在助焊剂，助焊剂残余物和/或其反应产物的存在下。在本发明的另一个实施方案中，提供了通过上述方法制备的制品。

49. 发明申请

US20060051940A1 Deposition from liquid sources 有权
标题翻译：液体源沉积
公开(公告)号：US20060051940A1
公开(公告)日：2006-03-09
申请号：US10933978
申请日：2004-09-03
申请人： Michael Todd , Ivo Raaijmakers
发明人： Michael Todd , Ivo Raaijmakers
IPC分类号： C23C16/00 , H01L21/20
CPC分类号： H01L21/67253 , C23C16/4481 , C23C16/4483 , C23C16/4486 , H01L21/02381 , H01L21/02422 , H01L21/02529 , H01L21/02532 , H01L21/02535 , H01L21/02573 , H01L21/0262 , H01L21/67115
摘要： A liquid injector is used to vaporize and inject a silicon precursor into a process chamber to form silicon-containing layers during a semiconductor fabrication process. The injector is connected to a source of silicon precursor, which preferably comprises liquid trisilane in a mixture with one or more dopant precursors. The mixture is metered as a liquid and delivered to the injector, where it is then vaporized and injected into the process chamber.
摘要翻译：在半导体制造过程中，使用液体注入器将硅前体汽化并注入到处理室中以形成含硅层。注射器连接到硅前体源，其优选包括与一种或多种掺杂剂前体的混合物中的液体丙硅烷。将混合物计量为液体并输送到注射器，然后将其蒸发并注入到处理室中。

50. 发明申请

US20050026400A1 Methods for depositing amorphous materials and using them as templates for epitaxial films by solid phase epitaxy 有权
标题翻译：用于沉积非晶材料并将其用作通过固相外延的外延膜的模板的方法
公开(公告)号：US20050026400A1
公开(公告)日：2005-02-03
申请号：US10871687
申请日：2004-06-09
申请人： Michael Todd , Paul Brabant , Keith Weeks , Jianqing Wen
发明人： Michael Todd , Paul Brabant , Keith Weeks , Jianqing Wen
IPC分类号： H01L21/20 , H01L21/36
CPC分类号： H01L21/02667 , H01L21/02634 , H01L21/2022
摘要： Methods for forming epitaxial films involve forming a buffer layer on a single crystal substrate, depositing an amorphous layer on the buffer layer, then forming an epitaxial film from the amorphous layer by solid phase epitaxy.
摘要翻译：用于形成外延膜的方法包括在单晶衬底上形成缓冲层，在缓冲层上沉积非晶层，然后通过固相外延从非晶层形成外延膜。

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