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41. 发明申请

US20050128596A1 Method for balancing color response of imagers 审中-公开
标题翻译：平衡成像器颜色响应的方法
公开(公告)号：US20050128596A1
公开(公告)日：2005-06-16
申请号：US11041406
申请日：2005-01-25
申请人： Jin Li , Ulrich Boettiger
发明人： Jin Li , Ulrich Boettiger
IPC分类号： B29D11/00 , G02B3/00 , H01L27/14 , H04N5/369 , H04N9/07 , G02B27/10
CPC分类号： G02B3/005 , B29D11/00278 , B29D11/00365 , G02B3/0018 , G02B3/0043 , G02B3/0056 , H01L27/14621 , H01L27/14627
摘要： A micro-lens array with reduced or no empty space between individual micro-lenses and a method for forming same. The micro-lens array is formed by patterning a first set of micro-lens material in a checkerboard pattern on a substrate. The first set of micro-lens material is reflowed and cured into first micro-lenses impervious to subsequent reflows. Then, a second set of micro-lens material is patterned in spaces among the first micro-lenses, reflowed and cured into second micro-lenses. The reflows and cures can be conducted under different conditions, and the micro-lenses may be differently sized. The conditions of the reflows can be chosen to ensure that the focal lengths of micro-lenses are optimized for maximum sensor signal.
摘要翻译：具有在单个微透镜之间减少或没有空白空间的微透镜阵列及其形成方法。微透镜阵列通过在衬底上以棋盘图案形成第一组微透镜材料而形成。第一组微透镜材料被回流并固化成不可逆转的第一微透镜。然后，将第二组微透镜材料图案化在第一微透镜之间的空间中，回流并固化成第二微透镜。可以在不同的条件下进行回流和固化，并且微透镜的尺寸可以不同。可以选择回流条件以确保微透镜的焦距被优化用于最大传感器信号。

42. 发明授权

US09093579B2 Dielectric barriers for pixel arrays 有权
标题翻译：像素阵列的介质阻挡层
公开(公告)号：US09093579B2
公开(公告)日：2015-07-28
申请号：US13294951
申请日：2011-11-11
申请人： Jeffrey Mackey , Ulrich Boettiger , Mattia Cichocki , Loriston Ford , Rick Holscher , Mitchell J. Mooney , Brian Vaartstra
发明人： Jeffrey Mackey , Ulrich Boettiger , Mattia Cichocki , Loriston Ford , Rick Holscher , Mitchell J. Mooney , Brian Vaartstra
IPC分类号： H01L31/0232 , H01L31/0216 , H01L27/144 , H01L27/146
CPC分类号： H01L31/02327 , H01L27/1446 , H01L27/14605 , H01L27/14621 , H01L27/14629 , H01L27/1464 , H01L27/14685 , H01L31/02162
摘要： Pixel arrays are provided for image sensors that have barriers between color filters in an array of color filters. Color filter barriers may be formed from a transparent or semi-transparent material. Color filter barriers may be formed from a low refractive index material. Color filters may be etched and color filter barrier material may be formed in the etched regions of the color filters. If desired, a layer of color filter barrier material may be etched to form open regions and color filter material may be formed in the open regions of the color filter barrier material. An image sensor may be a front-side illuminated image sensor or a back-side illuminated image sensor.
摘要翻译：像素阵列被提供用于在滤色器阵列中的滤色器之间具有屏障的图像传感器。滤色器屏障可以由透明或半透明材料形成。滤色器屏障可以由低折射率材料形成。可以蚀刻滤色器，并且可以在滤色器的蚀刻区域中形成滤色器阻挡材料。如果需要，可以蚀刻一层滤色器阻挡材料以形成开放区域，并且滤色器材料可以形成在滤色器阻挡材料的开放区域中。图像传感器可以是前侧照明图像传感器或背面照明图像传感器。

43. 发明申请

US20120188421A1 IMAGING SYSTEMS WITH ARRAYS OF ALIGNED LENSES 有权
标题翻译：具有对准镜片阵列的成像系统
公开(公告)号：US20120188421A1
公开(公告)日：2012-07-26
申请号：US13053728
申请日：2011-03-22
申请人： Ulrich Boettiger
发明人： Ulrich Boettiger
IPC分类号： H04N5/335 , H01L31/18
CPC分类号： H04N5/2254
摘要： An imaging system may include an array of lenses, each of which is aligned over a respective one of a plurality of imaging pixels. The array of lenses may be formed in two layers. The first layer may include a first set of non-adjacent lenses and centering structures between the first lenses. The centering structures may be aligned with the first set of lenses as part of a mask design with a high level of accuracy. The second layer may include a second set of lenses, each of which is formed on a respective one of the centering structures. Forming the second set of lenses may include a reflow process in which surface tension forces center the second set of lenses on their respective centering structures, thereby aligning the second set of lenses with the first set of lenses with a high level of accuracy.
摘要翻译：成像系统可以包括透镜阵列，每个透镜阵列在多个成像像素中的相应一个上对准。透镜阵列可以形成为两层。第一层可以包括第一组非相邻透镜和第一透镜之间的定心结构。定心结构可以与第一组透镜对准，作为掩模设计的一部分，具有高精度。第二层可以包括第二组透镜，每个透镜形成在相应的定心结构之一上。形成第二组透镜可以包括回流工艺，其中表面张力将第二组透镜定位在它们各自的对中结构上，从而以高精度对准第二组透镜与第一组透镜。

44. 发明申请

US20120061787A1 LIQUID ELECTRICAL INTERCONNECT AND DEVICES USING SAME 有权
标题翻译：液体电气互连和使用相同的装置
公开(公告)号：US20120061787A1
公开(公告)日：2012-03-15
申请号：US13302907
申请日：2011-11-22
申请人： Rick Lake , Ulrich Boettiger , Shashikant Hegde , Jacques Duparre
发明人： Rick Lake , Ulrich Boettiger , Shashikant Hegde , Jacques Duparre
IPC分类号： H01L31/0232
CPC分类号： H01L24/16 , H01L21/76898 , H01L23/481 , H01L24/81 , H01L2224/13099 , H01L2224/16237 , H01L2224/81141 , H01L2224/81191 , H01L2224/83191 , H01L2924/00011 , H01L2924/00014 , H01L2924/01006 , H01L2924/01013 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01079 , H01L2924/014 , H01L2924/14 , H01L2924/1433 , H01L2924/1461 , H01L2924/351 , H05K3/32 , H05K3/4007 , H05K2201/09045 , H01L2924/00 , H01L2224/0401
摘要： Various embodiments include interconnects for semiconductor structures that can include a first conductive structure, a second conductive structure and a non-hardening liquid conductive material in contact with the first and second structure. Other embodiments include semiconductor components and imager devices using the interconnects. Further embodiments include methods of forming a semiconductor structure and focusing methods for an imager device.
摘要翻译：各种实施例包括用于半导体结构的互连，其可以包括与第一和第二结构接触的第一导电结构，第二导电结构和非硬化液体导电材料。其他实施例包括使用互连的半导体部件和成像器件。另外的实施例包括形成半导体结构的方法和用于成像器装置的聚焦方法。

45. 发明申请

US20090225435A1 GRADIENT INDEX MICROLENSES AND METHOD OF FORMATION 有权
标题翻译：梯度指数微生物和形成方法
公开(公告)号：US20090225435A1
公开(公告)日：2009-09-10
申请号：US12043838
申请日：2008-03-06
申请人： Ulrich Boettiger , Saijin Liu
发明人： Ulrich Boettiger , Saijin Liu
IPC分类号： G02B3/00 , B29D11/00
CPC分类号： G02B3/0018 , B29D11/00365 , G02B3/0087 , H01L27/14627 , H01L27/14685
摘要： A lens includes a gradient index of refraction and a curved shape. A method of making the lens includes forming a plurality of layers, forming a shaped resist on the plurality of layers, and etching the resist and the plurality of layers to transfer the shape of the resist into the plurality of layers.
摘要翻译：透镜包括梯度折射率和弯曲形状。制造透镜的方法包括形成多个层，在多个层上形成成形抗蚀剂，并蚀刻抗蚀剂和多个层，以将抗蚀剂的形状转移到多个层中。

46. 发明申请

US20050233588A1 Semiconductor constructions 审中-公开
标题翻译：半导体结构
公开(公告)号：US20050233588A1
公开(公告)日：2005-10-20
申请号：US11115853
申请日：2005-04-25
申请人： Ulrich Boettiger , Scott Light
发明人： Ulrich Boettiger , Scott Light
IPC分类号： C23F1/00 , G03F7/004 , G03F7/20 , G03F7/40 , H01L21/302 , H01L21/311 , H01L21/76
CPC分类号： G03F7/2024 , G03F7/0045 , G03F7/40
摘要： The invention includes methods by which the size and shape of photoresist-containing masking compositions can be selectively controlled after development of the photoresist. For instance, photoresist features can be formed over a substrate utilizing a photolithographic process. Subsequently, at least some of the photoresist features can be exposed to actinic radiation to cause release of a substance from the photoresist. A layer of material is formed over the photoresist features and over gaps between the features. The material has a solubility in a solvent which is reduced when the material interacts with the substance released from the photoresist. The solvent is utilized to remove portions of the material which are not sufficiently proximate to the photoresist to receive the substance, selectively relative to portions which are sufficiently proximate to the photoresist. The photoresist features can be exposed to the actinic radiation either before or after forming the layer of material.
摘要翻译：本发明包括在光致抗蚀剂显影后可以选择性地控制含光致抗蚀剂的掩模组合物的尺寸和形状的方法。例如，可以利用光刻工艺在衬底上形成光致抗蚀剂特征。随后，光致抗蚀剂特征中的至少一些可以暴露于光化辐射以引起物质从光致抗蚀剂的释放。在光致抗蚀剂特征和特征之间的间隙上形成一层材料。该材料在溶剂中具有溶解性，当材料与从光致抗蚀剂释放的物质相互作用时，其溶解度降低。使用溶剂去除材料的不足够接近光致抗蚀剂的部分，以便相对于足够靠近光致抗蚀剂的部分选择性地接收物质。在形成材料层之前或之后，光致抗蚀剂特征可以暴露于光化辐射。

47. 发明申请

US20050186802A1 Methods of Forming Openings, And Methods of Forming Container Capacitors 有权
标题翻译：形成开口的方法和形成容器电容器的方法
公开(公告)号：US20050186802A1
公开(公告)日：2005-08-25
申请号：US10783843
申请日：2004-02-20
申请人： Brett Busch , Luan Tran , Ardavan Niroomand , Fred Fishburn , Yoshiki Hishiro , Ulrich Boettiger , Richard Holscher
发明人： Brett Busch , Luan Tran , Ardavan Niroomand , Fred Fishburn , Yoshiki Hishiro , Ulrich Boettiger , Richard Holscher
IPC分类号： H01L21/02 , H01L21/033 , H01L21/302 , H01L21/311 , H01L21/461 , H01L21/8234 , H01L21/8242 , H01L21/8244 , H01L27/108 , H01L29/76
CPC分类号： H01L21/0332 , H01L21/0337 , H01L21/31144 , H01L27/10852 , H01L28/91 , Y10S438/942 , Y10S438/946
摘要： A patterned mask can be formed as follows. A first patterned photoresist is formed over a masking layer and utilized during a first etch into the masking layer. The first etch extends to a depth in the masking layer that is less than entirely through the masking layer. A second patterned photoresist is subsequently formed over the masking layer and utilized during a second etch into the masking layer. The combined first and second etches form openings extending entirely through the masking layer and thus form the masking layer into the patterned mask. The patterned mask can be utilized to form a pattern in a substrate underlying the mask. The pattern formed in the substrate can correspond to an array of capacitor container openings. Capacitor structure can be formed within the openings. The capacitor structures can be incorporated within a DRAM array.
摘要翻译：图案化掩模可以如下形成。在掩模层上形成第一图案化的光致抗蚀剂，并在第一蚀刻进入掩模层期间使用。第一蚀刻延伸到掩模层中的深度不到完全通过掩模层的深度。随后在掩模层上形成第二图案化的光致抗蚀剂，并在第二次蚀刻进入掩模层期间利用。组合的第一和第二蚀刻形成完全延伸穿过掩模层的开口，从而在掩模层中形成掩模层。图案化掩模可以用于在掩模下面的衬底中形成图案。形成在基板中的图案可以对应于电容器容器开口的阵列。可以在开口内形成电容结构。电容器结构可以并入DRAM阵列中。

48. 发明申请

US20050099696A1 Micro-lenses and method for increasing area coverage and controlling shape of micro lenses 有权
标题翻译：微透镜和增加面镜覆盖度并控制微透镜形状的方法
公开(公告)号：US20050099696A1
公开(公告)日：2005-05-12
申请号：US11019233
申请日：2004-12-23
申请人： Ulrich Boettiger
发明人： Ulrich Boettiger
IPC分类号： G02B3/00 , G02B27/10
CPC分类号： B29D11/00365 , G02B3/0018
摘要： Micro-lenses for use in imagers and their method of manufacture from intermediate lens structures are described. Lithographic masks are used to remove unwanted portions from the intermediate lens structures and to remove cut-out portions from the intermediate lens structures to alter the radius of the resultant micro-lenses. Lithographic masks are also used to inhibit pull-back of the micro-lenses during a reflow step.
摘要翻译：描述了用于成像器的微透镜及其从中间透镜结构制造的方法。使用平版印刷掩模来从中间透镜结构去除不想要的部分，并从中间透镜结构去除切除部分以改变所得微透镜的半径。平版印刷掩模也用于在回流步骤期间抑制微透镜的拉回。

49. 发明授权

US08538120B2 System for targeting cells or other materials 有权
标题翻译：用于靶向细胞或其他材料的系统
公开(公告)号：US08538120B2
公开(公告)日：2013-09-17
申请号：US13114982
申请日：2011-05-24
申请人： Kenneth Edward Salsman , Ulrich Boettiger , Dmitry Bakin , Curtis W. Stith
发明人： Kenneth Edward Salsman , Ulrich Boettiger , Dmitry Bakin , Curtis W. Stith
IPC分类号： G06K9/00
CPC分类号： G01N15/1012 , G01N15/1434 , G01N15/1459 , G01N15/1463 , G01N2015/1025 , G01N2015/1443
摘要： An image sensor integrated circuit may contain image sensor pixels. A channel containing a fluid with particles such as cells may be formed on top of the image sensor. Some of the image sensor pixels may form a calibration sensor and some of the image sensor pixels may form an imager. As the fluid and particles flow through the channel at a flow rate, the calibration sensor may measures the flow rate and illumination intensity in the channel. Based on calibration data such as measured flow rate and measured illumination intensity, adjustments may be made to ensure that the imager acquires satisfactory image data. The adjustments may include flow rate adjustments, image acquisition data rate adjustments, and illumination adjustments. A processing unit in the channel may contain a laser or other component to destroy selected cells. A flared region in the channel may be used as a chromatograph.
摘要翻译：图像传感器集成电路可以包含图像传感器像素。可以在图像传感器的顶部上形成包含诸如细胞等颗粒的流体的通道。一些图像传感器像素可以形成校准传感器，并且一些图像传感器像素可以形成成像器。当流体和颗粒以流速流过通道时，校准传感器可以测量通道中的流量和照射强度。基于诸如测量流量和测量的照射强度的校准数据，可以进行调整以确保成像器获得令人满意的图像数据。调整可以包括流量调整，图像采集数据速率调整和照明调整。通道中的处理单元可以包含用于摧毁所选择的单元的激光器或其他组件。通道中的扩口区域可用作色谱仪。

50. 发明申请

US20120326256A1 SPECTRALLY TUNED PLASMONIC LIGHT COLLECTORS 有权
公开(公告)号：US20120326256A1
公开(公告)日：2012-12-27
申请号：US13365067
申请日：2012-02-02
申请人： Kenneth Edward Salsman , Ulrich Boettiger , Dmitry Bakin , Curtis W. Stith
发明人： Kenneth Edward Salsman , Ulrich Boettiger , Dmitry Bakin , Curtis W. Stith
IPC分类号： H01L31/0232
CPC分类号： H01L27/14625 , H01L27/14603
摘要： Electronic devices may be provided with imaging modules that include plasmonic light collectors. Plasmonic light collectors may be configured to exploit an interaction between incoming light and plasmons in the plasmonic light collector to alter the path of the incoming light. Plasmonic light collectors may include one or more spectrally tuned plasmonic image pixels configured to preferentially trap light of a given frequency. Spectrally tuned plasmonic image pixels may include plasmonic structures formed form a patterned metal layer over doped silicon layers. Doped silicon layers may be interposed between plasmonic structures and a reflective layer. Plasmonic image pixels may be used to absorb and detect as much as, or more than, ninety percent of incident light at wavelengths ranging from the infrared to the ultraviolet. Plasmonic image pixels that capture light of different colors may be arranged in patterned arrays to form imager modules or imaging spectrometers for optofluidic microscopes.
摘要翻译：电子设备可以设置有包括等离子体激光收集器的成像模块。等离子体光收集器可以被配置为利用等离子体光收集器中的入射光和等离子体激元之间的相互作用来改变入射光的路径。等离子体光收集器可以包括被配置为优先捕获给定频率的光的一个或多个频谱调谐等离子体像图像。光谱调谐等离子体激元图像像素可以包括由掺杂硅层上的图案化金属层形成的等离子体结构。掺杂的硅层可以介于等离子体激元结构和反射层之间。等离子体像图像可用于吸收和检测多达或多于百分之九十的入射光，其范围从红外至紫外。捕获不同颜色的光的等离子体像图像可以以图案化阵列布置以形成用于光流体显微镜的成像器模块或成像光谱仪。

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