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1. 发明授权

US08538120B2 System for targeting cells or other materials 有权
标题翻译：用于靶向细胞或其他材料的系统
公开(公告)号：US08538120B2
公开(公告)日：2013-09-17
申请号：US13114982
申请日：2011-05-24
申请人： Kenneth Edward Salsman , Ulrich Boettiger , Dmitry Bakin , Curtis W. Stith
发明人： Kenneth Edward Salsman , Ulrich Boettiger , Dmitry Bakin , Curtis W. Stith
IPC分类号： G06K9/00
CPC分类号： G01N15/1012 , G01N15/1434 , G01N15/1459 , G01N15/1463 , G01N2015/1025 , G01N2015/1443
摘要： An image sensor integrated circuit may contain image sensor pixels. A channel containing a fluid with particles such as cells may be formed on top of the image sensor. Some of the image sensor pixels may form a calibration sensor and some of the image sensor pixels may form an imager. As the fluid and particles flow through the channel at a flow rate, the calibration sensor may measures the flow rate and illumination intensity in the channel. Based on calibration data such as measured flow rate and measured illumination intensity, adjustments may be made to ensure that the imager acquires satisfactory image data. The adjustments may include flow rate adjustments, image acquisition data rate adjustments, and illumination adjustments. A processing unit in the channel may contain a laser or other component to destroy selected cells. A flared region in the channel may be used as a chromatograph.
摘要翻译：图像传感器集成电路可以包含图像传感器像素。可以在图像传感器的顶部上形成包含诸如细胞等颗粒的流体的通道。一些图像传感器像素可以形成校准传感器，并且一些图像传感器像素可以形成成像器。当流体和颗粒以流速流过通道时，校准传感器可以测量通道中的流量和照射强度。基于诸如测量流量和测量的照射强度的校准数据，可以进行调整以确保成像器获得令人满意的图像数据。调整可以包括流量调整，图像采集数据速率调整和照明调整。通道中的处理单元可以包含用于摧毁所选择的单元的激光器或其他组件。通道中的扩口区域可用作色谱仪。

2. 发明申请

US20120326256A1 SPECTRALLY TUNED PLASMONIC LIGHT COLLECTORS 有权
公开(公告)号：US20120326256A1
公开(公告)日：2012-12-27
申请号：US13365067
申请日：2012-02-02
申请人： Kenneth Edward Salsman , Ulrich Boettiger , Dmitry Bakin , Curtis W. Stith
发明人： Kenneth Edward Salsman , Ulrich Boettiger , Dmitry Bakin , Curtis W. Stith
IPC分类号： H01L31/0232
CPC分类号： H01L27/14625 , H01L27/14603
摘要： Electronic devices may be provided with imaging modules that include plasmonic light collectors. Plasmonic light collectors may be configured to exploit an interaction between incoming light and plasmons in the plasmonic light collector to alter the path of the incoming light. Plasmonic light collectors may include one or more spectrally tuned plasmonic image pixels configured to preferentially trap light of a given frequency. Spectrally tuned plasmonic image pixels may include plasmonic structures formed form a patterned metal layer over doped silicon layers. Doped silicon layers may be interposed between plasmonic structures and a reflective layer. Plasmonic image pixels may be used to absorb and detect as much as, or more than, ninety percent of incident light at wavelengths ranging from the infrared to the ultraviolet. Plasmonic image pixels that capture light of different colors may be arranged in patterned arrays to form imager modules or imaging spectrometers for optofluidic microscopes.
摘要翻译：电子设备可以设置有包括等离子体激光收集器的成像模块。等离子体光收集器可以被配置为利用等离子体光收集器中的入射光和等离子体激元之间的相互作用来改变入射光的路径。等离子体光收集器可以包括被配置为优先捕获给定频率的光的一个或多个频谱调谐等离子体像图像。光谱调谐等离子体激元图像像素可以包括由掺杂硅层上的图案化金属层形成的等离子体结构。掺杂的硅层可以介于等离子体激元结构和反射层之间。等离子体像图像可用于吸收和检测多达或多于百分之九十的入射光，其范围从红外至紫外。捕获不同颜色的光的等离子体像图像可以以图案化阵列布置以形成用于光流体显微镜的成像器模块或成像光谱仪。

3. 发明授权

US07701636B2 Gradient index microlenses and method of formation 有权
标题翻译：梯度指数微透镜和形成方法
公开(公告)号：US07701636B2
公开(公告)日：2010-04-20
申请号：US12043838
申请日：2008-03-06
申请人： Ulrich Boettiger , Saijin Liu
发明人： Ulrich Boettiger , Saijin Liu
IPC分类号： G02B27/10 , G02B3/00
CPC分类号： G02B3/0018 , B29D11/00365 , G02B3/0087 , H01L27/14627 , H01L27/14685
摘要： A lens includes a gradient index of refraction and a curved shape. A method of making the lens includes forming a plurality of layers, forming a shaped resist on the plurality of layers, and etching the resist and the plurality of layers to transfer the shape of the resist into the plurality of layers.
摘要翻译：透镜包括梯度折射率和弯曲形状。制造透镜的方法包括形成多个层，在多个层上形成成形抗蚀剂，并蚀刻抗蚀剂和多个层，以将抗蚀剂的形状转移到多个层中。

4. 发明授权

US07365305B2 Layered lens structures and methods of production in which radius of curvature of the upper lens can be varied 有权
标题翻译：层状透镜结构和制造方法，其中可以改变上透镜的曲率半径
公开(公告)号：US07365305B2
公开(公告)日：2008-04-29
申请号：US11641773
申请日：2006-12-20
申请人： Jin Li , Jiutao Li , Ulrich Boettiger , Loriston Ford
发明人： Jin Li , Jiutao Li , Ulrich Boettiger , Loriston Ford
IPC分类号： H01J5/02
CPC分类号： H01L27/14627 , G02B3/0018 , G02B3/0037 , G02B3/0056
摘要： A microlens structure includes lower lens layers on a substrate. A sputtered layer of glass, such as silicon oxide, is applied over the lower lens layers at an angle away from normal to form upper lens layers that increase the effective focal length of the microlens structure. The upper lens layers can be deposited in an aspherical shape with radii of curvature longer than the lower lens layers. As a result, small microlenses can be provided with longer focal lengths. The microlenses are arranged in arrays for use in imaging devices.
摘要翻译：微透镜结构包括在基底上的较低透镜层。将溅射的玻璃层（例如氧化硅）施加在下透镜层上以与法线成一定角度以形成增加微透镜结构的有效焦距的上透镜层。上透镜层可以沉积成具有比下透镜层更长的曲率半径的非球面形状。结果，可以提供更小焦距的小微透镜。微透镜被布置成阵列以用于成像装置。

5. 发明申请

US20070247719A1 MICRO-LENSES FOR IMAGERS 有权
标题翻译：图像微镜
公开(公告)号：US20070247719A1
公开(公告)日：2007-10-25
申请号：US11476041
申请日：2006-06-28
申请人： Ulrich Boettiger , Jin Li
发明人： Ulrich Boettiger , Jin Li
IPC分类号： G02B27/10
CPC分类号： G02B3/0031 , G02B3/0043 , G02B3/005 , G02B3/0068 , G02B13/002 , G02B13/0055 , G03F7/0005 , H01L27/14627 , H01L27/14632
摘要： A micro-lens and a method for forming the micro-lens is provided. A micro-lens includes a substrate and lens material located within the substrate, the substrate having a recessed area serving as a mold for the lens material. The recessed can be shaped such that the lens material corrects for optical aberrations. The micro-lens can be part of a micro-lens array. The recessed area can serve as a mold for lens material for the micro-lens array and can be shaped such that the micro-lens array includes arcuate, non-spherical, or non-symmetrical micro-lenses.
摘要翻译：提供微透镜和形成微透镜的方法。微透镜包括位于衬底内的衬底和透镜材料，衬底具有用作透镜材料的模具的凹陷区域。凹陷部分可以成形为使得透镜材料校正光学像差。微透镜可以是微透镜阵列的一部分。凹陷区域可以用作用于微透镜阵列的透镜材料的模具，并且可以被成形为使得微透镜阵列包括弓形，非球形或非对称微透镜。

6. 发明申请

US20070153107A1 Gapless microlens array and method of fabrication 有权
公开(公告)号：US20070153107A1
公开(公告)日：2007-07-05
申请号：US11707113
申请日：2007-02-16
申请人： Ulrich Boettiger , Jin Li
发明人： Ulrich Boettiger , Jin Li
IPC分类号： H04N9/04
CPC分类号： H01L27/14603 , B29D11/00278 , B29D11/00365 , G02B3/0018 , G02B3/0043 , G02B3/005 , G02B3/0056 , H01L27/14609 , H01L27/14621 , H01L27/14627 , H01L27/14641 , H01L31/02327 , H04N5/37457 , H04N9/045
摘要： A microlens array with reduced or no empty space between individual microlenses and a method for forming the same. The microlens array is formed by patterning a first set of microlens precursors in a checkerboard pattern on a substrate. The first set of microlens precursors is reflowed and cured into first microlenses impervious to subsequent reflows. Then, a second set of microlens precursors is patterned in spaces among the first microlenses, reflowed and cured into second microlenses. The reflows and cures can be conducted under different conditions, and the microlenses may be differently sized. The conditions of the reflows can be chosen to ensure that the focal lengths of microlenses are optimized for maximum sensor signal.

7. 发明申请

US20070121212A1 Controlling lens shape in a microlens array 有权
公开(公告)号：US20070121212A1
公开(公告)日：2007-05-31
申请号：US11640984
申请日：2006-12-19
申请人： Ulrich Boettiger , Jin Li
发明人： Ulrich Boettiger , Jin Li
IPC分类号： G02B27/10
CPC分类号： G02B3/0018 , G02B3/0043 , G02B3/005 , G02B3/0056 , G02B27/1013 , G02B27/1073 , G02B27/123 , H01L27/14603 , H01L27/14625 , H01L27/14627 , H01L27/14685
摘要： A semi-conductor based imager includes a microlens array having microlenses with modified focal characteristics. The microlenses are made of a microlens material, the melting properties of which are selectively modified to obtain different shapes after a reflow process. Selected microlenses, or portions of each microlens, are modified, by exposure to ultraviolet light, for example, to control the microlens shape produced by reflow melting. Controlling the microlens shape allows for modification of the focal characteristics of selected microlenses in the microlens array.

8. 发明申请

US20070096235A1 Microelectronic imagers with shaped image sensors and methods for manufacturing microelectronic imagers 有权
公开(公告)号：US20070096235A1
公开(公告)日：2007-05-03
申请号：US11589929
申请日：2006-10-31
申请人： Ulrich Boettiger , Jin Li , Steven Oliver
发明人： Ulrich Boettiger , Jin Li , Steven Oliver
IPC分类号： H01L31/0203
CPC分类号： H01L27/14618 , H01L27/14601 , H01L27/14625 , H01L27/14634 , H01L27/14683 , H01L27/14685 , H01L2924/0002 , H01L2924/351 , H01L2924/00
摘要： Microelectronic imagers with shaped image sensors and methods for manufacturing curved image sensors. In one embodiment, a microelectronic imager device comprises an imaging die having a substrate, a curved microelectronic image sensor having a face with a convex and/or concave portion at one side of the substrate, and integrated circuitry in the substrate operatively coupled to the image sensor. The imaging die can further include external contacts electrically coupled to the integrated circuitry and a cover over the curved image sensor.

9. 发明申请

US20060268143A1 Structure and method for FPN reduction in imaging devices 有权
标题翻译： FPN降低成像装置的结构和方法
公开(公告)号：US20060268143A1
公开(公告)日：2006-11-30
申请号：US11137446
申请日：2005-05-26
申请人： Ulrich Boettiger , John Ladd
发明人： Ulrich Boettiger , John Ladd
IPC分类号： H04N5/225
CPC分类号： C23C24/00 , C23C4/12 , C23C4/18 , C23C28/00 , C23C28/04 , C23C28/322 , C23C28/34 , C23C28/345 , H01L27/1462 , H01L27/14621 , H01L27/14627 , H01L27/14645 , H01L27/14685 , H04N5/365
摘要： Imaging devices having reduced fixed pattern noise are disclosed. The fixed pattern noise in the imaging devices is reduced by measuring and adjusting the spectral characteristics of the imager device on a pixel by pixel basis. The fixed pattern noise of the pixel cells are changed by modifying the absorption, reflectance, refractive index, shape, and/or micro structure of the material.
摘要翻译：公开了具有降低的固定图案噪声的成像装置。通过逐像素地测量和调整成像装置的光谱特性来降低成像装置中的固定图案噪声。通过改变材料的吸收，反射率，折射率，形状和/或微结构来改变像素单元的固定图案噪声。

10. 发明申请

US20060181692A1 Method and apparatus for controlling radiation beam intensity directed to microlithograhic substrates 有权
标题翻译：用于控制针对微蚀刻基片的辐射束强度的方法和装置
公开(公告)号：US20060181692A1
公开(公告)日：2006-08-17
申请号：US11397176
申请日：2006-04-04
申请人： Ulrich Boettiger , Scott Light
发明人： Ulrich Boettiger , Scott Light
IPC分类号： G03B27/72
CPC分类号： G03F7/70083 , G03F7/70108 , G03F7/70141 , G03F7/70191 , G03F7/70558 , Y10S430/143
摘要： A method and apparatus for controlling an intensity distribution of a radiation beam directed to a microlithographic substrate. The method can include directing a radiation beam from a radiation source along the radiation path, with the radiation beam having a first distribution of intensity as the function of location in a plane generally transverse to the radiation path. The radiation beam impinges on an adaptive structure positioned in the radiation path and an intensity distribution of the radiation beam is changed from the first distribution to a second distribution by changing a state of the first portion of the adaptive structure relative to a second portion of the adaptive structure. For example, the transmissivity of the first portion, or inclination of the first portion can be changed relative to the second portion. The radiation is then directed away from the adaptive structure to impinge on the microlithographic substrate.
摘要翻译：一种用于控制指向微光刻基片的辐射束的强度分布的方法和装置。该方法可以包括沿着辐射路径引导来自辐射源的辐射束，其中辐射束具有作为大致横向于辐射路径的平面中的位置的函数的强度的第一分布。辐射束照射位于辐射路径中的自适应结构，并且辐射束的强度分布从第一分布改变到第二分布，通过改变自适应结构的第一部分相对于第二部分的第二部分的状态自适应结构。例如，第一部分的透射率或第一部分的倾斜度可以相对于第二部分改变。然后将辐射导向远离自适应结构以照射到微光刻基板上。

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