专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明申请

US20110129478A1 PHARMACEUTICAL COMPOSITION FOR TREATMENT AND PREVENTION OF CANCER 审中-公开
标题翻译：用于治疗和预防癌症的药物组合物
公开(公告)号：US20110129478A1
公开(公告)日：2011-06-02
申请号：US13002636
申请日：2009-07-10
申请人： Fumiyoshi Okano , Takanori Saito , Takayoshi Ido , Masaki Shimizu
发明人： Fumiyoshi Okano , Takanori Saito , Takayoshi Ido , Masaki Shimizu
IPC分类号： A61K39/395 , C07K16/18 , C07K2/00 , C12N15/13 , A61P35/00
CPC分类号： C07K16/2803 , A61K2039/505 , C07K16/3015 , C07K16/3061 , C07K2317/732 , C07K2317/734
摘要： An antibody or a fragment thereof having immunoreactivity to a polypeptide comprising not less than 7 continuous amino acids in the CD179b protein, which was identified as a cancer antigen protein specifically expressed on the surfaces of cancer cells, can be used as a pharmaceutical composition for therapy and/or prophylaxis of cancer.
摘要翻译：可以将被鉴定为在癌细胞表面特异表达的癌抗原蛋白质的CD179b蛋白质中包含不少于7个连续氨基酸的多肽具有免疫反应性的抗体或其片段作为治疗用药物组合物和/或预防癌症。

42. 发明授权

US07336892B2 Reflection plate for semiconductor heat treatment and manufacturing method thereof 失效
标题翻译：半导体热处理用反射板及其制造方法
公开(公告)号：US07336892B2
公开(公告)日：2008-02-26
申请号：US10391583
申请日：2003-03-20
申请人： Kazuhiko Shimanuki , Hiroyuki Honma , Norihiko Saito , Hideyuki Yokoyama , Takanori Saito , Ken Nakao
发明人： Kazuhiko Shimanuki , Hiroyuki Honma , Norihiko Saito , Hideyuki Yokoyama , Takanori Saito , Ken Nakao
IPC分类号： F21V7/00 , G02F1/1335
CPC分类号： H01L21/67115 , H01L21/68757
摘要： It is provided that a reflection plate of semiconductor heat treatment, which is resistant to cracks or deformations by controlling the adsorption of foreign materials and the production of reaction. Said reflection plate 1 for semiconductor heat treatment is composed of a disk-shaped or ring-shaped plate of optically transmissible material and a plate 2 of inorganic material hermetically enclosed in said disk-shaped or ring-shaped plate, in which said plate of inorganic material has at least one side in contact with said plate of optically transmissible material, said at least one side 2a having a surface roughness of Ra 0.1 to 10.0 μm, said at least one side 2a formed grooves 2c therein.
摘要翻译：提供了半导体热处理反射板，其通过控制异物的吸附和反应的产生而耐裂纹或变形。用于半导体热处理的所述反射板1由光学可透射材料的盘形或环形板和密封在所述盘形或环形板上的无机材料板2组成，其中所述无机材料具有至少一侧与光学可透射材料的所述板接触，所述至少一个侧面2a具有Ra 0.1至10.0μm的表面粗糙度，所述至少一个侧面2a在其中形成沟槽2c。

43. 发明授权

US07311520B2 Heat treatment apparatus 有权
标题翻译：热处理设备
公开(公告)号：US07311520B2
公开(公告)日：2007-12-25
申请号：US10528704
申请日：2003-08-29
申请人： Takanori Saito , Kenichi Yamaga , Ken Nakao
发明人： Takanori Saito , Kenichi Yamaga , Ken Nakao
IPC分类号： F27D11/00
CPC分类号： H01L21/67109
摘要： The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a reaction tube consisting of a single tube contained in the heating-furnace body; a gas-discharging-unit connecting portion formed at an upper portion of the reaction tube, the gas-discharging-unit connecting portion having a narrow diameter; a substrate-to-be-processed supporting member for supporting a substrate to be processed, contained in the heating-furnace body; and a heating unit for heating the substrate to be processed supported by the substrate-to-be-processed supporting member. The heating unit has: a first heating portion arranged around the reaction tube, a second heating portion arranged around the gas-discharging-unit connecting portion, a third heating portion arranged around an upper portion of the reaction tube, a fourth heating portion arranged around a lower portion of the reaction tube, and a fifth heating portion arranged under the substrate-to-be-processed supporting member.
摘要翻译：本发明是一种热处理单元，包括：上端具有开口的加热炉体; 由包含在加热炉体内的单个管构成的反应管; 气体排出单元连接部，形成在反应管的上部，气体排出单元连接部具有窄直径; 用于支撑加热炉体内所包含的待处理基板的待处理基板的支撑部件; 以及加热单元，用于加热由要处理的基板支撑构件支撑的待处理基板。所述加热单元具有：设置在所述反应管周围的第一加热部，配置在所述排气单元连接部周围的第二加热部，配置在所述反应管的上部的第三加热部，反应管的下部，以及配置在被处理基板的支撑部件的下方的第五加热部。

44. 发明申请

US20070095288A1 Thermal processing method and thermal processing unit 失效
标题翻译：热处理方法和热处理单元
公开(公告)号：US20070095288A1
公开(公告)日：2007-05-03
申请号：US10551033
申请日：2004-03-29
申请人： Takanori Saito , Kazuhide Serizawa , Takashi Ichikawa
发明人： Takanori Saito , Kazuhide Serizawa , Takashi Ichikawa
IPC分类号： B05D3/02 , C23C16/00
CPC分类号： H01L21/67109
摘要： The present invention is a thermal processing method including: a step of conducting a predetermined thermal process in a low temperature zone to a plurality of objects to be processed held in a tier-like manner by a heating unit, in a processing container that is made of metal and has the heating unit therein, and a step of introducing a cooling gas into respective areas in the processing container divided in a height direction of the objects to be processed.
摘要翻译：本发明是一种热处理方法，其特征在于，包括以下步骤：在制造的处理容器中，通过加热单元，在低温区域对多个被处理物进行预定的热处理，的金属，并且在其中具有加热单元，以及将冷却气体引入处理容器中的被处理物体的高度方向上划分的各个区域的步骤。

45. 发明授权

US07141765B2 Heat treating device 有权
标题翻译：热处理装置
公开(公告)号：US07141765B2
公开(公告)日：2006-11-28
申请号：US10473248
申请日：2002-03-20
申请人： Toshiyuki Makiya , Takanori Saito , Karuki Eickmann , Sanjeev Kaushal , Anthony Dip , David L. O'meara
发明人： Toshiyuki Makiya , Takanori Saito , Karuki Eickmann , Sanjeev Kaushal , Anthony Dip , David L. O'meara
IPC分类号： H05B1/02 , A21B1/00
CPC分类号： G01K7/04 , G01K1/20
摘要： A antireflective film 50 is formed on a thermocouple 42 arranged in a processing vessel 1 of a heat treatment apparatus in order to improve the transient response characteristics of the thermocouple 42. In a typical embodiment, the thermocouple 42 is made by connecting a platinum wire 43A and a platinum-rhodium alloy wire 43B, and the antireflective film 50 is composed by stacking a silicon nitride layer 50C, silicon layer 50B and a silicon nitride layer 50A in that order.
摘要翻译：为了改善热电偶42的瞬态响应特性，在设置在热处理装置的处理容器1中的热电偶42上形成防反射膜50。在一个典型的实施例中，热电偶42是通过连接铂线43A和铂 - 铑合金线43B制成的，并且抗反射膜50由叠氮化硅层50C，硅层50B和硅氮化物层50A。

46. 发明授权

US07102104B2 Heat treatment system 失效
标题翻译：热处理系统
公开(公告)号：US07102104B2
公开(公告)日：2006-09-05
申请号：US10505863
申请日：2002-11-25
申请人： Takanori Saito , Kenichi Yamaga , Ken Nakao
发明人： Takanori Saito , Kenichi Yamaga , Ken Nakao
IPC分类号： F27B5/14
CPC分类号： H01L21/67109
摘要： The present invention is a thermal processing unit that includes: a tubular processing container; an object-to-be-processed holding unit that holds a plurality of objects to be processed in a tier-like manner and that can be inserted into and taken out from the processing container; a process-gas introducing unit that introduces a predetermined process gas into the processing container; a heating unit provided in the processing container, the heating unit heating the plurality of objects to be processed held by the object-to-be-processed holding unit when the object-to-be-processed holding unit is inserted into the processing container; and a container cooling unit that cools an outside wall surface of the processing container.
摘要翻译：本发明是一种热处理单元，其包括：管状处理容器; 待处理的待处理的保持单元，其以层状的方式保持待处理的多个对象，并且可以被插入到处理容器中并从处理容器中取出; 将预定的处理气体引入到处理容器内的处理气体导入部; 设置在处理容器中的加热单元，当待处理保持单元插入处理容器中时，加热单元将待处理保持单元保持的多个待处理对象加热; 以及冷却处理容器的外壁表面的容器冷却单元。

47. 发明申请

US20050225937A1 Cooling device and heat treating device using the same 有权
标题翻译：冷却装置及使用其的热处理装置
公开(公告)号：US20050225937A1
公开(公告)日：2005-10-13
申请号：US10505900
申请日：2003-02-28
申请人： Takanori Saito , Kenichi Yamaga
发明人： Takanori Saito , Kenichi Yamaga
IPC分类号： F27B5/04 , F27B5/06 , H01L21/00 , H01L21/205 , H01L21/22 , H01L21/302 , H01L21/31 , H05K7/20
CPC分类号： H01L21/67109
摘要： A heat treating device (50) has a cooling sleeve that covers a treating vessel (56) and a heater (100). The cooling sleeve has a cylindrical base member (110) and a cooling pipe (112) spirally wound on the outer peripheral surface hereof. The cooling pipe (112) is brazed to the base member (110).
摘要翻译：热处理装置（50）具有覆盖处理容器（56）和加热器（100）的冷却套筒。冷却套筒具有圆筒形的基座部件（110）和螺旋地卷绕在其外周面上的冷却管道（112）。冷却管（112）钎焊到基体（110）上。

48. 发明申请

US20050121432A1 Heat treatment system 失效
标题翻译：热处理系统
公开(公告)号：US20050121432A1
公开(公告)日：2005-06-09
申请号：US10505863
申请日：2002-11-25
申请人： Takanori Saito , Kenichi Yamaga , Ken Nakao
发明人： Takanori Saito , Kenichi Yamaga , Ken Nakao
IPC分类号： H01L21/28 , H01L21/00 , H01L21/02 , H01L21/205 , H01L21/324 , F27B5/14 , F27D11/00
CPC分类号： H01L21/67109
摘要： The present invention is a thermal processing unit that includes: a tubular processing container; an object-to-be-processed holding unit that holds a plurality of objects to be processed in a tier-like manner and that can be inserted into and taken out from the processing container; a process-gas introducing unit that introduces a predetermined process gas into the processing container; a heating unit provided in the processing container, the heating unit heating the plurality of objects to be processed held by the object-to-be-processed holding unit when the object-to-be-processed holding unit is inserted into the processing container; and a container cooling unit that cools an outside wall surface of the processing container.
摘要翻译：本发明是一种热处理单元，其包括：管状处理容器; 待处理的待处理的保持单元，其以层状的方式保持待处理的多个对象，并且可以被插入到处理容器中并从处理容器中取出; 将预定的处理气体引入到处理容器内的处理气体导入部; 设置在处理容器中的加热单元，当待处理保持单元插入处理容器中时，加热单元将待处理保持单元保持的多个待处理对象加热; 以及冷却处理容器的外壁表面的容器冷却单元。

49. 发明授权

US5899537A Wheel for an automobile and a manufacturing method therefor 失效
标题翻译：汽车车轮及其制造方法
公开(公告)号：US5899537A
公开(公告)日：1999-05-04
申请号：US863951
申请日：1997-05-27
申请人： Kishiro Abe , Saburo Maruyama , Jun Sakuma , Mitsunori Sugawara , Takanori Saito
发明人： Kishiro Abe , Saburo Maruyama , Jun Sakuma , Mitsunori Sugawara , Takanori Saito
IPC分类号： B21D53/26 , B23K9/00 , B23K26/00 , B23K26/20 , B60B3/04 , B60B3/00
CPC分类号： B60B3/005 , B21D53/26 , B60B3/044
摘要： A wheel for an automobile and a manufacturing method therefor wherein, in manufacturing a disc material portion from a substantially flat square plate, a length of the side of the substantially flat square plate is selected so that, after the subsequently formed disc is pressed into a rim, a most recessed portion of a ventilation is located axially outside a center of curvature of a well radius of the rim.
摘要翻译：一种用于汽车的车轮及其制造方法，其中，在从基本上平坦的方形板制造盘材料部分时，选择基本上平坦的方形板的一侧的长度，使得在随后形成的盘被压入轮辋，通气的最凹陷的部分位于轮辋的井半径的轴心外侧。

50. 发明授权

US5633079A Hard coat film having an easily slipping property and process for producing the same 失效
标题翻译：具有容易滑动性的硬涂膜及其制造方法
公开(公告)号：US5633079A
公开(公告)日：1997-05-27
申请号：US398999
申请日：1995-03-06
申请人： Satoru Shoshi , Shunpei Watanabe , Takanori Saito
发明人： Satoru Shoshi , Shunpei Watanabe , Takanori Saito
IPC分类号： B05D7/24 , B32B27/20 , B32B27/36 , C08J5/16 , C08J7/04 , C08L101/00 , C09D201/00 , C08L67/02 , C08L33/02 , C08L33/08
CPC分类号： C08J7/047 , C08J2433/00 , Y10T428/25 , Y10T428/26 , Y10T428/266 , Y10T428/31786 , Y10T428/31855
摘要： A hard coat film having an easily slipping property which comprises a plastic film and a hard coating layer of 1 to 15 .mu.m thickness made from an ultraviolet curable resin on the plastic film, wherein the hard coating layer contains particles of a high molecular weight polyester resin dispersed therein and the surface of the hard coating layer is provided with 3 to 200 protrusions of a diameter of 0.05 to 3 .mu.m and a height of 0.01 to 2 .mu.m per 100 .mu.m.sup.2 of the surface, and a process for producing the hard coat film. The hard coat film has a low haze value, a good transparency, an excellent resistance to scratch, a low kinematic friction coefficient, and an excellent slipping property both between coated surfaces and between a coated surface and a surface having no treatment.
摘要翻译：一种具有容易滑动性的硬涂层膜，其包含塑料膜和由塑料膜上的紫外线固化树脂制成的厚度为1至15μm的硬涂层，其中所述硬涂层含有高分子量聚酯颗粒树脂分散在其中，并且硬涂层的表面设置有3至200个直径为0.05至3μm的突起，并且每100平方米的表面具有0.01至2μm的高度，以及制备硬涂膜。硬涂膜具有低雾度值，良好的透明性，优异的耐划伤性，低运动摩擦系数，以及涂布表面之间以及涂覆表面和不经处理的表面之间的优异的滑动性能。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式