专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明授权

US07088443B2 System for detecting anomalies and/or features of a surface 有权
标题翻译：用于检测表面的异常和/或特征的系统
公开(公告)号：US07088443B2
公开(公告)日：2006-08-08
申请号：US10360512
申请日：2003-02-06
申请人： Mehdi Vaez-Iravani , Guoheng Zhao , Stanley E. Stokowski
发明人： Mehdi Vaez-Iravani , Guoheng Zhao , Stanley E. Stokowski
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/47 , G01N21/94 , G01N2201/1045
摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam. For inspecting surface with a pattern thereon, the light from the surface is first passed through a spatial filter before it is imaged onto the charge-coupled devices. The spatial filter includes stripes of scattering regions that shift in synchronism with relative motion between the beam and the surface to block Fourier components from the pattern. The spatial filter may be replaced by reflective strips that selectively reflects scattered radiation to the detector, where the reflective strips also shifts in synchronism with the relative motion.
摘要翻译：使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。为了在其上检查具有图案的表面，来自表面的光首先在其被成像到电荷耦合器件之前通过空间滤光器。空间滤波器包括散射区域的条带，其与波束和表面之间的相对运动同步地移动，以阻止来自图案的傅立叶分量。空间滤波器可以被选择性地将散射的辐射反射到检测器的反射条替代，其中反射条也与相对运动同步地移动。

42. 发明授权

US07079238B2 Sample inspection system 失效
公开(公告)号：US07079238B2
公开(公告)日：2006-07-18
申请号：US10437829
申请日：2003-05-13
申请人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
发明人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
IPC分类号： G01N21/00
CPC分类号： G01J3/44 , G01J3/0216 , G01J3/0229 , G01N21/21 , G01N21/47 , G01N21/474 , G01N21/8806 , G01N21/94 , G01N21/9501 , G01N2021/8825 , G01N2021/8845 , G01N2021/8848 , G01N2201/065
摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

43. 发明申请

US20050206886A1 Sample inspection system 审中-公开
公开(公告)号：US20050206886A1
公开(公告)日：2005-09-22
申请号：US11126467
申请日：2005-05-10
申请人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
发明人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
IPC分类号： G01N21/956 , G01J3/44 , G01N21/00 , G01N21/21 , G01N21/47 , G01N21/88 , G01N21/94 , G01N21/95 , H01L21/66
CPC分类号： G01J3/44 , G01J3/0216 , G01J3/0229 , G01N21/21 , G01N21/47 , G01N21/474 , G01N21/8806 , G01N21/94 , G01N21/9501 , G01N2021/8825 , G01N2021/8845 , G01N2021/8848 , G01N2201/065
摘要： A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors (78) to restrict detection to certain azimuthal angles.

44. 发明申请

US20050141810A1 Illumination apparatus and methods 有权
标题翻译：照明装置和方法
公开(公告)号：US20050141810A1
公开(公告)日：2005-06-30
申请号：US11015852
申请日：2004-12-15
申请人： Mehdi Vaez-Iravani , Guoheng Zhao , Stanley Stokowski
发明人： Mehdi Vaez-Iravani , Guoheng Zhao , Stanley Stokowski
IPC分类号： G02B6/00 , G02B6/04 , G02B6/32 , G02B27/48
CPC分类号： G02B27/48 , G02B6/0001 , G02B6/04
摘要： Disclosed are apparatus and methods for illuminating a sample, e.g., during an inspection of such sample for defects. In one aspect, the illumination apparatus includes a bundle of fibers that each have a first end and a second end. The illumination apparatus further includes an illumination selector for selectively transmitting one or more incident beams into one or more corresponding first ends of the optical fibers so that the selected one or more incident beams are output from one or more corresponding second ends of the fibers. The illumination apparatus also includes a lens arrangement for receiving the selected one or more incidents beams output from the corresponding one or more second ends of the fibers and directing the selected one or more incident beams towards the sample. The lens arrangement and the fibers are arranged with respect to each other so as to image an imaging plane of the sample at the second ends of the fibers. In one aspect, the incident beams are laser beams. In a specific application of the invention, the sample is selected from a group consisting of a semiconductor device, a semiconductor wafer, and a semiconductor reticle.
摘要翻译：公开了用于照亮样品的装置和方法，例如在检查这种样品的缺陷时。一方面，照明装置包括一束纤维，每束纤维具有第一端和第二端。照明装置还包括照明选择器，用于选择性地将一个或多个入射光束传输到光纤的一个或多个相应的第一端中，使得所选择的一个或多个入射光束从光纤的一个或多个对应的第二端输出。照明设备还包括透镜装置，用于接收从光纤的对应的一个或多个第二端输出的所选择的一个或多个事件光束，并将所选择的一个或多个入射光束引向样品。透镜布置和光纤相对于彼此布置，以便在纤维的第二端成像样品的成像平面。一方面，入射光束是激光束。在本发明的具体应用中，样品选自半导体器件，半导体晶片和半导体掩模版。

45. 发明申请

US20050094153A1 Metrology system using optical phase 审中-公开
标题翻译：计量系统采用光学相位
公开(公告)号：US20050094153A1
公开(公告)日：2005-05-05
申请号：US11016025
申请日：2004-12-17
申请人： Mehrdad Nikoonahad , Guoheng Zhao , Ian Smith , Mehdi Vaez-Iravani
发明人： Mehrdad Nikoonahad , Guoheng Zhao , Ian Smith , Mehdi Vaez-Iravani
IPC分类号： G03F7/20 , G01B9/02
CPC分类号： G03F7/70633
摘要： Misalignment error between two periodic structures such as two overlay targets placed side-by-side is measured. The two structures are illuminated by coherent radiation and the positive and negative diffraction beams of the input beam by the two structures are detected to discover the optical phase difference between the positive and negative diffraction beams. The misalignment between the two structures may then be ascertained from the phase difference.
摘要翻译：测量两个周期性结构（如并排放置的两个叠加目标）之间的对准误差。这两个结构被相干辐射照射，并且检测由两个结构的输入光束的正和负衍射光束以发现正和负衍射光束之间的光学相位差。然后可以从相位差确定两个结构之间的未对准。

46. 发明申请

US20050036138A1 System for detecting anomalies and / or features of a surface 有权
标题翻译：用于检测表面的异常和/或特征的系统
公开(公告)号：US20050036138A1
公开(公告)日：2005-02-17
申请号：US10949078
申请日：2004-09-24
申请人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
IPC分类号： G01B11/30 , G01N21/94 , G01N21/95 , G01N21/956 , H01L21/66 , G01N21/88
CPC分类号： G01N21/9501
摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.
摘要翻译：使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

47. 发明授权

US08462329B2 Multi-spot illumination for wafer inspection 有权
标题翻译：多点照明用于晶圆检查
公开(公告)号：US08462329B2
公开(公告)日：2013-06-11
申请号：US13187375
申请日：2011-07-20
申请人： Guoheng Zhao , Azmi Kadkly
发明人： Guoheng Zhao , Azmi Kadkly
IPC分类号： G01N21/94
CPC分类号： F21V5/008 , G01N21/8806 , G01N21/9501 , G01N21/9505
摘要： Illumination subsystems for multi-spot wafer inspection are provided.
摘要翻译：提供了多点晶圆检查的照明子系统。

48. 发明授权

US08415961B1 Measuring sheet resistance and other properties of a semiconductor 有权
标题翻译：测量薄膜电阻等半导体性能
公开(公告)号：US08415961B1
公开(公告)日：2013-04-09
申请号：US12961932
申请日：2010-12-07
申请人： Guoheng Zhao , Alex Salnik , Lena Nicolaides , Ady Levy
发明人： Guoheng Zhao , Alex Salnik , Lena Nicolaides , Ady Levy
IPC分类号： G01R27/08 , G01R31/308
CPC分类号： G01R31/2656 , G01R31/2648
摘要： A method may include illuminating a first area of a semiconductor utilizing a light source. The method may also include measuring at least one characteristic of electrical energy transmission utilizing a probe for placing at least one of at or near the illuminated first area of the semiconductor. The method may further include varying the measured at least one characteristic of the electrical energy transmission generated by the light from the light source incident upon the semiconductor while maintaining an intensity of the light source. Further, the method may include determining a sheet resistance for the junction of the semiconductor utilizing the varied at least one characteristic of the electrical energy transmission.
摘要翻译：一种方法可以包括利用光源照射半导体的第一区域。该方法还可以包括利用探针来测量电能传输的至少一个特征，所述探针用于放置半导体照明的第一区域中或其附近的至少一个。该方法还可以包括改变由入射到半导体上的来自光源的光产生的电能传输的测量的至少一个特性，同时保持光源的强度。此外，该方法可以包括利用电能传输的变化的至少一个特性来确定半导体的结的薄层电阻。

49. 发明授权

US08194240B1 Enhanced focusing capability on a sample using a spot matrix 有权
标题翻译：使用斑点矩阵对样本增强聚焦能力
公开(公告)号：US08194240B1
公开(公告)日：2012-06-05
申请号：US12042258
申请日：2008-03-04
申请人： Mehdi Vaez-Iravani , Stan Stokowski , Guoheng Zhao
发明人： Mehdi Vaez-Iravani , Stan Stokowski , Guoheng Zhao
IPC分类号： G01B9/00
CPC分类号： G01B11/0608 , G02B27/1086 , G02B27/425 , G02B27/4266 , G03F7/7085 , G03F9/7026
摘要： A plurality of spots forming an M×N matrix can be used in a focus system. Specifically, a plurality of identical spots can be simultaneously projected onto the sample. A V(z) curve can be generated for each spot. A robust focus can be determined based on the generated V(z) curves. Using the spot matrix significantly increases the probability that at least one of the plurality of spots in the matrix can provide an unambiguous V(z) curve. Thus, the spot matrix eliminates the need to search for an appropriate site because the spot matrix increases the probability of landing on a “good” location by a factor of M×N.
摘要翻译：在聚焦系统中可以使用形成M×N矩阵的多个点。具体地，可以将多个相同的斑点同时投影到样品上。可以为每个点生成V（z）曲线。可以基于生成的V（z）曲线来确定稳健的焦点。使用点阵显着增加矩阵中的多个点中的至少一个可以提供明确的V（z）曲线的概率。因此，斑点矩阵消除了搜索适当位置的需要，因为光点矩阵增加了在“良好”位置上降落M×N的概率。

50. 发明申请

US20100074515A1 Defect Detection and Response 审中-公开
标题翻译：缺陷检测和响应
公开(公告)号：US20100074515A1
公开(公告)日：2010-03-25
申请号：US12336704
申请日：2008-12-17
申请人： Guoheng Zhao , George H. Zapalac, JR. , Samuel S.H. Ngai , Medhi Vaez-Iravani , Ady Levy , Vineet Dharmadhikari
发明人： Guoheng Zhao , George H. Zapalac, JR. , Samuel S.H. Ngai , Medhi Vaez-Iravani , Ady Levy , Vineet Dharmadhikari
IPC分类号： G06K9/00 , G02F1/01
CPC分类号： G06T7/001 , G01N25/72 , G02F1/1309 , G06T2207/10048 , G06T2207/30148
摘要： To increase inspection throughput, the field of view of an infrared camera can be moved over the sample at a constant velocity. Throughout this moving, a modulation (such as optical or electrical) can be provided to the sample and infrared images can be captured using the infrared camera. Moving the field of view, providing the modulation, and capturing the infrared images can be synchronized. The infrared images can be filtered to generate the time delay lock-in thermography, thereby providing defect identification. In one embodiment, this filtering accounts for the number of pixels of the infrared camera in a scanning direction. For the case of optical modulation, a dark field region can be provided for the field of view throughout the moving, thereby providing an improved signal-to-noise ratio during filtering. Localized defects can be repaired by a laser integrated into the detection system or marked by ink for later repair in the production line.
摘要翻译：为了提高检查吞吐量，红外摄像机的视野可以以恒定的速度移动到样品上。在整个移动过程中，可以向样品提供调制（如光学或电气），并可使用红外摄像机捕获红外图像。移动视野，提供调制和捕获红外图像可以同步。可以对红外图像进行滤波以产生延时锁定热成像，从而提供缺陷识别。在一个实施例中，该过滤考虑了红外摄像机在扫描方向上的像素数量。对于光调制的情况，可以在整个移动期间为视场提供暗场区域，从而在滤波期间提供改善的信噪比。局部缺陷可以通过集成到检测系统中的激光器或由墨水标记来修复，以便在生产线中进行后续修复。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式