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    • 47. 发明授权
    • Electron beam lithography system
    • 电子束光刻系统
    • US06573520B1
    • 2003-06-03
    • US09534301
    • 2000-03-23
    • Hidetoshi SatohHiroshi TsujiKunio HaradaYasunari Sohda
    • Hidetoshi SatohHiroshi TsujiKunio HaradaYasunari Sohda
    • H01L2130
    • B82Y10/00B82Y40/00H01J37/18H01J37/20H01J37/3174H01J2237/204
    • An electron beam lithography system to conduct drawing on a sample with an electron beam within a first chamber. A second chamber is provided which is separated from the first chamber and has a volume smaller than that of the first chamber. A member is provided which is capable of placing the sample on a part separable from an X-Y stage within the first chamber and moving the separable part with the sample thereon to a position for drawing on the sample with the electron beam within the first chamber. A loading arrangement is provided for removing the separable part and the sample from the X-Y stage and moving the separated part to the second chamber from the first chamber. The separable part of the X-Y stage is independently removable from the sample and from the second chamber to outside of the second chamber.
    • 一种电子束光刻系统,用于在第一室内用电子束对样品进行拉伸。 设置有与第一室分离的第二室,其容积小于第一室的体积。 提供一种能够将样品放置在与第一室内的X-Y平台分离的部分上并将其上的样品移动到具有电子束在第一室内的样品的位置的位置的构件。 提供了一种装载装置,用于从X-Y平台移除可分离部分和样本,并将分离部分从第一室移动到第二室。 X-Y平台的可分离部分可独立从样品中移除,并从第二腔室分离到第二腔室外部。