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41. 发明申请

US20060243905A1 Imaging method 有权
公开(公告)号：US20060243905A1
公开(公告)日：2006-11-02
申请号：US11411154
申请日：2006-04-26
申请人： Kohei Yamaguchi , Kazuo Aoki , Kenji Obara
发明人： Kohei Yamaguchi , Kazuo Aoki , Kenji Obara
IPC分类号： G01N23/00
CPC分类号： G01N23/2251
摘要： A method which, while displacing the field-of-view, allows the image in a target area to be acquired without degradations such as out-of-focus of the image. Plural pieces of images are acquired before and after a target area while displacing the field-of-view. Next, these images are grouped into groups each of which includes several pieces of images, and integrated images on each group basis are created. Moreover, a relational expression is calculated which holds between image displacement quantity calculated by comparing the integrated images with each other and the number of the photographed pieces of images. Furthermore, image displacement quantities between the acquired plural pieces of images are calculated from this relational expression. Finally, these images are corrected by the amounts of these displacement quantities, then being integrated. This process allows reconfiguration of the image in the target area.

42. 发明授权

US08779360B2 Charged particle beam device, defect observation device, and management server 有权
标题翻译：带电粒子束装置，缺陷观察装置和管理服务器
公开(公告)号：US08779360B2
公开(公告)日：2014-07-15
申请号：US13809923
申请日：2011-06-22
申请人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
发明人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
IPC分类号： H01J37/153
CPC分类号： H01J37/153 , G01N23/00 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： Provided is a charged particle beam device that prevents the increase in processing trouble caused by deterioration in the reviewing performance (e.g., overlooking of defects) by detecting an operation abnormality affecting the performance of the device or a possibility of such an abnormality in the middle of a processing sequence of a sample and giving a feedback in real time. In each processing step of the charged particle beam device, monitoring items representing the operating status of the device (control status of the electron beam, an offset amount at the time of wafer positioning, a defect coordinate error offset amount, etc.) are monitored during the processing sequence of a sample and stored as history information. In the middle of the processing sequence, a comparative judgment between the value of each monitoring item and the past history information corresponding to the monitoring item is made according to preset judgment criteria. When the width of fluctuation from the past history information deviates from a reference range, an alert is issued.
摘要翻译：提供了一种带电粒子束装置，其通过检测影响装置的性能的操作异常或在中间的这种异常的可能性来防止由于检查性能的劣化（例如，忽视缺陷）引起的加工故障的增加样品的处理顺序并实时提供反馈。在带电粒子束装置的每个处理步骤中，监视表示装置的运行状态（电子束的控制状态，晶片定位时的偏移量，缺陷坐标误差偏移量等）的监视项目在样品的处理顺序期间并存储为历史信息。在处理顺序的中间，根据预先设定的判断基准，进行各监视项目的值与对应于监视项目的过去历史信息的比较判断。当过去历史信息的波动宽度偏离参考范围时，发出警报。

43. 发明申请

US20130112893A1 CHARGED PARTICLE BEAM DEVICE, DEFECT OBSERVATION DEVICE, AND MANAGEMENT SERVER 有权
标题翻译：充电颗粒光束装置，缺陷观察装置和管理服务器
公开(公告)号：US20130112893A1
公开(公告)日：2013-05-09
申请号：US13809923
申请日：2011-06-22
申请人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
发明人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
IPC分类号： G01N23/00
CPC分类号： H01J37/153 , G01N23/00 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： Provided is a charged particle beam device that prevents the increase in processing trouble caused by deterioration in the reviewing performance (e.g., overlooking of defects) by detecting an operation abnormality affecting the performance of the device or a possibility of such an abnormality in the middle of a processing sequence of a sample and giving a feedback in real time. In each processing step of the charged particle beam device, monitoring items representing the operating status of the device (control status of the electron beam, an offset amount at the time of wafer positioning, a defect coordinate error offset amount, etc.) are monitored during the processing sequence of a sample and stored as history information. In the middle of the processing sequence, a comparative judgment between the value of each monitoring item and the past history information corresponding to the monitoring item is made according to preset judgment criteria. When the width of fluctuation from the past history information deviates from a reference range, an alert is issued.
摘要翻译：提供了一种带电粒子束装置，其通过检测影响装置的性能的操作异常或在中间的这种异常的可能性来防止由于检查性能的劣化（例如，忽视缺陷）引起的加工故障的增加样品的处理顺序并实时提供反馈。在带电粒子束装置的每个处理步骤中，监视表示装置的运行状态（电子束的控制状态，晶片定位时的偏移量，缺陷坐标误差偏移量等）的监视项目在样品的处理顺序期间并存储为历史信息。在处理顺序的中间，根据预先设定的判断基准，进行各监视项目的值与对应于监视项目的过去历史信息的比较判断。当过去历史信息的波动宽度偏离参考范围时，发出警报。

44. 发明授权

US07881558B2 Scanning microscope 有权
标题翻译：扫描显微镜
公开(公告)号：US07881558B2
公开(公告)日：2011-02-01
申请号：US12420263
申请日：2009-04-08
申请人： Kohei Yamaguchi , Kazuo Aoki , Kenji Obara
发明人： Kohei Yamaguchi , Kazuo Aoki , Kenji Obara
IPC分类号： G06K9/36
CPC分类号： G01N23/2251
摘要： A method which, while displacing the field-of-view, allows the image in a target area to be acquired without degradations such as out-of-focus of the image. Plural pieces of images are acquired before and after a target area while displacing the field-of-view. Next, these images are grouped into groups each of which includes several pieces of images, and integrated images on each group basis are created. Moreover, a relational expression is calculated which holds between image displacement quantity calculated by comparing the integrated images with each other and the number of the photographed pieces of images. Furthermore, image displacement quantities between the acquired plural pieces of images are calculated from this relational expression. Finally, these images are corrected by the amounts of these displacement quantities, then being integrated. This process allows reconfiguration of the image in the target area.
摘要翻译：在移动视野的同时允许获取目标区域中的图像而不降低诸如图像的失焦的方法。在移动视野之前，在目标区域之前和之后获取多张图像。接下来，将这些图像分组成各自包括几个图像的组，并且创建基于每个组的集成图像。此外，计算出通过比较集成图像计算的图像位移量与拍摄的图像数量之间的关系表达式。此外，从该关系表达式计算所获取的多张图像之间的图像位移量。最后，这些图像被这些位移量的量校正，然后被整合。该过程允许重新配置目标区域中的图像。

45. 发明申请

US20100213371A1 SCANNING ELECTRON MICROSCOPE 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20100213371A1
公开(公告)日：2010-08-26
申请号：US12770244
申请日：2010-04-29
申请人： Kohei Yamaguchi , Kenji Obara
发明人： Kohei Yamaguchi , Kenji Obara
IPC分类号： H01J37/28 , G01N23/22
CPC分类号： H01J37/28 , H01J37/222 , H01J37/244 , H01J37/265 , H01J2237/216 , H01J2237/24475 , H01J2237/2448 , H01J2237/24495
摘要： A technique executes autofocus adjustment stably even when a plurality of patterns or foreign matter capable of being imaged only by a specific detector are included independently. Such an image as a concavo-convex image having a weak contrast can be picked up. The technique can automatically focus such an image even when it is difficult to find a focus position in the image. A scanning electron microscope includes a plurality of detectors for detecting secondary signals from a specimen when irradiated with an electron beam, and a calculation unit for combining the signals obtained from the detectors. At least two of the detectors are provided to be symmetric with respect to the electron beam. The focus of the electron beam is adjusted based on the signals of the detectors or on a signal corresponding to a combination of the signals.
摘要翻译：即使独立地包括仅能够由特定检测器成像的多个图案或异物也能够稳定地执行自动聚焦调整。可以拾取这样的具有弱对比度的凹凸图像的图像。即使在图像中难以找到焦点位置，该技术也可以自动对焦这样的图像。扫描电子显微镜包括多个用于在用电子束照射时检测来自样本的次级信号的检测器，以及用于组合从检测器获得的信号的计算单元。至少两个检测器被提供为相对于电子束对称。基于检测器的信号或对应于信号的组合的信号来调整电子束的焦点。

46. 发明授权

US07638767B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07638767B2
公开(公告)日：2009-12-29
申请号：US11655167
申请日：2007-01-19
申请人： Kohei Yamaguchi , Kenji Obara
发明人： Kohei Yamaguchi , Kenji Obara
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , G02B21/365 , H01J37/222 , H01J37/244 , H01J2237/24475 , H01J2237/2448 , H01J2237/24495
摘要： There is provided an electron microscope which can clearly detect a microscopic unevenness in a sample. According to a scanning electron microscope, when luminance signals from one pair of backscattered electron detectors are given by L and R, and when a luminance signal from a scattered electron detector is given by S, an adjustment value Lc of L and an adjustment value Rc of R are calculated by using primary homogeneous expressions of L, R, and S.
摘要翻译：提供了可以清楚地检测样品中的微观不均匀性的电子显微镜。根据扫描电子显微镜，当来自一对背散射电子检测器的亮度信号由L和R给出时，当来自散射电子检测器的亮度信号由S给出时，L的调整值Lc和调整值Rc 的R是通过使用L，R和S的初级均匀表达式来计算的。

47. 发明申请

US20080270044A1 Defect Review Apparatus and Method of Reviewing Defects 有权
标题翻译：缺陷评估装置及缺陷检查方法
公开(公告)号：US20080270044A1
公开(公告)日：2008-10-30
申请号：US12108068
申请日：2008-04-23
申请人： Takehiro Hirai , Kenji Obara , Kohei Yamaguchi
发明人： Takehiro Hirai , Kenji Obara , Kohei Yamaguchi
IPC分类号： G01B11/03 , G06F19/00
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/2817 , H01J2237/2826
摘要： The present invention aims to provide a defect review apparatus capable of suppressing a reduction in throughput with a minimized deviation-amount measurement, and capable of optimizing an FOV of a monitoring image. To this end, the review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated. Thereby, the reduction in throughput is suppressed to the minimum level, and furthermore a FOV necessary for the specimen to be within the field of view is set according to a convergence value of the calculated deviation amount.
摘要翻译：本发明的目的在于提供一种缺陷检查装置，其能够以最小化的偏差量测量来抑制吞吐量的降低，并能够优化监视图像的FOV。为此，用于通过将样本移动到预先计算的坐标来检查样本的检查装置包括：测量预先计算的坐标与样本的实际位置的坐标之间的偏差量的函数; 优化坐标校正表达式以最小化所测量的偏差量的函数; 以及确定偏差量已经收敛的函数。当偏差量收敛时，终止坐标校正表达式优化的测量。由此，将吞吐量的降低抑制到最小水平，并且根据计算出的偏差量的收敛值来设定样本在视野范围内所需的FOV。

48. 发明授权

US06792367B2 Method and apparatus for inspecting defects in a semiconductor wafer 失效
标题翻译：用于检查半导体晶片中的缺陷的方法和装置
公开(公告)号：US06792367B2
公开(公告)日：2004-09-14
申请号：US10115815
申请日：2002-03-28
申请人： Naoki Hosoya , Yuuji Takagi , Hisae Shibuya , Kenji Obara
发明人： Naoki Hosoya , Yuuji Takagi , Hisae Shibuya , Kenji Obara
IPC分类号： G06F1900
CPC分类号： H01L22/20 , G06T7/0002 , G06T7/0004 , G06T7/41 , G06T2200/24 , G06T2207/30148
摘要： In a wafer inspection and sampling system, wafer defects are detected and stored in a data store as defect data. Information is also provided, representative of clusters of defects on the wafer. A statistically based sampling of the defects is made to obtain a set of sampled defects. Subsequent detailed inspection and analysis of the sampled defects produces additional data which facilitate an understanding of process errors.
摘要翻译：在晶片检查和采样系统中，晶片缺陷被检测并存储在数据存储器中作为缺陷数据。还提供了信息，代表晶片上的缺陷簇。进行基于统计学的缺陷采样，以获得一组采样缺陷。随后对采样缺陷的详细检查和分析会产生额外的数据，有助于了解过程错误。

49. 发明授权

US09136189B2 Surface observation apparatus and surface observation method 有权
标题翻译：表面观察装置及表面观察法
公开(公告)号：US09136189B2
公开(公告)日：2015-09-15
申请号：US13318718
申请日：2010-05-25
申请人： Takehiro Hirai , Kenji Obara , Naoma Ban
发明人： Takehiro Hirai , Kenji Obara , Naoma Ban
IPC分类号： G06K9/00 , H01L21/66 , G06T7/00
CPC分类号： H01L22/20 , G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A surface observation apparatus is achieved, which enables even a beginner to easily select an optimal evaluation indicator for each of various patterns to be evaluated without a trial and error approach. A plurality of images to be evaluated are input from an image processing unit (114) to an evaluation image input unit (113a) (in step 901). The input images to be evaluated are displayed on a display (115). A user rearranges the images in accordance with an evaluation criterion of the user while referencing the display (115), and defines an evaluation criterion (in step 902). Evaluation values are calculated for the input images (to be evaluated) using a plurality of evaluation indicators (in step 903). The evaluation values for each of the evaluation indicators are compared with the evaluation criterion defined by the user, and correlation coefficients are then calculated (in step 904). An evaluation indicator having the maximum absolute value of a correlation coefficient is automatically selected as an evaluation criterion that is closest to the evaluation criterion defined by the user (in step 905). The images are rearranged in order of correlation coefficient and a list of the images is displayed on the display (115) so that the images are arranged in order of evaluation value (in step 906).
摘要翻译：实现了表面观察装置，即使初学者也能够在不进行试错法的情况下容易地选择要评估的各种图案中的各种图案的最佳评价指标。将要评估的多个图像从图像处理单元（114）输入到评估图像输入单元（113a）（在步骤901中）。待评估的输入图像显示在显示器（115）上。用户根据用户的评价标准重新排列图像，同时参照显示器（115），并定义评估标准（步骤902）。使用多个评价指标对输入图像（待评价）计算评价值（步骤903）。将各评价指标的评价值与用户定义的评价标准进行比较，然后计算相关系数（步骤904）。自动选择具有相关系数的最大绝对值的评估指标作为最接近用户定义的评估标准的评估标准（在步骤905中）。按照相关系数的顺序重新排列图像，并且在显示器（115）上显示图像列表，使得以评估值的顺序排列图像（在步骤906中）。

50. 发明授权

US08467595B2 Defect review system and method, and program 有权
标题翻译：缺陷审查制度和方法，程序
公开(公告)号：US08467595B2
公开(公告)日：2013-06-18
申请号：US13056353
申请日：2009-07-27
申请人： Noritsugu Takahashi , Muneyuki Fukuda , Tomoyasu Shojo , Naomasa Suzuki , Kenji Obara
发明人： Noritsugu Takahashi , Muneyuki Fukuda , Tomoyasu Shojo , Naomasa Suzuki , Kenji Obara
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/10061 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2811 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A system is provided that realizes both reduction in coordinate error and improvement in throughput and allows observation of a micro-defect. The system includes: a function of measuring an amount of displacement between preliminarily calculated coordinates and an actual specimen position; a function of optimizing a coordinate correction formula so as to minimize the amount of displacement from the measured amount of displacement; and a function of calculating variation of displacement between the preliminarily calculated coordinates and the actual specimen position by statistical processing. When a value of coordinate variation is sufficiently small with respect to the field of view of an image for observation, which is to be a defect observation image, the system acquires only the image for observation without performing acquisition of an image for search, which is to be a defect search image.
摘要翻译：提供一种系统，其实现了坐标误差的降低和吞吐量的提高，并且允许观察微缺陷。该系统包括：测量预先计算的坐标与实际样本位置之间的位移量的功能; 优化坐标校正公式的功能，以使从所测量的位移量中的位移量最小化; 以及通过统计处理来计算预先计算的坐标与实际样本位置之间的位移变化的功能。当相对于作为缺陷观察图像的观察用图像的视场的坐标变化量足够小时，系统仅获取用于观察的图像，而不进行用于搜索的图像的获取，其是成为缺陷搜索图像。

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