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    • 41. 发明授权
    • Bond and back side etchback transistor fabrication process
    • 键合和背面回蚀晶体管制造工艺
    • US06753239B1
    • 2004-06-22
    • US10407746
    • 2003-04-04
    • Robert O. Conn
    • Robert O. Conn
    • H01L2130
    • H01L27/1203H01L21/76256H01L21/84Y10S438/928
    • A supporting structure is wafer-bonded to the upper face side of a partially or fully processed device wafer. The device wafer includes a transistor having a well region that extends into the substrate material of the device wafer. The source and drain regions of the transistor extend into the well region. After attachment of the supporting structure, the device wafer is thinned from the back side until the bottom of the well region is reached. To reduce source and drain junction capacitances, etching can continue until the source and drain regions are reached. In one embodiment, all of the well-to-substrate junction is removed in a subsequent etching step, thereby reducing or eliminating the well-to-substrate junction capacitance of the resulting transistor. Resistance between the well electrode and the transistor channel is reduced because the well contact is disposed on the back side of the device wafer directly under the gate of the transistor.
    • 将支撑结构晶片结合到部分或完全处理的器件晶片的上表面侧。 器件晶片包括具有延伸到器件晶片的衬底材料中的阱区的晶体管。 晶体管的源区和漏极区延伸到阱区。 在安装支撑结构之后,装置晶片从后侧变薄直到达到井区的底部。 为了减少源极和漏极结电容,可以继续蚀​​刻直到达到源极和漏极区域。 在一个实施例中,在随后的蚀刻步骤中除去所有的阱到衬底结,从而减少或消除所得晶体管的阱到衬底结电容。 阱电极和晶体管沟道之间的电阻降低,因为阱触点直接设置在晶体管的栅极正下方的器件晶片的背面。
    • 43. 发明授权
    • Method for characterizing interconnect timing characteristics
    • 表征互连时序特征的方法
    • US6005829A
    • 1999-12-21
    • US83892
    • 1998-05-21
    • Robert O. Conn
    • Robert O. Conn
    • G01R27/04G01R31/28G01R31/30G01R31/317G01R31/3185G04F8/00G01R15/12G01R27/26
    • G01R31/31725G01R27/04G01R31/2853G01R31/2882G01R31/3016G01R31/318516
    • A reference ring oscillator circuit (RROC) is used to determine timing characteristics of a test interconnect structure in an integrated circuit. The RROC includes an odd number of inverters coupled together in a ring manner and has defined test segments at which a test interconnect can be loaded. Reference timing characteristics of the unloaded RROC are determined according to a calibration method including the steps of: (a) directly measuring signal propagation delay through each segment of the RROC; (b) modeling each test segment using an RC tree type reference circuit model having reference elements; (c) simulating the reference circuit model to provide a functional relationship between two reference capacitors; (d) defining upper and lower bounds for propagation delay through the test segment in terms of the reference elements; (e) determining values for the reference capacitor elements; and (f) measuring a reference frequency of oscillation of the unloaded RROC. After calibration, a test frequency of oscillation of the RROC is measured while a test interconnect structure is loaded onto a test segment. The period of the reference frequency is subtracted from the period of the test frequency. A time difference between the two periods is attributed to increased signal propagation delay through the RROC as a result of loading the test interconnect structure onto the test segment. Based on the measured time difference and determined reference timing characteristics of the test segment, timing characteristics of the test interconnect structure are determined.
    • 参考环形振荡器电路(RROC)用于确定集成电路中的测试互连结构的定时特性。 RROC包括以环形方式耦合在一起的奇数个反相器,并具有可以加载测试互连的定义的测试段。 根据校准方法确定无负载RROC的参考定时特性,包括以下步骤:(a)直接测量RROC的每个段的信号传播延迟; (b)使用具有参考元素的RC树型参考电路模型对每个测试段进行建模; (c)模拟参考电路模型以提供两个参考电容器之间的功能关系; (d)根据参考元素定义通过测试段的传播延迟的上限和下限; (e)确定参考电容器元件的值; 和(f)测量无负载RROC的参考振荡频率。 在校准之后,测量RROC的测试频率,同时将测试互连结构加载到测试段上。 从测试频率的周期中减去参考频率的周期。 两个周期之间的时间差归因于作为将测试互连结构加载到测试段上的结果,通过RROC增加的信号传播延迟。 基于所测量的时间差和测试段的确定的参考定时特性,确定测试互连结构的定时特性。
    • 44. 发明授权
    • Method for characterizing interconnect timing characteristics using
reference ring oscillator circuit
    • 使用参考环形振荡器电路来表征互连定时特性的方法
    • US5790479A
    • 1998-08-04
    • US710465
    • 1996-09-17
    • Robert O. Conn
    • Robert O. Conn
    • G01R27/04G01R31/28G01R31/30G01R31/317G01R31/3185G04F8/00G01R15/12
    • G01R31/31725G01R27/04G01R31/2853G01R31/2882G01R31/3016G01R31/318516
    • A reference ring oscillator circuit (RROC) is used to determine timing characteristics of a test interconnect structure in an integrated circuit. The RROC includes an odd number of inverters coupled together in a ring manner and has defined test segments at which a test interconnect can be loaded. Reference timing characteristics of the unloaded RROC are determined according to a calibration method including the steps of: (a) directly measuring signal propagation delay through each segment of the RROC; (b) modeling each test segment using an RC tree type reference circuit model having reference elements; (c) simulating the reference circuit model to provide a functional relationship between two reference capacitors; (d) defining upper and lower bounds for propagation delay through the test segment in terms of the reference elements; (e) determining values for the reference capacitor elements; and (f) measuring a reference frequency of oscillation of the unloaded RROC.
    • 参考环形振荡器电路(RROC)用于确定集成电路中的测试互连结构的定时特性。 RROC包括以环形方式耦合在一起的奇数个反相器,并具有可以加载测试互连的定义的测试段。 根据校准方法确定无负载RROC的参考定时特性,包括以下步骤:(a)直接测量RROC的每个段的信号传播延迟; (b)使用具有参考元素的RC树型参考电路模型对每个测试段进行建模; (c)模拟参考电路模型以提供两个参考电容器之间的功能关系; (d)根据参考元素定义通过测试段的传播延迟的上限和下限; (e)确定参考电容器元件的值; 和(f)测量无负载RROC的参考振荡频率。
    • 47. 发明授权
    • Accelerator on a chip having a cold ion source
    • 具有冷离子源的芯片上的加速器
    • US08541757B1
    • 2013-09-24
    • US13585829
    • 2012-08-14
    • Kim L. HaileyRobert O. Conn
    • Kim L. HaileyRobert O. Conn
    • H01H1/54
    • H01J37/3174B82Y10/00B82Y40/00H01J37/08H01J37/09H01J37/3177H01J2237/0437H01J2237/0802H01J2237/31755
    • An assembly includes a cold ion source and a chip. The cold ion source is fixed to the chip so that ions from the ion source can enter an acceleration channel in the chip. In one specific example, the ion source includes an ion exchange membrane that produces cold ions in that the ions as produced have an energy of less than 30 eV. The chip includes a substrate (such as a semiconductor substrate or a glass substrate) and a dielectric layer disposed on substrate, where the acceleration channel is a channel formed into the dielectric layer. In one specific example, the assembly is part of a Direct Write On Wafer (DWOW) printing system. The DWOW printing system is useful in semiconductor processing in that it can direct write an image onto a 300 mm diameter wafer in one minute.
    • 组件包括冷离子源和芯片。 冷离子源固定在芯片上,使得离子源的离子能够进入芯片中的加速通道。 在一个具体实例中,离子源包括产生冷离子的离子交换膜,因为产生的离子具有小于30eV的能量。 该芯片包括衬底(诸如半导体衬底或玻璃衬底)以及设置在衬底上的电介质层,其中加速通道是形成在电介质层中的通道。 在一个具体示例中,组件是直接写入晶圆(DWOW)打印系统的一部分。 DWOW打印系统在半导体处理中是有用的,因为它可以在一分钟内直接将图像写入到300mm直径的晶片上。
    • 48. 发明授权
    • Accelerator having acceleration channels formed between covalently bonded chips
    • 具有在共价键合芯片之间形成加速通道的加速器
    • US08519644B1
    • 2013-08-27
    • US13585833
    • 2012-08-15
    • Kim L. HaileyRobert O. Conn
    • Kim L. HaileyRobert O. Conn
    • H04H7/00
    • H05H7/00H01L24/01H01L2924/12042H01L2924/1306H01L2924/15787H01L2924/15788H05H7/06H05H9/00H05H15/00H01L2924/00
    • An accelerator assembly includes a first chip and a second chip. An acceleration channel is formed into a surface of a first side of the first chip. The first side of the first chip is covalently bonded to a first side of the second chip such that the channel is a tubular void between the first and second chips. The channel has a tubular inside sidewall surface, substantially no portion of which is a metal surface. The channel has length-to-width ratio greater than five, and a channel width less than one micron. There are many substantially identical channels that extend in parallel between the first and second chips. In one specific example, the assembly is part of a Direct Write On Wafer (DWOW) printing system. The DWOW printing system is useful in semiconductor processing in that it can direct write an image onto a 300 mm diameter wafer in one minute.
    • 加速器组件包括第一芯片和第二芯片。 加速通道形成在第一芯片的第一侧的表面上。 第一芯片的第一侧共价键合到第二芯片的第一侧,使得通道是第一和第二芯片之间的管状空隙。 通道具有管状内侧壁表面,其基本上没有其一部分是金属表面。 通道的长宽比大于5,通道宽度小于1微米。 在第一和第二芯片之间并行延伸有许多基本相同的通道。 在一个具体示例中,组件是直接写入晶圆(DWOW)打印系统的一部分。 DWOW打印系统在半导体处理中是有用的,因为它可以在一分钟内直接将图像写入到300mm直径的晶片上。