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41. 发明授权

US4721968A Ink jet transparency-mode recorder 失效
标题翻译：喷墨透明模式录像机
公开(公告)号：US4721968A
公开(公告)日：1988-01-26
申请号：US650245
申请日：1984-09-13
申请人： Ryuichi Arai , Shigeo Toganoh , Kunitaka Ozawa
发明人： Ryuichi Arai , Shigeo Toganoh , Kunitaka Ozawa
IPC分类号： B41J2/205 , G01D18/00 , B41J11/50 , G01D15/18 , H04N1/21
CPC分类号： B41J2/2052
摘要： A process for recording an image by depositing droplets of a recording liquid onto a light-transmitting recording material is provided which comprises depositing at least two droplets of a recording liquid of the same color per image element onto the recording material. An apparatus for the process is also provided which comprises an image-forming means or a recording means useful for a reflective recording material and a light transmitting material.
摘要翻译：提供了一种通过将记录液体的液滴沉积到透光记录材料上来记录图像的过程，其包括将至少两个每个图像元素的相同颜色的记录液体的液滴沉积到记录材料上。还提供了一种用于该方法的装置，其包括用于反射记录材料和透光材料的图像形成装置或记录装置。

42. 发明授权

US4676630A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4676630A
公开(公告)日：1987-06-30
申请号：US854541
申请日：1986-04-22
申请人： Koichi Matsushita , Junji Isohata , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
发明人： Koichi Matsushita , Junji Isohata , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70691
摘要： An exposure apparatus for exposing a plate-like member to a pattern with radiation in a step-and-repeat manner thereby to transfer images of the pattern onto different regions on a surface of the plate-like member. The apparatus includes an X-Y stage for moving the plate-like member in X and Y directions, a .theta.-stage for moving the plate-like member in a .theta. (rotational) direction relative to the X-Y stage, and laser interferometers for measuring an amount of movement of the plate-like member, by the X-Y stage, in each of the X and Y directions by use of a mirror mounted on the .theta.-stage. Placement of the mirror on the .theta.-stage allows correction of yawing if it occurs during movement of the plate-like member by X-Y stage. Also, deviation of the plate-like member in the Y direction if it occurs during movement of the plate-like member by the X-Y stage in the X direction, is detected by the laser interferometers. This allows detection of a positional error of the mirror in the .theta. direction and allows correction of the .theta.-error by the .theta.-stage.
摘要翻译：一种用于以逐步重复的方式将板状构件暴露于具有辐射的图案的曝光装置，从而将图案的图像转印到板状构件的表面上的不同区域上。该装置包括用于在X和Y方向上移动板状构件的XY平台，用于相对于XY平台以θ（旋转）方向移动板状构件的θ级和用于测量量的激光干涉仪通过使用安装在θ级上的反射镜，通过XY台在X和Y方向中的每一个中移动板状构件。如果在X-Y平台上移动板状构件时发生偏转，则可以在θ级放置镜子。此外，通过激光干涉仪检测板状构件在X方向上通过X-Y台移动期间在Y方向上的偏移。这允许在θ方向上检测反射镜的位置误差，并且允许通过θ级校正θ-误差。

43. 发明授权

US4664815A Ink production system 失效
标题翻译：油墨生产系统
公开(公告)号：US4664815A
公开(公告)日：1987-05-12
申请号：US792244
申请日：1985-10-30
申请人： Kunitaka Ozawa , Masahiro Haruta , Tsuyoshi Eida , Takashi Hamamoto
发明人： Kunitaka Ozawa , Masahiro Haruta , Tsuyoshi Eida , Takashi Hamamoto
IPC分类号： B01D15/08 , C09B67/54
CPC分类号： C09B67/0096 , B01D15/08
摘要： An ink production system constructed with a dyestuff solution producing unit, a dyestuff solution processing unit by execution of chromatographic operations on the dyestuff solution, and an ink preparation unit to effect preparation of ink with the refined dyestuff solution as discharged from the processing unit.
摘要翻译：由染料溶液产生单元构成的油墨生产系统，通过对染料溶液进行色谱操作的染料溶液处理单元和用于从处理单元排出的精制染料溶液制备油墨的油墨制备单元。

44. 发明授权

US09057966B2 Information processing apparatus, information processing method, and memory medium 有权
标题翻译：信息处理装置，信息处理方法和存储介质
公开(公告)号：US09057966B2
公开(公告)日：2015-06-16
申请号：US12356251
申请日：2009-01-20
申请人： Daisuke Itai , Yoshihiro Kawauchi , Kunitaka Ozawa
发明人： Daisuke Itai , Yoshihiro Kawauchi , Kunitaka Ozawa
IPC分类号： G06F17/18 , G03F7/20
CPC分类号： G03F7/70525
摘要： An information processing apparatus for processing information generated by an exposure apparatus which exposes a substrate to radiant energy, comprises an information collecting unit configured to collect first apparatus information obtained by the exposure apparatus via an operation thereof with respect to each of a plurality of first regions which form a first array defined on the substrate, a converting unit configured to convert at least a part of the first apparatus information collected with respect to each of the plurality of first regions by the information collecting unit into second apparatus information with respect to each of a plurality of second regions which form a second array, a statistical processing unit configured to statistically process the second apparatus information, and an analyzing unit configured to analyze the statistical processing result obtained by the statistical processing unit.
摘要翻译：一种信息处理设备，用于处理由曝光基板产生的辐射能量的曝光装置产生的信息，包括信息收集单元，被配置为收集由曝光装置获得的第一装置信息，该信息通过其对多个第一区域其形成在所述基板上限定的第一阵列，转换单元，被配置为将由所述信息收集单元将针对所述多个第一区域中的每一个收集的所述第一装置信息的至少一部分转换为关于每个所述第一装置信息的第二装置信息形成第二阵列的多个第二区域，统计处理单元，被配置为统计处理第二装置信息;以及分析单元，被配置为分析由统计处理单元获得的统计处理结果。

45. 发明授权

US08516145B2 Information processing method and information processing apparatus for transmitting data generated by device manufacturing apparatus 有权
标题翻译：用于发送由装置制造装置生成的数据的信息处理方法和信息处理装置
公开(公告)号：US08516145B2
公开(公告)日：2013-08-20
申请号：US12838210
申请日：2010-07-16
申请人： Daisuke Itai , Hiroaki Fujiwara , Mitsuhiro Masuda , Kunitaka Ozawa
发明人： Daisuke Itai , Hiroaki Fujiwara , Mitsuhiro Masuda , Kunitaka Ozawa
IPC分类号： G06F15/16
CPC分类号： G03F7/70525 , G03F7/70508 , G03F7/70991
摘要： An apparatus which transmits data generated by a device manufacturing apparatus to at least one terminal, comprises a communication unit, a transmission request processor configured to accept or reject a transmission request which the communication unit has received from the terminal, and a transmission controller configured to control the communication unit to transmit, in response to a transmission request accepted by the transmission request processor, data corresponding to the transmission request to a terminal, of the at least one terminal, which has transmitted the transmission request, wherein the transmission request processor accepts a new transmission request if a sum of transmission rates of the respective data concurrently transmitted from the communication unit in response to transmission requests which the transmission request processor has already accepted and a transmission rate at which data is transmitted in response to the new transmission request does not exceed a preset allowable transmission rate.
摘要翻译：将由装置制造装置生成的数据发送到至少一个终端的装置包括通信单元，被配置为接收或拒绝通信单元从终端接收到的发送请求的发送请求处理器，以及配置为控制所述通信单元响应于所述传输请求处理器接受的传输请求，将已经发送了所述传输请求的所述至少一个终端的发送请求的数据发送到终端，其中，所述传输请求处理器接受如果根据传输请求处理器已经接受的传输请求以及响应于新的传输请求发送数据的传输速率而从通信单元同时发送的各个数据的传输速率的总和，则发送新的传输请求不超过复位允许传输速率。

46. 发明申请

US20110029685A1 INFORMATION PROCESSING METHOD AND INFORMATION PROCESSING APPARATUS FOR TRANSMITTING DATA GENERATED BY DEVICE MANUFACTURING APPARATUS 有权
标题翻译：信息处理方法和信息处理装置，用于发送设备制造设备生成的数据
公开(公告)号：US20110029685A1
公开(公告)日：2011-02-03
申请号：US12838210
申请日：2010-07-16
申请人： Daisuke Itai , Hiroaki Fujiwara , Mitsuhiro Masuda , Kunitaka Ozawa
发明人： Daisuke Itai , Hiroaki Fujiwara , Mitsuhiro Masuda , Kunitaka Ozawa
IPC分类号： G06F15/16
CPC分类号： G03F7/70525 , G03F7/70508 , G03F7/70991
摘要： An apparatus which transmits data generated by a device manufacturing apparatus to at least one terminal, comprises a communication unit, a transmission request processor configured to accept or reject a transmission request which the communication unit has received from the terminal, and a transmission controller configured to control the communication unit to transmit, in response to a transmission request accepted by the transmission request processor, data corresponding to the transmission request to a terminal, of the at least one terminal, which has transmitted the transmission request, wherein the transmission request processor accepts a new transmission request if a sum of transmission rates of the respective data concurrently transmitted from the communication unit in response to transmission requests which the transmission request processor has already accepted and a transmission rate at which data is transmitted in response to the new transmission request does not exceed a preset allowable transmission rate.
摘要翻译：将由装置制造装置生成的数据发送到至少一个终端的装置包括通信单元，被配置为接收或拒绝通信单元从终端接收到的发送请求的发送请求处理器，以及配置为控制所述通信单元响应于所述传输请求处理器接受的传输请求，将已经发送了所述传输请求的所述至少一个终端的发送请求的数据发送到终端，其中，所述传输请求处理器接受如果根据传输请求处理器已经接受的传输请求以及响应于新的传输请求发送数据的传输速率而从通信单元同时发送的各个数据的传输速率的总和，则新的传输请求不超过复位允许传输速率。

47. 发明授权

US5964540A Printer apparatus 失效
标题翻译：打印机装置
公开(公告)号：US5964540A
公开(公告)日：1999-10-12
申请号：US488417
申请日：1995-06-07
申请人： Tadashi Shiina , Tetsuo Suzuki , Tetsuzo Mori , Kunitaka Ozawa , Katsunori Hatanaka , Masakazu Ozawa
发明人： Tadashi Shiina , Tetsuo Suzuki , Tetsuzo Mori , Kunitaka Ozawa , Katsunori Hatanaka , Masakazu Ozawa
IPC分类号： B41J25/304 , G06K15/10 , H04N1/50 , B41J3/54
CPC分类号： G06K15/102 , B41J25/304 , H04N1/506 , G06K2215/0077
摘要： A recording apparatus having a memory for storing recording data, and an address counter for controlling addresses in the memory in the direction of the columns or rows. The address counter controls a read start address for starting a process of reading the memory, thereby compensating for deviations in the longitudinal or widthwise direction of recording paper.
摘要翻译：具有用于存储记录数据的存储器的记录装置和用于控制存储器中列或行的方向上的地址的地址计数器。地址计数器控制用于开始读取存储器的处理的读取起始地址，从而补偿记录纸的纵向或宽度方向上的偏差。

48. 发明授权

US5898477A Exposure apparatus and method of manufacturing a device using the same 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US5898477A
公开(公告)日：1999-04-27
申请号：US782297
申请日：1997-01-15
申请人： Keiji Yoshimura , Kunitaka Ozawa , Hiroshi Kurosawa , Noriyasu Hasegawa
发明人： Keiji Yoshimura , Kunitaka Ozawa , Hiroshi Kurosawa , Noriyasu Hasegawa
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70358 , G03F7/70058 , G03F7/70558
摘要： An exposure apparatus includes a mask scanning device for scanning a mask on which a pattern is formed, a projection optical system for projecting the pattern on the mask onto a wafer, a wafer scanning device for scanning the wafer, onto which the pattern is projected by the projection optical system, an illuminating device for illuminating the mask in an illumination area narrower than the pattern by synchronously scanning the mask and the wafer relative to each other, using the mask scanning device and the wafer scanning device, so as to expose and transfer the pattern on the wafer, a detection device for detecting information regarding exposure before exposing and transferring the pattern onto the wafer by the illuminating device and for producing detection results, and a display for displaying exposure information obtained from the detection results. Also disclosed are methods of manufacturing semiconductor devices, for example, using such an exposure apparatus.
摘要翻译：曝光装置包括用于扫描其上形成有图案的掩模的掩模扫描装置，用于将掩模上的图案投影到晶片上的投影光学系统，用于扫描晶片的晶片扫描装置，其上突出有图案的晶片扫描装置投影光学系统，使用掩模扫描装置和晶片扫描装置通过使掩模和晶片相对于彼此同步扫描而在比图案窄的照明区域中照亮掩模的照明装置，以便曝光和转印晶片上的图案，用于检测关于在通过照明装置曝光并将图案转印到晶片上并且用于产生检测结果之前的曝光的信息的检测装置，以及用于显示从检测结果获得的曝光信息的显示器。还公开了制造半导体器件的方法，例如使用这种曝光装置。

49. 发明授权

US5822389A Alignment apparatus and SOR X-ray exposure apparatus having same 失效
标题翻译：对准装置和具有该对准装置的SOR X射线曝光装置
公开(公告)号：US5822389A
公开(公告)日：1998-10-13
申请号：US464038
申请日：1995-06-05
申请人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
发明人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
IPC分类号： G21K1/06 , G03F7/20 , G03F9/00 , G21K5/02 , G21K5/04 , G21K5/10 , H01L21/027 , H01L21/30 , H05H13/04 , G21K5/00
CPC分类号： G03F7/70008 , G03F7/702 , G03F7/70691 , G03F7/70741 , G03F7/70841 , G03F7/70866 , G03F7/70975 , G03F9/70 , G21K1/06
摘要： A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.
摘要翻译：同步加速器曝光包括用于产生同步加速器辐射束的同步加速器辐射源，以及具有用于保持掩模的掩模台和用于保持摇摆的晶片台的曝光单元，用于将辐射束引导到曝光单元的光束端口具有用于反射辐射束的反射镜的单元，用于使晶片相对于晶片台对准的预对准系统，用于使由晶片台保持的晶片相对于由掩模台保持的掩模对准的精细对准系统，用于存储掩模的掩模存储装置，用于存储晶片的晶片存储装置，用于在掩模存储装置和掩模台之间传送掩模的掩模传送装置和用于在晶片存储装置和掩模载台之间传送晶片的晶片传送装置晶圆台。

50. 发明授权

US5610965A Exposure method 失效
标题翻译：曝光方法
公开(公告)号：US5610965A
公开(公告)日：1997-03-11
申请号：US197569
申请日：1994-02-17
申请人： Makiko Mori , Kunitaka Ozawa , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Eiji Sakamoto
发明人： Makiko Mori , Kunitaka Ozawa , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Eiji Sakamoto
IPC分类号： G03F1/76 , G03F7/20 , H01L21/027 , G21K5/00
CPC分类号： G03F7/70866 , G03F7/70875
摘要： A method of exposing a wafer to exposure energy such as ultraviolet rays or X-rays through a mask to transfer a pattern of the mask onto the wafer, for example. The temperature of the mask and/or the wafer increases during the exposure operation by absorption of the exposure energy. While the wafer is being exposed, the temperature of the mask and/or the wafer is detected. If the temperature is going to exceed an exposable temperature range determined on the basis of the line width of the pattern to be transferred, the exposure operation is interrupted. Then, the heat accumulated in the mask and/or the wafer is removed. Thereafter, the exposure operation is resumed. This is repeated until the predetermined or required amount of exposure is reached, for one shot. By this, thermal expansion of the mask and the wafer during the exposure operation is prevented to assure the precision of the pattern transfer.
摘要翻译：例如，通过掩模将晶片暴露于诸如紫外线或X射线的曝光能量以将掩模的图案转印到晶片上的方法。掩模和/或晶片的温度在曝光操作期间通过吸收曝光能量而增加。当晶片被暴露时，检测掩模和/或晶片的温度。如果温度超过基于要传送的图案的线宽确定的可曝光温度范围，则曝光操作被中断。然后，除去积存在掩模和/或晶片中的热量。此后，恢复曝光操作。一直重复直到达到预定或所需的曝光量。由此，防止曝光操作期间的掩模和晶片的热膨胀，从而确保图案转印的精度。

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