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41. 发明授权

US09279774B2 Wafer inspection 有权
标题翻译：晶圆检查
公开(公告)号：US09279774B2
公开(公告)日：2016-03-08
申请号：US13544954
申请日：2012-07-09
申请人： Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak , Mehdi Vaez-Iravani , Guoheng Zhao
发明人： Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak , Mehdi Vaez-Iravani , Guoheng Zhao
IPC分类号： G01N21/00 , G01N21/95 , G01N21/47 , G01N21/956
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/8806 , G01N21/8851 , G01N21/956
摘要： Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to simultaneously form multiple illumination areas on the wafer with substantially no illumination flux between each of the areas. The system also includes a scanning subsystem configured to scan the multiple illumination areas across the wafer. In addition, the system includes a collection subsystem configured to simultaneously and separately image light scattered from each of the areas onto two or more sensors. Characteristics of the two or more sensors are selected such that the scattered light is not imaged into gaps between the two or more sensors. The two or more sensors generate output responsive to the scattered light. The system further includes a computer subsystem configured to detect defects on the wafer using the output of the two or more sensors.
摘要翻译：提供了配置用于检查晶片的系统。一个系统包括照明子系统，该照明子系统配置成在晶片上同时形成多个照明区域，其中每个区域之间基本上没有照明通量。该系统还包括扫描子系统，被配置为扫描晶片上的多个照明区域。另外，该系统包括一个收集子系统，该收集子系统配置成同时并分别将从每个区域散射的光分别映射到两个或更多个传感器上。选择两个或更多个传感器的特征，使得散射光不被成像到两个或更多个传感器之间的间隙中。两个或多个传感器响应散射光产生输出。该系统还包括被配置为使用两个或更多个传感器的输出来检测晶片上的缺陷的计算机子系统。

42. 发明授权

US09176072B2 Dark field inspection system with ring illumination 有权
标题翻译：具有环形照明的暗场检查系统
公开(公告)号：US09176072B2
公开(公告)日：2015-11-03
申请号：US12919760
申请日：2010-07-16
申请人： Guoheng Zhao , Mehdi Vaez-Iravani , Scott Young , Kris Bhaskar
发明人： Guoheng Zhao , Mehdi Vaez-Iravani , Scott Young , Kris Bhaskar
IPC分类号： H04N7/18 , G01N21/95 , G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8822
摘要： A dark field inspection system that minimizes the speckle noise due to sample surface roughness can include a plurality of beam shaping paths for generating a composite, focused illumination line on a wafer. Each beam shaping path can illuminate the wafer at an oblique angle. The plurality of beam shaping paths can form a ring illumination. This ring illumination can reduce the speckle effect, thereby improving SNR. An objective lens can capture scattered light from the wafer and an imaging sensor can receive an output of the objective lens. Because the wafer illumination occurs at oblique angles, the objective lens can have a high NA, thereby improving optical resolution of the imaging sensor, and the resulting signal level.
摘要翻译：使样品表面粗糙度引起的斑点噪声最小化的暗场检查系统可以包括用于在晶片上产生复合聚焦照明线的多个光束整形路径。每个光束成形路径可以倾斜角度照射晶片。多个光束成形路径可以形成环形照明。这种环形照明可以减少斑点效应，从而提高SNR。物镜可以捕获来自晶片的散射光，成像传感器可以接收物镜的输出。由于晶片照明以倾斜角度发生，所以物镜可以具有高NA，从而提高成像传感器的光学分辨率和所得到的信号电平。

43. 发明授权

US07989729B1 Detecting and repairing defects of photovoltaic devices 有权
标题翻译：检测和修复光伏器件的缺陷
公开(公告)号：US07989729B1
公开(公告)日：2011-08-02
申请号：US12045724
申请日：2008-03-11
申请人： Guoheng Zhao , George H. Zapalac, Jr. , Samuel S. H. Ngai , Ady Levy , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , George H. Zapalac, Jr. , Samuel S. H. Ngai , Ady Levy , Mehdi Vaez-Iravani
IPC分类号： G01J5/00 , G06K9/00
CPC分类号： G01J1/08 , G01J1/0466 , G01J2005/0077 , H01L31/186 , Y02E10/50 , Y02P70/521 , Y10S136/29
摘要： An apparatus for both detecting and repairing a shunt defect in a solar cell substrate. A shunt detection module detects the shunt defect in the substrate, using at least one of lock-in thermography and current-voltage testing. A process diagnostic module determines whether the substrate should be passed without further processing by the apparatus, rejected without further processing by the apparatus, or repaired by the apparatus. A shunt repair module electrically isolates the shunt defect in the substrate. In this manner, a single apparatus can quickly check for shunts and make a determination as to whether the substrate is worth repairing. If it is worth repairing, then the apparatus can make the repairs to the substrate.
摘要翻译：一种用于检测和修复太阳能电池基板中的分流缺陷的装置。分流检测模块使用锁定热成像和电流 - 电压测试中的至少一种来检测衬底中的分流缺陷。过程诊断模块确定衬底是否应该被通过而不被设备进一步处理，不经设备的进一步处理就被拒绝或被设备修复。分流修复模块电隔离衬底中的分流缺陷。以这种方式，单个装置可以快速检查分流并且确定基板是否值得修复。如果值得修理，那么设备可以对基材进行维修。

44. 发明申请

US20110169944A1 Dark Field Inspection System With Ring Illumination 有权
标题翻译：暗场检测系统与环照明
公开(公告)号：US20110169944A1
公开(公告)日：2011-07-14
申请号：US12919760
申请日：2010-07-16
申请人： Guoheng Zhao , Mehdi Vaez-Iravani , Scott Young , Kris Bhaskar
发明人： Guoheng Zhao , Mehdi Vaez-Iravani , Scott Young , Kris Bhaskar
IPC分类号： H04N7/18 , G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8822
摘要： A dark field inspection system that minimizes the speckle noise due to sample surface roughness can include a plurality of beam shaping paths for generating a composite, focused illumination line on a wafer. Each beam shaping path can illuminate the wafer at an oblique angle. The plurality of beam shaping paths can form a ring illumination. This ring illumination can reduce the speckle effect, thereby improving SNR. An objective lens can capture scattered light from the wafer and an imaging sensor can receive an output of the objective lens. Because the wafer illumination occurs at oblique angles, the objective lens can have a high NA, thereby improving optical resolution of the imaging sensor, and the resulting signal level.
摘要翻译：使样品表面粗糙度引起的斑点噪声最小化的暗场检查系统可以包括用于在晶片上产生复合聚焦照明线的多个光束整形路径。每个光束成形路径可以倾斜角度照射晶片。多个光束成形路径可以形成环形照明。这种环形照明可以减少斑点效应，从而提高SNR。物镜可以捕获来自晶片的散射光，成像传感器可以接收物镜的输出。由于晶片照明以倾斜角度发生，所以物镜可以具有高NA，从而提高成像传感器的光学分辨率和所得到的信号电平。

45. 发明申请

US20110069306A1 Referenced Inspection Device 审中-公开
标题翻译：参考检验装置
公开(公告)号：US20110069306A1
公开(公告)日：2011-03-24
申请号：US12994793
申请日：2009-05-29
申请人： Paul Doyle , Guoheng Zhao , Alexander Belyaev , J. Rex Runyon
发明人： Paul Doyle , Guoheng Zhao , Alexander Belyaev , J. Rex Runyon
IPC分类号： G01N21/88 , G01R31/26
CPC分类号： H01L21/6838
摘要： A tool for investigating a substrate, where the tool has a tool head for investigating the substrate, a chuck for disposing an upper surface of the substrate in proximity to the tool head, and an air bearing disposed on the tool head adjacent the substrate. The air bearing has a pressure source and a vacuum source, where the vacuum source draws the substrate toward the air bearing and the pressure source prevents the substrate from physically contacting the air bearing. The pressure source and the vacuum source work in cooperation to dispose the upper surface of the substrate at a known distance from the tool head. By using the air bearing as part of the tool in this manner, registration of the substrate to the tool head is accomplished relative to the upper surface of the substrate, not the back side of the substrate.
摘要翻译：一种用于调查基板的工具，其中该工具具有用于检查基板的工具头，用于将基板的上表面设置在工具头附近的卡盘以及设置在与基板相邻的工具头上的空气轴承。空气轴承具有压力源和真空源，其中真空源将基板拉向空气轴承，并且压力源防止基板物理接触空气轴承。压力源和真空源协同工作，将衬底的上表面设置在与工具头一段已知距离处。通过以这种方式使用空气轴承作为工具的一部分，基板相对于基板的上表面而不是基板的背面完成对准工具头。

46. 发明授权

US07733111B1 Segmented optical and electrical testing for photovoltaic devices 失效
标题翻译：光电器件分段光电测试
公开(公告)号：US07733111B1
公开(公告)日：2010-06-08
申请号：US12045734
申请日：2008-03-11
申请人： Guoheng Zhao , Bin-Ming B. Tsai , Mehdi Vaez-Iravani , Ady Levy , George H. Zapalac, Jr. , Samuel S. H. Ngai
发明人： Guoheng Zhao , Bin-Ming B. Tsai , Mehdi Vaez-Iravani , Ady Levy , George H. Zapalac, Jr. , Samuel S. H. Ngai
IPC分类号： G01R31/26
CPC分类号： H02S50/10 , F21S8/006 , F21Y2115/10
摘要： An apparatus for inducing a current in a solar cell substrate. A substrate receiving surface receives the substrate, and an array of a plurality of individually addressable light sources illuminates the substrate in a sequenced manner. A sequencer controls the sequenced manner of illumination of the substrate by the array. A front side electrical contact makes electrical contact to a front side of the substrate, and a back side electrical contact makes electrical contact to a back side of the substrate. A meter is electrically connected to the front side electrical contact and the back side electrical contact, and senses the current induced in the substrate during the sequenced illumination of the substrate.
摘要翻译：一种用于在太阳能电池基板中感应电流的装置。衬底接收表面接收衬底，并且多个可单独寻址的光源的阵列以顺序的方式照射衬底。定序器通过阵列控制衬底的照明顺序。前侧电触点与基板的前侧电接触，并且背面电触点与基板的背面进行电接触。仪表电连接到前侧电触头和后侧电触点，并感测在衬底的顺序照明期间在衬底中感应的电流。

47. 发明授权

US07515253B2 System for measuring a sample with a layer containing a periodic diffracting structure 有权
$System for measuring a sample with a layer containing a periodic diffracting structure$
标题翻译：用含有周期性衍射结构的层测量样品的系统
公开(公告)号：US07515253B2
公开(公告)日：2009-04-07
申请号：US11329500
申请日：2006-01-10
申请人： Noah Bareket , Daniel C. Wack , Guoheng Zhao
发明人： Noah Bareket , Daniel C. Wack , Guoheng Zhao
IPC分类号： G01B11/02
CPC分类号： G01N21/211 , G01N21/8422 , G01N2021/213
摘要： To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the thickness of the film, employing a film model that does not vary the critical dimension or parameters related to other characteristics of the structure. The thickness of the film may be estimated using the film model sufficiently accurately so that such estimate may be employed to simplify the structure model for deriving the critical dimension and other parameters related to the two-dimensional diffracting structure.
摘要翻译：为了测量膜的一维或二维衍射结构的临界尺寸和其它参数，可以通过首先进行薄膜厚度的测量来简化计算，使用不改变临界尺寸的膜模型或与结构的其他特征相关的参数。可以使用膜模型来充分准确地估计膜的厚度，使得可以采用这种估计来简化用于导出临界尺寸和与二维衍射结构相关的其它参数的结构模型。

48. 发明申请

US20080037005A1 System for measuring a sample with a layer containing a periodic diffracting structure 有权
$System for measuring a sample with a layer containing a periodic diffracting structure$
标题翻译：用含有周期性衍射结构的层测量样品的系统
公开(公告)号：US20080037005A1
公开(公告)日：2008-02-14
申请号：US11329500
申请日：2006-01-10
申请人： Noah Bareket , Daniel Wack , Guoheng Zhao
发明人： Noah Bareket , Daniel Wack , Guoheng Zhao
IPC分类号： G01N21/00 , G01J3/28
CPC分类号： G01N21/211 , G01N21/8422 , G01N2021/213
摘要： To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the thickness of the film, employing a film model that does not vary the critical dimension or parameters related to other characteristics of the structure. The thickness of the film may be estimated using the film model sufficiently accurately so that such estimate may be employed to simplify the structure model for deriving the critical dimension and other parameters related to the two-dimensional diffracting structure.
摘要翻译：为了测量膜的一维或二维衍射结构的临界尺寸和其它参数，可以通过首先进行薄膜厚度的测量来简化计算，使用不改变临界尺寸的膜模型或与结构的其他特征相关的参数。可以使用膜模型来充分准确地估计膜的厚度，使得可以采用这种估计来简化用于导出临界尺寸和与二维衍射结构相关的其它参数的结构模型。

49. 发明授权

US07319229B2 Illumination apparatus and methods 有权
标题翻译：照明装置和方法
公开(公告)号：US07319229B2
公开(公告)日：2008-01-15
申请号：US11015852
申请日：2004-12-15
申请人： Mehdi Vaez-Iravani , Guoheng Zhao , Stanley E. Stokowski
发明人： Mehdi Vaez-Iravani , Guoheng Zhao , Stanley E. Stokowski
IPC分类号： G01J1/42 , G08B5/36 , G02B6/32
CPC分类号： G02B27/48 , G02B6/0001 , G02B6/04
摘要： Disclosed are apparatus and methods for illuminating a sample, e.g., during an inspection of such sample for defects. In one aspect, the illumination apparatus includes a bundle of fibers that each has a first end and a second end. The illumination apparatus further includes an illumination selector for selectively transmitting one or more incident beams into one or more corresponding first ends of the optical fibers so that the selected one or more incident beams are output from one or more corresponding second ends of the fibers. The illumination apparatus also includes a lens arrangement for receiving the selected one or more incidents beams output from the corresponding one or more second ends of the fibers and directing the selected one or more incident beams towards the sample. The lens arrangement and the fibers are arranged with respect to each other so as to image an imaging plane of the sample at the second ends of the fibers. In one aspect, the incident beams are laser beams. In a specific application of the invention, the sample is selected from a group consisting of a semiconductor device, a semiconductor wafer, and a semiconductor reticle.
摘要翻译：公开了用于照亮样品的装置和方法，例如在检查这种样品的缺陷时。一方面，照明装置包括一束纤维，每束纤维具有第一端和第二端。照明装置还包括照明选择器，用于选择性地将一个或多个入射光束传输到光纤的一个或多个对应的第一端中，使得所选择的一个或多个入射光束从光纤的一个或多个对应的第二端输出。照明设备还包括透镜装置，用于接收从光纤的对应的一个或多个第二端输出的所选择的一个或多个事件光束，并将所选择的一个或多个入射光束引向样品。透镜布置和光纤相对于彼此布置，以便在纤维的第二端成像样品的成像平面。一方面，入射光束是激光束。在本发明的具体应用中，样品选自半导体器件，半导体晶片和半导体掩模版。

50. 发明申请

US20080002193A1 SYSTEM FOR DETECTING ANOMALIES AND/OR FEATURES OF A SURFACE 审中-公开
标题翻译：用于检测表面异常和/或特征的系统
公开(公告)号：US20080002193A1
公开(公告)日：2008-01-03
申请号：US11855935
申请日：2007-09-14
申请人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/9501
摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.
摘要翻译：使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

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