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41. 发明授权

US07888301B2 Resist, barc and gap fill material stripping chemical and method 有权
标题翻译：抗蚀剂，棒材和间隙填充材料剥离化学和方法
公开(公告)号：US07888301B2
公开(公告)日：2011-02-15
申请号：US10581475
申请日：2004-12-01
申请人： David D. Bernhard , Yoichiro Fujita , Tomoe Miyazawa , Makoto Nakajima
发明人： David D. Bernhard , Yoichiro Fujita , Tomoe Miyazawa , Makoto Nakajima
IPC分类号： C11D7/32
CPC分类号： H01L21/31111 , C11D3/044 , C11D3/245 , C11D3/30 , C11D3/43 , C11D7/10 , C11D7/28 , C11D7/3209 , C11D7/5004 , C11D11/0047 , G03F7/423 , G03F7/425 , H01L21/02063 , H01L21/02071
摘要： An aqueous-based composition and process for removing photoresist, bottom anti-reflective coating (BARC) material, and/or gap fill material from a substrate having such material(s) thereon. The aqueous-based composition includes a fluoride source, at least one organic amine, at least one organic solvent, water, and optionally chelating agent and/or surfactant. The composition achieves high-efficiency removal of such material(s) in the manufacture of integrated circuitry without adverse effect on metal species on the substrate, such as copper, and without damage to SiOC-based dielectric materials employed in the semiconductor architecture.
摘要翻译：一种用于从其上具有这种材料的基材去除光致抗蚀剂，底部抗反射涂层（BARC）材料和/或间隙填充材料的水基组合物和方法。水基组合物包括氟化物源，至少一种有机胺，至少一种有机溶剂，水和任选的螯合剂和/或表面活性剂。组合物可以在集成电路的制造中实现这种材料的高效去除，而不会对衬底（例如铜）上的金属物质产生不利影响，并且不损坏半导体结构中使用的基于SiOC的介电材料。

42. 发明授权

US07873138B2 Structure and method for bolting neutron reflector 有权
标题翻译：螺栓中子反射器的结构和方法
公开(公告)号：US07873138B2
公开(公告)日：2011-01-18
申请号：US10311602
申请日：2002-04-25
申请人： Makoto Nakajima , Hirokazu Shoumura , Kenji Umeda
发明人： Makoto Nakajima , Hirokazu Shoumura , Kenji Umeda
IPC分类号： G21C5/00
CPC分类号： G21C11/06 , G21Y2002/206 , G21Y2002/303 , G21Y2004/301 , Y02E30/40
摘要： A neutron reflector bolt fastening structure is disclosed in which even upon relaxation in the fastening forces thereof being generated in tie rods for divided stage portions as a result of neutron irradiation, it is possible to press the neutron reflector firmly against a core vessel. The neutron reflector bolt fastening structure includes: a neutron reflector which includes of a plurality of divided stage portions and situated in a core vessel in a reactor vessel; a plurality of tie rods for fixing the neutron reflector to the core vessel; and a plurality of bolts for exclusively fixing the lowermost stage portion of the plurality of stage portions of the neutron reflector to the core vessel.
摘要翻译：公开了一种中子反射器螺栓紧固结构，其中即使在由于中子照射而产生在用于分割台部分的拉杆中的紧固力的松弛中，也可以将中子反射器牢固地压靠在核心容器上。中子反射器螺栓紧固结构包括：中子反射器，其包括多个分级台部并且位于反应器容器中的核心容器中; 多个用于将中子反射器固定到核心容器的拉杆; 以及用于将中子反射器的多个台阶部分的最下段部分专门固定到核心容器的多个螺栓。

43. 发明申请

US20080006305A1 Resist, Barc and Gap Fill Material Stripping Chemical and Method 有权
标题翻译：抗蚀剂，Barc和Gap填充材料剥离化学和方法
公开(公告)号：US20080006305A1
公开(公告)日：2008-01-10
申请号：US10581475
申请日：2004-12-01
申请人： David D. Bernhard , Yoichiro Fujita , Tomoe Miyazawa , Makoto Nakajima
发明人： David D. Bernhard , Yoichiro Fujita , Tomoe Miyazawa , Makoto Nakajima
IPC分类号： G03F7/42 , B08B3/04 , C11D7/32
CPC分类号： H01L21/31111 , C11D3/044 , C11D3/245 , C11D3/30 , C11D3/43 , C11D7/10 , C11D7/28 , C11D7/3209 , C11D7/5004 , C11D11/0047 , G03F7/423 , G03F7/425 , H01L21/02063 , H01L21/02071
摘要： An aqueous-based composition and process for removing photoresist, bottom anti-reflective coating (BARC) material, and/or gap fill material from a substrate having such material(s) thereon. The aqueous-based composition includes a fluoride source, at least one organic amine, at least one organic solvent, water, and optionally chelating agent and/or surfactant. The composition achieves high-efficiency removal of such material(s) in the manufacture of integrated circuitry without adverse effect on metal species on the substrate, such as copper, and without damage to SiOC-based dielectric materials employed in the semiconductor architecture.
摘要翻译：一种用于从其上具有这种材料的基材去除光致抗蚀剂，底部抗反射涂层（BARC）材料和/或间隙填充材料的水基组合物和方法。水基组合物包括氟化物源，至少一种有机胺，至少一种有机溶剂，水和任选的螯合剂和/或表面活性剂。组合物可以在集成电路的制造中实现这种材料的高效去除，而不会对衬底（例如铜）上的金属物质产生不利影响，并且不损坏半导体结构中使用的基于SiOC的介电材料。

44. 发明授权

US06982009B2 Method and device for cleaning abrasive plates on an abrasive machine 失效
标题翻译：用于在研磨机上清洁研磨板的方法和装置
公开(公告)号：US06982009B2
公开(公告)日：2006-01-03
申请号：US10937830
申请日：2004-09-09
申请人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
发明人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
IPC分类号： B08B3/00
CPC分类号： B24B37/08 , B08B3/024 , B08B15/04 , B08B2203/0229 , B24B53/017 , Y10S134/902
摘要： The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.
摘要翻译：本发明的方法清洗研磨机的上磨料板和下研磨板的磨料面。该方法由清洁装置执行，该清洁装置包括：用于喷射水的喷嘴; 用于防止喷射水在空气中飞散的刷子，刷子包围喷嘴; 以及用于封闭防磨刷和上磨料板的外边缘之间的间隙的另一刷子，其特征在于以下步骤：从喷嘴向上磨料板的研磨面喷射水; 将喷嘴移向上磨料板的外边缘; 并且当在防磨刷和上磨料板的外边缘之间形成间隙时，通过闭合刷闭合间隙。

45. 发明申请

US20050159090A1 Polishing apparatus 有权
标题翻译：抛光设备
公开(公告)号：US20050159090A1
公开(公告)日：2005-07-21
申请号：US11033884
申请日：2005-01-13
申请人： Makoto Nakajima
发明人： Makoto Nakajima
IPC分类号： B24B37/08 , B24B47/12 , H01L21/304 , B24B7/00
CPC分类号： B24B37/08 , B24B37/105 , B24B47/12
摘要： The small polishing apparatus is capable of simultaneously polishing both side faces of a work piece, and a lower polishing plate, an internal gear and a sun gear are respectively driven by direct drive (DD) motors. The polishing apparatus comprises: an upper and a lower polishing plates; a sun gear and an internal gear; and a carrier provided between the polishing plates and engaged with the gears. Both side faces of the work piece held by the carrier are simultaneously polished by the polishing plates. DDmotors respectively rotate the lower polishing plate and the gears. Each DD motor has a ring-shaped output member. A first DD motor has the output member directly connected to a rotary holding member rotatably holding the lower polishing plate. A second DD motor is provided under the first DD motor. One end of a rotary shaft, which is pierced through the first DD motor, is connected to a rotary holding member rotatably holding one of the gears, and the other end is directly connected to the output member of the second DD motor.
摘要翻译：小型抛光装置能够同时抛光工件的两个侧面，并且下部抛光板，内部齿轮和太阳齿轮分别由直接驱动（DD）电动机驱动。抛光装置包括：上和下抛光板; 太阳齿轮和内齿轮; 以及设置在所述研磨板之间并与所述齿轮接合的载体。由载体保持的工件的两个侧面由抛光板同时抛光。 DDmotors分别旋转下抛光板和齿轮。每个DD电机具有环形输出部件。第一DD马达具有直接连接到可旋转地保持下抛光板的旋转保持构件的输出构件。第一DD电机设置在第一DD电机下面。旋转轴的穿过第一DD电动机的一端连接到可旋转地保持其中一个齿轮的旋转保持构件，另一端直接连接到第二DD电动机的输出构件。

46. 发明授权

US06705929B1 Cloth cleaning device and polishing machine 失效
标题翻译：布清洁装置和抛光机
公开(公告)号：US06705929B1
公开(公告)日：2004-03-16
申请号：US09716398
申请日：2000-11-20
申请人： Yoshinobu Nishimoto , Makoto Nakajima , Yoshio Nakamura , Yasuhide Denda , Chihiro Miyagawa
发明人： Yoshinobu Nishimoto , Makoto Nakajima , Yoshio Nakamura , Yasuhide Denda , Chihiro Miyagawa
IPC分类号： B24B700
CPC分类号： B24B53/017 , B08B3/024
摘要： Cloth cleaning device of a polishing machine which is capable of fully cleaning a polishing cloth including a part in the vicinity of a center roller. The cloth cleaning device includes an arm movable in a plane parallel to the polishing cloth between a first position above the polishing cloth and a second position outside of the polishing cloth. A jet nozzle is attached to the arm and directs high pressure water toward the polishing cloth. An enclosing member encloses the jet nozzle so as to prevent the high pressure water, which has been directed out from the jet nozzle, from scattering. The jet nozzle is oriented toward the center roller and the high pressure water is directed toward the part of the polishing cloth in the vicinity of the center roller when the arm moves the jet nozzle close to the center roller.
摘要翻译：能够完全清洁包括中心辊附近的部分的抛光布的抛光机的布料清洗装置。布清洁装置包括在抛光布上方的第一位置和抛光布之外的第二位置的平行于抛光布的平面中可移动的臂。喷嘴连接到臂上，并将高压水引向抛光布。封闭构件包围喷嘴，以防止从喷嘴喷出的高压水不会飞散。当喷嘴靠近中心辊移动喷嘴时，喷嘴朝向中心辊定向，高压水指向中心辊附近的抛光布的部分。

47. 发明授权

US10080460B2 Beverage extraction apparatus 有权
公开(公告)号：US10080460B2
公开(公告)日：2018-09-25
申请号：US13979888
申请日：2011-08-24
申请人： Yoshihiro Nakao , Yoshiaki Yokoo , Makoto Nakajima , Hiroaki Shimizu , Hiroki Furuta , Morio Mitsuhashi
发明人： Yoshihiro Nakao , Yoshiaki Yokoo , Makoto Nakajima , Hiroaki Shimizu , Hiroki Furuta , Morio Mitsuhashi
IPC分类号： A47J31/06 , A47J31/44 , A23F5/26 , A47J31/40 , B65D85/804
CPC分类号： A47J31/44 , A23F5/262 , A47J31/407 , B65D85/8043
摘要： A roasted plant extraction apparatus is provided which is capable of selectively reducing excessive bitterness in an extract liquid obtained by water extraction from a roasted plant raw material while preserving desirable flavor ingredients and body. A beverage extraction apparatus includes a granule containing part adapted to contain granules for extraction of a beverage, a pouring device for pouring an extraction solvent into the granule containing part from a first direction, and a collecting device for collecting an extract liquid extracted by means of the extraction solvent. The granule containing part comprises a detachable restraining member for placing the granules in a substantially sealed state. The beverage extraction apparatus further comprises a rotary mechanism for rotating the granule containing part.

48. 发明授权

US09217921B2 Resist underlayer film forming composition containing silicon having sulfide bond 有权
标题翻译：含有硫化物键的硅的抗蚀剂下层膜形成组合物
公开(公告)号：US09217921B2
公开(公告)日：2015-12-22
申请号：US13375517
申请日：2010-05-28
申请人： Yuta Kanno , Makoto Nakajima , Wataru Shibayama
发明人： Yuta Kanno , Makoto Nakajima , Wataru Shibayama
IPC分类号： H01L21/312 , G03F7/11 , G03F7/075 , G03F7/09
CPC分类号： G03F7/11 , G03F7/0752 , G03F7/091 , Y10T428/31663
摘要： There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hard mask; and a forming method of a resist pattern using the underlayer film forming composition for lithography. A resist underlayer film forming composition for lithography comprising: as a silicon atom-containing compound, a hydrolyzable organosilane containing a sulfur atom-containing group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein in the whole silicon atom-containing compound, the ratio of a sulfur atom to a silicon atom is less than 5% by mole. The hydrolyzable organosilane is preferably a compound of Formula (1): [R1aSi(R2)3-a]bR3 wherein R3 has a partial structure of Formula (2): R4—S—R5.
摘要翻译：提供了用于形成能够用作硬掩模的抗蚀剂下层膜的光刻用抗蚀剂下层膜形成组合物; 以及使用用于光刻的下层膜形成组合物的抗蚀剂图案的形成方法。一种用于光刻的抗蚀剂下层膜形成组合物，包括：含硅原子的化合物，含有含硫原子的基团的可水解的有机硅烷，其水解产物或其水解缩合产物，其中在整个含硅原子的化合物，硫原子与硅原子的比例小于5摩尔％。可水解的有机硅烷优选为式（1）的化合物：[R a Si（R 2）3-a] b R 3，其中R 3具有式（2）的部分结构：R4-S-R5。

49. 发明授权

US09093279B2 Thin film forming composition for lithography containing titanium and silicon 有权
标题翻译：用于含钛和硅的光刻的薄膜形成组合物
公开(公告)号：US09093279B2
公开(公告)日：2015-07-28
申请号：US14131945
申请日：2012-07-20
申请人： Makoto Nakajima , Yuta Kanno , Satoshi Takeda , Yasushi Sakaida , Shuhei Shigaki
发明人： Makoto Nakajima , Yuta Kanno , Satoshi Takeda , Yasushi Sakaida , Shuhei Shigaki
IPC分类号： G03F7/26 , H01L21/033 , G03F7/40 , H01L21/311 , G03F7/075 , G03F7/09
CPC分类号： H01L21/0332 , G03F7/0752 , G03F7/091 , G03F7/094 , G03F7/40 , H01L21/31111 , H01L21/31138
摘要： A thin film forming composition for forming resist underlayer film useable in the production of a semiconductor device, and a resist upper layer film absorbs undesirable UV light with a thin film as an upper layer of the EUV resist before undesirable UV light reaches the EUV resist layer in EUV lithography, an underlayer film (hardmask) for an EUV resist, a reverse material, and an underlayer film for a resist for solvent development. The thin film forming composition useable together with a resist in a lithography process, comprising a mixture of titanium compound (A) selected from: R0aTi(R1)(4-a) Formula (1) a titanium chelate compound, and a hydrolyzable titanium dimer, and a silicon compound (B): R2a′R3bSi(R4)4-(a′+b) Formula (2) a hydrolysis product, or a hydrolysis-condensation product of the mixture, wherein the number of moles of Ti atom is 50% to 90% relative to the total moles in terms of Ti atom and Si atoms in the composition.
摘要翻译：用于形成用于制造半导体器件的抗蚀剂下层膜的薄膜形成组合物，并且抗蚀剂上层膜在不期望的UV光到达EUV抗蚀剂层之前吸收作为EUV抗蚀剂的上层的薄膜的不期望的UV光在EUV光刻中，用于EUV抗蚀剂的底层膜（硬掩模），反向材料以及用于溶剂显影用抗蚀剂的下层膜。该薄膜形成组合物与平版印刷工艺中的抗蚀剂一起使用，包括钛化合物（A）的混合物，其选自：R a Ti（R 1）（4-a）式（1）钛螯合化合物和可水解的钛二聚体，和硅化合物（B）：R2a'R3bSi（R4）4-（a'+ b）式（2）水解产物或混合物的水解缩合产物，其中Ti原子的摩尔数为相对于组合物中Ti原子和Si原子的总摩尔数为50〜90％。

50. 发明授权

US08828879B2 Silicon-containing composition having sulfonamide group for forming resist underlayer film 有权
标题翻译：含有形成抗蚀剂下层膜的磺酰胺基的含硅组合物
公开(公告)号：US08828879B2
公开(公告)日：2014-09-09
申请号：US13496768
申请日：2010-09-07
申请人： Yuta Kanno , Makoto Nakajima , Wataru Shibayama
发明人： Yuta Kanno , Makoto Nakajima , Wataru Shibayama
IPC分类号： C08G77/04 , C09D183/08 , C08G77/28
CPC分类号： C08G77/04 , C08G77/28 , C09D183/08 , G03F7/0751 , G03F7/0752 , G03F7/091 , G03F7/094
摘要： There is provided a lithographic resist underlayer film-forming composition for forming a resist underlayer film which can be used as a hard mask. A lithographic resist underlayer film-forming composition including a silane compound having sulfonamide group, wherein the silane compound having sulfonamide group is a hydrolyzable organosilane having a sulfonamide group in the molecule, a hydrolyzate thereof, or a hydrolytic condensation product thereof. The composition including a silane compound having sulfonamide group and a silane compound lacking a sulfonamide group, wherein the silane compound having sulfonamide group is present within the silane compounds overall in a proportion of less than 1 mol %, for example 0.1 to 0.95 mol %.
摘要翻译：提供了可用作硬掩模的用于形成抗蚀剂下层膜的平版印刷抗蚀剂下层膜形成组合物。含有具有磺酰胺基的硅烷化合物的平版印刷抗蚀剂下层膜形成用组合物，其中，具有磺酰胺基的硅烷化合物为分子内具有磺酰胺基的水解性有机硅烷，其水解物或其水解缩合物。所述组合物包括具有磺酰胺基团的硅烷化合物和不具有磺酰胺基团的硅烷化合物，其中具有磺酰胺基团的硅烷化合物总体上以小于1摩尔％，例如0.1至0.95摩尔％的比例存在于硅烷化合物中。

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