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41. 发明授权

US08553198B2 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure 有权
标题翻译：掩模图案校正装置，掩模图案的校正方法，曝光修正装置以及曝光校正方法
公开(公告)号：US08553198B2
公开(公告)日：2013-10-08
申请号：US13487388
申请日：2012-06-04
申请人： Teruyoshi Yao , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
发明人： Teruyoshi Yao , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
IPC分类号： G03B27/68 , G03F1/00 , G03C5/00
CPC分类号： G03F7/70941 , G03F7/70433 , G03F7/705
摘要： In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in width, over the entire portion not only of a single shot region, but also of a single chip region, a mask pattern correction device of the present invention has a numerical aperture calculation unit calculating, for every single shot region, flare energy for a mask pattern corresponding to a transferred pattern, based on an exposure layout of a plurality of shot regions, or more specifically, while considering flare from a plurality of shot regions located around every single shot region.
摘要翻译：鉴于实现能够以极高的精度估计和校正火炬的平版印刷工艺，并且在整个部分上不仅在单一拍摄区域上，而且在单个区域的整个部分上仅产生非常小的尺寸变化芯片区域，本发明的掩模图案校正装置具有数值孔径计算单元，对于每个单个拍摄区域，基于多个拍摄区域的曝光布局来计算对应于被转印图案的掩模图案的闪光能量，或者更具体地，同时考虑来自位于每个单个拍摄区域周围的多个拍摄区域的闪光。

42. 发明授权

US08409786B2 Pattern forming method and method for manufacturing semiconductor device 有权
标题翻译：图案形成方法和半导体器件的制造方法
公开(公告)号：US08409786B2
公开(公告)日：2013-04-02
申请号：US11848786
申请日：2007-08-31
申请人： Tomohiko Yamamoto , Satoru Asai
发明人： Tomohiko Yamamoto , Satoru Asai
IPC分类号： G03F7/20
CPC分类号： G03F1/32 , G03F1/70
摘要： Double exposure is performed by using a pair of photomasks, an attenuated phase shift mask or the like which is not an alternating phase shift mask, and a pattern is transferred onto a photoresist. Here, on the occasion of performing exposure with the photomask for forming a finer pattern, double pole illumination is used as an illumination system.
摘要翻译：通过使用不是交替相移掩模的一对光掩模，衰减相移掩模等进行双重曝光，并且将图案转印到光致抗蚀剂上。这里，在用用于形成更精细图案的光掩模进行曝光的场合，使用双极照明作为照明系统。

43. 发明申请

US20120236279A1 Mask Pattern Correction Device, Method of Correcting Mask Pattern, Light Exposure Correction Device, and Method of Correcting Light Exposure 有权
标题翻译：掩模图案校正装置，校正掩模图案的方法，曝光修正装置以及校正曝光的方法
公开(公告)号：US20120236279A1
公开(公告)日：2012-09-20
申请号：US13487388
申请日：2012-06-04
申请人： Teruyoshi YAO , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
发明人： Teruyoshi YAO , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
IPC分类号： G03B27/42
CPC分类号： G03F7/70941 , G03F7/70433 , G03F7/705
摘要： In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in width, over the entire portion not only of a single shot region, but also of a single chip region, a mask pattern correction device of the present invention has a numerical aperture calculation unit calculating, for every single shot region, flare energy for a mask pattern corresponding to a transferred pattern, based on an exposure layout of a plurality of shot regions, or more specifically, while considering flare from a plurality of shot regions located around every single shot region.
摘要翻译：鉴于实现能够以极高的精度估计和校正火炬的平版印刷工艺，并且在整个部分上不仅在单一拍摄区域上，而且在单个区域的整个部分上仅产生非常小的尺寸变化芯片区域，本发明的掩模图案校正装置具有数值孔径计算单元，对于每个单个拍摄区域，基于多个拍摄区域的曝光布局来计算对应于被转印图案的掩模图案的闪光能量，或者更具体地，同时考虑来自位于每个单个拍摄区域周围的多个拍摄区域的闪光。

44. 发明授权

US08105023B2 Steam turbine 有权
标题翻译：汽轮机
公开(公告)号：US08105023B2
公开(公告)日：2012-01-31
申请号：US11968309
申请日：2008-01-02
申请人： Kazutaka Ikeda , Takashi Sasaki , Satoru Asai , Hitoshi Sakakida , Kenji Kamimura , Ryohei Ogino , Yasushi Ooishi
发明人： Kazutaka Ikeda , Takashi Sasaki , Satoru Asai , Hitoshi Sakakida , Kenji Kamimura , Ryohei Ogino , Yasushi Ooishi
IPC分类号： F01D11/12
CPC分类号： F01D25/246 , F01D5/3046 , F01D11/001 , F01D11/02 , F01D11/122 , F05D2220/31 , F05D2240/55
摘要： A steam turbine has: a casing; a rotor rotatably arranged in the casing; a nozzle diaphragm concentrically arranged with respect to the rotor, the nozzle diaphragm being engaged with the casing; moving blades arranged in circumferential direction on outer circumference of the rotor at positions adjacent to the nozzle diaphragm; seal strips circumferentially extending on tips of the moving blades, the seal strips protruding in radial outward direction; and an abradable structure rigidly connected to the nozzle diaphragm. The abradable structure faces the seal strips in radial direction at a facing surface, and has an abradable part made of an abradable material arranged at the facing surface.
摘要翻译：蒸汽轮机具有：壳体; 可旋转地布置在壳体中的转子; 相对于转子同心地布置的喷嘴隔膜，喷嘴隔膜与壳体接合; 在与所述喷嘴隔膜相邻的位置处，在所述转子的外周上沿圆周方向配置的动叶片; 密封条在活动叶片的尖端周向延伸，密封条沿径向向外的方向突出; 以及刚性地连接到喷嘴隔膜的可磨损结构。可磨损结构在面对面处径向地面向密封条，并且具有由布置在相对表面上的可磨损材料制成的可磨损部分。

45. 发明授权

US07971160B2 Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask 有权
标题翻译：创建光掩模图案数据的方法，使用光掩模图案数据创建的光掩模以及使用光掩模的半导体装置的制造方法
公开(公告)号：US07971160B2
公开(公告)日：2011-06-28
申请号：US12017658
申请日：2008-01-22
申请人： Morimi Osawa , Takayoshi Minami , Satoru Asai
发明人： Morimi Osawa , Takayoshi Minami , Satoru Asai
IPC分类号： G06F17/50 , G03C5/00 , G03F1/00
CPC分类号： G03F1/36 , H01L27/0207
摘要： A method for creating a pattern on a photomask includes steps of recognizing a space between main patterns by using pattern data which indicate the main patterns to be adjacently transferred onto a wafer, determining a 1st rule about arrangement of an assist pattern on the photomask, the assist pattern being adjacent to the main patterns and not being transferred onto the wafer, estimating a depth of focus in the presence of the assist pattern among the main patterns, determining a 2nd rule about arrangement of the assist pattern on the photomask to improve the depth of focus in the presence of the 1st assist pattern among the main patterns in a group having one or more number of appearance times of the space between main patterns, and correcting the assist pattern on the photomask using the assist pattern data on the basis of the 2nd rule.
摘要翻译：用于在光掩模上创建图案的方法包括通过使用指示要相邻转印到晶片上的主图案的图案数据来识别主图案之间的空间的步骤，确定关于光掩模上的辅助图案的布置的第一规则，辅助图案与主图案相邻并且不被转印到晶片上，在主图案之中估计辅助图案的存在时估计焦深，确定关于在光掩模上的辅助图案的布置的第二规则以提高深度在具有一个或多个主图案之间的空间的出现次数的组中的主要图案之中存在第一辅助图案的情况下，并且基于所述辅助图案数据来校正光掩模上的辅助图案第二条规则

46. 发明授权

US07604912B2 Local flare correction 有权
标题翻译：局部耀斑校正
公开(公告)号：US07604912B2
公开(公告)日：2009-10-20
申请号：US11147213
申请日：2005-06-08
申请人： Teruyoshi Yao , Satoru Asai
发明人： Teruyoshi Yao , Satoru Asai
IPC分类号： G03C5/00 , G03F1/00 , G03B27/68 , G06K9/00 , G06F17/50 , H01L21/00
CPC分类号： G03F7/70941 , G03F1/44 , G03F1/70
摘要： A correction of a local flare generated at a time of exposure when manufacturing a semiconductor device, wherein a substantial numerical aperture to a pattern in a region to be exposed is calculated for the each region, after that, the flare correction amount for the pattern in the each region is adjusted in conformity with the substantial numerical aperture and exposure conditions in the each region. Backed by this, the effect of the local flare on the pattern exposed by photolithography can be quantitatively corrected in conformity with the respective exposure conditions, so that a desired pattern can be formed readily and accurately.
摘要翻译：在制造半导体器件时在曝光时产生的局部光斑的校正，其中针对每个区域计算要暴露的区域中的图案的实质数值孔径，之后，对于图案中的图案的光斑校正量根据每个区域中的实际数值孔径和曝光条件调整每个区域。由此，可以根据各自的曝光条件定量地校正局部光斑对通过光刻曝光的图案的影响，从而可以容易且准确地形成期望的图案。

47. 发明授权

US07577556B2 Method and equipment for simulation 有权
标题翻译：模拟方法和设备
公开(公告)号：US07577556B2
公开(公告)日：2009-08-18
申请号：US10782821
申请日：2004-02-23
申请人： Hiroki Futatsuya , Satoru Asai
发明人： Hiroki Futatsuya , Satoru Asai
IPC分类号： G06G7/48
CPC分类号： G03F1/70
摘要： The simulation equipment has division unit for dividing a layout of a photo mask (mask layout) into a plurality of areas, average light intensity value calculation unit for calculating an average value of light intensity in each of the areas, smoothing unit for subjecting the calculated average value to smoothing processing, and multiplication unit for multiplying the smoothed average value by a predetermined multiplier.
摘要翻译：模拟设备具有用于将光掩模（掩模布局）的布局分割成多个区域的分割单元，用于计算每个区域中的光强度的平均值的平均光强度值计算单元，平滑处理的平均值，以及将平滑后的平均值乘以预定乘数的乘法单元。

48. 发明申请

US20060111023A1 Method of polishing a large part and abrasive for use in the method 有权
标题翻译：抛光方法大部分和磨料用于该方法
公开(公告)号：US20060111023A1
公开(公告)日：2006-05-25
申请号：US11312341
申请日：2005-12-21
申请人： Kenji Kamimura , Satoru Asai , Satoru Yanaka , Ryusuke Tsuboi , Tadashi Tanuma , Masataka Kikuchi
发明人： Kenji Kamimura , Satoru Asai , Satoru Yanaka , Ryusuke Tsuboi , Tadashi Tanuma , Masataka Kikuchi
IPC分类号： B24C1/00 , B24C3/00
CPC分类号： B24C1/08 , B24C1/086 , B24C11/00 , F01D5/286 , Y02T50/673
摘要： A surface to be polished of a large part is polished by projecting and colliding an abrasive comprising abrasive grains and an elastic petrochemical high polymer material having the specific gravity of 0.5 to 1.8 g/cm3 and elasticity of 10 to 200 ckg/cm2 or an elastic natural material, to the surface to be polished of the large part at a speed of 600 m to 3800 m per minute and by a volume of 5 to 300 cc/cm2·sec per unit area, and sliding the abrasive.
摘要翻译：通过将包含磨粒的研磨剂和比重为0.5〜1.8g / cm 3的弹性石油化学高分子材料投射并碰撞来研磨大部分被研磨的表面，弹性为10 至200ckg / cm 2或弹性天然材料，以600μm至3800m /分钟的速度向大部分抛光表面，以5至300cc / 厘米2秒/秒，并滑动研磨剂。

49. 发明授权

US06412713B1 Fuel injection apparatus 有权
公开(公告)号：US06412713B1
公开(公告)日：2002-07-02
申请号：US09729992
申请日：2000-12-06
申请人： Masahiro Okajima , Satoru Asai
发明人： Masahiro Okajima , Satoru Asai
IPC分类号： B05B130
摘要： In an electromagnetic fuel injector, when an opening valve pulse is turned ON by a command from an ECU, a first coil is energized and a first fixed core attracts a moving core and unseats a valve member from a valve seat to open a valve of the fuel injector. A time Tx before the opening valve pulse becomes OFF, a closing valve pulse is turned ON, whereby a second coil is energized and a second fixed core attracts the moving core toward a valve closing direction. As a result, after the valve starts to close, the urging force in the valve closing direction increases rapidly, the time delay from the start of valve closing to the end is shortened, and the valve closing responsiveness improves.

50. 发明授权

US06232758B1 Load drive control apparatus 有权
标题翻译：负载驱动控制装置
公开(公告)号：US06232758B1
公开(公告)日：2001-05-15
申请号：US09365753
申请日：1999-08-03
申请人： Shinichi Konda , Kunihiko Goto , Satoru Asai
发明人： Shinichi Konda , Kunihiko Goto , Satoru Asai
IPC分类号： H02J100
CPC分类号： H03K17/302 , H03K17/6871 , H03K2217/0036
摘要： A load drive control apparatus includes a drive control circuit for driving and controlling a load in response to a given drive condition. A power supply circuit operates for feeding drive electric power to the drive control circuit. The feed of the drive electric power to the drive control circuit by the power supply circuit is controlled in response to a control signal for drive and control of the load to implement a change between a normal mode of operation and a stand-by mode of operation in which consumed electric power is reduced.
摘要翻译：负载驱动控制装置包括用于响应于给定的驱动条件来驱动和控制负载的驱动控制电路。电源电路用于将驱动电力馈送到驱动控制电路。响应于用于驱动和控制负载的控制信号来控制由电源电路向驱动控制电路馈送驱动电力，以实现正常操作模式和待机操作模式之间的改变其中消耗的电力降低。

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