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41. 发明申请

US20130002661A1 STEREOSCOPIC IMAGE DISPLAY APPARATUS AND METHOD OF CONTROLLING SAME 审中-公开
标题翻译：立体图像显示装置及其控制方法
公开(公告)号：US20130002661A1
公开(公告)日：2013-01-03
申请号：US13583910
申请日：2010-10-13
申请人： Kouichi Tanaka , Tetsu Wada , Hisashi Endo
发明人： Kouichi Tanaka , Tetsu Wada , Hisashi Endo
IPC分类号： G06T15/00 , G06F3/041
CPC分类号： H04N13/128
摘要： Designated positions in a left-eye image and in a right-eye image are detected. The dominant eye is input and, if there is a position designation made by the observer, the coordinate position of the designated position is calculated in each of the left-eye and right-eye images. A template image is detected from the dominant-eye image and an image identical with the detected template image is detected from the non-dominant-eye image. Positions in respective ones of the template image and matching image become the designated positions. A distance differential between the template image detected from the dominant-eye image and the image detected from the non-dominant-eye image is parallax. The parallax of the designated positions is adjusted.
摘要翻译：检测左眼图像和右眼图像中的指定位置。优势眼是输入，如果有观察者所做的位置指定，则在左眼和右眼的每个图像中计算指定位置的坐标位置。从显性眼图像检测模板图像，并且从非优势眼图像检测与检测到的模板图像相同的图像。模板图像和匹配图像的相应位置成为指定位置。从显性眼图像检测到的模板图像与从非优势眼图像检测到的图像之间的距离差是视差。调整指定位置的视差。

42. 发明申请

US20120065426A1 PROCESS FOR PREPARING AMINE COMPOUND 审中-公开
标题翻译：制备胺化合物的方法
公开(公告)号：US20120065426A1
公开(公告)日：2012-03-15
申请号：US13232755
申请日：2011-09-14
申请人： Masahito Watanabe , Kouichi Tanaka , Takashi Miki , Kunihiko Murata
发明人： Masahito Watanabe , Kouichi Tanaka , Takashi Miki , Kunihiko Murata
IPC分类号： C07C209/24 , C07C227/08
CPC分类号： C07C209/26 , C07B2200/09 , C07C213/00 , C07C213/02 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07C211/35 , C07C211/40 , C07C211/36 , C07C211/37 , C07C211/27 , C07C215/44
摘要： The present invention aims to provide a practical process for preparing amine compounds through a generalized highly-diastereoselective reductive amination reaction. The present invention relates to a process for diastereoselectively preparing an amine compound using a catalyst employed in a reductive amination reaction, comprising a specific organometallic compound represented by the following general formula (1):
摘要翻译：本发明旨在提供一种通过广义高度非对映选择性还原胺化反应制备胺化合物的实用方法。本发明涉及使用在还原胺化反应中使用的催化剂非对映选择性制备胺化合物的方法，其包含由以下通式（1）表示的特定有机金属化合物：

43. 发明授权

US08106290B2 Method for manufacturing single crystal silicon solar cell and single crystal silicon solar cell 有权
标题翻译：单晶硅太阳能电池和单晶硅太阳能电池的制造方法
公开(公告)号：US08106290B2
公开(公告)日：2012-01-31
申请号：US12073437
申请日：2008-03-05
申请人： Atsuo Ito , Shoji Akiyama , Makoto Kawai , Kouichi Tanaka , Yuuji Tobisaka , Yoshihiro Kubota
发明人： Atsuo Ito , Shoji Akiyama , Makoto Kawai , Kouichi Tanaka , Yuuji Tobisaka , Yoshihiro Kubota
IPC分类号： H01L31/00 , H01L21/00
CPC分类号： H01L31/056 , H01L21/76254 , H01L31/03921 , H01L31/0682 , H01L31/1804 , H01L31/1896 , Y02E10/52 , Y02E10/547 , Y02P70/521
摘要： A method for manufacturing a single crystal silicon solar cell includes implanting either hydrogen ions or rare-gas ions into a single crystal silicon substrate; bringing the single crystal silicon substrate in close contact with a transparent insulator substrate via a transparent adhesive, with the ion-implanted surface being a bonding surface; curing the transparent adhesive; mechanically delaminating the single crystal silicon substrate to form a single crystal silicon layer; forming a plurality of diffusion areas of a second conductivity type in the delaminated surface side of the single crystal silicon layer, and causing a plurality of areas of a first conductivity type and the plurality of areas of the second conductivity type to be present in the delaminated surface of the single crystal silicon layer; forming each of a plurality of individual electrodes on each one of the plurality of areas of the first conductivity type and on each one of the plurality of areas of the second conductivity type; forming a collector electrode for the plurality of individual electrodes on the plurality of areas of the first conductivity type, and a collector electrode for the plurality of individual electrodes on the plurality of areas of the second conductivity type; and forming a light-reflecting film.
摘要翻译：制造单晶硅太阳能电池的方法包括将氢离子或稀土离子注入到单晶硅衬底中; 使单晶硅衬底通过透明粘合剂与透明绝缘体衬底紧密接触，离子注入表面是接合表面; 固化透明胶; 机械地分层单晶硅衬底以形成单晶硅层; 在单晶硅层的分层表面侧形成多个第二导电类型的扩散区域，并且使多个第一导电类型的区域和第二导电类型的多个区域存在于分层的单晶硅层表面; 在第一导电类型的多个区域中的每一个区域和第二导电类型的多个区域中的每一个区域上形成多个单独电极中的每一个; 在所述第一导电类型的多个区域上形成用于所述多个单独电极的集电极，以及在所述第二导电类型的多个区域上的所述多个单独电极的集电极; 并形成光反射膜。

44. 发明授权

US07749870B2 Method for producing SOI substrate 有权
标题翻译： SOI衬底的制造方法
公开(公告)号：US07749870B2
公开(公告)日：2010-07-06
申请号：US12383834
申请日：2009-03-27
申请人： Makoto Kawai , Yoshihiro Kubota , Atsuo Ito , Kouichi Tanaka , Yuji Tobisaka , Shoji Akiyama , Hiroshi Tamura
发明人： Makoto Kawai , Yoshihiro Kubota , Atsuo Ito , Kouichi Tanaka , Yuji Tobisaka , Shoji Akiyama , Hiroshi Tamura
IPC分类号： H01L21/322
CPC分类号： H01L21/76254 , Y10S438/964 , Y10S438/967
摘要： Provided is a method for producing an SOI substrate comprising a transparent insulating substrate and a silicon film formed on a first major surface of the insulating substrate wherein a second major surface of the insulating substrate which is opposite to the major surface is roughened, the method suppressing the generation of metal impurities and particles in a simple and easy way. More specifically, provided is a method for producing an SOI substrate comprising a transparent insulating substrate, a silicon film formed on a first major surface of the transparent insulating substrate, and a roughened second major surface, which is opposite to the first major surface, the method comprising steps of: providing the transparent insulating substrate, mirror surface-processing at least the first major surface of the transparent insulating substrate, forming a silicon film on the first major surface of the transparent insulating substrate, and laser-processing the second major surface of the transparent insulating substrate so as to roughen the second major surface by using a laser.
摘要翻译：提供一种制造SOI基板的方法，该SOI基板包括透明绝缘基板和形成在绝缘基板的第一主表面上的硅膜，其中绝缘基板的与主表面相对的第二主表面被粗糙化，该方法抑制以简单方便的方式生成金属杂质和颗粒。更具体地说，提供一种SOI基板的制造方法，其包括透明绝缘基板，形成在透明绝缘基板的第一主表面上的硅膜和与第一主表面相对的粗糙化的第二主表面，方法包括以下步骤：提供透明绝缘基板，至少透明绝缘基板的第一主表面进行镜面处理，在透明绝缘基板的第一主表面上形成硅膜，并且对第二主表面进行激光加工的透明绝缘基板，以便通过使用激光使第二主表面粗糙化。

45. 发明申请

US20090221131A1 Method for preparing substrate having monocrystalline film 有权
标题翻译：制备具有单晶膜的衬底的方法
公开(公告)号：US20090221131A1
公开(公告)日：2009-09-03
申请号：US12380090
申请日：2009-02-24
申请人： Yoshihiro Kubota , Makoto Kawai , Kouichi Tanaka , Yuji Tobisaka , Shoji Akiyama , Yoshihiro Nojima
发明人： Yoshihiro Kubota , Makoto Kawai , Kouichi Tanaka , Yuji Tobisaka , Shoji Akiyama , Yoshihiro Nojima
IPC分类号： H01L21/36
CPC分类号： C30B31/20 , C30B19/12 , C30B23/025 , C30B25/183 , C30B29/04 , C30B29/06 , C30B29/16 , C30B29/36 , C30B29/40 , C30B33/02 , C30B33/06 , H01L21/76254
摘要： Provided is a method for easily preparing a substrate comprising a monocrystalline film thereon or thereabove with almost no crystal defects without using a special substrate. More specifically, provided is a method for preparing a substrate comprising a monocrystalline film formed on or above a handle substrate, the method comprising: a step A of providing a donor substrate and the handle substrate; a step B of growing a monocrystalline layer on the donor substrate; a step C of implanting ions into the monocrystalline layer on the donor substrate so as to form an ion-implanted layer; a step D of bonding a surface of the monocrystalline layer of the ion-implanted donor substrate to a surface of the handle substrate; and a step E of peeling the bonded donor substrate at the ion-implanted layer existing in the monocrystalline layer so as to form the monocrystalline film on or above the handle substrate; wherein at least the steps A to E are repeated by using the handle substrate having the monocrystalline film formed thereon or thereabove as a donor substrate.
摘要翻译：提供一种在不使用特殊基板的情况下容易地制备其上或其上的单晶膜几乎没有晶体缺陷的基板的方法。更具体地，提供了一种制备包括在手柄基板上或上方形成的单晶膜的基板的方法，所述方法包括：提供施主基板和所述手柄基板的工序A; 在施主衬底上生长单晶层的步骤B; 将离子注入施主衬底上的单晶层中以形成离子注入层的步骤C; 将离子注入的施主基板的单晶层的表面接合到手柄基板的表面的工序D; 以及在存在于单晶层中的离子注入层剥离键合的供体基板以在手柄基板上或上方形成单晶膜的步骤E; 其中通过使用其上形成有单晶膜的处理衬底或其上方作为施主衬底来重复步骤A至E的至少一个。

46. 发明授权

US07442420B2 Retardation films comprising a UV-curable alignment film and a liquid crystal compound 有权
标题翻译：包含可UV固化的取向膜和液晶化合物的延迟膜
公开(公告)号：US07442420B2
公开(公告)日：2008-10-28
申请号：US10468243
申请日：2002-02-22
申请人： Kouichi Tanaka , Syoushi Takahashi , Kenichiro Yoshioka
发明人： Kouichi Tanaka , Syoushi Takahashi , Kenichiro Yoshioka
IPC分类号： C08K19/00
CPC分类号： G02B5/3083 , G02B5/3016 , G02F1/133711 , Y10T428/10 , Y10T428/1005 , Y10T428/1059 , Y10T428/1082 , Y10T428/1086 , Y10T428/3188 , Y10T428/31928
摘要： A UV-curable resin composition for alignment film and an alignment film which is prepared by curing the composition with UV rays. The migration of a material which is present in a polymer film and capable of affecting the optical properties of a liquid crystalline compound layer to the liquid crystalline compound layer is controlled or blocked. The composition comprises at least one (meth)acrylate compound having one or more polar groups and one or more (meth)acryloyl groups in the molecule and a photoinitiator. A protective layer is inserted between a polymer film and a liquid crystalline compound layer for controlling or blocking the migration of the material which is present in the polymer film and capable of affecting the optical properties of the liquid crystalline compound layer.
摘要翻译：用于取向膜的UV固化树脂组合物和通过用UV射线固化该组合物制备的取向膜。控制或阻止存在于聚合物膜中并能够影响液晶化合物层的液晶化合物层的光学性质的材料向液晶化合物层的迁移。该组合物包含至少一种在分子中具有一个或多个极性基团和一个或多个（甲基）丙烯酰基的（甲基）丙烯酸酯化合物和光引发剂。在聚合物膜和液晶化合物层之间插入保护层，用于控制或阻挡存在于聚合物膜中的材料的迁移并且能够影响液晶化合物层的光学性质。

47. 外观设计

USD560130S1 Clamp meter 有权
标题翻译：夹钳
公开(公告)号：USD560130S1
公开(公告)日：2008-01-22
申请号：US29272411
申请日：2007-02-08
申请人： Akihiro Nagai , Takao Miyasaka , Kouichi Tanaka
设计人： Akihiro Nagai , Takao Miyasaka , Kouichi Tanaka

48. 发明申请

US20070074906A1 Space Providing System and Information Exhibition System 审中-公开
标题翻译：空间提供系统和信息展示系统
公开(公告)号：US20070074906A1
公开(公告)日：2007-04-05
申请号：US11470379
申请日：2006-09-06
申请人： Kouichi Tanaka , Hideyuki Murayama , Chiharu Haraoka , Hiroshi Oota , Yuko Sakata , Naoki Terada , Takashi Kunishita , Hideki Tachikawa , Tetsuya Matsuda
发明人： Kouichi Tanaka , Hideyuki Murayama , Chiharu Haraoka , Hiroshi Oota , Yuko Sakata , Naoki Terada , Takashi Kunishita , Hideki Tachikawa , Tetsuya Matsuda
IPC分类号： H02B1/40
CPC分类号： E04H1/1272 , G06Q30/02
摘要： An object is to provide a space providing system that can be flexibly adapted to a modification to the configuration of a space structure in accordance with the intended purpose of a conference or exhibition and to replacement or addition of an information apparatus. In a space structure constructed by joining one or more post members extending upwardly from the floor and one or more horizontal beams extending parallel to the floor, connection means that can be fixed at a desired position is provided, by which a service providing apparatus is connected to the space structure. In addition, a space management server that detects and manages a service provided by the service providing apparatus is provided.
摘要翻译：本发明的目的是提供一种空间提供系统，其能够灵活地适应于根据会议或展览的预期目的对空间结构的配置的修改以及信息设备的更换或添加。在通过连接从地板向上延伸的一个或多个柱构件和平行于地板延伸的一个或多个水平梁构成的空间结构中，提供可固定在期望位置的连接装置，通过该连接装置连接服务提供装置到空间结构。另外，提供了检测并管理由服务提供装置提供的服务的空间管理服务器。

49. 发明申请

US20060257230A1 Retaining ring for shaft 审中-公开
标题翻译：轴固定环
公开(公告)号：US20060257230A1
公开(公告)日：2006-11-16
申请号：US11409309
申请日：2006-04-21
申请人： Kouichi Tanaka , Yoshichika Tanaka
发明人： Kouichi Tanaka , Yoshichika Tanaka
IPC分类号： F16B39/24
CPC分类号： F16B21/186
摘要： Respective portions to contact a shaft do not contact the shaft in a stable condition. At least three projections 3, 3a, . . . are formed in an inner periphery of a C-shaped base material 2 that has an opening portion 1 at one place of an outer periphery that expands toward the outer circumference, and spaces between the adjacent projections 3, 3a, . . . are made inner notches 5, 5a, . . . . Inner edges of the projections 3, 3a, . . . are shaped like a convex circular arc circumscribed to an outer circumferential surface of a mounting region of the shaft S. Thus, the respective projections 3, 3a, . . . can abut the shaft at one point, so that the retaining ring for shaft of the present application can be mounted to the shaft in a good posture.
摘要翻译：接触轴的各部分在稳定的状态下不接触轴。至少三个投影3，3 a，。。。形成在C形基材2的内周面上，C形基材2的外周的一个位置具有开口部1，并且在相邻的突起3,3a之间形成空间。。。是内切口5,5a，。。。。突出部3,3a，...的内边缘。。。形成为与轴S的安装区域的外周面外接的凸圆弧形状。因此，各个突起3,3a，。。可以在一个点处抵靠轴，使得本申请的轴的保持环能够以良好的姿势安装到轴上。

50. 发明申请

US20050262677A1 Tool for installing retaining ring 失效
标题翻译：安装固定环的工具
公开(公告)号：US20050262677A1
公开(公告)日：2005-12-01
申请号：US11124428
申请日：2005-05-06
申请人： Kouichi Tanaka , Yoshichika Tanaka
发明人： Kouichi Tanaka , Yoshichika Tanaka
IPC分类号： B23P19/08 , B25B27/20 , B23P19/04
CPC分类号： B25B27/20 , B23P19/084 , Y10T29/5363 , Y10T29/53783
摘要： A problem where a tool is deformed when a retaining ring is fitted on a shaft is solved. Plate members (2, 2a) positioned at at least one side of a full back surface of a retaining ring (W) are arranged at a holder (1) provided at the head of a tool body. A contact portion (3), a portion opposite an opening portion (Y) in the outer periphery of the retaining ring (W), is provided more backward than the heads of the plate members (2, 2a). Fall-off prevention means (4) from which the retaining ring (W) can be easily detached is provided at the holder (1). There are sheltering spaces (5, 5a) arranged outside both side portions of the retaining ring (W) in its installed state. When the retaining ring (W) is installed to the holder (1), the retaining ring (W) does not fall off because of the fall-off prevention means (4). Further, even when the retaining ring (W) is slightly opened by being pressed by the contact portion (3) when the ring is fitted on a shaft (S), both side portions do not come into contact with the holder (1) side and therefore the holder (1) is not deformed.
摘要翻译：解决了将固定环安装在轴上时工具变形的问题。位于保持环（W）的整个后表面的至少一侧的板构件（2,2a）布置在设置在工具主体的头部的保持器（1）上。在保持环（W）的外周中与开口部（Y）相对的部分的接触部分（3）比板部件（2a）的头部更靠后设置。在保持器（1）上设置防止脱落装置（4），保持环（W）可以从其中容易地脱离。在其安装状态下，在保持环（W）的两侧部分外设有遮蔽空间（5,5a）。当保持环（W）安装到保持器（1）上时，由于脱落防止装置（4），保持环（W）不会脱落。此外，即使当环安装在轴（S）上时通过被接触部分（3）按压而保持环（W）稍微打开时，两侧部分也不会与保持器（1）侧接触因此保持器（1）不变形。

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