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41. 发明授权

US5498306A Method and apparatus for manufacturing ink jet recording head 失效
标题翻译：用于制造喷墨记录头的方法和装置
公开(公告)号：US5498306A
公开(公告)日：1996-03-12
申请号：US275743
申请日：1994-07-19
申请人： Makoto Shibata , Hitoshi Itoh
发明人： Makoto Shibata , Hitoshi Itoh
IPC分类号： B29C35/08 , B29C65/14 , B29C65/78 , B41J2/05 , B41J2/16 , B32B31/04 , B32B31/20 , B32B31/28 , B32B35/00
CPC分类号： B29C65/1435 , B29C65/1483 , B29C65/4845 , B29C65/7855 , B29C66/53462 , B29C66/73151 , B29C66/81267 , B29C66/8322 , B41J2/1604 , B41J2/1623 , B41J2/1631 , B41J2/164 , B29C2035/0827 , B29C65/1406 , B29C65/1412 , B29C65/4835 , B29C65/485 , B29K2995/0027 , B29K2995/007 , B29L2031/767
摘要： The present invention relates to an ink jet head manufacturing method including a pressurizing step for forming liquid passages communicating with discharge openings for discharging ink, by pressurizing to bond a base member and a top member together via wall members defining the liquid passages, except for areas where the liquid passages are formed. The present invention further provides an apparatus for carrying out such ink jet head manufacturing method.
摘要翻译：喷墨头制造方法技术领域本发明涉及一种喷墨头制造方法，包括：加压步骤，用于形成液体通道，该液体通道与用于排出墨水的排出口连通，通过加压将基部构件和顶部构件通过限定液体通道的壁构件连接在一起，其中形成液体通道。本发明还提供一种用于执行这种喷墨头制造方法的装置。

42. 发明授权

US5211987A Method and apparatus for forming refractory metal films 失效
$Method and apparatus for forming refractory metal films$
标题翻译：用于形成难熔金属膜的方法和装置
公开(公告)号：US5211987A
公开(公告)日：1993-05-18
申请号：US800743
申请日：1991-11-29
申请人： Iwao Kunishima , Hitoshi Itoh
发明人： Iwao Kunishima , Hitoshi Itoh
IPC分类号： C23C16/04 , C23C16/14 , C23C16/56 , H01L21/285 , H01L21/768
CPC分类号： C23C16/56 , C23C16/04 , C23C16/14 , H01L21/28562 , H01L21/76877
摘要： A method for improving the adhesion between a refractory metal film and a silicon substrate is disclosed, which comprises depositing the refractory metal film on the silicon substrate at a first temperature; and heating the contact surface between the deposited film and the silicon surface at a second temperature between 300.degree. and 600.degree. C., wherein the depositing and heating steps are performed in a single reaction furnace and the temperature between the depositing and heating steps does not drop below about 300.degree. C.
摘要翻译：公开了一种用于改善难熔金属膜和硅衬底之间的粘合性的方法，其包括在第一温度下将难熔金属膜沉积在硅衬底上; 并在300℃至600℃的第二温度下加热沉积膜和硅表面之间的接触表面，其中沉积和加热步骤在单个反应炉中进行，并且沉积和加热步骤之间的温度不低于约300℃

43. 发明授权

US08634108B2 Method and apparatus for inspecting image, image forming apparatus, and computer-readable recording medium storing image inspecting program 有权
标题翻译：用于检查图像的方法和装置，图像形成装置和存储图像检查程序的计算机可读记录介质
公开(公告)号：US08634108B2
公开(公告)日：2014-01-21
申请号：US13064959
申请日：2011-04-28
申请人： Keiji Kojima , Fumihiro Nakashige , Hitoshi Itoh
发明人： Keiji Kojima , Fumihiro Nakashige , Hitoshi Itoh
IPC分类号： H04N1/40
CPC分类号： G01N21/57 , G03G15/5062 , G03G2215/0081
摘要： An image inspecting apparatus includes a first light illuminating unit that irradiates a measured object on which an image is formed with illuminating light from a diagonal direction; an imaging unit that receives specular light of the illuminating light with which the measured object is irradiated by the first light illuminating unit; and an image inspecting unit that inspects the image. The image inspecting unit generates gloss reference data from density distribution data included in print data used for forming the image by using a converting unit. The image inspecting unit inspects a gloss distribution of the image by using the gloss reference data and a gloss distribution of the image that is generated based on an amount of the specular light received by the imaging unit.
摘要翻译：图像检查装置包括：第一光照射单元，其对来自对角线方向的照明光照射形成有图像的测量对象; 摄像单元，其接收由所述第一光照射单元照射被测量物体的照明光的镜面光; 以及检查图像的图像检查单元。图像检查单元通过使用转换单元从用于形成图像的打印数据中包括的密度分布数据生成光泽参考数据。图像检查单元通过使用光泽参考数据和基于由成像单元接收的镜面光量产生的图像的光泽分布来检查图像的光泽分布。

44. 发明授权

US08610353B2 Plasma generating apparatus, plasma processing apparatus and plasma processing method 有权
标题翻译：等离子体发生装置，等离子体处理装置和等离子体处理方法
公开(公告)号：US08610353B2
公开(公告)日：2013-12-17
申请号：US13224879
申请日：2011-09-02
申请人： Hitoshi Itoh , Hidenori Miyoshi , Masaru Hori , Hirotaka Toyoda , Makoto Sekine
发明人： Hitoshi Itoh , Hidenori Miyoshi , Masaru Hori , Hirotaka Toyoda , Makoto Sekine
IPC分类号： H01J7/24 , H05B31/26
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/3222 , H01J37/32229 , H01J37/3244 , H05H2001/4622
摘要： An apparatus for generating plasma, comprises: a microwave generator configured to generate a microwave; a wave guide which is connected to the microwave generator, wherein the wave guide is elongated in a traveling direction of the microwave and has a hollow shape having a rectangular section in a direction perpendicular to the traveling direction; a gas feeder which is connected to the wave guide and feeds process gas into the wave guide; and an antenna unit which is a part of the wave guide and discharges plasma generated by the microwave to the outside, wherein the antenna unit has one or more slots formed on a wall constituting a short side in a section of the antenna unit, plasmarizes the process gas fed into the wave guide under an atmospheric pressure in the slots by the microwave, and discharges the plasma out of the slots.
摘要翻译：一种用于产生等离子体的装置，包括：微波发生器，被配置为产生微波; 与微波发生器连接的波导，其中波导在微波的行进方向上伸长，并且具有在与行进方向垂直的方向上具有矩形截面的中空形状; 气体供给器，其连接到波导并将处理气体馈送到波导中; 以及天线单元，其是波导的一部分并将由微波产生的等离子体放电到外部，其中天线单元具有形成在构成天线单元的部分中的短边的壁上的一个或多个槽，通过微波在大气压下在槽中供给到波导管中的工艺气体，并将等离子体从槽中排出。

45. 发明授权

US08587844B2 Image inspecting apparatus, image inspecting method, and image forming apparatus 有权
标题翻译：图像检查装置，图像检查方法和图像形成装置
公开(公告)号：US08587844B2
公开(公告)日：2013-11-19
申请号：US13067382
申请日：2011-05-27
申请人： Hitoshi Itoh , Fumihiro Nakashige , Keiji Kojima
发明人： Hitoshi Itoh , Fumihiro Nakashige , Keiji Kojima
IPC分类号： H04N1/04
CPC分类号： G01N21/8901 , B41F33/0036 , G01N21/57 , G01N21/86 , G01N21/93
摘要： An image inspecting apparatus includes a first light illuminating unit irradiating a measured object on which an image is formed with light from an inclined direction; a second light illuminating unit irradiating the measured object with light from a different direction; an imaging unit receiving reflected light of the light with which the measured object is irradiated by the first light illuminating unit and the second light illuminating unit; a first and a second reference plate having a mirror surface and a diffuse surface, respectively; and an image inspecting unit inspecting a gloss distribution of the image based on the amount of light received by the imaging unit and a correcting coefficient.
摘要翻译：图像检查装置包括：第一光照射单元，用于从倾斜方向照射形成有图像的被测物体; 第二光照射单元，用来自不同方向的光照射测量对象; 摄像单元，其接收由所述第一光照射单元和所述第二光照射单元照射被测量物体的光的反射光; 第一和第二参考板，分别具有镜面和漫射表面; 以及图像检查单元，基于由所述成像单元接收的光量和校正系数来检查所述图像的光泽分布。

46. 发明授权

US08537421B2 Image processing apparatus, method, and program product removing show-through from density image using mask image generated from gloss image 有权
标题翻译：使用由光泽图像生成的掩模图像的图像处理装置，方法和程序产品从密度图像中移除显示
公开(公告)号：US08537421B2
公开(公告)日：2013-09-17
申请号：US13273297
申请日：2011-10-14
申请人： Hitoshi Itoh , Fumihiro Nakashige , Keiji Kojima
发明人： Hitoshi Itoh , Fumihiro Nakashige , Keiji Kojima
IPC分类号： H04N1/409 , G06T5/50
CPC分类号： H04N1/4095
摘要： An image processing apparatus includes a scanning unit configured to scan at least one of two surfaces of a printed material on both of which information is printed and to obtain a density image representing intensity distribution of diffuse reflection light from the scanned surface and a gloss image representing intensity distribution of specular reflection light from the scanned surface, a mask image generating unit configured to generate a mask image for the scanned surface based on the obtained gloss image, and a show-through removing unit configured to perform mask processing on the density image using the generated mask image to generate a show-through-removed image that does not include show-through information for the scanned surface.
摘要翻译：图像处理装置包括扫描单元，被配置为扫描印刷材料的两个表面中的至少一个，其中打印了两个信息，并获得表示来自扫描表面的漫反射光强度分布的浓度图像，以及表示基于获得的光泽图像，配置成生成用于扫描面的掩模图像的掩模图像生成部，以及通过去除单元，对所述密度图像进行掩模处理，使用生成的掩模图像以生成不包括扫描表面的显示信息的直通图像。

47. 发明授权

US08268396B2 Film forming method and apparatus, and storage medium 失效
标题翻译：成膜方法和装置以及存储介质
公开(公告)号：US08268396B2
公开(公告)日：2012-09-18
申请号：US12568142
申请日：2009-09-28
申请人： Hitoshi Itoh
发明人： Hitoshi Itoh
IPC分类号： C23C16/00
CPC分类号： C23C16/4481 , C23C16/18 , C23C16/448 , C23C16/455 , C23C16/45593 , H01L21/28556 , H01L21/76877
摘要： A method for film formation is provided that can significantly suppress the amount of a source gas consumed in the formation of a copper film on a substrate by supplying a gas of a metallic source material complex, for example, copper acetate, produced by the sublimation of a solid source material, as a source gas to the substrate to cause a chemical reaction of the source gas. A source gas produced by the sublimation of a solid source material is supplied into a processing chamber, and the source material is adsorbed as a solid onto an adsorption/desorption member within the processing chamber. Next, the source gas supply and exhaust are stopped, and the processing chamber is brought to the state of a closed space. Thereafter, the substrate is heated, and the source material is chemically reacted on the substrate to form a thin film on the substrate.
摘要翻译：提供了一种成膜方法，其可以通过将金属源材料配合物（例如乙酸铜）的气体供给到基板上，从而可以显着地抑制在形成铜膜时所消耗的源气体的量，固体源材料，作为引起原料气化学反应的基质的源气体。通过固体源材料的升华产生的源气体被供给到处理室中，并且源材料作为固体被吸附到处理室内的吸附/解吸构件上。接下来，停止源气供给和排气，使处理室处于封闭空间的状态。此后，加热衬底，并且在衬底上使源材料发生化学反应，以在衬底上形成薄膜。

48. 发明申请

US20120180811A1 DRY CLEANING METHOD OF SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板加工装置的干燥清洗方法
公开(公告)号：US20120180811A1
公开(公告)日：2012-07-19
申请号：US13351641
申请日：2012-01-17
申请人： Isao GUNJI , Yusaku Izawa , Hitoshi Itoh , Tomonori Umezaki , Yuta Takeda , Isamu Mori
发明人： Isao GUNJI , Yusaku Izawa , Hitoshi Itoh , Tomonori Umezaki , Yuta Takeda , Isamu Mori
IPC分类号： B08B7/00
CPC分类号： C23C16/4405
摘要： A dry cleaning method of a substrate processing apparatus includes forming a metal oxide by oxidizing a metal film adhered to the inside of a processing chamber of the substrate processing apparatus; forming a complex by reacting the metal oxide with β-diketone; and sublimating the complex to be removed. A cleaning gas containing oxygen and β-diketone is supplied into the processing chamber while heating the inside of the processing chamber. A flow rate ratio of oxygen to β-diketone in the cleaning gas is set such that a formation rate of the metal oxide is lower than a formation rate of the complex.
摘要翻译：基板处理装置的干洗方法包括通过氧化附着在基板处理装置的处理室内部的金属膜来形成金属氧化物; 通过使金属氧化物与二 - 二酮反应形成络合物; 并升华待除去的复合物。含有氧和二酮的清洁气体在加热处理室的内部时被供应到处理室中。将清洗气体中的氧与二酮的流量比设定为使得金属氧化物的生成速度低于络合物的形成速度。

49. 发明申请

US20050276983A1 Metal object-coating method and primer composition used in the same 审中-公开
标题翻译：用于其中的金属物体涂覆方法和底漆组合物
公开(公告)号：US20050276983A1
公开(公告)日：2005-12-15
申请号：US10492775
申请日：2002-10-16
申请人： Seiji Kashiwada , Satomi Kitagawa , Toshio Ohkoshi , Yoshinori Kato , Tohru Hayase , Makoto Mizutani , Minoru Ishikura , Hitoshi Itoh
发明人： Seiji Kashiwada , Satomi Kitagawa , Toshio Ohkoshi , Yoshinori Kato , Tohru Hayase , Makoto Mizutani , Minoru Ishikura , Hitoshi Itoh
IPC分类号： B05D1/36 , B05D7/16 , B32B15/08 , B32B27/36 , B32B27/38 , C09D5/00 , C09D5/08
CPC分类号： C23C22/83 , B05D7/16 , B05D2254/00 , C09D5/002 , C09D5/084 , Y10T428/31522 , Y10T428/31786 , Y10T428/31855
摘要： The present invention relates to metal object-coating method, which method comprises coating a primer composition (I) prepared by adding an inorganic anti-corrosive agent to at least one binder component selected from the group consisting of a binder component (A) containing an epoxy resin and ant least one of amino resin and phenol resin, a binder component (B) containing a polyester resin, epoxy resin and phenol resin, and a binder component (C) containing α-olefin•α,β-ethylenically unsaturated carboxylic acid copolymer resin onto the surface of a metal object coating substrate to form a primer coating film layer, followed by coating a topcoat coating composition consisting of a thermoplastic resin based coating composition (II) onto the primer coating film layer to form a topcoat coating film layer consisting of a thermoplastic resin coating film layer; and the primer composition used in the method.
摘要翻译：本发明涉及金属物体涂覆方法，该方法包括涂布底漆组合物（I），该底漆组合物（I）是通过向至少一种选自以下的粘合剂组分中添加无机抗腐蚀剂而制备的：粘合剂组分（A）环氧树脂和氨基树脂和酚醛树脂中的至少一种，含有聚酯树脂，环氧树脂和酚醛树脂的粘合剂组分（B）和含有α-烯烃，α-烯属不饱和羧酸的粘合剂组分（C）共聚物树脂涂布到金属物体涂布基材的表面上，形成底漆涂膜层，然后将由热塑性树脂基涂料组合物（II）组成的面漆涂料组合物涂布在底涂层膜上，形成面漆涂膜层由热塑性树脂涂膜层组成; 和该方法中使用的底漆组合物。

50. 发明授权

US06252272B1 Semiconductor device, and method of fabricating the same 失效
标题翻译：半导体装置及其制造方法
公开(公告)号：US06252272B1
公开(公告)日：2001-06-26
申请号：US09267607
申请日：1999-03-15
申请人： Hiroshi Watanabe , Hitoshi Itoh , Ken Uchida
发明人： Hiroshi Watanabe , Hitoshi Itoh , Ken Uchida
IPC分类号： H01L29788
CPC分类号： H01L27/11521 , H01L27/115 , H01L27/11524 , H01L29/42324 , H01L29/7883
摘要： A surface portion of a semiconductor substrate 41 is serrated at intervals equal to a minimum processing size to form impurity diffusion layers in peaks. These impurity diffusion layers are isolated from each other by valleys. At a valley where a gate is formed, the gate and impurity diffusion layers and in peaks on the two sides of the gate form a MOS transistor. A valley in which no gate is formed functions as an element isolation region. Since a MOS transistor or an element isolation region is formed in one valley, the element area is reduced. A surface of a p-type semiconductor substrate is serrated to form n+-type impurity regions in peaks and floating gates having an upper spired portion in valleys via a silicon oxide film. Control gates are formed on the floating gates via a tunnel oxide film. The lower portion of the control gate has a shape corresponding to the valley and opposes the upper portion of the floating gate by self-alignment. Data is written or erased by using a tunnel current flowing of electrons through the tunnel oxide film between the floating gate and control gate having the above-mentioned shapes and positional relationship. This achieves micropatterning and reduces the maximum operating voltage at the same time.
摘要翻译：半导体衬底41的表面部分以等于最小处理尺寸的间隔被锯齿，以在峰上形成杂质扩散层。这些杂质扩散层通过谷彼此隔离。在形成栅极的谷中，栅极和杂质扩散层以及栅极两侧的峰形成MOS晶体管。没有栅极的谷形成元件隔离区域。由于在一个谷中形成MOS晶体管或元件隔离区域，所以元件面积减小。p型半导体衬底的表面被锯齿形以形成峰顶中的n +型杂质区域和具有上部尖端部分的浮动栅极谷经硅氧化膜。控制栅极通过隧道氧化膜形成在浮动栅极上。控制栅极的下部具有与谷相对应的形状，并且通过自对准与浮栅的上部相对。通过使用电子流通过具有上述形状和位置关系的浮动栅极和控制栅极之间的隧道氧化物膜的隧道电流来写入或擦除数据。这实现了微图案化，同时降低了最大工作电压。

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