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41. 发明授权

US07323415B2 Polishing pad for semiconductor wafer, polishing multilayered body for semiconductor wafer having same, and method for polishing semiconductor wafer 有权
标题翻译：用于半导体晶片的抛光垫，用于其半导体晶片的抛光多层体，以及用于研磨半导体晶片的方法
公开(公告)号：US07323415B2
公开(公告)日：2008-01-29
申请号：US10529742
申请日：2004-04-23
申请人： Hiroshi Shiho , Yukio Hosaka , Kou Hasegawa , Nobuo Kawahashi
发明人： Hiroshi Shiho , Yukio Hosaka , Kou Hasegawa , Nobuo Kawahashi
IPC分类号： H01L21/302
CPC分类号： B24B37/205
摘要： An objective of the present invention is to provide a polishing pad for a semiconductor wafer and a laminated body for polishing of a semiconductor wafer equipped with the same which can perform optical endpoints detection without lowering the polishing performance as well as methods for polishing of a semiconductor wafer using them. The polishing pad of the present invention comprises a substrate 11 for a polishing pad provided with a through hole penetrating from surface to back, a light transmitting part 12 fitted in the through hole, the light transmitting part comprises a water-insoluble matrix material (1,2-polybutadiene) and a water-soluble particle (β-cyclodextrin) dispersed in the water-insoluble matrix material, and the water-soluble particle is less than 5% by volume based on 100% by volume of the total amount of the water-insoluble matrix material and the water-soluble particle. In addition, the laminated body for polishing of the present invention comprises a supporting layer on a backside of the polishing pad. These polishing pad and laminated body for polishing can comprise a fixing layer 13 on a backside.
摘要翻译：本发明的目的是提供一种用于半导体晶片的抛光垫和用于抛光其配备的半导体晶片的层叠体，其可以在不降低抛光性能的情况下进行光学终点检测以及半导体的抛光方法晶圆使用它们。本发明的抛光垫包括用于抛光垫的基板11，该抛光垫具有从表面向后穿透的通孔，安装在通孔中的透光部12，透光部包括水不溶性基质材料（1 ，2-聚丁二烯）和分散在水不溶性基质材料中的水溶性颗粒（β-环糊精），并且水溶性颗粒的体积百分比小于5体积％水不溶性基质材料和水溶性颗粒。另外，本发明的研磨用层叠体在研磨垫的背面具有支撑层。这些抛光垫和用于抛光的层压体可以在背面上包括固定层13。

42. 发明授权

US07217305B2 Polishing body 失效
标题翻译：抛光体
公开(公告)号：US07217305B2
公开(公告)日：2007-05-15
申请号：US11288094
申请日：2005-11-29
申请人： Kou Hasegawa , Hozumi Satou , Osamu Ishikawa , Yukio Hosaka
发明人： Kou Hasegawa , Hozumi Satou , Osamu Ishikawa , Yukio Hosaka
IPC分类号： B24D3/00 , B24B7/22
CPC分类号： B24B37/245 , B24B37/24 , B24D3/28 , B24D11/001 , B24D18/0009 , C09K3/1454
摘要： An object of the present invention is to provide a polishing body, wherein the abrasive in the polishing body are extremely dispersed well, which provides stable polishing performance in the polishing process, and which can effectively reduce the occurrence of scratches even in a case a large quantity of the abrasive are contained. A polishing part constituting the polishing body in the invention is produced obtained by loading predetermined amounts of butadiene, styrene, methyl methacrylate, itaconic acid, acrylic acid, α-methylstyrenedimer, and t-dodecylmercaptan in an autoclave, making the mixture react for 16 hours at 75° C. to obtain an emulsion wherein a copolymer is dispersed, adjusting this emulsion to pH8.5, incorporating cerium oxide powder with an average primary particle diameter of 0.3 μm and stirring to obtain an aqueous dispersion, drying this aqueous dispersion by spreading it thinly across a film, and mold pressing the dried product obtained. The above-mentioned polishing part may have a crosslinked structure. The polishing body in the invention can be used favorably in a polishing pad and the like, for polishing the surface of a semiconductor wafer or the like.
摘要翻译：本发明的目的是提供一种抛光体，其中抛光体中的磨料非常分散，在抛光过程中提供稳定的抛光性能，并且即使在大的情况下也能有效地减少划痕的发生含有磨料的数量。通过在高压釜中加载预定量的丁二烯，苯乙烯，甲基丙烯酸甲酯，衣康酸，丙烯酸，α-甲基苯乙炔二酮和叔十二烷基硫醇，制得本发明中构成抛光体的抛光部分，使混合物反应16小时在75℃下，得到其中分散共聚物的乳液，将该乳液调节至pH8.5，并加入平均一次粒径为0.3μm的二氧化铈粉末并搅拌，得到水分散体，通过涂布干燥该水性分散体薄膜穿过薄膜，模压所得干燥产品。上述抛光部分可以具有交联结构。本发明的研磨体可以在抛光垫等中有利地使用，用于研磨半导体晶片等的表面。

43. 发明申请

US20060128271A1 Polishing pad for semiconductor wafer and laminated body for polishing of semiconductor wafer equipped with the same as well as method for polishing of semiconductor wafer 有权
标题翻译：用于半导体晶片的抛光垫和用于抛光配备有其的半导体晶片的层叠体以及半导体晶片的抛光方法
公开(公告)号：US20060128271A1
公开(公告)日：2006-06-15
申请号：US10529742
申请日：2004-04-23
申请人： Hiroshi Shiho , Yukio Hosaka , Kuo Hasegawa , Nobuo Kawahashi
发明人： Hiroshi Shiho , Yukio Hosaka , Kuo Hasegawa , Nobuo Kawahashi
IPC分类号： B24B49/00 , B24B1/00 , B24B7/30
CPC分类号： B24B37/205
摘要： An objective of the present invention is to provide a polishing pad for a semiconductor wafer and a laminated body for polishing of a semiconductor wafer equipped with the same which can perform optical endpoint detection without lowering the polishing performance as well as methods for polishing of a semiconductor wafer using them. The polishing pad of the present invention comprises a substrate 11 for a polishing pad provided with a through hole penetrating from surface to back, a light transmitting part 12 fitted in the through hole, the light transmitting part comprises a water-insoluble matrix material (1,2-polybutadiene) and a water-soluble particle (β-cyclodextrin) dispersed in the water-insoluble matrix material, and the water-soluble particle is less than 5% by volume based on 100% by volume of the total amount of the water-insoluble matrix material and the water-soluble particle. In addition, the laminated body for polishing of the present invention comprises a supporting layer on a backside of the polishing pad. These polishing pad and laminated body for polishing can comprise a fixing layer 13 on a backside.
摘要翻译：本发明的目的是提供一种用于半导体晶片的抛光垫和用于抛光配备有该半导体晶片的半导体晶片的半导体晶片的层叠体，其可以在不降低抛光性能的情况下进行光学终点检测以及半导体的抛光方法晶圆使用它们。本发明的抛光垫包括用于抛光垫的基板11，该抛光垫具有从表面向后穿透的通孔，安装在通孔中的透光部12，透光部包括水不溶性基质材料（1 ，2-聚丁二烯）和分散在水不溶性基质材料中的水溶性颗粒（β-环糊精），并且水溶性颗粒的体积百分比小于5体积％水不溶性基质材料和水溶性颗粒。另外，本发明的研磨用层叠体在研磨垫的背面具有支撑层。这些抛光垫和用于抛光的层压体可以在背面上包括固定层13。

44. 发明授权

US06976910B2 Polishing pad 有权
公开(公告)号：US06976910B2
公开(公告)日：2005-12-20
申请号：US10849782
申请日：2004-05-21
申请人： Yukio Hosaka , Hiroshi Shiho , Kou Hasegawa , Nobuo Kawahashi
发明人： Yukio Hosaka , Hiroshi Shiho , Kou Hasegawa , Nobuo Kawahashi
IPC分类号： B24B37/20 , B24B37/24 , B24D3/00 , B24D13/14 , H01L21/304 , B24D11/00
CPC分类号： B24B37/26
摘要： A polishing pad comprising a recessed portion in the non-polishing surface. This polishing pad can prevent the surface to be polished of an object from being scratched.

45. 发明申请

US20050003749A1 Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：US20050003749A1
公开(公告)日：2005-01-06
申请号：US10849782
申请日：2004-05-21
申请人： Yukio Hosaka , Hiroshi Shiho , Kou Hasegawa , Nobuo Kawahashi
发明人： Yukio Hosaka , Hiroshi Shiho , Kou Hasegawa , Nobuo Kawahashi
IPC分类号： B24B37/20 , B24B37/24 , B24D3/00 , B24D13/14 , H01L21/304 , B24B1/00
CPC分类号： B24B37/26
摘要： A polishing pad comprising a recessed portion in the non-polishing surface. This polishing pad can prevent the surface to be polished of an object from being scratched.
摘要翻译：抛光垫，其包括在非抛光表面中的凹陷部分。该抛光垫可以防止被抛光的表面被划伤。

46. 发明授权

US06683970B1 Method of diagnosing nutritious condition of crop in plant field 有权
标题翻译：诊断农作物营养状况的方法
公开(公告)号：US06683970B1
公开(公告)日：2004-01-27
申请号：US09635271
申请日：2000-08-09
申请人： Satoru Satake , Yukio Hosaka , Hideharu Maruyama , Nobuhiko Nakamura
发明人： Satoru Satake , Yukio Hosaka , Hideharu Maruyama , Nobuhiko Nakamura
IPC分类号： G06U900
CPC分类号： G01N21/31 , A01G7/00 , G01N2021/8466
摘要： A method of diagnosing nutritious condition of crop in a plant field is disclosed. The method comprises the steps of: locating a camera equipped with a plurality of image elements in a predetermined central depression angle with respect to the plant field; obtaining an amount of reflection light of a crop leaf for each image element by image-taking the field; obtaining an image-taken area for each unit image element by an area function constituted by a conversion variable including a ground clearance, an image element depression angle, the number of image elements and a field angle of the camera; making an area compensation of the amount of reflection light for each image element by the image-taken area; making a depression angle compensation of the amount of reflection light by a depression angle coefficient predetermined for compensating differences of amounts of reflection light correspondingly with image element depression angles; measuring an amount of light incident on the crop leaf; obtaining reflectance from the amount of the reflection light compensated and the measured amount of incident light; obtaining first crop information in a predetermined area based on the reflectance and a first crop related formula predetermined for obtaining crop information from reflectance, and storing the first crop information; and determining a nutritious condition of the crop in the plant field based on the first crop information. Instead of the grand clearance of the camera, a distance of field of view of the camera may well be used.
摘要翻译：公开了一种诊断植物营养状况的方法。该方法包括以下步骤：将装备有相对于植物场的预定中心凹陷角的多个图像元素的相机定位; 通过图像拍摄获得每个图像元素的作物叶的反射光量; 通过由包括离地间隙，图像元素俯仰角，图像元素的数量和相机的视场角的转换变量构成的区域函数来获得每个单位图像元素的图像拍摄区域; 通过图像拍摄区域对每个图像元素的反射光量进行面积补偿; 通过预定的用于补偿反射光量的差异的按压角系数对应于图像元素下压角来对反射光的倾斜角补偿; 测量入射在作物叶上的光量; 从补偿的反射光的量和入射光的测量量获得反射率; 基于所述反射率和预定的用于从反射率获得作物信息的第一作物相关公式获得预定区域中的第一作物信息，以及存储所述第一作物信息; 以及基于所述第一作物信息确定所述作物在所述植物区域中的营养状况。而不是相机的大清除，可以使用相机的视野的距离。

47. 发明授权

US06466321B1 Method of diagnosing nutritious condition of crop in plant field 失效
标题翻译：诊断农作物营养状况的方法
公开(公告)号：US06466321B1
公开(公告)日：2002-10-15
申请号：US09595023
申请日：2000-06-16
申请人： Satoru Satake , Yukio Hosaka , Hideharu Maruyama , Nobuhiko Nakamura
发明人： Satoru Satake , Yukio Hosaka , Hideharu Maruyama , Nobuhiko Nakamura
IPC分类号： G01J351
CPC分类号： G01N21/3563 , G01N2021/1797 , G01N2021/8466 , G06T7/44 , G06T2207/30188
摘要： From the crop of a predetermined area in a plant field under exposure to natural light, a reflectivity of the light having relation to crop information such as nitrogen content rate is measured by a camera; the crop information as first crop information is obtained from the first crop related formula established in advance for obtaining the crop information from the reflectivity; light is irradiated on crop leaf blades in the same area as the predetermined area and an amount of the light is measured; the crop information as second crop information is obtained from the second crop related formula established in advance for obtaining the crop information from the amount of the light; differences are calculated from the first crop information and the second crop information; the first crop information is obtained from the unknown crop in the predetermined area within the crop field of the same area; the first crop information is corrected based on the differences; and the nutritious diagnosis of the crop in the field is conducted by the corrected first crop information. In conducting diagnosis of crop by measuring the reflection light amount from the crop, since compensation or correction is performed, no great errors occur caused by differences in the measurement locations and the planting densities, and the diagnosis of the crop is simple and easy and, more over, the precision in the measuring is enhanced.
摘要翻译：在暴露于自然光下的植物场中的预定区域的作物中，通过照相机测量与作物信息（如含氮量）有关的光的反射率; 作物信息作为第一作物信息是从预先建立的用于从反射率获得作物信息的第一作物相关公式获得的; 光照射在与预定面积相同的区域中的作物叶片上，并测量光量; 作为第二作物信息的作物信息从预先确定的用于从光量获得作物信息的第二作物相关公式获得; 差异由第一作物信息和第二作物信息计算; 第一作物信息从相同区域的作物田中的预定区域中的未知作物获得; 基于差异来校正第一作物信息; 并且通过校正的第一作物信息进行田间作物的营养诊断。在通过测量作物的反射光量进行作物的诊断时，由于进行了补偿或校正，因测量位置和种植密度的差异而不会发生大的错误，并且作物的诊断简单易行，更重要的是，测量的精度得到提高。

48. 发明授权

US5952234A Apparatus for measuring ash content of food stuff by ultraviolet radiation 失效
标题翻译：用于通过紫外线辐射测量食物的灰分含量的装置
公开(公告)号：US5952234A
公开(公告)日：1999-09-14
申请号：US942300
申请日：1997-10-01
申请人： Satoru Satake , Takaharu Kameoka , Yukio Hosaka , Takeshi Imai , Shinji Saito
发明人： Satoru Satake , Takaharu Kameoka , Yukio Hosaka , Takeshi Imai , Shinji Saito
IPC分类号： G01N21/27 , G01N21/33 , G01N21/35 , G01N21/3563 , G01N21/359 , G01N33/02
CPC分类号： G01N21/33 , G01N21/274 , G01N21/3563 , G01N21/359 , G01N33/02 , Y10T436/10
摘要： A method for measuring ash content of food stuff is carried out by 1) preparing, with respect to food stuff samples whose ash content values are known, a calibration curve by a non-linear analysis of absorbance values and the known ash content of each sample, the absorbance values being obtained by irradiating light having particular wavelengths containing at least an ultraviolet ray band wavelength, the particular wavelength being specific to organic ingredients well coupled to inorganic ingredients which result in the ash content, and 2) deriving, with respect to a sample whose ash content value is unknown, an ash content value of the sample from absorbance values obtained by irradiating, on the sample, light having the particular wavelengths containing at least the ultraviolet ray band wavelength and from the calibration curve prepared in advance by the non-linear analysis. An apparatus for carrying out the method includes a light source section, a photo detecting section, a storing section for storing the calibration curve, and a calculation section for calculating, with respect to a sample whose ash content value is unknown, the ash content value based on the absorbance values and the calibration curve stored in the storing section. It is possible to speed up the measuring operation and to improve the measuring precision.
摘要翻译：通过以下方式进行食品灰分含量测定的方法：1）对于灰分含量已知的食品样品，通过吸光度值的非线性分析和每个样品的已知灰分含量制备校准曲线通过照射具有至少具有紫外线波长的特定波长的光获得的吸光度值，该特定波长特异于有机成分，其与无机成分良好耦合，导致灰分含量，以及2）相对于灰分含量未知的样品，样品的灰分含量值，其通过在样品上照射具有至少包含紫外线波段波长的特定波长的光和由非预定制备的校准曲线获得的吸光度值，线性分析。用于执行该方法的装置包括光源部分，光检测部分，用于存储校准曲线的存储部分，以及计算部分，用于相对于灰分含量值未知的样本计算灰分含量值基于存储部分中存储的吸光度值和校准曲线。可以加快测量操作，提高测量精度。

49. 发明授权

US5033371A Process of and system for flouring wheat 失效
标题翻译：播种小麦的过程和系统
公开(公告)号：US5033371A
公开(公告)日：1991-07-23
申请号：US366698
申请日：1989-06-15
申请人： Toshihiko Satake , Yukio Hosaka
发明人： Toshihiko Satake , Yukio Hosaka
IPC分类号： B02B1/08 , B02B5/02 , B02C9/04
CPC分类号： B02C9/04 , B02B5/02
摘要： A wheat flouring system comprises a polishing machine for polishing wheat grains, a humidifying machine for humidifying the grains, a conditioning machine for subjecting the grains to conditioning and a milling machine for milling the grains to produce a flour. The polishing machine, the humidifying machine, the conditioning machine and the milling machine are successively arranged from an upstream side to a downstream side as viewed in a direction of flow of the wheat grains. There is provided an agitating machine for agitating the grains humidified by the humidifying machine, thereby preventing the humidified grains from sticking together into lumps of the grains.

50. 发明授权

US3965360A Method for discriminating high-temperature red heated material 失效
标题翻译：鉴别高温红色加热材料的方法
公开(公告)号：US3965360A
公开(公告)日：1976-06-22
申请号：US498371
申请日：1974-08-19
申请人： Koji Sakasegawa , Atsushi Ohsumi , Tatsue Saito , Yukio Hosaka , Kazuo Kunioka , Tomio Yamamoto , Tadashi Asai
发明人： Koji Sakasegawa , Atsushi Ohsumi , Tatsue Saito , Yukio Hosaka , Kazuo Kunioka , Tomio Yamamoto , Tadashi Asai
IPC分类号： C09D5/00 , C09D5/18 , C21D1/00 , F27D21/00 , F27D21/02 , G01J3/00 , G01V8/10 , G06K7/12 , G01N21/34
CPC分类号： F27D21/02 , F27D21/0014
摘要： In heating a material radiant at high temperatures, such as a steel product, in a heating furnace, the said material is charged into the heating furnace to heat. A discrimination mark is previously drawn on the surface of material to be discriminated on a portion readily watched from outside the furnace. A heat resisting paint sensitive to near ultraviolet rays is used to make the mark. The said material radiant-heated in the heating furnace is discriminated from outside the furnace as being radiant by applying near ultraviolet rays of a high pressure mercury lamp thereto from outside the furnace to provide a sharp contrast between the said material surface and the said discrimination mark for the discrimination of the said mark from outside the furnace.
摘要翻译：在加热炉中加热高温辐射物质（如钢铁产品）时，将所述材料装入加热炉中进行加热。先前在容易从炉外观察的部分上的待鉴别材料的表面上画出鉴别标记。使用对近紫外线敏感的耐热涂料来制作标记。在加热炉中辐射加热的所述材料通过从炉外部施加高压汞灯的近紫外线而被从外部鉴别为辐射，以在所述材料表面和所述鉴别标记之间提供清晰的对比度用于从炉外区分所述标记。

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