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41. 发明授权

US06385217B1 Compact wavelength-independent wavelength-locker for absolute wavelength stability of a laser diode 有权
标题翻译：紧凑的波长独立波长锁定器，用于激光二极管的绝对波长稳定性
公开(公告)号：US06385217B1
公开(公告)日：2002-05-07
申请号：US09250879
申请日：1999-02-16
申请人： Harmeet Singh , Fahri Diner
发明人： Harmeet Singh , Fahri Diner
IPC分类号： H01S310
CPC分类号： H01S5/0687
摘要： A wavelength independent wave-locker arrangement is used to control the output wavelength of a laser diode. In the wave-locker arrangement, a narrow-band power splitter is responsive to the reception of a portion of an optical output signal from the laser diode for splitting the received optical signal into first and second coupler optical output signals, respectively. First and second photodetectors are coupled to receive the first and second coupler optical output signals, respectively, and generate respective corresponding first and second electrical output signals. A control unit is responsive to the reception of the first and second electrical output signals from the first and second photodetectors for generating predetermined control signals to the laser diode for maintaining the wavelength of the laser diode at a predetermined constant value.
摘要翻译：使用波长独立的波形锁存器布置来控制激光二极管的输出波长。在波形锁定装置中，窄带功率分配器响应于来自激光二极管的一部分光输出信号的接收，用于将接收的光信号分别分成第一和第二耦合器光输出信号。第一和第二光电探测器被耦合以分别接收第一和第二耦合器光输出信号，并且产生相应的对应的第一和第二电输出信号。控制单元响应于来自第一和第二光电检测器的第一和第二电输出信号的接收，以产生到激光二极管的预定控制信号，以将激光二极管的波长保持在预定的恒定值。

42. 发明授权

US06185345B2 Ultra-stable optical wavelength division multiplexer/demultiplexer 失效
标题翻译：超稳定光波分复用器/解复用器
公开(公告)号：US06185345B2
公开(公告)日：2001-02-06
申请号：US09271524
申请日：1999-03-18
申请人： Harmeet Singh , Fahri Diner
发明人： Harmeet Singh , Fahri Diner
IPC分类号： G02B628
CPC分类号： G02B6/29355 , G02B6/12007 , G02B6/2835 , G02B6/2861 , G02B6/2938
摘要： An unbalanced Mach-Zehnder interferometer is useable in an optical wavelength division multiplexer or demultiplexer to provide wavelength stability. First and second fused tapered couplers in the unbalanced Mach-Zehnder interferometer are each responsive to the reception of at least one first and second optical input signals for generating separate predetermined first and second optical output signals. The first and second output signals from the first fused tapered coupler are coupled via first and second optical waveguides, respectively, to respective first and second optical inputs of the second fused tapered coupler. First and second output signals from the second fused tapered coupler are provided as first and second output signals from the unbalanced Mach-Zehnder interferometer. A variable delay is coupled in one of the first and second waveguides coupling the first and second optical output signals from the first fused tapered coupler to the first and second optical inputs of the second fused tapered coupler for introducing a predetermined variable delay into an optical signal passing therethrough for maintaining a relative delay between the first and second waveguides at a constant value. A plurality of such Mach-Zehnder interferometers can be used to form cascaded stages of an optical wavelength division multiplexer or demultiplexer.
摘要翻译：非平衡马赫 - 曾德干涉仪可用于光波分复用器或解复用器中以提供波长稳定性。不平衡马赫 - 策德尔干涉仪中的第一和第二熔融锥形耦合器各自响应于接收至少一个第一和第二光学输入信号，以产生分开的预定的第一和第二光学输出信号。来自第一熔接锥形耦合器的第一和第二输出信号分别经由第一和第二光波导耦合到第二熔接锥形耦合器的相应的第一和第二光学输入端。来自第二熔接锥形耦合器的第一和第二输出信号被提供为来自不平衡马赫 - 曾德尔干涉仪的第一和第二输出信号。可变延迟耦合在将第一和第二光输出信号从第一融合锥形耦合器耦合到第二融合锥形耦合器的第一和第二光输入的第一和第二波导中的一个中，以将预定的可变延迟引入光信号通过其以恒定值保持第一和第二波导之间的相对延迟。可以使用多个这样的马赫 - 策德尔干涉仪来形成光波分复用器或解复用器的级联级。

43. 发明授权

US10388493B2 Component of a substrate support assembly producing localized magnetic fields 有权
公开(公告)号：US10388493B2
公开(公告)日：2019-08-20
申请号：US13234473
申请日：2011-09-16
申请人： Harmeet Singh , Keith Gaff , Brett Richardson , Sung Lee
发明人： Harmeet Singh , Keith Gaff , Brett Richardson , Sung Lee
IPC分类号： H01F7/20 , H01J37/32 , H01L21/67 , H01L21/311
摘要： A component of a substrate support assembly such as a substrate support or edge ring includes a plurality of current loops incorporated in the substrate support and/or the edge ring. The current loops are laterally spaced apart and extend less than halfway around the substrate support or edge ring with each of the current loops being operable to induce a localized DC magnetic field of field strength less than 20 Gauss above a substrate supported on the substrate support during plasma processing of the substrate. When supplied with DC power, the current loops generate localized DC magnetic fields over the semiconductor substrate so as to locally affect the plasma and compensate for non-uniformity in plasma processing across the substrate.

44. 发明授权

US09349621B2 Vacuum seal arrangement useful in plasma processing chamber 有权
标题翻译：真空密封装置可用于等离子体处理室
公开(公告)号：US09349621B2
公开(公告)日：2016-05-24
申请号：US13113605
申请日：2011-05-23
申请人： Harmeet Singh
发明人： Harmeet Singh
IPC分类号： F16L17/06 , H01L21/67 , F16J15/06
CPC分类号： H01L21/67126 , F16J15/062
摘要： A vacuum seal arrangement comprising a one-piece elastomeric gasket having at least first and second O-rings interconnected by a planar web, a first part having a first planar sealing surface with a dove-tail groove therein holding the first O-ring and a square walled groove therein holding the second O-ring, the first part further including at least one passage in the first planar sealing surface surrounded by the first O-ring or second O-ring.
摘要翻译：一种真空密封装置，包括具有通过平面腹板互连的至少第一和第二O形环的单件式弹性垫圈，第一部分具有第一平面密封表面，其中带有第一O形环的鸽尾槽，其中保持第二O形环的方形壁槽，第一部分还包括由第一O形环或第二O形环包围的第一平面密封表面中的至少一个通道。

45. 发明申请

US20150206774A1 APPARATUS FOR ATOMIC LAYERING ETCHING 有权
标题翻译：用于原子层析蚀刻的装置
公开(公告)号：US20150206774A1
公开(公告)日：2015-07-23
申请号：US14103688
申请日：2013-12-11
申请人： Harmeet Singh
发明人： Harmeet Singh
IPC分类号： H01L21/67 , H01J37/32
CPC分类号： H01L21/67069 , H01J37/32082 , H01J37/3244 , H01J37/32449 , H01J37/32458 , H01J37/32633 , H01J37/32715 , H01J37/32899 , H01J2237/334 , H01L21/3065 , H01L21/76814
摘要： A substrate processing system having a processing chamber for etching a layer on a substrate is provided. The system includes a chuck upon which the substrate r disposed during etching. The system also includes the chamber being divided into a plasma generating region and a substrate processing region by a separating plate structure. The system further includes a plasma source for generating plasma in the plasma generating region. The system further includes logic for introducing a first gas into the chamber, wherein the gas is suitable for etching the layer. The logic, also allows the first gas to be present in the chamber tin a period of time sufficient to cause adsorption of at least some of the first gas into the layer. The logic further replaces the first gas with an inert gas, generates metastables from the inert gas, and etches the layer with the metastables.
摘要翻译：提供了具有用于蚀刻基板上的层的处理室的基板处理系统。该系统包括在蚀刻期间衬底r设置在其上的卡盘。该系统还包括通过分离板结构将室分成等离子体产生区域和基板处理区域。该系统还包括用于在等离子体产生区域中产生等离子体的等离子体源。该系统还包括用于将第一气体引入室中的逻辑，其中气体适于蚀刻该层。该逻辑还允许第一气体在室中存在足以使至少一些第一气体吸附到该层中的时间。该逻辑进一步用惰性气体替代第一气体，从惰性气体中产生亚稳态，并用亚稳态剂蚀刻该层。

46. 发明授权

US08699686B2 Method and apparatus for join selection of a conference call 有权
标题翻译：用于连接选择电话会议的方法和装置
公开(公告)号：US08699686B2
公开(公告)日：2014-04-15
申请号：US13423144
申请日：2012-03-16
申请人： Joseph Patrick Thomas Goguen , Manish Sunder Punjabi , Carsten Michael Bergmann , Harmeet Singh , Christina Evelyn Lucey , Eric Reyes , Yoshimichi Brian Sekiya
发明人： Joseph Patrick Thomas Goguen , Manish Sunder Punjabi , Carsten Michael Bergmann , Harmeet Singh , Christina Evelyn Lucey , Eric Reyes , Yoshimichi Brian Sekiya
IPC分类号： H04M3/42 , H04M11/00 , H04M1/00 , H04L12/16 , H04Q11/00 , H04N7/14
CPC分类号： H04M3/56 , H04M3/42246 , H04M3/42348 , H04M3/565 , H04M2203/2072 , H04M2203/2094 , H04M2203/5054
摘要： A method for join selection of a conference call from a communication device, wherein the communication device includes a memory for storing an event record. The method includes: identifying from the event record one or more addresses for contacting a conference call server for establishing a scheduled conference call session; automatically selecting, based on specified criteria, one of the addresses as a default address associated with a default join option for establishing the scheduled conference call session; generating an identifier for associating the selected default address with the default join option; and storing the identifier in the memory.
摘要翻译：一种用于从通信设备连接选择会议呼叫的方法，其中所述通信设备包括用于存储事件记录的存储器。该方法包括：从事件记录中识别用于联系会议呼叫服务器的一个或多个地址，用于建立预定的电话会议会话; 根据指定的标准自动选择其中一个地址作为与用于建立预定的电话会议会话的默认加入选项相关联的默认地址; 生成用于将所选择的默认地址与所述默认连接选项相关联的标识符; 并将该标识符存储在存储器中。

47. 发明授权

US08546732B2 Heating plate with planar heater zones for semiconductor processing 有权
标题翻译：具有用于半导体加工的平面加热器区域的加热板
公开(公告)号：US08546732B2
公开(公告)日：2013-10-01
申请号：US12943492
申请日：2010-11-10
申请人： Harmeet Singh
发明人： Harmeet Singh
IPC分类号： H05B3/26 , F27B5/14 , F27D11/02 , H01L23/48 , H01L23/52
CPC分类号： H01L21/3065 , B29D7/01 , H01C17/28 , H01L21/67109 , H01L21/67248 , H01L21/6831 , H05B3/68 , H05B2203/037
摘要： A heating plate for a substrate support assembly in a semiconductor plasma processing apparatus, comprises multiple independently controllable planar heater zones arranged in a scalable multiplexing layout, and electronics to independently control and power the planar heater zones. Each planar heater zone includes one or more heater elements made of an insulator-conductor composite. A substrate support assembly in which the heating plate is incorporated includes an electrostatic clamping electrode and a temperature controlled base plate. Methods for manufacturing the heating plate include bonding together ceramic sheets having planar heater zones, power supply lines, power return lines and vias.
摘要翻译：一种用于半导体等离子体处理设备中的基板支撑组件的加热板，包括以可伸缩复用布局布置的多个可独立控制的平面加热器区域，以及用于独立地控制和供电平面加热器区域的电子装置。每个平面加热器区域包括由绝缘体 - 导体复合材料制成的一个或多个加热器元件。其中结合加热板的基板支撑组件包括静电夹持电极和温度控制的基板。制造加热板的方法包括将具有平面加热区，电源线，电源返回线和通孔的陶瓷片接合在一起。

48. 发明授权

US08524099B2 Methods for accessing a process chamber using a dual zone gas injector with improved optical access 有权
标题翻译：使用具有改进的光学访问的双区域气体注入器访问处理室的方法
公开(公告)号：US08524099B2
公开(公告)日：2013-09-03
申请号：US12987030
申请日：2011-01-07
申请人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
发明人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
IPC分类号： G01L21/30
CPC分类号： C23C16/513 , H01J37/3244
摘要： Methods for processing events occurring in a process chamber are provided. In one method, an operation includes carrying gas and receiving an optical signal from the process chamber to an analysis tool that operates in response to the optical signal having a signal-to-noise ratio (SNR) for process analysis. And, dividing the carried gas and optical signal into a plurality of separate gas and optical signals between the process chamber and the analysis tool. The dividing is configured through separate apertures so that the apertures collectively maintain the SNR of the optical signal received at the tool. Methods provide a septum in a second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.
摘要翻译：提供了用于处理在处理室中发生的事件的方法。在一种方法中，操作包括携带气体并从处理室接收光信号到响应于具有用于过程分析的信噪比（SNR）的光信号而工作的分析工具。并且，在处理室和分析工具之间将承载的气体和光信号分成多个单独的气体和光信号。分隔通过单独的孔配置，使得孔一起保持在工具处接收的光信号的SNR。方法在第二孔中提供隔膜，将第二孔分成孔，所述孔被构造成减少光学接口窗口上的蚀刻和沉积并维持诊断终点处的期望SNR。

49. 发明申请

US20130072025A1 COMPONENT OF A SUBSTRATE SUPPORT ASSEMBLY PRODUCING LOCALIZED MAGNETIC FIELDS 审中-公开
标题翻译：基板支撑组件组件生产本地化磁场
公开(公告)号：US20130072025A1
公开(公告)日：2013-03-21
申请号：US13234473
申请日：2011-09-16
申请人： Harmeet Singh , Keith Gaff , Brett Richardson , Sung Lee
发明人： Harmeet Singh , Keith Gaff , Brett Richardson , Sung Lee
IPC分类号： H01L21/3065 , H01F7/20
CPC分类号： H01J37/32669 , H01F7/20 , H01J37/32715 , H01L21/31116 , H01L21/67069
摘要： A component of a substrate support assembly such as a substrate support or edge ring includes a plurality of current loops incorporated in the substrate support and/or the edge ring. The current loops are laterally spaced apart and extend less than halfway around the substrate support or edge ring with each of the current loops being operable to induce a localized DC magnetic field of field strength less than 20 Gauss above a substrate supported on the substrate support during plasma processing of the substrate. When supplied with DC power, the current loops generate localized DC magnetic fields over the semiconductor substrate so as to locally affect the plasma and compensate for non-uniformity in plasma processing across the substrate.
摘要翻译：诸如衬底支撑件或边缘环的衬底支撑组件的部件包括结合在衬底支撑件和/或边缘环中的多个电流回路。电流环横向间隔开并且延伸小于衬底支撑件或边缘环周围的一半，其中每个电流回路可操作以在支撑在衬底支撑件上的衬底上方引起小于20高斯的场强的局部DC磁场，基板的等离子体处理。当提供直流电源时，电流环路在半导体衬底上产生局部DC磁场，以便局部地影响等离子体并且补偿横跨衬底的等离子体处理的不均匀性。

50. 发明申请

US20130023125A1 METHODS AND APPARATUS FOR ATOMIC LAYER ETCHING 有权
标题翻译：原子层蚀刻的方法和装置
公开(公告)号：US20130023125A1
公开(公告)日：2013-01-24
申请号：US13187437
申请日：2011-07-20
申请人： Harmeet Singh
发明人： Harmeet Singh
IPC分类号： H01L21/4757 , H01L21/3065
CPC分类号： H01L21/67069 , H01J37/32082 , H01J37/3244 , H01J37/32449 , H01J37/32458 , H01J37/32633 , H01J37/32715 , H01J37/32899 , H01J2237/334 , H01L21/3065 , H01L21/76814
摘要： Substrate processing systems and methods for etching an atomic layer are disclosed. The methods and systems are configured to introducing a first gas into the chamber, the gas being an etchant gas suitable for etching the layer and allowing the first gas to be present in the chamber for a period of time sufficient to cause adsorption of at least some of the first gas into the layer. The first gas is substantially replaced in the chamber with an inert gas, and metastables are then generated from the inert gas to etch the layer with the metastables while substantially preventing the plasma charged species from etching the layer.
摘要翻译：公开了用于蚀刻原子层的衬底处理系统和方法。所述方法和系统被配置为将第一气体引入所述室中，所述气体是适于蚀刻所述层的蚀刻剂气体，并允许所述第一气体在所述室中存在足以引起至少一些吸附的时间的第一个气体进入层。第一种气体在室内基本上被惰性气体替代，然后从惰性气体产生亚稳态，以便在亚稳态下蚀刻该层，同时基本上防止等离子体带电物质蚀刻该层。

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