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    • 41. 发明授权
    • Display device and driving method of display device
    • 显示装置和显示装置的驱动方法
    • US08743030B2
    • 2014-06-03
    • US12813885
    • 2010-06-11
    • Hideaki Shishido
    • Hideaki Shishido
    • G09G3/30
    • H01L27/1225G09G3/3241G09G2300/0465G09G2300/0809G09G2300/0819G09G2300/0852G09G2300/0861G09G2310/0251G09G2310/0256G09G2310/0262G09G2320/0223G09G2320/043H01L27/12H01L27/1214H01L27/127H01L27/13
    • One feature of the present invention includes first to third steps of holding a voltage, corresponding to a difference between a voltage applied to a first power supply line and a threshold voltage of a first transistor, between both electrodes of first and second storage capacitors; holding a voltage, corresponding to a difference between a voltage applied to the first power supply line and a gate-source voltage of the first transistor, which is necessary to supply a light-emitting element with a current equivalent to a video signal current inputted into a signal line, between both the electrodes of the second storage capacitor; and applying a voltage based on the voltage held in the first and second storage capacitors in the first and second steps to a gate electrode of the first transistor; therefore, a current is supplied to the light-emitting element through the first transistor.
    • 本发明的一个特征包括在第一和第二存储电容器的两个电极之间保持对应于施加到第一电源线的电压与第一晶体管的阈值电压之间的差的电压的第一至第三步骤; 保持对应于施加到第一电源线的电压与第一晶体管的栅极 - 源极电压之间的差的电压,该电压是为了向发射元件提供与输入的视频信号电流相当的电流所必需的 在第二存储电容器的两个电极之间的信号线; 以及将第一和第二步骤中保持在第一和第二存储电容器中的电压的电压施加到第一晶体管的栅电极; 因此,通过第一晶体管将电流提供给发光元件。
    • 42. 发明授权
    • Photomask
    • 光掩模
    • US08512917B2
    • 2013-08-20
    • US13093974
    • 2011-04-26
    • Hideaki ShishidoYuto YakuboHirotada Oishi
    • Hideaki ShishidoYuto YakuboHirotada Oishi
    • G03F1/26G03F1/36
    • G03F1/36
    • A photomask is provided, with which the roundness of a corner portion of a resist mask can be reduced in a photolithography step. Further, a method for manufacturing a semiconductor device with less variation is provided. A photomask includes an auxiliary pattern at a corner portion of a light-blocking portion, and (k+1) sides (k is a natural number of 3 or more) form k obtuse angles in the auxiliary pattern. Alternatively, a photomask includes an auxiliary pattern at a corner portion of a light-blocking portion, and the auxiliary pattern includes a zigzag curve.
    • 提供了一种光掩模,利用该光掩模可以在光刻步骤中减小抗蚀剂掩模的角部的圆度。 此外,提供了一种具有较小变化的半导体器件的制造方法。 光掩模在遮光部分的角部包括辅助图案,并且辅助图案中的(k + 1)边(k是3以上的自然数)形成k个钝角。 或者,光掩模在遮光部分的角部包括辅助图案,并且辅助图案包括锯齿形曲线。
    • 43. 发明授权
    • Light-emitting display device and electronic device including the same
    • 发光显示装置及包括其的电子装置
    • US08482004B2
    • 2013-07-09
    • US12897299
    • 2010-10-04
    • Ryo ArasawaHideaki Shishido
    • Ryo ArasawaHideaki Shishido
    • H01L29/04
    • H01L27/124H01L27/1225H01L33/16
    • An object is to provide a light-emitting display device in which a pixel including a thin film transistor using an oxide semiconductor has a high aperture ratio. The light-emitting display device includes a plurality of pixels each including a thin film transistor and a light-emitting element. The pixel is electrically connected to a first wiring functioning as a scan line. The thin film transistor includes an oxide semiconductor layer over the first wiring with a gate insulating film therebetween. The oxide semiconductor layer is extended beyond the edge of a region where the first wiring is provided. The light-emitting element and the oxide semiconductor layer overlap with each other.
    • 本发明的目的是提供一种发光显示装置,其中包括使用氧化物半导体的薄膜晶体管的像素具有高开口率。 发光显示装置包括多个像素,每个像素包括薄膜晶体管和发光元件。 像素电连接到用作扫描线的第一布线。 薄膜晶体管包括在第一布线之间的氧化物半导体层,其间具有栅极绝缘膜。 氧化物半导体层延伸超过设置有第一布线的区域的边缘。 发光元件和氧化物半导体层彼此重叠。
    • 44. 发明授权
    • Semiconductor device and driving method thereof
    • 半导体装置及其驱动方法
    • US08477085B2
    • 2013-07-02
    • US11951817
    • 2007-12-06
    • Hideaki Shishido
    • Hideaki Shishido
    • G09G3/20
    • G09G3/3233G09G2300/0819G09G2300/0842G09G2300/0861G09G2310/0262G09G2320/043H01L27/3265H01L2251/5315H01L2251/5323
    • A display device which can compensate for variations of the threshold voltage of transistors and suppress variations in luminance, and a driving method thereof are provided. Current is supplied to a light emitting element and light is emitted from the light emitting element by following steps: in the first period initial voltage is stored in a storage capacitor; in the second period, voltage based on video signal voltage and the threshold voltage of the transistor is stored in the storage capacitor; and in the third period, the voltage stored in the storage capacitor in the second period is applied to a gate electrode of the transistor. By these operation processes, the current which compensates the effect of the variations of the threshold voltage of the transistor can be supplied to the light emitting element. Therefore, variations in luminance are suppressed.
    • 提供了能够补偿晶体管的阈值电压的变化并抑制亮度变化的显示装置及其驱动方法。 电流被提供给发光元件,并且通过以下步骤从发光元件发射光:在第一周期中,初始电压被存储在存储电容器中; 在第二时段中,基于视频信号电压和晶体管的阈值电压的电压被存储在存储电容器中; 并且在第三时段中,将在第二周期中存储在存储电容器中的电压施加到晶体管的栅电极。 通过这些操作处理,可以向发光元件提供补偿晶体管的阈值电压的变化的影响的电流。 因此,抑制亮度的变化。
    • 48. 发明授权
    • Semiconductor device and electronic device
    • 半导体器件和电子器件
    • US08368145B2
    • 2013-02-05
    • US12479291
    • 2009-06-05
    • Osamu FukuokaMasahiko HayakawaHideaki Shishido
    • Osamu FukuokaMasahiko HayakawaHideaki Shishido
    • H01L33/00
    • H01L27/14692H01L24/06H01L27/14603H01L27/14609H01L27/14636H01L2924/12043H01L2924/15788H01L2924/00
    • A semiconductor device has a structure including the first semiconductor region 103 which is provided in the first terminal portion 100 and includes the first n-type impurity region 106, the first resistance region 107 provided at an inner periphery portion of the first n-type impurity region 106 in a plane view, and the first p-type impurity region 108 provided at an inner periphery portion of the first resistance region 107 in the plane view, and the second semiconductor region 104 which is provided in the second terminal portion 101 and includes the second p-type impurity region 109, the second resistance region 110 provided at an inner periphery portion of the second p-type impurity region 109 in the plane view, and the second n-type impurity region 111 provided at an inner periphery portion of the second resistance region 110 in the plane view.
    • 半导体器件具有包括设置在第一端子部分100中并包括第一n型杂质区域106的第一半导体区域103的结构,设置在第一n型杂质的内周部分的第一电阻区域107 在俯视图中设置在第一电阻区域107的内周部的第一p型杂质区域108和设置在第二端子部101中的第二半导体区域104, 第二p型杂质区域109,在平面图中设置在第二p型杂质区域109的内周部分的第二电阻区域110和设置在第二p型杂质区域109的内周部分的第二n型杂质区域111 平面图中的第二电阻区域110。
    • 49. 发明授权
    • Semiconductor device and electronic device
    • 半导体器件和电子器件
    • US08354724B2
    • 2013-01-15
    • US12073721
    • 2008-03-10
    • Hideaki Shishido
    • Hideaki Shishido
    • H01L23/62
    • H01L27/14H01L23/60H01L2924/0002H01L2924/09701H01L2924/00
    • The present invention relates to a semiconductor device which includes a photoelectric conversion layer; an amplifier circuit amplifying an output current of the photoelectric conversion layer and including two thin film transistors; a first terminal supplying a high-potential power supply voltage; a second terminal supplying a low-potential power supply voltage; an electrode electrically connecting the two thin film transistors and the photoelectric conversion layer; a first wiring electrically connecting the first terminal and a first thin film transistor which is one of the two thin film transistors; and a second wiring electrically connecting the second terminal and a second thin film transistor which is the other of the two thin film transistors. In the semiconductor device, the value of voltage drop of the first wiring and the second wiring are increased by bending the first wiring and the second wiring.
    • 本发明涉及一种包括光电转换层的半导体器件; 放大电路,放大光电转换层的输出电流并包括两个薄膜晶体管; 提供高电位电源电压的第一端子; 提供低电位电源电压的第二端子; 电连接两个薄膜晶体管和光电转换层的电极; 电连接第一端子和作为两个薄膜晶体管之一的第一薄膜晶体管的第一布线; 以及将第二端子和作为两个薄膜晶体管中的另一个的第二薄膜晶体管电连接的第二布线。 在半导体装置中,通过弯曲第一布线和第二布线来增加第一布线和第二布线的电压降的值。
    • 50. 发明授权
    • Semiconductor device
    • 半导体器件
    • US08174047B2
    • 2012-05-08
    • US12495963
    • 2009-07-01
    • Osamu FukuokaMasahiko HayakawaHideaki Shishido
    • Osamu FukuokaMasahiko HayakawaHideaki Shishido
    • H01L29/66
    • H01L27/1262H01L27/0255H01L27/12H01L27/1214H01L27/1277
    • To improve the performance of a protection circuit including a diode formed using a semiconductor film. A protection circuit is inserted between two input/output terminals. The protection circuit includes a diode which is formed over an insulating surface and is formed using a semiconductor film. Contact holes for connecting an n-type impurity region and a p-type impurity region of the diode to a first conductive film in the protection circuit are distributed over the entire impurity regions. Further, contact holes for connecting the first conductive film and a second conductive film in the protection circuit are dispersively formed over the semiconductor film. By forming the contact holes in this manner wiring resistance between the diode and a terminal can be reduced and the entire semiconductor film of the diode can be effectively serve as a rectifier element.
    • 提高包括使用半导体膜形成的二极管的保护电路的性能。 一个保护电路插在两个输入/输出端子之间。 保护电路包括形成在绝缘表面上并使用半导体膜形成的二极管。 用于将二极管的n型杂质区域和p型杂质区域连接到保护电路中的第一导电膜的接触孔分布在整个杂质区域上。 此外,用于连接保护电路中的第一导电膜和第二导电膜的接触孔分散地形成在半导体膜上。 通过以这种方式形成接触孔,可以减小二极管和端子之间的布线电阻,并且二极管的整个半导体膜可以有效地用作整流元件。