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41. 发明申请

US20050035292A1 Charged particle deflecting system 有权
标题翻译：带电粒子偏转系统
公开(公告)号：US20050035292A1
公开(公告)日：2005-02-17
申请号：US10871879
申请日：2004-06-18
申请人： Pavel Adamec , Harry Munack
发明人： Pavel Adamec , Harry Munack
IPC分类号： H01J37/147 , H01J37/153 , H01J37/256 , H01J37/28
CPC分类号： H01J37/153 , H01J37/1475 , H01J2237/141 , H01J2237/1532 , H01J2237/1536
摘要： The invention provides a deflecting system for deflecting a charged particle beam from a first direction to a second direction, the deflecting system comprising a first deflector for deflecting said charged particle beam off the first direction within a first deflection plane; a second deflector for deflecting the deflected charged particle beam into the second direction within the first deflection plane; and at least one deflect pair of correcting coils comprising two correction coils which are positioned and shaped t reduce an astigmatism of the charged particle beam caused by the deflections.
摘要翻译：本发明提供了一种用于将带电粒子束从第一方向偏转到第二方向的偏转系统，该偏转系统包括用于在第一偏转平面内将所述带电粒子束偏离第一方向的第一偏转器; 第二偏转器，用于将偏转的带电粒子束偏转到第一偏转平面内的第二方向; 以及至少一个偏转对的校正线圈，其包括两个校正线圈，其被定位和成形，以减少由偏转引起的带电粒子束的像散。

42. 发明申请

US20130270439A1 MULTI CHANNEL DETECTOR, OPTICS THEREFOR AND METHOD OF OPERATING THEREOF 有权
标题翻译：多通道探测器，其光学器件及其操作方法
公开(公告)号：US20130270439A1
公开(公告)日：2013-10-17
申请号：US13543608
申请日：2012-07-06
申请人： Pavel Adamec
发明人： Pavel Adamec
IPC分类号： H01J37/244 , H01J37/26 , H01J37/22
CPC分类号： H01J37/244 , H01J2237/2441 , H01J2237/2449 , H01J2237/24592
摘要： A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection areas, wherein the active detection areas are separated by a gap, a particle optics configured for separating the signal beam in a first portion of the signal beam and in at least one second portion of the signal beam, configured for focusing the first portion of the signal beam, and configured for deflecting and focusing the at least one second portion of the signal beam, wherein the particle optics includes a first electrode and at least one second electrode. Therein, the first electrode is an inner electrode and the at least one second electrode is provided radially outward of the first electrode.
摘要翻译：描述了用于检测信号光束的二次带电粒子检测装置。所述装置包括具有至少两个具有主动检测区域的检测元件的检测器装置，其中所述主动检测区域被间隙分开，所述粒子光学器件被配置用于在所述信号束的第一部分中和在至少一个所述信号光束的第二部分被配置用于聚焦所述信号光束的所述第一部分，并且被配置为偏转和聚焦所述信号光束的所述至少一个第二部分，其中所述粒子光学器件包括第一电极和至少一个第二电极。其中，第一电极是内电极，并且至少一个第二电极设置在第一电极的径向外侧。

43. 发明授权

US08164067B2 Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen 有权
标题翻译：用于检查样本的带电粒子束装置的对比度改善的布置和方法
公开(公告)号：US08164067B2
公开(公告)日：2012-04-24
申请号：US12701463
申请日：2010-02-05
申请人： Pavel Adamec , Helmut Banzhof , Ivo Liska
发明人： Pavel Adamec , Helmut Banzhof , Ivo Liska
IPC分类号： G01N23/22 , G01N23/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2446
摘要： It is provided a charged particle beam device for inspecting a specimen, comprising a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; and a detector device comprising one or more charged particle detectors adapted to detect a secondary charged particle beam generated by the primary charged particle beam at the specimen and passing through the objective lens device, the secondary charged particle beam comprising a first group of secondary charged particles starting from the specimen with high starting angles and a second group of secondary charged particles starting from the specimen with low starting angles; wherein at least one of the charged particle detectors is adapted to detect depending on the starting angles one group of the first and the second groups of secondary charged particles.
摘要翻译：提供了一种用于检查样本的带电粒子束装置，包括适于产生初级带电粒子束的带电粒子束源; 适于将初级带电粒子束引导到样本上的物镜装置; 以及检测器装置，其包括一个或多个带电粒子检测器，其适于检测在所述样本处由所述初级带电粒子束产生的并通过所述物镜装置的次级带电粒子束，所述次级带电粒子束包括第一组次级带电粒子从具有较高起始角度的样品开始，第二组二次带电粒子从起始角低的样品开始; 其中所述带电粒子检测器中的至少一个适于根据起始角度检测一组第一和第二组次级带电粒子。

44. 发明授权

US07982179B2 Beam current calibration system 有权
标题翻译：光束电流校准系统
公开(公告)号：US07982179B2
公开(公告)日：2011-07-19
申请号：US12366465
申请日：2009-02-05
申请人： Pavel Adamec , Fang Zhou
发明人： Pavel Adamec , Fang Zhou
IPC分类号： H01J23/00 , G12B13/00
CPC分类号： H01J37/244 , H01J37/261 , H01J2237/2443 , H01J2237/24507 , H01J2237/2826
摘要： A charged particle beam device is described. The charged particle beam device includes an emitter adapted for emitting a primary charged particle beam, a specimen location adapted for holding a specimen, from which secondary and/or backscattered charged particles are released on impingement of the primary charged particle beam, a detection unit adapted for detecting the secondary particles and/or secondary particles, and a beam guiding unit adapted for guiding the primary charged particle beam to the detection unit for impingement of a primary charged particle beam on the detection unit.
摘要翻译：描述带电粒子束装置。带电粒子束装置包括适于发射初级带电粒子束的发射器，适于保持试样的试样位置，从而从初级带电粒子束的冲击中释放辅助和/或反向散射的带电粒子，检测单元适于用于检测二次粒子和/或二次粒子的光束引导单元，以及用于将初级带电粒子束引导到检测单元的光束引导单元，用于将一次带电粒子束撞击在检测单元上。

45. 发明授权

US07932495B2 Fast wafer inspection system 有权
标题翻译：快速晶圆检测系统
公开(公告)号：US07932495B2
公开(公告)日：2011-04-26
申请号：US12202833
申请日：2008-09-02
申请人： Pavel Adamec
发明人： Pavel Adamec
IPC分类号： G21K7/00 , H01J37/08
CPC分类号： H01J37/28 , H01J37/244 , H01J37/265 , H01J2237/24465 , H01J2237/24495 , H01J2237/24592
摘要： A charged particle beam device is provided including a particle source emitting a primary particle beam, a secondary particle beam generated by the impingement of the primary particle beam on the sample, a detection unit for detecting the secondary particle beam, the detector having at least two detector channels, and a distribution deflecting device for deflecting the secondary particle beam in a chronological sequence. Further, a detection assembly for a fast wafer inspection system is provided including a distribution deflecting device for distributing a secondary particle beam in a chronological sequence and a detector for detecting the secondary particle beam, the detector having multiple detector channels. Further, a method of operating a particle beam device with chronological resolution is provided.
摘要翻译：提供一种带电粒子束装置，包括发射一次粒子束的粒子源，通过一次粒子束撞击在样本上产生的二次粒子束，用于检测二次粒子束的检测单元，该检测器具有至少两个检测器通道和用于按时间顺序偏转次级粒子束的分布偏转装置。此外，提供了一种用于快速晶片检查系统的检测组件，其包括用于按时间顺序分布二次粒子束的分布偏转装置和用于检测二次粒子束的检测器，该检测器具有多个检测器通道。此外，提供了按照时间分辨率操作粒子束装置的方法。

46. 发明授权

US07282711B2 Multiple electron beam device 有权
标题翻译：多电子束装置
公开(公告)号：US07282711B2
公开(公告)日：2007-10-16
申请号：US10491939
申请日：2002-10-04
申请人： Dieter Winkler , Pavel Adamec , Achim Göhl , Helmut Banzhof
发明人： Dieter Winkler , Pavel Adamec , Achim Göhl , Helmut Banzhof
IPC分类号： H01J37/21
CPC分类号： H01J37/28 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J37/3174 , H01J2237/216 , H01J2237/2446 , H01J2237/2826 , H01J2237/30433 , H01J2237/3045
摘要： The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.
摘要翻译：本发明提供了用于用具有电子束源阵列（3）的一次电子束（14）探测或构造非透明样品（20）以产生多个一次电子束（14）的电子多光束装置（1），电子传感器（12），其具有用于检测一次电子束（14）的电子和至少一个阳极（7）的电子传感器段（12a），以将一次电子束（14）引向电子传感器（12）。电子传感器（12）用于检查一次电子束（14），校准一次电子束（14）的位置，并可能在探测之前或之后校准一次电子束的最终聚焦长度（13）和电流构造不透明样品（20）的上表面（20a）。此外，提供了检查一次电子束（14），调整最终聚焦长度（13）和校准多个电子束装置（1）的方法。

47. 发明授权

US07274018B2 Charged particle beam apparatus and method for operating the same 有权
标题翻译：带电粒子束装置及其操作方法
公开(公告)号：US07274018B2
公开(公告)日：2007-09-25
申请号：US11396751
申请日：2006-04-03
申请人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
发明人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
IPC分类号： H01J37/28
CPC分类号： H01J37/285 , H01J37/265 , H01J37/28 , H01J2237/0435 , H01J2237/049 , H01J2237/2855 , H01J2237/2857
摘要： A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.
摘要翻译：提供一种带电粒子束装置，其包括用于产生带电粒子的一次束的带电粒子源，用于准直所述带电粒子的一次束的孔径装置，其中所述孔口装置适于在所述主束的准直之间切换，导致适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度;用于聚集所述带电粒子的一次束的聚光透镜;用于偏转所述主要束带电的扫描装置颗粒，用于聚焦所述冷凝的主光束的物镜，用于检测次级带电粒子的扇形检测器。此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。

48. 发明授权

US07253417B2 Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens 有权
标题翻译：多轴复合透镜，使用复合透镜的光束系统，以及使用复合透镜的方法
公开(公告)号：US07253417B2
公开(公告)日：2007-08-07
申请号：US10539179
申请日：2003-12-12
申请人： Jürgen Frosien , Pavel Adamec
发明人： Jürgen Frosien , Pavel Adamec
IPC分类号： H01J3/07 , H01J29/51
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/145 , H01J37/3177
摘要： The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.
摘要翻译：本发明提供了一种用于带电粒子多光束系统的光学系统。光学系统包括静电透镜部件和磁性透镜部件。这些部件用于将多个带电粒子束聚焦在分开的开口中，用于至少多个穿过光学系统的带电粒子束中的每一个。

49. 发明授权

US06943507B2 Device and method for controlling focussed electron beams 有权
标题翻译：用于控制聚焦电子束的装置和方法
公开(公告)号：US06943507B2
公开(公告)日：2005-09-13
申请号：US10474464
申请日：2002-04-08
申请人： Dieter Winkler , Pavel Adamec
发明人： Dieter Winkler , Pavel Adamec
IPC分类号： H01J37/073 , H01J37/304 , H01J29/52
CPC分类号： H01J37/073 , H01J37/304 , H01J2237/06316 , H01J2237/0635 , H01J2237/31774
摘要： The invention provides a focussing electron beam device with a single or an array of field emitter beam sources to generate electron beams with field emitter beam sources, at least one anode capable of accelerating the electrons of the electron beams towards a specimen, focussing components capable of focussing the electron beams onto the specimen and a control circuit that a) senses for deviations of the actual current values of the electron beams from desired current values; b) controls first voltages V1 to adjust the actual current values of the electron beams to the desired current values and c) controls second voltages V2 to adjust the actual focus positions of the electron beams to the desired focus positions. The voltage control circuit adjusts the actual current values of the electron beams to the desired current values and makes it possible to adjust the current values of an array of electron beams to a single value. Furthermore, a focussing electron beam device is disclosed with an array of field emitter beam sources integrated onto a substrate, which makes it possible to have arrays of field emitter beam sources with thousands or even millions of field emitter beam sources. With the integration of the control circuits for each field emitter beam source it is possible to adjust the current values and focus positions of each electron beam individually. Furthermore, methods are disclosed describing the operation of a single field emitter beam source or an array of field emitter beam sources.
摘要翻译：本发明提供一种聚焦电子束装置，其具有单个或阵列的场致发射束源，以产生具有场致发射束源的电子束，至少一个阳极，能够将电子束的电子加速朝向检体，将电子束聚焦到样本上，以及控制电路，其a）感测电子束的实际电流值与期望电流值的偏差; b）控制第一电压V 1以将电子束的实际电流值调整到期望的电流值，并且c）控制第二电压V 2以将电子束的实际焦点位置调整到期望的焦点位置。电压控制电路将电子束的实际电流值调整到期望的电流值，并且可以将电子束阵列的电流值调整为单个值。此外，公开了一种聚焦电子束器件，其集成在衬底上的场发射器束源的阵列，这使得可以具有数千甚至数百万场发射器束源的场发射器束源的阵列。通过对每个场发射器束源的控制电路的集成，可以单独地调整每个电子束的电流值和聚焦位置。此外，公开了描述单个场发射器束源或场发射器束源的阵列的操作的方法。

50. 发明授权

US06614026B1 Charged particle beam column 有权
标题翻译：带电粒子束柱
公开(公告)号：US06614026B1
公开(公告)日：2003-09-02
申请号：US09292710
申请日：1999-04-15
申请人： Pavel Adamec
发明人： Pavel Adamec
IPC分类号： H01J37145
CPC分类号： H01J37/28 , H01J37/1478 , H01J2237/1506
摘要： A column for directing a beam of charged particles with a finite energy spread onto a specimen surface under an oblique beam landing angle comprises: a particle source; an objective lens; a deflection unit for deflecting the beam of charged particles away from the optical axis such that the beam.of charged particles traverses the objective lens off-axis, thereby causing a chromatic aberration, a compensation unit adapted to disperse the beam of charged particles, thereby substantially compensating said chromatic aberration in the plane of the specimen surface, whereby the combined action of the objective lens and the deflection unit directs the beam of charged particles to hit the specimen surface under said large beam landing angle.
摘要翻译：用于将有限能量的带电粒子束引导到倾斜束着陆角的样品表面上的列包括：粒子源; 物镜; 偏转单元，用于使带电粒子束偏离光轴，使得带电粒子的束离轴偏离物镜，从而产生色差，适于分散带电粒子束的补偿单元，从而基本上补偿了样品表面的平面中的色差，由此物镜和偏转单元的组合作用引导带电粒子束在所述大光束着落角度下撞击试样表面。

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