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    • 44. 发明授权
    • Method for fabricating a side shield for a flux guide layer for perpendicular magnetic recording
    • 用于制造用于垂直磁记录的磁通引​​导层的侧屏蔽的方法
    • US07515381B2
    • 2009-04-07
    • US11317917
    • 2005-12-22
    • Amanda BaerDaniel Wayne BedellQuang LeAron Pentek
    • Amanda BaerDaniel Wayne BedellQuang LeAron Pentek
    • G11B5/147G11B5/187
    • G11B5/3116G11B5/112G11B5/1278G11B5/3146G11B5/3163
    • A magnetic head for use in a perpendicular recording system having a novel shield structure that provides exceptional magnetic shielding from extraneous magnetic fields such as from a write coil, shaping layer or return pole of the write head. The shield structure is constructed to have a bottom or leading surface that is generally coplanar with the bottom or leading surface of the shaping layer, but all or a portion of the shield structure is not as thick as the shaping layer so as to have a top surface that does not extend to the same elevation (in a trailing direction) as that of the shaping layer. Making the shields extend to a lower level than the shaping layer improves magnetic performance by reducing flux leakage from the write pole, and also provides manufacturing advantages, such as during the manufacturing of the write pole. These manufacturing advantages include the advantage of having the shields covered with a protective layer of, for example, alumina during the ion milling of the write pole.
    • 一种用于垂直记录系统的磁头,其具有新的屏蔽结构,其提供例如来自写入磁头的写入线圈,成形层或返回磁极的外部磁场的卓越的磁屏蔽。 屏蔽结构被构造成具有与成形层的底部或前表面大致共面的底部或前表面,但是屏蔽结构的全部或一部分不像成形层那样厚,以便具有顶部 表面不延伸到与成形层相同的高度(在拖尾方向上)。 使屏蔽层延伸到比成形层更低的水平,通过减小来自写入极的磁通泄漏来提高磁性能,并且还提供制造优点,例如在写入磁极的制造期间。 这些制造优点包括在写入极的离子铣削期间使屏蔽覆盖有例如氧化铝的保护层的优点。
    • 45. 发明申请
    • Perpendicular magnetic write pole formation using an aluminum oxide wrap around mask
    • 使用氧化铝缠绕掩模的垂直磁性写入磁极形成
    • US20080072417A1
    • 2008-03-27
    • US11525788
    • 2006-09-21
    • Yimin HsuVladimir NikitinAron Pentek
    • Yimin HsuVladimir NikitinAron Pentek
    • G11B5/127
    • G11B5/1278G11B5/3146G11B5/315G11B5/3163Y10T29/49041Y10T29/49043Y10T29/49044Y10T29/49046Y10T29/49048Y10T29/49052
    • A method for manufacturing a write pole for a perpendicular magnetic write head. The method includes forming a mask structure over a full film layer of magnetic write pole material. A layer of hard mask material such as conformally deposited alumina is then deposited full film over the mask and write pole material. An ion mill, such as in an Ar or CHF3 chemistry is then used to preferentially remove horizontally disposed portions of the alumina layer (hard mask layer), thereby forming vertical hard mask walls at the sides of the mask structure. An ion mill is then used to form the write pole, with the alumna side walls providing excellent masking for forming well defined write pole edges. A relatively gentle clean up process can then be performed to remove the remaining mask material and side walls. The use of the alumina side walls eliminated the need to use an alumina hard mask that extends over the entire top of the write pole, Because of this, after forming the write pole, a relatively gentle clean up such as TMAH etch and NMP can be used to remove the remaining mask and alumina walls from the write pole.
    • 一种用于制造用于垂直磁写头的写极的方法。 该方法包括在磁性写入磁极材料的全部薄膜层上形成掩模结构。 然后将诸如保形沉积氧化铝的硬掩模材料层沉积在掩模上并写入极材料。 然后使用诸如Ar或CHF 3化学中的离子磨机来优先除去氧化铝层(硬掩模层)的水平设置的部分,从而在掩模结构的侧面形成垂直的硬掩模壁。 然后使用离子磨机形成写柱,校准侧壁为形成良好定义的写极边缘提供了优​​异的掩模。 然后可以执行相对温和的清理过程以除去剩余的掩模材料和侧壁。 使用氧化铝侧壁消除了使用在写入极的整个顶部上延伸的氧化铝硬掩模的需要。因此,在形成写入极之后,可以进行相对温和的清洁,例如TMAH蚀刻和NMP可以 用于从写入极上去除剩余的掩模和氧化铝壁。