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41. 发明授权

US5138869A In-line detector system for real-time determination of impurity concentration in a flowing gas stream 失效
标题翻译：用于实时确定流动气流中污染浓度的在线检测系统
公开(公告)号：US5138869A
公开(公告)日：1992-08-18
申请号：US628490
申请日：1990-12-14
申请人： Glenn M. Tom
发明人： Glenn M. Tom
IPC分类号： G01N9/00 , G01N29/02 , G01N33/00
CPC分类号： G01N33/0026
摘要： An in-line detector system for real-time detection of impurity concentration in a flowing gas stream in which purified and unpurified volumes of gas from the flowing gas stream are subjected to concentration sensing, to determine a corrected impurity concentration value for the flowing gas stream. The system in a preferred embodiment employs a manifold in flow communication with a purifier unit, a main flow conduit through which the flowing gas stream is passed, and a sensor port, with a selectively positionable valve to flow gas through a purifier loop of the manifold to the sensing port, and alternately through a bypass loop of the manifold without passage through the purifier unit, for comparative impurity sensing of gas in the respective loops. The system may utilize hygrometric sensors in the case of water as a critical impurity, or surface acoustical wave (SAW) devices coated with suitable impurity-affinity coatings. The system has particular utility in monitoring low impurity concentration levels (e.g., from about 0.1 ppm to about 100 ppm) in gas streams employed in vapor-phase processes such as chemical vapor deposition in the manufacture of semiconductor devices.
摘要翻译：一种在线检测器系统，用于实时检测流动气流中的杂质浓度，其中来自流动气流的净化和未纯化体积的气体经受浓度感测，以确定流动气流的校正杂质浓度值。在优选实施例中的系统采用与净化器单元流动连通的歧管，通过流动气流的主流管和传感器端口，其具有可选择性定位的阀，以使气体流过歧管的净化器回路并且通过歧管的旁路回路而不通过净化器单元，用于比较杂质检测各回路中的气体。在水作为关键杂质的情况下，该系统可以使用湿度传感器，或者涂覆有合适的杂质亲和性涂层的表面声波（SAW）装置。该系统在用于半导体器件制造中的气相法（例如化学气相沉积）中所用的气流中的低杂质浓度水平（例如约0.1ppm至约100ppm）具有特别的用途。

42. 发明授权

US4936877A Dopant delivery system for semiconductor manufacture 失效
标题翻译：用于半导体制造的掺杂剂输送系统
公开(公告)号：US4936877A
公开(公告)日：1990-06-26
申请号：US381583
申请日：1989-07-18
申请人： Steven J. Hultquist , Glenn M. Tom
发明人： Steven J. Hultquist , Glenn M. Tom
IPC分类号： B01D53/22 , C30B25/14
CPC分类号： C23C16/45561 , B01D53/22 , C30B25/14
摘要： A gas delivery system for supplying a vapor phase constituent at low concentration in a carrier gas, wherein the carrier gas is flowed through a contacting zone in which is disposed a permeable film through which the vapor phase constituent permeates into the contacing zone, to yield a product gas mixture comprising the vapor phase constituent and the carrier gas. In a particularly preferred embodiment, concentration of the vapor phase constituent in the product gas mixture is sensed, e.g., by a surface acoustical wave (SAW) concentration sensor device, and the concentration sensing is employed to controllably adjust the flow rate of the carrier gas flowed through the contacting zone, to maintain a selected delivery rate and concentration of the vapor phase constituent in the product gas mixture. The gas delivery system of the invention has particular utility for supplying gaseous dopant source compounds such as arsine, hydrogen selenide, and/or hydrogen telluride, for fabrication of semiconducting materials and semiconductor devices.
摘要翻译：一种用于在载气中提供低浓度的气相成分的气体输送系统，其中所述载气流过其中设置有透气膜的接触区，所述渗透膜通过所述渗透膜，所述气相组分渗透到所述引导区中，以产生产物气体混合物，其包含气相成分和载气。在特别优选的实施方案中，例如通过表面声波（SAW）浓度传感器装置感测产物气体混合物中气相成分的浓度，采用浓度检测来可控地调节载气的流速流过接触区，以保持产物气体混合物中气相成分选择的输送速率和浓度。本发明的气体输送系统特别适用于供应气态掺杂剂源化合物如胂，硒化氢和/或碲化氢，以制造半导体材料和半导体器件。

43. 发明授权

US4925646A Process and composition for drying of gaseous hydrogen halides 失效
标题翻译：用于干燥气态卤化氢的方法和组合物
公开(公告)号：US4925646A
公开(公告)日：1990-05-15
申请号：US357049
申请日：1989-05-25
申请人： Glenn M. Tom , Duncan W. Brown
发明人： Glenn M. Tom , Duncan W. Brown
IPC分类号： B01D53/28 , C01B7/07 , C01B7/09 , C01B7/13 , C01B7/19 , C01G1/06
CPC分类号： C01B7/093 , B01D53/28 , C01B7/0718 , C01B7/135 , C01B7/197 , C01G1/06
摘要： A process for drying a gaseous hydrogen halide of the formula HX, wherein X is bromine, Chlorine, FLuorine, or iodine, to remove water impurity therefrom, in which a scavenger precursor composition is provided, including a support having associated therewith partially or fully alkylated metal alkyl compounds or pendant groups. The precursor composition is reacted with gaseous hydrogen halide to convert the metal alkyl compounds and/or pendant functional groups to the corresponding metal halide compounds and/or pendant functional groups, which in turn react with the water impurity to produce an essentially completely water-free (below 0.1 ppm) gaseous hydrogen halide effluent. The process of the invention has utility for producing high purity, anhydrous gaseous hydrogen halides for semiconductor manufacturing operations.
摘要翻译：一种用于干燥式HX的气态卤化氢的方法，其中X是溴，氯，氟嘌呤或碘，以除去其中含有杂质的水分杂质，其中提供了一种清除剂前体组合物，包括其部分或完全烷基化的载体金属烷基化合物或侧基。前体组合物与气态卤化氢反应以将金属烷基化合物和/或侧链官能团转化成相应的金属卤化物化合物和/或侧基官能团，其又与水杂质反应以产生基本上完全无水的（低于0.1ppm）气态卤化氢流出物。本发明的方法可用于生产用于半导体制造操作的高纯度无水气态卤化氢。

44. 发明授权

US4867960A Water scavengers for hydrochloric acid streams 失效
标题翻译：盐酸流除水剂
公开(公告)号：US4867960A
公开(公告)日：1989-09-19
申请号：US311433
申请日：1989-02-16
申请人： Glenn M. Tom
发明人： Glenn M. Tom
IPC分类号： C01B7/07
CPC分类号： C01B7/0718
摘要： The water content of an HCl gas stream is reduced to less than 1 ppm by contacting the gas stream with a chloride of silicon or a chloride of a metal having a valence of at least four that is immobilized on a solid support.
摘要翻译：通过将气流与固定在固体载体上的硅或氯化物至少为4的金属的氯化物接触，将HCl气流的水含量降低至小于1ppm。

45. 发明授权

US4797227A Process and composition for purifying hydrogen selenide and hydrogen telluride, to remove moisture and oxidant impurities therefrom 失效
标题翻译：用于净化硒化氢和碲化氢的方法和组合物，以从中除去水分和氧化剂杂质
公开(公告)号：US4797227A
公开(公告)日：1989-01-10
申请号：US80478
申请日：1987-07-31
申请人： Glenn M. Tom , Duncan W. Brown
发明人： Glenn M. Tom , Duncan W. Brown
IPC分类号： B01J20/32 , C09K3/00
CPC分类号： B01J20/08 , B01J20/0248 , B01J20/0262 , B01J20/20 , B01J20/261 , B01J20/264 , B01J20/267 , B01J20/28004 , B01J20/28016 , B01J20/28057 , B01J20/28078 , B01J20/28097 , B01J20/3204 , B01J20/321 , B01J20/3236 , B01J20/3297 , B01J2220/56
摘要： A scavenger, having utility for purifying a mixture comprising:(i) a primary component selected from one or more members of the group consisting of hydrogen selenide and hydrogen telluride, and(ii) impurities selected from one or more members of the group consisting of moisture and oxidants, comprising:(a) a support; and(b) associated with said support, one or more members of the group consisting of:(I) precursor compounds of the formula R.sub.3-x AlH.sub.x, wherein x is 0 or 1, and R is a hydrocarbon radical containing from 1 to 12 carbon atoms; and(II) aluminum chalconides of the formula Al.sub.2 M.sub.3, wherein M is selenium or tellurium.Illustrative supports useful in such scavenger include aluminosilicates, alumina, silica, carbon, and macroreticulate polymers. A process and apparatus are disclosed for purifying hydrogen selenide and/or hydrogen telluride, to remove moisture and/or oxidant impurities therefrom, in which a bed of the scavenger is employed.
摘要翻译：一种清除剂，其用于纯化混合物，其包含：（i）选自硒化氢和碲化氢中的一种或多种成员的主要成分，和（ii）选自以下的一种或多种成员的杂质：水分和氧化剂，包括：（a）载体; 和（b）与所述载体相关联，所述组中的一个或多个成员由以下组成：（I）式R3-xAlHx的前体化合物，其中x为0或1，R为含有1至12碳的烃基原子和（II）式Al 2 M 3的铝金卤素，其中M是硒或碲。在这种清除剂中有用的说明性的载体包括硅铝酸盐，氧化铝，二氧化硅，碳和大理石聚合物。公开了一种用于净化硒化氢和/或碲化氢以从其中除去其中的水分和/或氧化剂杂质的方法和装置，其中采用清除剂床。

46. 发明授权

US4748216A Purified cycloolefin polymerization composition 失效
标题翻译：纯化环烯烃聚合组合物
公开(公告)号：US4748216A
公开(公告)日：1988-05-31
申请号：US24876
申请日：1987-03-12
申请人： Glenn M. Tom
发明人： Glenn M. Tom
IPC分类号： C08G61/08 , C08F2/02 , C07C7/12 , C08F32/06 , C08F36/04
CPC分类号： C08G61/08
摘要： A high flash point cycloolefin composition, including at least 50% by weight dicyclopentadiene, the composition having a flash point of greater than 100.degree. F. and a viscosity of from about 3 cps to about 3000 cps at about 70.degree. F. and about 1 atmosphere pressure. The cycloolefin composition is used in a method of preparation of cycloolefin for polymerization by metathesis catalysis to form a substantially crosslinked thermoset polymer by: distilling the cycloolefin to form distilled cycloolefin, and contacting the distilled cycloolefin and an adsorbent.
摘要翻译：高闪点环烯烃组合物，包括至少50重量％的二环戊二烯，该组合物的闪点大于100°F，在约70°F下粘度为约3cps至约3000cps，约为1 大气压力。环烯烃组合物用于制备环烯烃的方法，用于通过复分解催化聚合形成基本交联的热固性聚合物，方法是：蒸馏环烯烃以形成蒸馏的环烯烃，并使蒸馏的环烯与吸附剂接触。

47. 发明授权

US4723967A Valve block and container for semiconductor source reagent dispensing and/or purification 失效
标题翻译：用于半导体源试剂分配和/或净化的阀块和容器
公开(公告)号：US4723967A
公开(公告)日：1988-02-09
申请号：US43168
申请日：1987-04-27
申请人： Glenn M. Tom
发明人： Glenn M. Tom
IPC分类号： B01D53/04 , B01D53/14 , B01D53/18
CPC分类号： B01D53/18 , B01D53/0407 , B01D53/14 , B01D53/72 , B01D2256/10 , B01D2256/16 , B01D2256/18 , B01D2257/556 , B01D2257/80 , B01D2258/0216 , B01D2259/40003 , B01D2259/40086 , B01D2259/4525 , B01D53/261 , Y10T137/3112 , Y10T137/86863
摘要： A valve block leak-tightly joinable to a receptacle to form a container suitable for liquid storage/vapor dispensing, and gas purification applications. The valve block is provided with first and second valve ports with which valves may be employed to flow feed gas through the valve block and receptacle. To effect purging the valve block ports and gas flow passages, the valve block is provided with a purge valve port wich may be opened while the first and second valve ports are closed, to remove dead space hold-up gas from the respective ports and flow passages of the block prior to initiation of vapor dispensing or gas purification operation.The disclosed container is particularly advantageous for dispensing or purifying source reagent compounds for elements of Group III and Group V, in semiconductor manufacturing applications.
摘要翻译：阀块与密封件密封地连接以形成适于液体储存/蒸气分配的容器和气体净化应用。阀块设置有第一和第二阀口，阀可用于使进料气体通过阀块和容器流动。为了清洗阀块端口和气体流动通道，阀块设置有可在第一和第二阀口关闭的同时打开的清洗阀口，以从相应的端口和流动中去除死空间滞留气体在开始蒸汽分配或气体净化操作之前块的通道。所公开的容器在半导体制造应用中特别有利于分配或净化用于第III族和第V族元素的源试剂化合物。

48. 发明授权

US4696953A Scavengers for the removal of impurities from arsine and phosphine 失效
公开(公告)号：US4696953A
公开(公告)日：1987-09-29
申请号：US938701
申请日：1986-12-05
申请人： Glenn M. Tom
发明人： Glenn M. Tom
IPC分类号： B01J49/00 , C01B6/06 , C01B25/06 , C08F14/00
CPC分类号： C01B25/06 , B01J49/0004 , C01B6/065
摘要： Disclosed are macroreticulate polymer scavengers functionalized with arsenic or phosphorus compounds. These scavengers are used for removing oxidants, protic acids and compounds that can be metallated, from arsine and phosphine.

49. 发明申请

US20080302421A1 PERMEABLE GAS ASSEMBLY FOR GAS DELIVERY 审中-公开
标题翻译：用于气体输送的透气性气体组件
公开(公告)号：US20080302421A1
公开(公告)日：2008-12-11
申请号：US12120004
申请日：2008-05-13
申请人： Glenn M. Tom
发明人： Glenn M. Tom
IPC分类号： F17D3/00 , F16K31/12 , F16K31/165 , B65D83/00
CPC分类号： F16K1/303 , F16K1/32 , F16K1/385 , F16K1/42 , F16K25/00 , F16K25/005 , F17C2205/0338 , F17C2205/0391 , Y10T137/0318 , Y10T137/7793 , Y10T137/7823 , Y10T137/86759
摘要： A valve assembly for controlling gas delivery from a higher pressure fluid source to a lower pressure processing tool. The valve assembly includes a valve poppet movingly engageable with a valve seating member and a fluid permeable insert positioned between the valve poppet and the valve seating member that is unexposed to flowing fluid when the valve poppet is in a closed position thereby preventing fluid flow through the valve assembly and providing a diffusional path for transfer of all flowing fluid when the valve poppet is in an open position. The permeable insert can be inserted into the sealable and engageable surface of either the valve seat member or the valve poppet.
摘要翻译：一种阀组件，用于控制从较高压力流体源到较低压力处理工具的气体输送。阀组件包括可与阀座构件可移动地接合的阀提升阀和位于阀提升阀和阀座构件之间的流体可渗透插入件，当阀提升阀处于关闭位置时，该提升阀和阀座构件未暴露于流体流体，从而防止流体流过阀组件并且当阀提升阀处于打开位置时提供用于传送所有流动流体的扩散路径。可渗透插入件可以插入到阀座构件或阀提升阀的可密封和可接合的表面中。

50. 发明授权

US06907740B2 Gas charging system for fill of gas storage and dispensing vessels 失效
公开(公告)号：US06907740B2
公开(公告)日：2005-06-21
申请号：US10625178
申请日：2003-07-23
申请人： Glenn M. Tom
发明人： Glenn M. Tom
IPC分类号： B01D8/00 , F17C1/00 , F17C5/06 , F17C7/00 , F17C7/04 , F17C9/02 , F17C13/02 , F17C13/04
CPC分类号： F17C5/06 , F17C1/00 , F17C7/00 , F17C13/025 , F17C13/04 , F17C2201/0104 , F17C2201/0109 , F17C2201/0114 , F17C2201/032 , F17C2201/054 , F17C2201/056 , F17C2201/058 , F17C2203/03 , F17C2203/0617 , F17C2203/0643 , F17C2203/0648 , F17C2205/0305 , F17C2205/0323 , F17C2205/0326 , F17C2205/0329 , F17C2205/0335 , F17C2205/0338 , F17C2205/0341 , F17C2205/0344 , F17C2205/035 , F17C2205/0382 , F17C2205/0385 , F17C2205/0391 , F17C2209/221 , F17C2221/01 , F17C2221/011 , F17C2221/012 , F17C2221/014 , F17C2221/017 , F17C2221/03 , F17C2223/0123 , F17C2223/033 , F17C2223/035 , F17C2225/0123 , F17C2225/036 , F17C2227/0157 , F17C2227/0178 , F17C2227/0302 , F17C2227/0341 , F17C2227/0353 , F17C2227/0369 , F17C2227/0388 , F17C2227/04 , F17C2227/044 , F17C2227/047 , F17C2250/01 , F17C2250/032 , F17C2250/043 , F17C2250/0443 , F17C2265/05 , F17C2270/025 , F17C2270/05 , F17C2270/0518 , Y02E60/321
摘要： An apparatus and method for charging a gas storage and dispensing vessel with gas to a predetermined pressure level, e.g., a gas to be employed in a semiconductor manufacturing operation such as a hydride, halide or organometallic reagent gas. In the gas charging, a source gas is liquefied, e.g., in a cryotrap, and then gasified in closed flow communication with the vessel to introduce the gas thereinto, and such liquefaction/gasification steps are carried out alternatively and repetitively, to charge the vessel in a step-wise, progressive fashion with gas, until a full fill state is achieved, with the contained gas at the predetermined pressure level.

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