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    • 49. 发明授权
    • Semiconductor laser with tensile-strained etch-stop layer
    • 具有拉伸应变蚀刻停止层的半导体激光器
    • US5379312A
    • 1995-01-03
    • US142742
    • 1993-10-25
    • David P. BourDavid W. Treat
    • David P. BourDavid W. Treat
    • H01S5/00H01S5/20H01S5/223H01S5/32H01S5/323H01S3/19
    • H01S5/2231H01S5/209H01S5/3201H01S5/32325
    • Ridged waveguide and selectively-buried ridged waveguide, index-guided, visible semiconductor lasers incorporating a lattice-mismatched, preferably tensile-strained, etch-stop layer in the design and fabrication of the laser. Compared with other structures with etch-stop layers that are lattice matched, the etch-stop layer of the invention would have greater etch-rate selectivity, and the resulting structure would be more optically transparent with less transverse mode distortion and would present fewer difficulties with layer regrowth. These advantages would translate into greater design flexibility, more reliable fabrication, and better device performance. A preferred material for the etch-stop layer is Ga.sub.x In.sub.1-x P (x>0.5).
    • 在设计和制造激光器时,引入波导和选择性埋入的脊状波导,折射率引导的可见半导体激光器,其结合了晶格失配的优选的拉伸应变的蚀刻停止层。 与具有格子匹配的蚀刻停止层的其他结构相比,本发明的蚀刻停止层将具有更大的蚀刻速率选择性,并且所得到的结构将具有更光学透明度,而较少的横向模式失真,并且将呈现更少的困难 层再生长。 这些优点将转化为更大的设计灵活性,更可靠的制造和更好的设备性能。 用于蚀刻停止层的优选材料是GaxIn1-xP(x> 0.5)。