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41. 发明授权

US07701640B2 Projection optical system and method for photolithography and exposure apparatus and method using same 有权
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US07701640B2
公开(公告)日：2010-04-20
申请号：US11907797
申请日：2007-10-17
申请人： Yasuhiro Omura , Hironori Ikezawa , David M. Williamson
发明人： Yasuhiro Omura , Hironori Ikezawa , David M. Williamson
IPC分类号： G02B3/00 , G02B17/00
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An immersion optical system includes a plurality of lenses disposed along a light beam path of the immersion optical system. The plurality of lenses include a liquid immerged lens which is contactable with a liquid layer. An optically conjugate point of an object surface is formed in the light beam path of the immersion optical system. The object surface is contactable with a liquid.
摘要翻译：浸入式光学系统包括沿着浸没式光学系统的光束路径设置的多个透镜。多个透镜包括可与液体层接触的液体浸没透镜。物镜表面的光学共轭点形成在浸没式光学系统的光束路径中。物体表面可与液体接触。

42. 发明申请

US20090092925A1 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20090092925A1
公开(公告)日：2009-04-09
申请号：US11920331
申请日：2006-05-08
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G03F7/20 , G03B27/42 , G03B27/54 , G03B27/52 , G03B27/32
CPC分类号： G03F7/70825 , G02B1/02 , G02B1/06 , G02B17/0892 , G02B21/33 , G03F7/70341
摘要： An immersion projection optical system that prevents leakage of a liquid (immersion liquid) into the optical system and maintains satisfactory imaging capability. The projection optical system of the present invention is a projection optical system that projects a reduced image of a first plane onto a second plane through a liquid. The projection optical system includes an interface optical lens (Lb) having a side towards the first plane that contacts a gas and a side towards the second plane that contacts the liquid. The interface optical element includes a light entering surface (Lba), which has a convex shape facing towards the first plane, and a groove (Gr), which is formed to surround an effective region in a light emitting surface of the interface optical element.
摘要翻译：一种浸没投影光学系统，其防止液体（浸没液体）泄漏到光学系统中并保持令人满意的成像能力。本发明的投影光学系统是通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统。投影光学系统包括界面光学透镜（Lb），其具有朝向接触气体的第一平面的侧面和朝向接触液体的第二平面的一侧。界面光学元件包括具有朝向第一平面的凸形的光入射表面（Lba）和形成为围绕界面光学元件的发光表面中的有效区域的凹槽（Gr）。

43. 发明授权

US07471374B2 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US07471374B2
公开(公告)日：2008-12-30
申请号：US11260160
申请日：2005-10-28
申请人： Yasuhiro Omura , Hironori Ikezawa , Kumiko Ishida
发明人： Yasuhiro Omura , Hironori Ikezawa , Kumiko Ishida
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70875 , G03F7/70241 , G03F7/70341 , G03F7/70425 , G03F7/70466
摘要： A projection optical system and exposure method for forming a reduced image of a first surface on a second surface, including forming a projection exposure of a reduced image of a pattern formed on a mask on a photosensitive substrate, the optical path between the projection optical system and the second surface being filled with a medium having a refractive index larger than 1.1 where a refractive index of an atmosphere in the optical path of the projection optical system is 1, and the magnification of the projection optical system being not more than ⅛. In variations, the projection optical system is substantially telecentric on both the first surface side and the second surface side; every optical member having a power in the projection optical system is a transmitting optical member; and a projection exposure in a one shot-area can include a plurality of partial exposures in partial exposure regions.
摘要翻译：一种投影光学系统和曝光方法，用于在第二表面上形成第一表面的缩小图像，包括形成在感光基板上的掩模上形成的图案的缩小图像的投影曝光，投影光学系统并且第二表面填充有折射率大于1.1的介质，其中投影光学系统的光路中的气氛的折射率为1，并且投影光学系统的放大率不大于1/8 。在变型中，投影光学系统在第一表面侧和第二表面侧都基本上是远心的; 在投影光学系统中具有动力的每个光学构件是透射光学构件; 并且在一个拍摄区域中的投影曝光可以包括部分曝光区域中的多个部分曝光。

44. 发明授权

US07362508B2 Projection optical system and method for photolithography and exposure apparatus and method using same 有权
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US07362508B2
公开(公告)日：2008-04-22
申请号：US10525372
申请日：2003-08-22
申请人： Yasuhiro Omura , Hironori Ikezawa , David M Williamson
发明人： Yasuhiro Omura , Hironori Ikezawa , David M Williamson
IPC分类号： G02B3/00 , G02B17/00
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.
摘要翻译：光学投影系统和光刻方法。一种用于在宽视野下以高分辨率投影图像的光刻浸没投影系统和方法。投影系统和方法包括最终透镜，其在光线进入浸没液体以撞击到图像平面之前减小光路的边缘射线角度。

45. 发明申请

US20080080067A1 Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element 失效
标题翻译：浸没物镜光学系统，曝光装置，装置制造方法和边界光学元件
公开(公告)号：US20080080067A1
公开(公告)日：2008-04-03
申请号：US11889180
申请日：2007-08-09
申请人： Yasuhiro Omura , Hironori Ikezawa
发明人： Yasuhiro Omura , Hironori Ikezawa
IPC分类号： G02B17/08 , G02B27/18 , G02B3/00
CPC分类号： G03F7/70341 , G02B1/02 , G02B13/143 , G02B17/08 , G02B21/33 , G03F7/70225
摘要： In a liquid immersion type projection optical system for forming an image of a first plane on a second plane, an optical path between the optical system and the second plane is filled with a liquid having the refractive index larger than 1.5, and the optical system has a boundary optical element whose surface on the first plane side is in contact with a gas and whose surface on the second plane side is in contact with the liquid. The optical system satisfies the condition of 3.2
摘要翻译：在用于在第二平面上形成第一平面的图像的液浸型投影光学系统中，用折射率大于1.5的液体填充光学系统和第二平面之间的光路，并且光学系统具有边界光学元件，其在第一平面侧的表面与气体接触，并且其表面在第二平面侧与液体接触。光学系统满足3.2

46. 发明申请

US20070296941A1 Optical System, Exposure System, and Exposure Method 失效
标题翻译：光学系统，曝光系统和曝光方法
公开(公告)号：US20070296941A1
公开(公告)日：2007-12-27
申请号：US10587254
申请日：2005-01-14
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G03B27/54 , G02B5/30
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G02B27/28 , G03F7/70091 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.
摘要翻译：基于简单的配置，光学系统能够在抑制光量损失的同时实现透镜孔中的基本方位极化状态。本发明的光学系统设置有用于实现基本圆周分布或基本上径向分布作为透镜孔径中的快轴分布的双折射元件，以及位于双折射元件后面并适于旋转偏振状态的旋转器在镜头光圈。双折射元件具有由单轴晶体材料制成的光学透明构件，其晶轴基本上与光学系统的光轴平行。呈基本圆形极化状态的大致球形的光束入射到光学透明构件。

47. 发明申请

US20070188879A1 Projection optical system, exposure system, and exposure method 有权
标题翻译：投影光学系统，曝光系统和曝光方法
公开(公告)号：US20070188879A1
公开(公告)日：2007-08-16
申请号：US11645041
申请日：2006-12-26
申请人： Hironori Ikezawa , Yuji Kudo , Yasuhiro Omura
发明人： Hironori Ikezawa , Yuji Kudo , Yasuhiro Omura
IPC分类号： G02B3/00
CPC分类号： G03F7/70341
摘要： A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, Θ is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25
摘要翻译：一种液浸型投影光学系统，其可以稳定地防止浸没液体流入光学系统内部并且可以保持良好的成像性能。在本发明的投影光学系统中，在最靠近第二表面（W）侧设置的透光构件（Lp）和第二表面之间的光路填充有折射率大于在光透射部件的侧面（41,42）上形成用于遮蔽光的遮光膜（36）。当D是第二表面和遮光膜之间的空间时，Theta是到达第二表面的图像形成光束的最大入射角，Ym是第二表面上的最大图像高度，条件为0.25

48. 发明授权

US07154585B2 Projection optical system, exposure apparatus, and device production method 有权
标题翻译：投影光学系统，曝光装置和装置制作方法
公开(公告)号：US07154585B2
公开(公告)日：2006-12-26
申请号：US10611966
申请日：2003-07-03
申请人： Koji Shigematsu , Youhei Fujishima , Yasuhiro Omura , Toshiro Ishiyama
发明人： Koji Shigematsu , Youhei Fujishima , Yasuhiro Omura , Toshiro Ishiyama
IPC分类号： G03B27/54 , G02B9/00
CPC分类号： G03F7/703 , G02B13/146 , G03F7/70241
摘要： Provided is a projection optical system for forming an image of a pattern of a first object (R) on a second object (W). The projection optical system is made of an optical material having a refractive index of not more than 1.6 and is substantially telecentric both on the first object side and on the second object side. The projection optical system satisfies the condition of (λ×L)/(NA×Y02)
摘要翻译：提供了一种用于在第二物体（W）上形成第一物体（R）的图案的图像的投影光学系统。投影光学系统由折射率不大于1.6的光学材料制成，并且在第一物体侧和第二物体侧均基本上是远心的。投影光学系统满足条件（lambdaxL）/（NAxY＆lt; 0＆lt; 2＆gt; 2＆lt; 2＆lt; 2＆lt; 2＆lt; 2＆lt; 2＆lt; 2＆lt; 光，L是第一物体和第二物体之间的距离，MA是第二物体侧上的数值孔径，Y 0是第二物体上的最大像高。

49. 发明申请

US20050122499A1 Projection optical system and an exposure apparatus with the projection optical system 审中-公开
标题翻译：投影光学系统和投影光学系统的曝光装置
公开(公告)号：US20050122499A1
公开(公告)日：2005-06-09
申请号：US10982781
申请日：2004-11-08
申请人： Yasuhiro Omura , Naomasa Shiraishi , Issey Tanaka , Soichi Owa , Toshihiko Ozawa , Shunsuke Niisaka
发明人： Yasuhiro Omura , Naomasa Shiraishi , Issey Tanaka , Soichi Owa , Toshihiko Ozawa , Shunsuke Niisaka
IPC分类号： G02B13/24 , G02B17/08 , G03F7/20 , G03B27/54
CPC分类号： G02B17/0892 , G02B13/24 , G02B17/08 , G03F7/70225 , G03F7/70233 , G03F7/70358 , G03F7/70566 , G03F7/70966
摘要： A projection optical system, which forms a reduced image of a first surface onto a second surface, has excellent optical performance without substantially being affected by birefringence despite the use of optical material having intrinsic birefringence. This is done by suitably arranging certain crystal axes of radiation transmissive members that make up the projection optical system relative to the optical axis of the projection optical system, and by suitably arranging the certain crystal axes of the radiation transmissive members relative to the crystal axes of other radiation transmissive members in the projection optical system.
摘要翻译：将第一表面的缩小图像形成到第二表面上的投影光学系统虽然使用具有固有双折射的光学材料，但是基本上不受双折射的影响，具有优异的光学性能。这通过适当地布置构成投影光学系统的相对于投影光学系统的光轴的辐射透射构件的某些晶轴，并且通过将辐射透射构件的某些晶轴相对于晶体轴适当地布置投影光学系统中的其他辐射透射构件。

50. 发明授权

US06903803B2 Projection optical system, exposure apparatus incorporating this projection optical system, and manufacturing method for micro devices using the exposure apparatus 失效
标题翻译：投影光学系统，包含该投影光学系统的曝光装置以及使用该曝光装置的微型装置的制造方法
公开(公告)号：US06903803B2
公开(公告)日：2005-06-07
申请号：US10726494
申请日：2003-12-04
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B5/18 , G02B13/14 , G02B13/18 , G02B13/24 , G02B27/00 , G03F7/20 , H01L21/027 , G03B27/54 , G03B27/42
CPC分类号： G02B5/1857 , G02B13/143 , G02B27/0043 , G02B27/4211 , G02B27/4222 , G03F7/70241 , G03F7/70308
摘要： In a projection optical system which forms an image of a first plane on a second plane, using extreme ultraviolet illumination light, an object of the invention is to form an image of the first plane on the second plane under suitable conditions. This projection optical system includes a first diffractive optical element arranged in an optical path between the first plane and the second plane; a second diffractive optical element arranged in the optical path on the side of the second plane from the first diffractive optical element; and an optical system having a negative power, arranged in the optical path between the first diffractive optical element and the second diffractive optical element.
摘要翻译：在使用极紫外照明光在第二平面上形成第一平面的图像的投影光学系统中，本发明的目的是在合适的条件下在第二平面上形成第一平面的图像。该投影光学系统包括布置在第一平面和第二平面之间的光路中的第一衍射光学元件; 第二衍射光学元件，其布置在所述光路中，所述第二衍射光学元件在所述第二平面的与所述第一衍射光学元件相反的一侧上; 以及具有负功率的光学系统，布置在第一衍射光学元件和第二衍射光学元件之间的光路中。

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