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41. 发明授权

US08873161B2 Zoom lens, camera apparatus, information device and mobile information terminal apparatus 有权
标题翻译：变焦镜头，相机装置，信息装置和移动信息终端装置
公开(公告)号：US08873161B2
公开(公告)日：2014-10-28
申请号：US12968993
申请日：2010-12-15
申请人： Takahiro Nakayama
发明人： Takahiro Nakayama
IPC分类号： G02B15/16 , G02B15/173 , G02B27/00
CPC分类号： G02B15/173 , G02B27/0062
摘要： A zoom lens includes a first lens group having a positive refractive power, a second lens group having a negative refractive power, an aperture stop, a third lens group having a positive refractive power, and a fourth lens group having a positive refractive power, which are disposed in order from an object side. The first lens group has a negative lens and a positive lens having a convex surface at an object side, which are disposed in order from the object side. An interval between the first lens group and the second lens group is increased and an interval between the second lens group and the third lens group is decreased when changing a magnification of the zoom lens from a wide angle end to a telephoto end. The first lens group and the third lens group are moved from positions at the wide angle end toward positions, which are at object sides thereof, at the telephoto end, respectively. Parameters are set so as to successfully correct chromatic aberration while achieving compact size, wide half field angle at the wide angle end, good performance, and a high magnification ratio.
摘要翻译：变焦透镜包括具有正折光力的第一透镜组，具有负折光力的第二透镜组，孔径光阑，具有正折光力的第三透镜组和具有正折光力的第四透镜组，从物体侧依次排列。第一透镜组具有从物体侧依次设置的负透镜和物镜侧具有凸面的正透镜。当从广角端到望远端改变变焦透镜的倍率时，第一透镜组和第二透镜组之间的间隔增大，并且第二透镜组和第三透镜组之间的间隔减小。第一透镜组和第三透镜组分别从位于广角端处的位置朝向远摄端的位于其物体侧的位置移动。设定参数，以便在实现紧凑的尺寸，广角端的宽半场角，良好的性能和高放大倍数的情况下成功地校正色差。

42. 发明授权

US08563950B2 Energy beam drawing apparatus and method of manufacturing device 失效
标题翻译：能量射束拉制装置及其制造方法
公开(公告)号：US08563950B2
公开(公告)日：2013-10-22
申请号：US13353571
申请日：2012-01-19
申请人： Takahiro Nakayama , Shigeru Terashima
发明人： Takahiro Nakayama , Shigeru Terashima
IPC分类号： H01J37/317 , G03F7/20 , H01L31/18 , B82Y10/00 , B82Y40/00
CPC分类号： H01J37/317 , B82Y10/00 , B82Y40/00 , G03F7/70841 , G03F7/70925 , H01J37/3174 , H01J2237/022
摘要： An energy beam drawing apparatus includes a member, positioned between an energy beam source and a substrate, on which a deposit is deposited and a removing unit which removes the deposit. The removing unit includes a catalyst for generating, from a gas, an active species for decomposing the deposit by irradiation with the energy beam, a supplying mechanism for supplying the gas to a position where the active species is generated, and a moving mechanism for moving, when executing processing of removing the deposit, the catalyst to a first position which is irradiated with the energy beam, and moving, when executing drawing processing on the substrate, the catalyst to a second position which is not irradiated with the energy beam.
摘要翻译：能量束描绘装置包括位于能量束源和衬底之间的构件，沉积物沉积在其上，以及去除沉积物的去除单元。除去单元包括用于从气体产生用于通过用能量束照射分解沉积物的活性物质的催化剂，用于将气体供给到产生活性物质的位置的供给机构，以及用于移动的移动机构当执行将所述沉积物去除的处理时，将所述催化剂移动到被所述能量束照射的第一位置，并且当在所述基板上执行拉伸处理时将所述催化剂移动到未被所述能量束照射的第二位置。

43. 发明申请

US20130215321A1 IMAGE FORMING LENS, CAMERA DEVICE, AND HANDHELD TERMINAL 有权
标题翻译：图像形成镜头，相机设备和手持式终端
公开(公告)号：US20130215321A1
公开(公告)日：2013-08-22
申请号：US13728687
申请日：2012-12-27
申请人： Takahiro Nakayama
发明人： Takahiro Nakayama
IPC分类号： G02B9/04
CPC分类号： G02B9/62 , G02B9/04 , G02B13/04
摘要： An image forming lens including an aperture stop, a first lens group, and a second lens group having a positive power, the first lens group including a first F lens group having a negative power and a first R lens group having a positive power, the first F lens group including at least two negative lenses, the first R lens group including at least one positive lens, the second lens group including a second F lens group having a positive power and a second R lens group, the second F lens group including a first positive lens, a first negative lens, a second negative lens, and a second positive lens, and the second R lens group including at least one lens.
摘要翻译：一种包括孔径光阑，第一透镜组和具有正光焦度的第二透镜组的成像透镜，所述第一透镜组包括具有负光焦度的第一F透镜组和具有正光焦度的第一R透镜组，包括至少两个负透镜的第一F透镜组，所述第一R透镜组包括至少一个正透镜，所述第二透镜组包括具有正光焦度的第二F透镜组和第二R透镜组，所述第二F透镜组包括第一正透镜，第一负透镜，第二负透镜和第二正透镜，第二R透镜组包括至少一透镜。

44. 发明授权

US08394457B2 Precursor composition for porous thin film, method for preparation of the precursor composition, porous thin film, method for preparation of the porous thin film, and semiconductor device 有权
标题翻译：多孔薄膜的前体组合物，前体组合物的制备方法，多孔薄膜，多孔薄膜的制备方法以及半导体装置
公开(公告)号：US08394457B2
公开(公告)日：2013-03-12
申请号：US12303240
申请日：2007-05-16
申请人： Nobutoshi Fujii , Takahiro Nakayama , Kazuo Kohmura , Hirofumi Tanaka
发明人： Nobutoshi Fujii , Takahiro Nakayama , Kazuo Kohmura , Hirofumi Tanaka
IPC分类号： B05D3/02 , C08J7/06 , B05D3/06
CPC分类号： C09D183/04 , C08G77/04 , C08G77/56 , C08G77/58 , C09D183/14 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/3122 , H01L21/31695 , Y10T428/249921 , Y10T428/249953
摘要： Disclosed is a precursor composition comprising: a compound selected from a compound represented by the formula: Si(OR1)4 and a compound represented by the formula Ra(Si)(OR2)4−a (in the formulas R1 represents a monovalent organic group; R represents a hydrogen atom, a fluorine atom or a monovalent organic group; R2 represents a monovalent organic group; and a is an integer ranging from 1 to 3, provided that R, R1 and R2 may be the same or different from one another) a thermally degradable organic compound; an element having a catalyst activity; urea; and the like. A porous thin film produced from the precursor composition is irradiated with ultraviolet ray, and then subjected to gas-phase reaction with a hydrophobic compound. A porous thin film thus prepared can be used for the manufacture of a semiconductor device.
摘要翻译：公开了一种前体组合物，其包含：选自下式的化合物：Si（OR 1）4和由式Ra（Si）（OR 2）4-a表示的化合物（式中，R1表示一价有机基团 R表示氢原子，氟原子或一价有机基团; R 2表示一价有机基团，a表示1〜3的整数，条件是R，R 1和R 2可以相同也可以不同）可热降解的有机化合物; 具有催化剂活性的元素; 尿素等等。用紫外线照射由前体组合物制成的多孔薄膜，然后与疏水性化合物进行气相反应。如此制备的多孔薄膜可用于制造半导体器件。

45. 发明授权

US08273410B2 Process for manufacturing hydrophobized microporous film 有权
标题翻译：制造疏水化微孔薄膜的工艺
公开(公告)号：US08273410B2
公开(公告)日：2012-09-25
申请号：US12680275
申请日：2008-09-29
申请人： Shinichi Chikaki , Takahiro Nakayama
发明人： Shinichi Chikaki , Takahiro Nakayama
IPC分类号： C23C16/00 , B05D3/04
CPC分类号： H01L21/3122 , H01L21/02126 , H01L21/02203 , H01L21/02337 , H01L21/02359 , H01L21/31058 , H01L21/31695 , H01L21/76826 , H01L23/5329 , H01L2924/0002 , H01L2924/00
摘要： A process for manufacturing a hydrophobized microporous film includes: forming an organic silica insulating film 2 on a substrate 1; supplying a gaseous mixture 3 composed of a silylation gas and an inert gas in an apparatus having the substrate 1 disposed therein at a temperature of the substrate 1, the substrate 1 having the organic silica insulating film 2 formed thereon, and the temperature being equal to or higher than a dew point temperature of the silylation gas and equal to or lower than a vaporizing temperature of the silylation gas; stopping the supply of the gaseous mixture 3 into the apparatus; and heating the substrate having the organic silica insulating film 2 formed thereon, so that a hydrophobizing organic silica insulating film, in which the surface of the organic silica insulating film 2 and the surfaces of the pores are hydrophobized, can be obtained with reduced increase in the specific dielectric constant.
摘要翻译：疏水化微孔膜的制造方法包括：在基板1上形成有机二氧化硅绝缘膜2; 在基板1的温度下在其中设置有基板1的设备中提供由甲硅烷基化气体和惰性气体组成的气体混合物3，其上形成有机二氧化硅绝缘膜2的基板1，其温度等于或高于甲硅烷化气体的露点温度，并且等于或低于甲硅烷化气体的汽化温度; 停止将气体混合物3供应到设备中; 并加热形成有有机二氧化硅绝缘膜2的基板，从而可以减少有机二氧化硅绝缘膜2的表面和孔表面疏水化的疏水化有机二氧化硅绝缘膜，比介电常数。

46. 发明申请

US20120181455A1 ENERGY BEAM DRAWING APPARATUS AND METHOD OF MANUFACTURING DEVICE 失效
标题翻译：能量束绘图装置和制造装置的方法
公开(公告)号：US20120181455A1
公开(公告)日：2012-07-19
申请号：US13353571
申请日：2012-01-19
申请人： Takahiro NAKAYAMA , Shigeru TERASHIMA
发明人： Takahiro NAKAYAMA , Shigeru TERASHIMA
IPC分类号： G21K5/00
CPC分类号： H01J37/317 , B82Y10/00 , B82Y40/00 , G03F7/70841 , G03F7/70925 , H01J37/3174 , H01J2237/022
摘要： An energy beam drawing apparatus includes a member, positioned between an energy beam source and a substrate, on which a deposit is deposited and a removing unit which removes the deposit. The removing unit includes a catalyst for generating, from a gas, an active species for decomposing the deposit by irradiation with the energy beam, a supplying mechanism for supplying the gas to a position where the active species is generated, and a moving mechanism for moving, when executing processing of removing the deposit, the catalyst to a first position which is irradiated with the energy beam, and moving, when executing drawing processing on the substrate, the catalyst to a second position which is not irradiated with the energy beam.
摘要翻译：能量束描绘装置包括位于能量束源和衬底之间的构件，沉积物沉积在其上，以及去除沉积物的去除单元。除去单元包括用于从气体产生用于通过用能量束照射分解沉积物的活性物质的催化剂，用于将气体供给到产生活性物质的位置的供给机构，以及用于移动的移动机构当执行将所述沉积物去除的处理时，将所述催化剂移动到被所述能量束照射的第一位置，并且当在所述基板上执行拉伸处理时将所述催化剂移动到未被所述能量束照射的第二位置。

47. 发明申请

US20120025395A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：半导体器件及制造半导体器件的方法
公开(公告)号：US20120025395A1
公开(公告)日：2012-02-02
申请号：US13193154
申请日：2011-07-28
申请人： Shinichi CHIKAKI , Takahiro NAKAYAMA
发明人： Shinichi CHIKAKI , Takahiro NAKAYAMA
IPC分类号： H01L23/532 , H01L21/768
CPC分类号： H01L23/53295 , H01L21/02126 , H01L21/022 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/02359 , H01L21/76807 , H01L21/7682 , H01L21/76825 , H01L21/76826 , H01L21/76835 , H01L23/53238 , H01L23/5329 , H01L2221/1047 , H01L2924/0002 , H01L2924/00
摘要： A semiconductor device includes: a first porous layer that is formed over a substrate and includes a SiO2 skeleton; a second porous layer that is formed immediately above the first porous layer and includes a SiO2 skeleton; a via wiring that is provided in the first porous layer; and a trench wiring that is buried in the second porous layer. The first porous layer has a pore density x1 of 40% or below and the second porous layer has a pore density x2 of (x1+5) % or above.
摘要翻译：半导体器件包括：形成在衬底上并包括SiO 2骨架的第一多孔层; 第二多孔层，其形成在第一多孔层的正上方，并且包括SiO 2骨架; 设置在所述第一多孔层中的通孔布线; 以及埋设在第二多孔层中的沟槽布线。第一多孔层的孔密度x1为40％以下，第二多孔层的孔密度x2为（x1 + 5）％以上。

48. 发明申请

US20110262866A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20110262866A1
公开(公告)日：2011-10-27
申请号：US13090410
申请日：2011-04-20
申请人： Takahiro Nakayama , Shigeru Terashima , Yutaka Watanabe
发明人： Takahiro Nakayama , Shigeru Terashima , Yutaka Watanabe
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70925
摘要： An exposure apparatus which projects exposure light from a pattern of an illuminated original onto a substrate, comprises a projection system including an optical element and configured to project the exposure light onto the substrate, an enclosure configured to enclose the projection system, and a cleaning mechanism configured to clean the optical element by irradiating the optical element with ultraviolet light under an environment in which oxygen is present within the enclosure, the cleaning mechanism including a light source configured to generate ultraviolet light, a tubular member including an exit window and configured to partially enclose an optical path between the light source and the optical element, and a regulating device configured to regulate an environment of a space inside the tubular member so that a partial pressure of oxygen becomes lower in the space inside the tubular member than in a space which is outside the tubular member.
摘要翻译：将曝光光从照明原稿的图案投影到基板上的曝光装置包括：投影系统，包括光学元件，并将曝光光投射到基板上;被构造成包围投影系统的外壳;以及清洁机构被配置为通过在所述外壳内存在氧气的环境下用紫外线照射所述光学元件来清洁所述光学元件，所述清洁机构包括被配置为产生紫外线的光源，所述管状部件包括出射窗，在光源和光学元件之间包围光路，以及调节装置，其被配置为调节管状部件内的空间的环境，使得在管状部件内的空间中氧的分压变低在管状构件外。

49. 发明申请

US20110006632A1 EMBEDDED MAGNET MOTOR AND MANUFACTURING METHOD OF THE SAME 有权
公开(公告)号：US20110006632A1
公开(公告)日：2011-01-13
申请号：US12861311
申请日：2010-08-23
申请人： Takahiro NAKAYAMA , Hirotaka ITOH , Yoshiyuki TAKABE
发明人： Takahiro NAKAYAMA , Hirotaka ITOH , Yoshiyuki TAKABE
IPC分类号： H02K1/27
CPC分类号： H02K1/2766 , Y10T29/49009
摘要： In an embedded magnet motor, radial magnets and first inclined magnets form north poles. The radial magnets and second inclined magnets form south poles. Core sheets each include preformed radial accommodating slots the number of which is expressed by P/2. Some of the preformed radial accommodating slots are short slots and the rest are long slots. The short slots are located at some parts of each radial accommodating slot along the axial direction. Radially inner ends of the short slots restrict the radial magnets from moving radially inward.

50. 发明授权

US07868503B1 Embedded magnet motor and manufacturing method of the same 有权
公开(公告)号：US07868503B1
公开(公告)日：2011-01-11
申请号：US12861311
申请日：2010-08-23
申请人： Takahiro Nakayama , Hirotaka Itoh , Yoshiyuki Takabe
发明人： Takahiro Nakayama , Hirotaka Itoh , Yoshiyuki Takabe
IPC分类号： H02K1/27
CPC分类号： H02K1/2766 , Y10T29/49009
摘要： In an embedded magnet motor, radial magnets and first inclined magnets form north poles. The radial magnets and second inclined magnets form south poles. Core sheets each include preformed radial accommodating slots the number of which is expressed by P/2. Some of the preformed radial accommodating slots are short slots and the rest are long slots. The short slots are located at some parts of each radial accommodating slot along the axial direction. Radially inner ends of the short slots restrict the radial magnets from moving radially inward.

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