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41. 发明申请

US20070202343A1 COLOR EFFECT LAYER SYSTEM AND COATINGS BASED ON PHOTONIC CRYSTALS AND A METHOD FOR THE PRODUCTION AND USE THEREOF 审中-公开
标题翻译：基于光子晶体的颜色效应层系统和涂层及其生产和使用方法
公开(公告)号：US20070202343A1
公开(公告)日：2007-08-30
申请号：US11677146
申请日：2007-02-21
申请人： Dirk Sprenger , Martin Letz , Steffen Reichel , Wolfgang Mannstadt , Peter Blaum
发明人： Dirk Sprenger , Martin Letz , Steffen Reichel , Wolfgang Mannstadt , Peter Blaum
IPC分类号： B32B17/06
CPC分类号： C03C17/006 , B44F1/04 , B82Y20/00 , C03C17/007 , C03C2217/425 , C03C2217/485 , C03C2217/72 , F25D2400/18 , G02B1/005
摘要： The invention relates to a color effect layer system, including: a carrier substrate selected from glass or glass-ceramics, at least one layer of spheres, particularly preferred at least 50 layers, more preferred 50 to 100 layers, including filled or not filled cavities/honeycombs, in the form of a porous material composite of a crystal-like superstructure or an inverse crystal-like superstructure having a three-dimensional periodic or substantially periodic configuration in the order of magnitude of the wavelength of visible light, wherein the sphere diameters and optionally the cavity/honeycomb diameters have a very strict distribution. In addition to the excellent optical properties, the coating systems also have sufficient mechanical stability.
摘要翻译：本发明涉及一种颜色效应层系统，其包括：选自玻璃或玻璃陶瓷的载体基材，至少一层球体，特别优选至少50层，更优选50至100层，包括填充或未填充空腔 /蜂窝体，以具有可见光波长的数量级的三维周期性或基本上周期性构造的晶状上层结构或反晶体状上层结构的多孔材料复合物的形式，其中球形直径并且可选地，空腔/蜂窝直径具有非常严格的分布。除了优异的光学性能之外，涂层体系也具有足够的机械稳定性。

42. 发明申请

US20070127140A1 Optical elements and imaging optics comprising them 有权
标题翻译：光学元件和包括它们的成像光学元件
公开(公告)号：US20070127140A1
公开(公告)日：2007-06-07
申请号：US11523845
申请日：2006-09-20
申请人： Steffen Reichel , Wolfram Beier , Frank-Thomas Lentes , Yoshio Okano , Jochen Alkemper , Jose Zimmer , Joseph Hayden , Carsten Weinhold , Ulrich Peuchert , Martin Letz
发明人： Steffen Reichel , Wolfram Beier , Frank-Thomas Lentes , Yoshio Okano , Jochen Alkemper , Jose Zimmer , Joseph Hayden , Carsten Weinhold , Ulrich Peuchert , Martin Letz
IPC分类号： G02B9/00
CPC分类号： G02B1/02 , C04B35/486 , C04B2235/3201 , C04B2235/3203 , C04B2235/3206 , C04B2235/3208 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3229 , C04B2235/3232 , C04B2235/3418 , C04B2235/72 , C04B2235/762 , C04B2235/786 , C04B2235/81 , C04B2235/9653
摘要： The optical elements are made from an opto-ceramic material that is characterized by high density, transparency for visible light and IR, high refractive index, high Abbe number and outstanding relative partial dispersion. Mixed oxides are sintered to obtain the opto-ceramic material. The mixed oxides contain zirconium oxide and hafnium oxide mixed with one or more oxides of yttrium, scandium, lanthanide elements, and optionally mixed with one or more of SiO2, Na2O, and TiO2. Alternatively the mixed oxides contain zirconium oxide and hafnium oxide mixed with CaO and/or MgO and optionally mixed with one or more of SiO2, Na2O, and TiO2. In addition, the mixed oxides can also include one or more oxides of Al, Ga, In, and Sc; optionally one or more oxides of yttrium, some lanthanide elements; and optionally one or more of SiO2, Na2O, MgO, CaO, and TiO2.
摘要翻译：光学元件由光学陶瓷材料制成，其特征在于高密度，可见光和IR的透明度，高折射率，高阿贝数和优异的相对部分色散。混合氧化物被烧结以获得光陶瓷材料。混合氧化物含有与一种或多种钇，钪，镧系元素的氧化物混合的氧化锆和氧化铪，并且任选地与一种或多种SiO 2，Na 2 O 3混合， O和TiO 2。或者，混合氧化物含有与CaO和/或MgO混合的氧化锆和氧化铪，并且任选与SiO 2，Na 2 O和TiO 2中的一种或多种混合 > 2 。此外，混合氧化物还可以包括一种或多种Al，Ga，In和Sc的氧化物; 任选的一种或多种钇氧化物，一些镧系元素; 和任选的一种或多种SiO 2，Na 2 O，MgO，CaO和TiO 2。

43. 发明申请

US20050186513A1 Liquid and method for liquid immersion lithography 审中-公开
标题翻译：液浸法和液浸式光刻法
公开(公告)号：US20050186513A1
公开(公告)日：2005-08-25
申请号：US10784922
申请日：2004-02-24
申请人： Martin Letz , Konrad Knapp , Hauke Esemann , Andreas Voitsch
发明人： Martin Letz , Konrad Knapp , Hauke Esemann , Andreas Voitsch
IPC分类号： G03F7/00 , G03F7/20
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/70566
摘要： The present invention relates to a new class of compound useful as liquid for immersion lithography, said liquid comprising molecules so that said liquid is substantially transparent at a wavelength used for said liquid immersion lithography, wherein a degree of polarization of light, which is incident on a sample of said liquid in a forward direction and which is scattered in a direction perpendicular to said forward direction within a plane of scattering defined by said forward direction and said direction perpendicular to said forward direction, is larger than 0.9. Suited liquids are, for example, such comprising molecules transparent to UV radiation, wherein said molecules are high-symmetric molecules. Suited compounds are defined by A(R)4 wherein A is defined to be a 4-valent element and R is selected from —(C)n— and —(Si)n—, with n=1 to 10, wherein the remaining valences of the carbon or silica are saturated by one (or more) selected from hydrogen and a halogen. The invention further relates to a method for exposing a photoresist layer on a semiconductor substrate for producing microelectronic circuits or micro-electromechanical systems (MEMS). The method uses a step of liquid immersion lithography using a liquid according to the invention.
摘要翻译：本发明涉及可用作浸没式光刻液体的新类化合物，所述液体包含分子，使得所述液体在用于所述液浸光刻的波长处基本上是透明的，其中入射到所述液体在向前方向上的样品在垂直于所述正向方向的垂直方向和垂直于所述正向的方向的散射面内沿垂直于所述正向的方向散射，大于0.9。合适的液体例如是包含对UV辐射透明的分子，其中所述分子是高对称分子。适用的化合物由<？in-line-formula description =“In-line Formulas”end =“lead”？> A（R）<4> <？in-line-formula description =“In 其中A定义为4价元素，并且R选自 - （C）n - 和 - （Si）n < 其中n = 1至10，其中碳或二氧化硅的剩余价数由选自氢和卤素的一个（或多个）饱和。本发明还涉及用于在用于制造微电子电路或微机电系统（MEMS）的半导体衬底上曝光光致抗蚀剂层的方法。该方法使用根据本发明的液体的液浸光刻步骤。

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