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    • 31. 发明申请
    • REPLICATION TOOLS AND RELATED FABRICATION METHODS AND APPARATUS
    • 复制工具及相关制造方法和装置
    • US20160329075A1
    • 2016-11-10
    • US15213907
    • 2016-07-19
    • MicroContinuum, Inc.
    • W. Dennis Slafer
    • G11B7/26B29C59/04C25D1/02C25D1/10C25D3/12C25D3/46C25D3/48C25D3/04C25D5/02C25D7/04C25D17/06C25D21/02C25D21/06C25D21/10B29C33/38
    • Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.
    • 公开了耐久的无缝复制工具,用于在期望的介质(例如光学记录或数据存储介质)中复制无缝浮雕图案。 公开了制造这种耐用的复制工具的方法,包括在支撑圆筒的内表面上制备记录基底,在基底中记录和显影浮雕图案,形成图案的耐久的负浮雕复制品,提取所得到的耐用的工具套 并且将工具套筒安装在安装夹具上。 公开了用于制造这种无缝复制工具的装置,包括用于在支撑筒的内表面上的感光层上记录期望的浮雕图案的系统。 还公开了用于形成具有期望的浮雕图案的耐用工具套筒的电沉积池。 复制工具浮雕功能可能具有至微米和纳米方面的关键尺寸。
    • 33. 发明申请
    • METHOD OF ELECTROPLATING PLASTIC SUBSTRATE
    • 电镀基材的电镀方法
    • US20160083859A1
    • 2016-03-24
    • US14704952
    • 2015-05-05
    • De Tian CAO
    • De Tian CAO
    • C25D5/56C25D5/48C25D3/38C25D3/04C25D5/40C25D3/12
    • C25D3/38C23C18/1653C23C18/2086C23C18/30C23C18/36C25D3/06C25D3/12C25D5/14
    • Provided is a method of electroplating a plastic substrate, wherein the treatment time of processes including coarsening, copper plating, nickel plating, etc. is decreased, and a semi-gloss nickel plating process (a semi-gloss nickel plating layer) in a conventional electroplating process is obviated. Also, production capacity is remarkably increased and the plating cost and use of chromium are decreased, thus lowering environmental pollution. Furthermore, the process time and the thickness of the copper and nickel plating layers are decreased, and the electroplated surface of the plastic substrate by PVD is eco-friendly and exhibits superior heat resistance, corrosion resistance, and anti-scratching and anti-oxidation properties. Moreover, as the temperature and the gas content are adjusted in the PVD process, the resulting PVD layer can show various vivid colors having a metallic and 3D appearance, and conventional monotonous color defects can be overcome.
    • 提供一种电镀塑料基板的方法,其中减少了包括粗化,镀铜,镀镍等的处理的处理时间,以及常规的半光泽镍电镀工艺(半光泽镀镍层) 电镀工艺得到消除。 此外,生产能力显着增加,镀层成本和铬的使用量下降,从而降低了环境污染。 此外,铜和镍镀层的处理时间和厚度减小,并且PVD的塑料基板的电镀表面是环境友好的并且表现出优异的耐热性,耐腐蚀性和抗划痕和抗氧化性能 。 此外,随着在PVD工艺中调节温度和气体含量,所得到的PVD层可以显示出具有金属和3D外观的各种生动的颜色,并且可以克服常规的单调颜色缺陷。
    • 36. 发明授权
    • Method of preparing chromium plating bath and method of forming plating film
    • 镀铬浴的制备方法及镀膜方法
    • US08372259B2
    • 2013-02-12
    • US12620352
    • 2009-11-17
    • Toru MurakamiSuhaimi HamidRyo Maeda
    • Toru MurakamiSuhaimi HamidRyo Maeda
    • C25D3/04C25D3/06C25D3/10
    • C25D3/04C25D3/06C25D5/12C25D5/14
    • A chromium plating bath containing trivalent chromium ions and hexavalent chromium ions is prepared by a method including the steps of: (A) mixing chromic acid and an organic acid in an aqueous solution containing these acids and reducing chromic acid by the organic acid so as to prepare an aqueous solution not containing hexavalent chromium ions; (B) adding a pH adjustor to the aqueous solution not containing hexavalent chromium ions so as to adjust pH to a value of 1 to 4; and (C) further adding chromic acid to the aqueous solution not containing hexavalent chromium ions and having undergone the pH adjustment so as to prepare an aqueous solution containing trivalent chromium ions and hexavalent chromium ions. The chromium plating bath containing both trivalent chromium ions and hexavalent chromium ions can be prepared while easily and assuredly adjusting the contents (content ratio) of trivalent chromium ions and hexavalent chromium ions to predetermined values (a predetermined value).
    • 通过包括以下步骤的方法制备含有三价铬离子和六价铬离子的镀铬浴:(A)将含有这些酸的水溶液中的铬酸和有机酸混合并用有机酸还原铬酸, 制备不含六价铬离子的水溶液; (B)向不含六价铬离子的水溶液中添加pH调节剂,以将pH调节至1〜4的值; 和(C)进一步向不含六价铬离子的水溶液中加入铬酸,并进行pH调节,以制备含有三价铬离子和六价铬离子的水溶液。 可以容易且可靠地将三价铬离子和六价铬离子的含量(含有比例)调整为规定值(规定值),同时制备含有三价铬离子和六价铬离子的镀铬浴。
    • 40. 发明授权
    • Production of electrolytic copper from dilute solutions contaminated by
other metals
    • 从其他金属污染的稀释溶液中生产电解铜
    • US6086744A
    • 2000-07-11
    • US135255
    • 1998-08-17
    • Gianni Zoppi
    • Gianni Zoppi
    • C25C1/12C25D3/04C25D3/06
    • C25C1/12
    • The copper is selectively precipitated in the form of a sulfide from the solutions containing it, according to the reaction:Cu.sup.2+ +S.sup.2- .fwdarw.CuSThe precipitated solid, constituted by copper sulfide, is filtered, washed and then leached with a solution of ferric fluoborate and fluoboric acid, which dissolves the copper as a fluoborate while forming elemental sulfur, according to the reaction:CuS+2Fe(BF.sub.4).sub.3 .fwdarw.Cu(BF.sub.4).sub.2+2Fe(BF.sub.4).sub.2 +S.sup.oAfter filtering off the sulfur, the copper fluoborate solution is subjected to an electrolysis in a diaphragm cell, obtaining a deposit of pure copper at the cathode and a regenerated solution of ferric fluoborate at the anode, which is utilized to leach further copper sulfide.
    • 从含有溶液的溶液中选择性地以硫化物的形式沉淀出铜,根据以下反应:由硫化铜构成的Cu2 ++ S2→CuSThe沉淀固体被过滤,洗涤,然后用三价铁 根据CuS + 2Fe(BF4)3→Cu(BF4)2 + 2Fe(BF4)2 +的反应,可以溶解作为氟硼酸盐的铜的氟硼酸盐和氟硼酸,然后过滤掉硫, 铜箔氟溶液在隔膜电池中进行电解,在阴极处获得纯铜沉积物,在阳极获得氟硼酸铁的再生溶液,用于浸出进一步的硫化铜。