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31. 发明申请

US20030124866A1 Method and apparatus for forming pattern using printing method 有权
标题翻译：使用印刷方法形成图案的方法和装置
公开(公告)号：US20030124866A1
公开(公告)日：2003-07-03
申请号：US10328048
申请日：2002-12-26
申请人： LG.Philips LCD Co., Ltd.
发明人： Eu-Gene Kim , Dong-Hoon Lee , Jung-Jae Lee , Dae-Hyun Nam
IPC分类号： C09K019/02 , H01L021/302
CPC分类号： H05K3/0079 , B41M1/12 , H05K3/207 , H05K2203/0113 , H05K2203/0165 , H05K2203/0537
摘要： A method for forming a pattern, including the steps of preparing a clichnull having a recess thereon corresponding to a position of a pattern, filling one of resist and ink within the recess of the clichnull, affixing a substrate on which the pattern is to be formed on a loading plate, aligning the loading plate on the clichnull, attaching the substrate on the loading plate to the clichnull, and separating the substrate on the loading plate from the clichnull.
摘要翻译：一种用于形成图案的方法，包括以下步骤：制备具有与图案位置相对应的凹部的陈腔板，在底片的凹槽内填充抗蚀剂和墨水中的一个，固定其上将形成图案的基底在装载板上，将底板上的装载板对准，将装载板上的基板连接到底板，并将装载板上的基板与底板分开。

32. 发明申请

US20030124757A1 Method of forming pattern 有权
标题翻译：形成图案的方法
公开(公告)号：US20030124757A1
公开(公告)日：2003-07-03
申请号：US10303039
申请日：2002-11-25
发明人： Yun Bok Lee , Dong Hoon Lee
IPC分类号： H01L021/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/12 , H05K3/0079 , H05K3/1225
摘要： A method of forming a pattern suitable for fabricating a liquid crystal device which includes the steps of forming a film on a substrate, printing a resist pattern by having the film covered with a screen mask, etching the film using the resist pattern as a mask, and stripping the resist pattern.
摘要翻译：一种形成适于制造液晶器件的图案的方法，包括以下步骤：在衬底上形成膜，通过将膜覆盖有屏蔽掩模来印刷抗蚀剂图案，使用抗蚀剂图案作为掩模蚀刻该膜; 并剥离抗蚀剂图案。

33. 发明授权

US06537720B1 Ablation-transfer imaging/recording 失效
公开(公告)号：US06537720B1
公开(公告)日：2003-03-25
申请号：US08739157
申请日：1996-10-30
申请人： Diane M. Foley , Everett W. Bennett , Sam C. Slifkin
发明人： Diane M. Foley , Everett W. Bennett , Sam C. Slifkin
IPC分类号： B41M5035
CPC分类号： B41M5/465 , B41M3/12 , B41M3/14 , B41M5/24 , B41M5/38257 , B41M5/3854 , B41M5/395 , B41M5/426 , B41M5/46 , B41M7/0027 , G01D15/10 , G03F3/108 , H05K3/0079 , Y10S428/913 , Y10S428/914 , Y10S430/146
摘要： A unique method/system for simultaneously creating and transferring a contrasting pattern of intelligence on and from an ablation-transfer imaging medium to a receptor element in contiguous registration therewith is not dependent upon contrast imaging materials that must absorb the imaging radiation and is well adopted for such applications as, e.g., color proofing and printing, the security coding of various documents and the production of masks for the graphic arts and printed circuit industries; the ablation-transfer imaging medium, per se, comprises a support substrate and an imaging radiation-, preferably a laser radiation-ablative topcoat essentially coextensive therewith, such ablative topcoat having a non-imaging ablation sensitizer and an imaging amount of a non-ablation sensitizing contrast imaging material contained therein.

34. 发明授权

US06453963B1 Vacuum film laminating apparatus 失效
标题翻译：真空膜层压装置
公开(公告)号：US06453963B1
公开(公告)日：2002-09-24
申请号：US09624071
申请日：2000-07-24
申请人： Tokinobu Furukawa , Kazuo Takahashi , Takeshi Ishida , Takehiko Hayashi , Hideaki Yamamoto
发明人： Tokinobu Furukawa , Kazuo Takahashi , Takeshi Ishida , Takehiko Hayashi , Hideaki Yamamoto
IPC分类号： B32B3100
CPC分类号： B32B38/10 , B32B37/185 , B32B2309/68 , B32B2457/08 , H05K3/0079
摘要： A film laminating apparatus attaches films to electronic circuit boards, such as printed circuit boards and silicone boards or wafers. The film laminating apparatus conveys a plurality of boards at intervals, forms pieces of lamination film at the intervals of the boards on a base film with a processing area between boards and continuously conveys the base film into a reduced-pressure chamber having a board loading port, a film loading port, a laminating mechanism for attaching the lamination film on the base film to the boards, and a board unloading port for ejecting the laminated boards. Shutters are provided for opening and closing shutter sections provided in the board loading port and the board unloading port of the reduced-pressure chamber, and a vacuum source is provided for evacuating the reduced-pressure chamber when the reduced-pressure chamber is closed by the shutters. A shutter section is equipped with a shutter in the film loading port of the reduced-pressure chamber, and a detector is provided for detecting when a processing area in the film between boards being fed into the reduced-pressure chamber is in the shutter section of the film loading port. A control means then operates the shutter means of the film loading port, the board loading port, and the board unloading port to close the reduced-pressure chamber according to the result of detection by the detecting means, and actuates the vacuum source to evacuate the reduced-pressure chamber to a desired degree of vacuum. Then, the laminating means is actuated.
摘要翻译：薄膜层压装置将薄膜附着到诸如印刷电路板和硅树脂板或晶片之类的电子电路板上。膜层叠装置间隔地输送多个板，在基板上形成片状间隔的层叠膜，在基板之间具有处理区域，并将基膜连续地输送到具有板装载口的减压室，薄膜装载口，用于将层叠膜附着在基板上的层叠机构，以及用于排出层压板的板卸载口。设置有用于打开和关闭设置在减压室的板装载口和板卸载口中的闸门部分的闸门，并且提供真空源，用于当减压室由减压室关闭时排空减压室百叶窗。闸门部分在减压室的胶片装载端口中装有挡板，并且提供检测器，用于检测进入减压室的纸板之间的胶片中的处理区域何时位于胶片装载端口。控制装置然后根据检测装置的检测结果操作胶片装载口，纸板装载口和纸板卸载口的遮光装置，以关闭减压室，并且致动真空源以抽真空减压室达到所需的真空度。然后，层压装置被致动。

35. 发明申请

US20010051223A1 Polymer-coated metal composites by dip autopolymerization 失效
标题翻译：聚合物涂覆的金属复合材料通过浸渍自聚合
公开(公告)号：US20010051223A1
公开(公告)日：2001-12-13
申请号：US09894794
申请日：2001-06-29
发明人： James P. Bell , Nicole Baker
IPC分类号： B05D001/02 , B05D001/28 , B05D001/18
CPC分类号： B05D7/144 , B05D7/142 , C09D4/00 , H05K3/0079 , H05K3/3452 , H05K3/386 , H05K3/389 , C08F220/00
摘要： A composition and method is described for providing conformal protective or decorative polymer coatings on metals such as aluminum, copper, iron, steel, zinc, and their formation by dip autopolymerization. In accordance with the present invention, an acidic solution of organic monomer undergoes autopolymerization upon contact with a metal substrate, thereby forming a polymeric coating on the substrate. The method comprises providing the acidic monomer solution, dipping the metal substrate to be coated for a prescribed period of time depending on the thickness of the coating desired, and then removing the substrate from the solution. Importantly, the polymerization requires no application of external driving force, such as thermal or electrical energy. The coatings thus formed are up to 50 microns thick, and conform to the shape of the substrate. These coatings further have uniform thickness, and excellent thermal stability and protective properties. In one preferred embodiment of the present invention, the composition comprises an acidic solution of an organic electron acceptor monomer that undergoes autopolymerization in contact with a metal substrate, thereby forming a polymeric coating on the substrate. In another preferred embodiment of the present invention, the composition comprises an acidic solution of an organic electron acceptor monomer and an organic electron donor monomer that undergo autopolymerization in contact with a metal substrate, thereby forming a polymeric coating on the substrate. Metal-polymer composites are also described.
摘要翻译：描述了一种组合物和方法，用于在诸如铝，铜，铁，钢，锌的金属上提供保形或装饰聚合物涂层，并通过浸渍自聚合形成。根据本发明，有机单体的酸性溶液在与金属基材接触时经历自聚合，从而在基材上形成聚合物涂层。该方法包括提供酸性单体溶液，根据所需涂层的厚度将待涂覆的金属基材浸渍规定的时间，然后从溶液中除去基材。重要的是，聚合不需要外部驱动力，例如热或电能。如此形成的涂层最多达50微米厚，并且符合基材的形状。这些涂层还具有均匀的厚度，以及优异的热稳定性和保护性能。在本发明的一个优选实施方案中，组合物包含与金属基材接触的自聚合的有机电子受体单体的酸性溶液，从而在基材上形成聚合物涂层。在本发明的另一个优选实施方案中，组合物包含有机电子受体单体和有机电子供体单体的酸性溶液，其经历与金属基材接触的自聚合，从而在基材上形成聚合物涂层。还描述了金属 - 聚合物复合材料。

36. 发明授权

US06176286B1 Film applying apparatus 失效
标题翻译：涂膜装置
公开(公告)号：US06176286B1
公开(公告)日：2001-01-23
申请号：US09163346
申请日：1998-09-30
申请人： Kenji Kitagawa , Shigeru Yamamoto
发明人： Kenji Kitagawa , Shigeru Yamamoto
IPC分类号： B32B3104
CPC分类号： B32B38/10 , B32B37/226 , B32B2309/06 , B32B2457/08 , B32B2457/20 , G03F7/16 , H05K3/0079 , Y10T156/1343 , Y10T156/1741
摘要： A film applying apparatus 10 is provided with preparatory bonding rolls 20A, 20B and laminating rolls 21A, 21B, and a laminated film 12 wound out from a film roll 18 and a substrate 16 conveyed by a substrate conveying device 14 pass between these rolls and pressure bonding is performed. Diameter of the preparatory bonding rolls 20A, 20B is made smaller than diameter of the laminating rolls 21A, 21B and range of elastic deformable area S1 at the roll surface at grasping starting of the substrate and the laminated film 12 by the preparatory bonding rolls 20A, 20B is made small thereby range of generating, air holding or the like is limited to small.
摘要翻译：薄膜施加装置10设置有预备粘合辊20A，20B和层压辊21A，21B以及从薄膜辊18卷绕的层叠膜12和由基板输送装置14输送的基板16在这些辊之间通过并且压力进行接合。制备接合辊20A，20B的直径小于叠层辊21A，21B的直径，以及通过预备接合辊20A，21B抓取基板和叠层膜12时的辊表面处的弹性变形区域S1的范围，由于20B的尺寸较小，所以产生范围，空气保持等受到限制。

37. 发明授权

US6162569A Method for manufacturing fine pattern, and color filter, shading pattern filter and color LCD element formed and printed board by using the same 失效
标题翻译：用于制造精细图案的方法，彩色滤光片，阴影图案滤光片和彩色LCD元件的形成和使用它们的印刷电路板
公开(公告)号：US6162569A
公开(公告)日：2000-12-19
申请号：US165129
申请日：1998-10-02
申请人： Kouji Nakashima , Keita Ihara , Hidetoshi Matsumoto , Takahiro Oomori
发明人： Kouji Nakashima , Keita Ihara , Hidetoshi Matsumoto , Takahiro Oomori
IPC分类号： G02F1/1335 , H05K3/00 , H05K3/06 , H05K3/10 , C25D9/02 , G02B5/20
CPC分类号： H05K3/0079 , G02F1/133512 , G02F1/133516 , H05K3/061 , H05K3/108 , H05K2203/0117 , H05K2203/0537 , H05K2203/135
摘要： A method for manufacturing a fine pattern includes steps of forming a master substrate having an electrode layer patterned to a predetermined shape, forming peel layers made of a conductive water-repellent thin film on the master substrate, forming the fine pattern made of the electrodeposit resin on the peel layers, impregnating the electrodeposit resin with water, and stripping the fine pattern off the master substrate and transferring the fine pattern on a bonding layer of the media substrate. A color filter and a shading pattern filter are manufactured by the method for manufacturing the fine pattern. The color LCD element includes plastic film substrates, a transparent pixel electrode, a liquid crystal material, and color filters. The color filters are pasted on the plastic film with a bonding film laid therebetween. The color LCD element includes fine emittable filters two-dimensionally created as the color filter on a light-transmissive substrate so that the emittable filter is composed to seal at least one kind of the light-storage and the fluorescent coloring particles in the electrodeposit resin layer.
摘要翻译：一种精细图案的制造方法包括以下步骤：形成具有图案化为规定形状的电极层的母基板，在母基板上形成由导电性疏水性薄膜构成的剥离层，形成由电沉积树脂在剥离层上，用水浸渍电沉积树脂，并将精细图案从母基板上剥离并将精细图案转印到介质基板的粘合层上。通过精细图案的制造方法制造滤色器和遮光图案过滤器。彩色LCD元件包括塑料薄膜基板，透明像素电极，液晶材料和滤色器。将滤色片粘贴在塑料薄膜上，并将粘合薄膜铺在其间。彩色LCD元件包括在透光性基板上二维地形成作为滤色器的精细的可发射滤光片，使得可发射滤光片被构成以密封电沉积树脂层中的至少一种储光和荧光着色颗粒。

38. 发明授权

US5916735A Method for manufacturing fine pattern 失效
标题翻译：制作精细图案的方法
公开(公告)号：US5916735A
公开(公告)日：1999-06-29
申请号：US967941
申请日：1997-11-12
申请人： Kouji Nakashima , Keita Ihara , Hidetoshi Matsumoto , Takahiro Oomori
发明人： Kouji Nakashima , Keita Ihara , Hidetoshi Matsumoto , Takahiro Oomori
IPC分类号： G02F1/1335 , G03C7/12 , G03F7/16 , H05K3/00 , H05K3/06 , H05K3/10 , C25D9/02 , G02B5/20
CPC分类号： G02F1/133516 , G03C7/12 , G03F7/164 , H05K3/0079 , G02F1/133512 , H05K2203/0117 , H05K2203/0537 , H05K2203/135 , H05K3/061 , H05K3/108
摘要： A method for manufacturing a fine pattern is provided which method makes it possible to well reproducibly and completely strip and transfer the fine pattern, repetitively use a master substrate, and simply form a high-definition and high-density fine pattern with good massproductivity. Further, a color filter and a shading pattern filter are implemented by the fine pattern. A color LCD element with the color filter is provided which enables to output a well color-reproducibly high-quality image with no color or brightness evenness. Moreover, a color LCD element is provided which enables to continuously output a coloring function for a certain length of time after light from a light source or ambient light disappears and form a brighter and more vivid image. The method for manufacturing a fine pattern includes the steps of forming a master substrate having an electrode layer patterned to a predetermined shape, forming peel layers made of a conductive water-repellent thin film on the master substrate, forming the fine pattern made of the electrodeposit resin on the peel layers, impregnating the electrodeposit resin with water, and stripping the fine pattern off the master substrate and transferring the fine pattern on a bonding layer of the media substrate. The color filter and the shading pattern filter are manufactured by the method for manufacturing the fine pattern. The color LCD element includes plastic film substrates, a transparent pixel electrode, a liquid crystal material, and color filters. The color filters are pasted on the plastic film with a bonding film laid therebetween. The color LCD element includes fine emittable filters two-dimensionally created as the color filter on a light-transmissive substrate so that the emittable filter is composed to seal at least one kind of the light-storage and the fluorescent coloring particles is sealed in-the electrodeposit resin layer.
摘要翻译：提供了一种制造精细图案的方法，该方法使得可以良好地再现和完全剥离和转印精细图案，重复使用母版基板，并且简单地形成具有良好批量生产率的高清晰度和高密度精细图案。此外，通过精细图案实现滤色器和阴影图案滤光器。提供了具有滤色器的彩色LCD元件，其能够输出没有颜色或亮度均匀性的良好颜色可再现的高质量图像。此外，提供了一种彩色LCD元件，其能够在来自光源或环境光的光消失之后连续地输出着色功能一定的时间并且形成更明亮和更生动的图像。精细图案的制造方法包括以下步骤：形成具有图案化为规定形状的电极层的母基板，在母基板上形成由导电性疏水性薄膜构成的剥离层，形成由电沉积物形成的微细图案树脂在剥离层上，用水浸渍电沉积树脂，并将精细图案从主基板上剥离并将精细图案转印到介质基板的粘合层上。彩色滤光片和阴影图案滤光片由精细图案的制造方法制造。彩色LCD元件包括塑料薄膜基板，透明像素电极，液晶材料和滤色器。将滤色片粘贴在塑料薄膜上，并将粘合薄膜铺在其间。彩色LCD元件包括在透光性基板上作为滤色器二维地形成的精细的可发射滤光片，使得可发射滤光片被构成为密封至少一种储光器，并将荧光着色颗粒密封在电沉积树脂层。

39. 发明授权

US5800723A Process for fabricating flex circuits and product thereby 失效
标题翻译：从而制造柔性电路和产品的方法
公开(公告)号：US5800723A
公开(公告)日：1998-09-01
申请号：US763958
申请日：1996-12-10
申请人： Frank J. Juskey , Douglas W. Hendricks , Sally A. Stallings
发明人： Frank J. Juskey , Douglas W. Hendricks , Sally A. Stallings
IPC分类号： C23F1/02 , H05K3/00 , H05K3/04 , H05K3/06 , B44C1/22 , C23F1/00 , H05K1/00
CPC分类号： C23F1/02 , H05K3/0079 , H05K3/046 , H05K3/061 , H05K2203/0528 , H05K2203/0537 , H05K2203/1105 , H05K2203/1545
摘要： A process (200) for fabricating a flex circuit (708, 806, 812, 818 or 824) using a fabrication process without the use of a photomask includes the steps of generating (412) an electronic image (702 or 802) of circuit traces (704 or 804) representing at least a single-sided flex circuit, and selectively thermal transferring (506 or 606) a resin to either a conductively clad or non-conductive flexible substrate (304) under the control of the electronic image (702 or 802) to form either an etch resist or a conductor which defines the circuit traces (704 or 804). The conductively clad flexible substrate (304) is etched to form the circuit traces (704 or 804) of the flex circuit defined by the etch resist, after which the etch resist is removed.
摘要翻译：用于使用不使用光掩模的制造工艺来制造柔性电路（708,806,818,818或824）的工艺（200）包括以下步骤：产生（412）电路迹线的电子图像（702或802）（704或804），其代表至少单面柔性电路，并且在电子图像的控制下将树脂选择性地热转印（506或606）到导电包覆或非导电柔性基板（304） 802）以形成蚀刻抗蚀剂或限定电路迹线（704或804）的导体。蚀刻导电包覆的柔性基板（304）以形成由蚀刻抗蚀剂限定的柔性电路的电路迹线（704或804），然后除去抗蚀剂。

40. 发明授权

US5696013A Method of manufacturing semiconductor device having unit circuit-blocks 失效
标题翻译：制造具有单位电路块的半导体器件的方法
公开(公告)号：US5696013A
公开(公告)日：1997-12-09
申请号：US463928
申请日：1995-06-05
申请人： Taiji Ema
发明人： Taiji Ema
IPC分类号： H01L21/82 , H01L21/3205 , H01L21/70 , H01L27/02 , H05K3/00 , H01L21/308 , H01L21/77
CPC分类号： G03F7/70433 , G03F7/70466 , H01L21/70 , H01L27/0207 , H05K3/0079
摘要： A semiconductor device having two or more unit circuit-blocks is produced by (a) forming in a chip area on a substrate two or more circuit-blocks by repeating, a required number of times, a process comprising exposing in sequence each block section within each chip area coated with a resist film, using masks for making respective circuit-blocks, developing a resist pattern, and a subsequent process using the pattern, and (b) forming external interconnections between the circuit-blocks using a resist pattern formed over the circuit-blocks.
摘要翻译：具有两个或多个单元电路块的半导体器件通过以下步骤来产生：（a）通过重复所需次数的步骤，在基板上的芯片区域中形成两个或更多个电路块，所述过程包括依次暴露每个块部分内的每个块部分每个芯片区域涂覆有抗蚀剂膜，使用用于制造各个电路块的掩模，显影抗蚀剂图案，以及使用该图案的后续处理，以及（b）在电路块之间形成外部互连，电路块。

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