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31. 发明授权

US09497526B2 Speaker apparatus and methods useful in conjunction therewith 有权
标题翻译：扬声器装置和与此有用的方法
公开(公告)号：US09497526B2
公开(公告)日：2016-11-15
申请号：US14293381
申请日：2014-06-02
申请人： AUDIO PIXELS LTD.
发明人： Yuval Cohen , Daniel Lewin , Shay Kaplan , Alex Sromin , Meir Ben Simon
IPC分类号： H04R3/12 , H04R1/00 , H02K41/03 , H02N13/00 , H04R1/40 , H04R3/00
CPC分类号： H04R1/005 , H02K41/03 , H02K2201/18 , H02N13/00 , H04R1/403 , H04R3/007 , H04R3/12 , H04R2201/403 , H04R2203/12 , H04R2460/03 , Y10T29/49005
摘要： An actuation system for generating a physical effect, the system comprising at least one array of translating elements each constrained to travel alternately back and forth along a respective axis, toward first and second extreme positions respectively, in response to activation of first and second forces respectively; and a controller operative to use the first and second forces to selectably latch at least one subset of said translating elements into the first and second extreme positions respectively.
摘要翻译：一种用于产生物理效应的致动系统，所述系统包括至少一个平移元件阵列，每个转移元件被分别围绕相应的轴线交替地前后移动，分别朝向第一和第二极限位置的第一和第二极限位置 ; 以及控制器，其操作以使用所述第一和第二力分别可选地将所述平移元件的至少一个子集锁定到所述第一和第二极限位置。

32. 发明授权

US09445170B2 Speaker apparatus and methods useful in conjunction therewith 有权
公开(公告)号：US09445170B2
公开(公告)日：2016-09-13
申请号：US14522963
申请日：2014-10-24
申请人： AUDIO PIXELS LTD.
发明人： Yuval Cohen , Daniel Lewin , Shay Kaplan , Alex Sromin , Meir Ben Simon
IPC分类号： H04R1/00 , H02K41/03 , H02N13/00 , H04R1/40 , H04R3/12 , H04R3/00
CPC分类号： H04R1/005 , H02K41/03 , H02K2201/18 , H02N13/00 , H04R1/403 , H04R3/007 , H04R3/12 , H04R2201/403 , H04R2203/12 , H04R2460/03 , Y10T29/49005
摘要： An actuation system for generating a physical effect, the system comprising at least one array of translating elements each constrained to travel alternately back and forth along a respective axis, toward first and second extreme positions respectively, in response to activation of first and second forces respectively; and a controller operative to use the first and second forces to selectably latch at least one subset of said translating elements into the first and second extreme positions respectively.

33. 发明授权

US09438140B2 Member for semiconductor manufacturing apparatus 有权
标题翻译：半导体制造设备会员
公开(公告)号：US09438140B2
公开(公告)日：2016-09-06
申请号：US13870254
申请日：2013-04-25
申请人： NGK INSULATORS, LTD.
发明人： Hideaki Takasaki , Takashi Kataigi
IPC分类号： H02N13/00 , H01L21/67 , H01L21/683 , H01L21/687
CPC分类号： H02N13/00 , H01L21/67109 , H01L21/6831 , H01L21/68721 , H01L21/68785
摘要： A member for a semiconductor manufacturing apparatus includes an electrostatic chuck, a cooling unit, a spacer (an O-ring, an outer periphery spacer, or the like) for securing a gap placed between the electrostatic chuck and the cooling unit, and a clamp ring placed on the upper surface of the outer periphery of the electrostatic chuck. The clamp ring is fastened to the cooling unit with screws. The screws are inserted into coil springs that prevent loosening, and are fastened to nuts. The coil springs are attached not to the clamp ring side but to the cooling unit side.
摘要翻译：半导体制造装置的构件包括用于固定放置在静电卡盘和冷却单元之间的间隙的静电卡盘，冷却单元，间隔件（O形环，外周间隔件等）和夹具环放置在静电卡盘的外周的上表面上。夹紧环用螺丝固定在冷却装置上。螺钉插入螺旋弹簧，防止松动，并固定在螺母上。螺旋弹簧不是连接到夹紧环侧而是连接到冷却单元侧。

34. 发明申请

US20160251265A1 CORROSION-RESISTANT MEMBER AND ELECTROSTATIC CHUCK DEVICE 审中-公开
标题翻译：耐腐蚀成员和静电切割装置
公开(公告)号：US20160251265A1
公开(公告)日：2016-09-01
申请号：US15027339
申请日：2014-10-15
申请人： SUMITOMO OSAKA CEMENT CO., LTD.
发明人： Kentaro Takahashi , Yoshiaki Moriya , Megumi Ootomo
IPC分类号： C04B35/44 , H05K7/20 , H01L21/683 , C04B35/645 , H02N13/00
CPC分类号： C04B35/44 , C04B35/6261 , C04B35/6262 , C04B35/62655 , C04B35/62675 , C04B35/645 , C04B2235/3217 , C04B2235/3222 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/5436 , C04B2235/5445 , C04B2235/761 , C04B2235/764 , C04B2235/768 , C04B2235/77 , C04B2235/9669 , C04B2235/9684 , C04B2235/9692 , H01L21/6831 , H01L21/6833 , H01L21/68757 , H02N13/00 , H05K7/2039
摘要： Provided are a corrosion-resistant member and an electrostatic chuck device using the same, in which corrosion resistance to halogen corrosive gas such as fluorine corrosive gas or chlorine corrosive gas and plasma thereof is high, dielectric constant and volume resistivity are high, and dielectric loss is low. The corrosion-resistant member is formed of a composite oxide sintered compact containing aluminum, samarium, and a rare earth metal element other than samarium, in which the rare earth metal element other than samarium has an ionic radius of 0.88×10−10 m or more.
摘要翻译：提供一种耐蚀性构件和使用其的静电吸盘装置，其中对氟腐蚀性气体或氯气腐蚀性气体及其等离子体的卤素腐蚀性气体的耐腐蚀性高，介电常数和体积电阻率高，并且介电损耗低。耐腐蚀部件由含有钐，钐以外的稀土元素的复合氧化物烧结体形成，其中钐以外的稀土金属元素的离子半径为0.88×10 -10 m，或更多。

35. 发明申请

US20160233122A1 SUBSTRATE PROCESSING SYSTEM AND METHOD 有权
公开(公告)号：US20160233122A1
公开(公告)日：2016-08-11
申请号：US15099523
申请日：2016-04-14
申请人： Intevac, Inc.
发明人： Terry Pederson , Henry Hieslmair , Moon Chun , Vinay Prabhakar , Babak Adibi , Terry Bluck
IPC分类号： H01L21/683 , H02N13/00
CPC分类号： H01L21/6833 , H01L21/26506 , H01L21/67745 , H01L21/6776 , H01L21/681 , H01L21/6831 , H01L31/1876 , H02N13/00 , Y02E10/50 , Y02P70/521
摘要： A system for processing substrates has a vacuum enclosure and a processing chamber situated to process wafers in a processing zone inside the vacuum enclosure. Two rail assemblies are provided, one on each side of the processing zone. Two chuck arrays ride, each on one of the rail assemblies, such that each is cantilevered on one rail assemblies and support a plurality of chucks. The rail assemblies are coupled to an elevation mechanism that places the rails in upper position for processing and at lower position for returning the chuck assemblies for loading new wafers. A pickup head assembly loads wafers from a conveyor onto the chuck assemblies. The pickup head has plurality of electrostatic chucks that pick up the wafers from the front side of the wafers. Cooling channels in the processing chucks are used to create air cushion to assist in aligning the wafers when delivered by the pickup head.

36. 发明申请

US20160186305A1 APPARATUS FOR DEPOSITION AND SUBSTRATE ALIGNMENT METHOD IN THE SAME 有权
标题翻译：用于沉积和底物对准方法的装置
公开(公告)号：US20160186305A1
公开(公告)日：2016-06-30
申请号：US14792443
申请日：2015-07-06
申请人： Samsung Display Co., Ltd.
发明人： Jeong Won Han
IPC分类号： C23C14/04 , C23C14/50
CPC分类号： C23C14/042 , B05C21/005 , C23C14/50 , C23C16/042 , H01L21/32139 , H01L21/6831 , H01L21/6833 , H01L51/0011 , H02N13/00
摘要： A deposition apparatus is disclosed. In one aspect, the apparatus includes a metal sheet of which an edge portion is integrally combined with a sheet frame and an electrostatic chuck attached to a bottom surface of the metal sheet and configured to pull a substrate based on a static electricity force. The apparatus also includes a metal mask placed below the electrostatic chuck, wherein an edge portion of the metal mask is combined with a mask frame, and wherein the metal mask has a predetermined patterned opening where the substrate is mounted to the upper surface thereof. The apparatus further includes a magnet plate placed above the metal sheet, and configured to pull the metal mask based on a magnetic force so as to attach the substrate to the electrostatic chuck.
摘要翻译：公开了一种沉积设备。一方面，该装置包括：金属板，其边缘部分与片材框架一体地组合;以及静电卡盘，其安装在金属板的底面上，并被构造成基于静电力拉动基板。该设备还包括放置在静电卡盘下方的金属掩模，其中金属掩模的边缘部分与掩模框架组合，并且其中金属掩模具有预定的图案化开口，其中基板安装到其上表面。该设备还包括一个放置在金属片上方的磁板，并被配置为基于磁力拉动金属掩模，从而将该基板固定在静电卡盘上。

37. 发明授权

US09349630B2 Methods and apparatus for electrostatic chuck repair and refurbishment 有权
标题翻译：静电卡盘修复和翻新的方法和装置
公开(公告)号：US09349630B2
公开(公告)日：2016-05-24
申请号：US14162041
申请日：2014-01-23
申请人： Applied Materials, Inc.
发明人： Govinda Raj , Robert T. Hirahara
IPC分类号： H01T23/00 , H01L21/683 , H01L21/687 , H02N13/00
CPC分类号： H01L21/6833 , H01L21/6831 , H01L21/68785 , H02N13/00 , Y10T29/49718
摘要： In one embodiment of the invention, a substrate support assembly comprises an electrostatic chuck having an electrode embedded therein and having an aperture disposed therethrough, a conductive liner disposed on the surface of the electrostatic chuck within the aperture, a conductive tubing extending from a lower surface of the electrostatic chuck and axially aligned with the aperture, and a conductive coating at least partially within the aperture and at least partially within the conductive tubing, wherein the conductive coating provides a conductive path between the conductive liner and the conductive tubing.
摘要翻译：在本发明的一个实施例中，一个基板支撑组件包括静电卡盘，该静电卡盘具有嵌入其中的电极，并且具有穿过其中的孔;导电衬套，其布置在孔内的静电卡盘的表面上，导电管从下表面延伸并且至少部分地在所述孔内并且至少部分地在所述导电管内的导电涂层，其中所述导电涂层在所述导电衬垫和所述导电管之间提供导电路径。

38. 发明授权

US09324598B2 Substrate processing system and method 有权
标题翻译：基板加工系统及方法
公开(公告)号：US09324598B2
公开(公告)日：2016-04-26
申请号：US13672652
申请日：2012-11-08
申请人： INTEVAC, INC.
发明人： Terry Pederson , Henry Hieslmair , Moon Chun , Vinay Prabhakar , Babak Adibi , Terry Bluck
IPC分类号： H01L21/677 , H01L21/265 , H01L21/68 , H01L31/18 , H01L21/683
CPC分类号： H01L21/6833 , H01L21/26506 , H01L21/67745 , H01L21/6776 , H01L21/681 , H01L21/6831 , H01L31/1876 , H02N13/00 , Y02E10/50 , Y02P70/521
摘要： A system for processing substrates has a vacuum enclosure and a processing chamber situated to process wafers in a processing zone inside the vacuum enclosure. Two rail assemblies are provided, one on each side of the processing zone. Two chuck arrays ride, each on one of the rail assemblies, such that each is cantilevered on one rail assemblies and support a plurality of chucks. The rail assemblies are coupled to an elevation mechanism that places the rails in upper position for processing and at lower position for returning the chuck assemblies for loading new wafers. A pickup head assembly loads wafers from a conveyor onto the chuck assemblies. The pickup head has plurality of electrostatic chucks that pick up the wafers from the front side of the wafers. Cooling channels in the processing chucks are used to create air cushion to assist in aligning the wafers when delivered by the pickup head.
摘要翻译：用于处理衬底的系统具有真空外壳和位于处理真空外壳内的处理区中的晶片的处理室。提供两个轨道组件，一个在处理区域的每一侧。两个卡盘阵列，每个在一个导轨组件上，使得每个卡盘阵列悬挂在一个导轨组件上并支撑多个卡盘。轨道组件联接到升降机构，其将轨道放置在用于处理的上部位置，并且在较低位置处返回用于装载新晶片的卡盘组件。拾取头组件将晶片从传送器装载到卡盘组件上。拾取头具有从晶片的前侧拾取晶片的多个静电卡盘。处理卡盘中的冷却通道用于产生气垫，以在由拾取头传送时帮助对准晶片。

39. 发明申请

US20160071755A1 ELECTROSTATIC CHUCK ASSEMBLIES CAPABLE OF BIDIRECTIONAL FLOW OF COOLANT AND SEMICONDUCTOR FABRICATING APPARATUS HAVING THE SAME 有权
标题翻译：具有冷却剂和半导体制造装置的双向流动的静电冲击组件
公开(公告)号：US20160071755A1
公开(公告)日：2016-03-10
申请号：US14842936
申请日：2015-09-02
申请人： Haejoong PARK , Hongmyoung KIM , Kye Hyun BAEK , Sangkyu PARK
发明人： Haejoong PARK , Hongmyoung KIM , Kye Hyun BAEK , Sangkyu PARK
IPC分类号： H01L21/683 , H02N13/00
CPC分类号： H02N13/00 , H01L21/67109 , H01L21/6831
摘要： An electrostatic chuck assembly, including an electrostatic chuck on which a substrate is loaded; a channel that provides a flow passage for coolant in the electrostatic chuck, the channel having a first opening at a first end corresponding to a center of the substrate and a second opening at a second end corresponding to an edge of the substrate; and a valve box to control a flow direction of the coolant in the channel, the valve box including a first supply valve to control an introduction of the coolant into the first opening; a first return valve to control a drainage of the coolant from the second opening; a second supply valve to control an introduction of the coolant into the second opening; and a second return valve to control a drainage of the coolant from the first opening.
摘要翻译：一种静电卡盘组件，包括其上装载有基底的静电卡盘; 该通道为静电卡盘中的冷却剂提供流动通道，所述通道在第一端处具有对应于基板的中心的第一开口和在对应于基板的边缘的第二端处的第二开口; 以及用于控制所述通道中的冷却剂的流动方向的阀箱，所述阀箱包括用于控制所述冷却剂引入所述第一开口的第一供给阀; 第一回流阀，用于控制来自第二开口的冷却剂的排放; 第二供给阀，用于控制冷却剂引入到第二开口中; 以及第二回流阀，用于控制来自第一开口的冷却剂的排放。

40. 发明申请

US20160028330A1 SAMPLE LOADING DEVICE FOR ELECTROSTATIC LEVITATION APPARATUS 审中-公开
标题翻译：用于静电吸引装置的样品装载装置
公开(公告)号：US20160028330A1
公开(公告)日：2016-01-28
申请号：US14840525
申请日：2015-08-31
申请人： Korea Research Institute of Standards and Science
发明人： Geun-Woo Lee , Sangho Jeon , Dong-Hee Kang
IPC分类号： H02N13/00 , G01N1/28
CPC分类号： H02N13/00 , F27B17/02 , G01N1/28 , G01N11/00 , H02N1/002
摘要： Sample loading device and electrostatic levitation apparatus. The electrostatic levitation apparatus includes a sample storage part including a rod-shaped sample standby part having an external diameter of a first diameter and a rod-shaped sample loading part having an external diameter of a second diameter and a sample cover part covering the sample standby part. The sample storage part has a loading bar inserting hole formed in its center. The loading bar inserting hole is formed through the sample standby part and is formed successively through a portion of the sample loading part. The sample standby part has sample storage vertical through-holes. The sample loading part has a single sample transfer vertical through-hole. The sample transfer vertical through-hole is formed on a surface where the sample storage vertical through-hole is viewed, penetrates the sample loading part, and is connected to the loading bar inserting hole.
摘要翻译：样品加载装置和静电悬浮装置。静电悬浮装置包括：样本收纳部，包括具有第一直径的外径的棒状样品备用部和具有第二直径的外径的棒状样品加载部，以及覆盖样品备用的样品盖部部分。样品存储部件具有形成在其中心的加载杆插入孔。装载杆插入孔通过样品待机部分形成，并且连续地通过样品装载部分的一部分形成。样品待机部件具有样品存储垂直通孔。样品加载部分具有单个样品转移垂直通孔。样品转移垂直通孔形成在观察样品储存垂直通孔的表面上，穿过样品装载部分，并连接到装载杆插入孔。

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